The invention relates to a charge accumulating type chemical and physical phenomenon detecting apparatus (or merely called the apparatus).
Typical examples of charge accumulating type chemical and physical phenomenon detecting apparatuses are disclosed in patent document 1 and patent document 2.
On a silicon substrate 10, n+ type dope regions 11, 13, and a p type dope region 15 are formed. In the p type dope region 15, a silicon oxide film 19 is deposited as a gate insulation film. On this silicon oxide film 19, two gate electrodes 22 and 24 are provided. Reference numeral 23 in the drawing is a silicon nitride film. On the silicon nitride film 23, a liquid cell 31 is provided, which is filled with an aqueous solution 32 for measuring the ion concentration (pH). Reference numeral 26 is a reference electrode, which is kept at a specific potential.
Those provided in the substrate, that is, the n+ region 11, the gate electrode 22, the gate electrode 24, and the n+ region 13 are respectively connected to terminals ID, ICG, TG, and FD, and a specific potential is applied at a specific timing. As a result, the n+ region 11 of the substrate becomes a charge supply unit 1, the portion corresponding to the gate electrode 22 becomes a charge injection adjusting part 2, the portion corresponding to the silicon nitride film 23 becomes a sensing part 3, the portion corresponding to the gate electrode 24 becomes a barrier part 4, and the n+ type region 13 becomes a floating diffusion part 5.
In the charge accumulating type chemical and physical phenomenon detecting apparatus of the prior art having such configuration, a theoretical operation is shown in
In standby state S1, an electric charge is accumulated in a floating diffusion part 5. This charge is accumulated by unit detection operation up to the last time. At this time, corresponding to the ion concentration of a solution 32, the potential of a sensing part 3 is changed.
By lowering the potential to be applied to a charge supply unit 1, an electric charge is supplied in the sensing part 3 (step 3). Consequently, by raising the potential of the charge supply unit 1, the charge scooped by a charge injection adjusting part 2 is left over in the sensing part 3 (step 5). At step 7, this residual charge is accumulated in the floating diffusion part 5.
By repeating the unit detection operations at step 1 to step 7, the charge is accumulated in the floating diffusion part 5. As a result, the sensitivity of detection is enhanced as shown in
According to the studies by the present inventors, it was difficult to enhance the sensitivity as shown in
An actual sensor output characteristic was as shown in
The inventors intensively investigated to find the cause of drop of sensitivity, and found that the sensitivity is lowered because of accumulation of trace charges in the sensing part, regardlessly of chemical or physical phenomenon to be detected.
One of the causes of accumulation of charge in the sensing part lies in a potential bump (barrier) 40 formed between the charge injection adjusting part 2 and the sensing part 3 as shown in
A second cause lies in the charge trapped in the interface state of the sensing part 3. The residual charge is also transferred to the floating diffusion part and causes to lower the sensitivity (see
A first aspect of the invention has a configuration as described below.
A charge accumulating type chemical and physical phenomenon detecting apparatus including a removing means for removing the charge remaining in the sensing part due to the potential bump formed between the sensing part and the charge injection adjusting part, from the sensing part.
According to the first aspect of the invention having such configuration, since the charge remaining in the sensing part is removed by the removing means, it is not transferred to the floating diffusion part. Hence, the output characteristic is improved, and the sensitivity is enhanced.
As the removing means, an elimination well is provided consecutively to the sensing part, and the charge remaining in this elimination well may be temporarily put aside. The elimination well can be provided in a simple structure of disposing electrodes, and thus the apparatus is not complicated. Therefore, an inexpensive apparatus can be presented.
An example of this elimination well 50 is shown in
According to the studies by the inventors, when the potential at the bottom of the elimination well 50 is constant, a new bump 51 is formed, and the charge is not scooped sufficiently due to the bump 51, and the charge is left over in the sensing part (see
Accordingly, the depth of a potential well of this elimination well is varied. More specifically, as shown in
In this example, by changing the potential in one elimination well, the depth of the potential well of the elimination well is changed, but by forming a new elimination well, too, the residual charge in the sensing part can be sucked in.
The charge sucked in the elimination well is desired to be removed from the elimination well. In an embodiment of the invention, the potential of the charge injection adjusting part is set higher than that of the elimination well, and the charge in the elimination well is distributed into the charge supply unit.
The charge may be trapped in the interface state existing between the silicon substrate corresponding to the sensing part 3 and the silicon oxide film, and it may take a long time until sucked completely in the elimination well or the floating diffusion part. To solve this problem, the position of charge existing in the sensing part is preferred to be separated from the substrate surface. More specifically, by doping an n type impurity in the surface of a p type region for forming the sensing part, the charge existing position can be transferred from the substrate surface to its inside (see
As a result, trapping of charge of the sensing part 3 in the interface state can be prevented.
