BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 shows a view showing a basic structure of a defect inspection apparatus of a first embodiment;
FIG. 2 shows a view further explaining an arrangement of light sources 1A and 1B of FIG. 1 in detail;
FIG. 3 shows a view further explaining in detail a structure of a main control part 3 of FIG. 1;
FIG. 4 shows a flowchart showing a flow of an inspection processing executed by the main control part 3 of FIG. 2;
FIG. 5 shows a first view explaining an advantage of the defect inspection apparatus of the embodiment 1;
FIG. 6 shows a second view explaining the advantage of the defect inspection apparatus of the embodiment 1;
FIG. 7 shows a view explaining an inspection area by the defect inspection apparatus of the embodiment 1;
FIG. 8 shows a view explaining a result of inspecting the inspection area shown in FIG. 7 by the defect inspection apparatus of the embodiment 1;
FIG. 9 shows a flowchart showing the flow of inspection processing in the defect inspection apparatus of an embodiment 2;
FIG. 10 shows a schematic view showing a structure of a conventional defect inspection apparatus;
FIG. 11 shows a view schematically showing an inspection of irregularity defects by a main control part 113 of FIG. 10;
FIG. 12 shows a view explaining a problem generated in the inspection by the defect inspection apparatus 110 of FIG. 10, when an inspected surface is a curved surface;
FIG. 13 shows a view explaining a method of securing a wide inspection area when the inspected surface is the curved surface;
FIG. 14 shows a view explaining the problem of an inspection method disclosed in Japanese Patent Application Laid Open No. 11-23243;
FIG. 15 shows a view explaining a defect detection on an edge part of an inspection area; and
FIG. 16 shows a view explaining light received by an imaging apparatus when the inspected surface of a work is a flat surface.