Claims
- 1. A cationic initiator composition for initiating cationic polymerization comprising:
a) a sulfur- or nitrogen-containing initiator and b) a deodorizing agent; wherein the deodorizing agent reduces the odor of the initiator composition upon initiation.
- 2. The composition of claim 1, wherein the initiator is a sulfonium salt.
- 3. The composition of claim 1, wherein cationic polymerization of the composition is initiated by a member selected from the group consisting of ultraviolet, visible light, infrared, microwaves, radio, alpha, beta, gamma, X-rays and electron beams.
- 4. The composition of claim 1, wherein the deodorizing agent is a free radical inhibitor or a phenolic compound.
- 5. The composition of claim 4, wherein the phenolic compound is a quinone or a quinone derivative.
- 6. The composition of claim 5, wherein the quinone derivative is selected from the group consisting of hydroquinone, toluhydroquinone and methylether of hydroquinone.
- 7. The composition of claim 6, wherein the quinone derivative is methylether of hydroquinone.
- 8. The composition of claim 3, wherein the initiator comprises an arylsulfonium salt or a phenacylsulfonium salt.
- 9. The composition of claim 8, wherein the arylsulfonium salt or phenacylsulfonium salt is selected from the group consisting of dialkylphenacylsulfonium salts, dialkyl-4-hydroxyphenylsulfonium salts, bis-p-diphenylsulfoniumphenylsulfide salts, diphenylphenylthiophenyl sulfonium salts, benzylsulfonium salts, benzyltetramethylene sulfonium salts, benzyl(p-hydroxyphenyl)methyl-sulfonium salts, triarylsulfonium salts, triphenylsulfonium salts and mixtures thereof.
- 10. The composition of claim 6, wherein the initiator comprises an arylsulfonium salt or a phenacylsulfonium salt.
- 11. The composition of claim 10, wherein the arylsulfonium salt or phenacylsulfonium salt is selected from the group consisting of dialkylphenacylsulfonium salts, dialkyl-4-hydroxyphenylsulfonium salts, bis-p-diphenylsulfoniumphenylsulfide salts, diphenylphenylthiophenyl sulfonium salts, benzylsulfonium salts, benzyltetramethylene sulfonium salts, benzyl(p-hydroxyphenyl)methyl-sulfonium salts, triarylsulfonium salts, triphenylsulfonium salts and mixtures thereof.
- 12. The composition of claim 1 further comprising a solvent.
- 13. The composition of claim 12, wherein said solvent is selected from the group consisting of propylene carbonate, γ-butyrolactone, tetrahydrofuran, N,N-dimethylformamide, tetrahydropyran, aliphatic alcohols, aliphatic hydrocarbons, aromatic hydrocarbons, dioxane, dimethoxyethane, acetone, acetonitrile and mixtures thereof.
- 14. The composition of claim 13, wherein the solvent is propylene carbonate or γ-butyrolactone.
- 15. A curable cationic polymerizable composition comprising:
a) a sulfonium salt initiator, b) polymerizable material, and c) a deodorizing agent; wherein the deodorizing agent reduces the odor of the composition upon initiation.
- 16. In a process for curing a cationic polymerizable composition containing:
a) a sulfonium salt initiator and b) polymerizable material; the improvement which comprises adding a deodorizing agent to said composition in order to reduce the odor upon curing.
- 17. A photoresist composition comprising:
a photoactive sulfonium salt, a resin binder and a deodorizing agent; wherein said deodorizing agent reduces the odor of the photoresist composition upon cure.
- 18. The photoresist composition of claim 17, wherein said composition is a chemically amplified positive-acting photoresist.
- 19. The photoresist composition of claim 17, wherein said composition is a negative-acting photoresist.
- 20. An article of manufacture having at least one surface, wherein said at least one surface comprises a coating layer of the photoresist composition of claim 17.
- 21. In a process for preparing a photoresist composition containing:
a) a photoactive sulfonium salt and b) a resin binder; the improvement which comprises adding a deodorizing agent to said photoresist composition in order to reduce the odor upon curing.
- 22. The process of claim 21, wherein said photoresist composition is a chemically amplified positive-acting photoresist composition.
- 23. The process of claim 21, wherein said photoresist composition is a negative-acting photoresist composition.
Parent Case Info
[0001] This is a continuation-in-part of Ser. No. 09/933,910, filed Aug. 22, 2001.
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
09933910 |
Aug 2001 |
US |
Child |
10218641 |
Aug 2002 |
US |