An embodiment of the invention is described below.
A charge accumulating type chemical and physical phenomenon detecting apparatus 60 of the embodiment is shown in
The apparatus 60 of the embodiment includes a gate electrode (first charge control electrode) 22 and an elimination electrode (second charge control electrode) 62 formed between a charge supply unit 1 and a sensing part 3. The elimination electrode 62 controls the potential of the elimination well 50. The surface of a p type region 15 is transformed to an n type by polysilicon. As a result, trapping of charge in the surface state of the sensing part 3 is prevented.
Operation of the apparatus of the embodiment is explained with reference to
Step 1 shows a standby state. In this standby state, as explained in
At step 3, the potential of the charge supply unit 1 is lowered, and the charge is supplied in the sensing part 3. And then, by raising the potential of the charge supply unit 1, the charge after being scooped by the charge supply unit 1 is left over in the sensing part 3 (step 5). At this time, if signal is not staying in the sensing part 3, as explained in
Consequently, by raising the potential of the elimination well 50 and increasing the depth of the elimination well 50, the charge remaining in the sensing part 3 is sucked into the elimination well 50. Since the substrate surface corresponding to the sensing part 3 is doped in the n type, the charge is not trapped on this surface. Therefore, the charge can be removed from the sensing part 3 in a short time.
When a signal is staying in the sensing part 3, it may be sucked in the elimination well 50, but since the quantity is always the same, no adverse effect is given to the output.
In this embodiment, in the standby state, the potential of the elimination electrode 62 is raised, and the potential of the elimination well 50 is set deeper than the potential of the sensing part 3, but it may be set at the same potential as the sensing part 3, and at step 6, the potential of this part may set deeper.
At step 7, the potential of the barrier 4 is raised, and the charge in the sensing par 3 is transferred to the floating diffusion part 5. At this time, in the sensing part 3, since charge due to the potential bump is not left over, the remaining charge is not accumulated in the floating diffusion part 5. Besides, since the substrate surface of the sensing part 3 is doped in the n type, charge is not trapped therein, and if a signal is staying, the whole amount of charge accumulated in the sensing part 3 can be transferred to the floating diffusion part 5 completely and in a short time.
At step 9, the potential of the elimination well 50 is returned to the standby state.
Prior to step 9, preferably, the charge accumulated in the elimination well 50 should be discharged. Accordingly, for example, at step 8 shown in
A layout of the apparatus in the embodiment is shown in
The area of the sensing part 3 is 10000 μm2, the area of the floating diffusion part 5 is 1500 μm2. Film thickness of the silicon nitride film 23 as a cause of the potential bump is 0.1 μm.
This apparatus was calibrated in pH standard solution 32. The output voltage when sweeping the reference voltage Vref is shown in
A method of determining the pH from the characteristic shown in
A liquid cell 31 is filled with a solution of a specified pH (for example, standard solution of pH=7), and a relation of
In the graph obtained in
Next, the reference voltage is set at the specified Vref1, and different standard solutions are measured. In the example in
G(V)=F(x)=ax+b
where V is an output signal (voltage), in this case it is a differential value G (V) of a reset voltage and an output voltage. In other words, the differential value is expressed by the function G (V) of an output signal.
This linear function is a calibration curve for defining the relation of a pH value and an output value.
Therefore, it is known that the pH value can be specified from the output voltage V.
In the detecting apparatus 60 of the embodiment, by using L-glutamate oxidase instead of the silicon nitride film, or laminating on the silicon nitride film, a chemical phenomenon detecting apparatus capable of detecting L-glutamic acid can be composed. Or by fixing DNA or antigen on the silicon nitride film, antigen or antibody of DNA can be detected. It is also possible to deposite a metal film and/or an SAM film (self-forming monomolecular film) on the silicon nitride film.
At the position of the silicon nitride film, by connecting the output of a temperature sensor, a pressure sensor, or a magnetic sensor, a physical phenomenon detecting apparatus capable of measuring the temperature, pressure, or magnetism can be realized.
The invention is not limited to the illustrated embodiment or example alone, but may be changed or modified freely within the scope easily devised by those skilled in the art without departing from the true spirit of the invention.
Number | Date | Country | Kind |
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2005-069501 | Mar 2005 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2006/304868 | 3/13/2006 | WO | 00 | 4/4/2008 |
Publishing Document | Publishing Date | Country | Kind |
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WO2006/095903 | 9/14/2006 | WO | A |
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