Claims
- 1. A polymer formed by polymerization of a compound having the formula: ##STR7## where R is an unsubstituted or substituted alkylene, an epoxy, a silyl or alkoxysilyl group, and where X and Y are hydrogen or a halogen.
- 2. A polymer according to claim 1 where X is a halogen and Y is hydrogen.
- 3. A polymer according to claim 1 where R is vinyl, .beta.-chlorovinyl, .beta.-methylvinyl, (.beta.-acetoxy)vinyl, .beta.-phenylvinyl), .beta.,.beta.-dimethylvinyl, .alpha.-chlorovinyl, or (.beta.-methoxycarbonyl-.beta.-methyl)vinyl.
- 4. A polymer according to claim 1 where R is an alkylene group having from 1 to 4 carbon atoms.
- 5. A polymer according to claim 1 where R is trimethylsilyl.
- 6. A polymer according to claim 1 where R is an epoxy having from 1 to 4 carbon atoms.
Parent Case Info
This is a division of application Ser. No. 862,742, filed May 13, 1986 and now U.S. Pat. No. 4,649,207, which is a continuation-in-part of prior application Ser. No. 646,999, filed Sept. 4, 1984 and now abandoned.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
4503254 |
Kelleghan |
May 1985 |
|
Non-Patent Literature Citations (2)
Entry |
Chemical Abstracts 89:180690u, "Dielectric Properties of Glass-Fabric Laminates Based on Halogen-Containing Epoxy Resins", Shirokov et al., 1978. |
Chemical Abstracts 102:114582w, "Impact-Resistance Matrix Resins for Advanced Composites", Gardner et al., 1985 (Appl. publ. Nov. 28, 1984). |
Divisions (1)
|
Number |
Date |
Country |
Parent |
862742 |
May 1986 |
|
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
646999 |
Sep 1984 |
|