Number | Name | Date | Kind |
---|---|---|---|
3514391 | Hablanian et al. | May 1970 | |
4356073 | McKelvey | Oct 1982 | |
4407708 | Landau | Oct 1983 | |
4410407 | Macaulay | Oct 1983 | |
4417968 | McKelvey | Nov 1983 | |
4422916 | McKelvey | Dec 1983 | |
4443318 | McKelvey | Apr 1984 | |
4466877 | McKelvey | Aug 1984 | |
4525264 | Hoffman | Jun 1985 | |
4619755 | Hessberger et al. | Oct 1986 | |
5108574 | Kirs et al. | Apr 1992 | |
5213672 | Hartig et al. | May 1993 |
Number | Date | Country |
---|---|---|
222900A | Apr 1984 | DDX |
3229969 | Apr 1983 | DEX |
55-12732 | Jan 1980 | JPX |
1-215975 | Aug 1989 | JPX |
WO9202659 | Feb 1992 | WOX |
Entry |
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Chapman, "Glow Discharge Processes: Sputtering and Plasma Etching," New York: John Wiley & Sons, 1980, pp. 196-198. |
Wright et al., "Design Advances and Applications of the Rotatable Cylindrical Magnetron," J. Vac. Sci. Technol. A, 4(3), May/Jun. 1986, pp. 388-392. |