The present disclosure relates to a deterioration evaluation method of a line sensor, a spectrum measurement device, and a computer readable medium.
Recently, in a semiconductor exposure apparatus, improvement in resolution has been desired for miniaturization and high integration of semiconductor integrated circuits. For this purpose, an exposure light source that outputs light having a shorter wavelength has been developed. For example, as a gas laser device for exposure, a KrF excimer laser device for outputting laser light having a wavelength of about 248 nm and an ArF excimer laser device for outputting laser light having a wavelength of about 193 nm are used.
The KrF excimer laser device and the ArF excimer laser device each have a large spectral line width of about 350 to 400 pm in natural oscillation light. Therefore, when a projection lens is formed of a material that transmits ultraviolet rays such as KrF laser light and ArF laser light, there is a case in which chromatic aberration occurs. As a result, the resolution may decrease. Then, a spectral line width of laser light output from the gas laser device needs to be narrowed to the extent that the chromatic aberration can be ignored. For this purpose, there is a case in which a line narrowing module (LNM) including a line narrowing element (etalon, grating, and the like) is provided in a laser resonator of the gas laser device to narrow a spectral line width. In the following, a gas laser device with a narrowed spectral line width is referred to as a line narrowing gas laser device.
A deterioration evaluation method of a line sensor according to an aspect of the present disclosure includes detecting an interference fringe of pulse laser light using the line sensor; calculating, based on a signal value obtained from each of a plurality of sensor channels included in a sensor channel range being at least a part of the line sensor in accordance with light intensity of the interference fringe, an evaluation value which is an index of deterioration for each of the sensor channels or each group of the sensor channels, and storing the evaluation value in a storage device; and determining a deterioration state of the line sensor based on the evaluation value.
A spectrum measurement device according to another aspect of the present disclosure includes an optical system configured to generate an interference fringe by causing pulse laser light to be incident thereon, a line sensor configured to detect the interference fringe, and a processor configured to process information obtained from the line sensor. Here, the processor is configured to calculate, based on a signal value obtained from each of a plurality of sensor channels included in a sensor channel range being at least a part of the line sensor in accordance with light intensity of the interference fringe, an evaluation value which is an index of deterioration for each of the sensor channels or each group of the sensor channels, store the evaluation value in a storage device, and determine a deterioration state of the line sensor based on the evaluation value.
A computer readable medium according to another aspect of the present disclosure, being a non-transitory computer readable medium, in which a program is recorded, the program causing a processor to execute a process of acquiring a signal output from a line sensor which detects an interference fringe of pulse laser light, a process of calculating, based on a signal value obtained from each of a plurality of sensor channels included in a sensor channel range being at least a part of the line sensor in accordance with light intensity of the interference fringe, an evaluation value which is an index of deterioration for each of the sensor channels or each group of the sensor channels and storing the evaluation value in a storage device, and a process of determining a deterioration state of the line sensor based on the evaluation value.
Embodiments of the present disclosure will be described below merely as examples with reference to the accompanying drawings.
1. Description of terms and technology
5. First embodiment
Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The embodiments described below show some examples of the present disclosure and do not limit the contents of the present disclosure. Also, all configurations and operation described in the embodiments are not necessarily essential as configurations and operation of the present disclosure. Here, the same components are denoted by the same reference numeral, and duplicate description thereof is omitted.
The laser light is incident on the diffusion element 12. The diffusion element 12 scatters the incident laser light. The scattered light enters the FP etalon 14. The laser light transmitted through the FP etalon 14 is incident on the light concentrating lens 16. The laser light is transmitted through the light concentrating lens 16 and generates interference fringes on the focal plane. The line sensor 18 is arranged at the focal plane of the light concentrating lens 16 having a focal length f. The transmitted light concentrated by the light concentrating lens 16 causes interference fringes to be generated at the position of the line sensor 18. The line sensor 18 detects the light intensity of the interference fringes generated by the FP etalon 14.
As shown in
In general, the interference fringes of an etalon are expressed by the following Expression (1).
Here, λ is the wavelength of laser light, n is the refractive index of an air gap, d is the distance between mirrors, m is an integer which is not 0, θ is the incident angle of the laser light, and rm is the interference fringe radius.
As shown in Expression (1), the square of the interference fringe radius rm is proportional to the wavelength λ of the laser light. Therefore, the spectral line width (spectral profile) and the center wavelength of the entire laser light can be detected from the detected interference fringes. The spectral line width and the center wavelength may be obtained from the detected interference fringes by an information processing device (not shown) or may be calculated by a wavelength control unit (e.g., a wavelength control unit 60 of
r
m
2=(r12+r22)/2 (2)
The half value of the interference fringe indicates a half value (50% intensity) Imax/2 of peak intensity Imax at the fringe peak in the waveform indicating the intensity distribution.
As described above, the wavelength λ of the laser light is proportional to the square of the interference fringe radius rm. Using this relationship, a fringe order is defined as an index representing the relative position of the fringe peak in the wavelength space. The fringe order is calculated as follows.
First, in a similar manner as in
r
m1
2=(r112+r212)/2 (3)
Similarly, as shown in
r
m2
2=(r122+r222)/2 (4)
Here, MavEx is defined by the following Expression (5), where the fringe order at a position with a distance from the fringe center being r is taken as MavEx.
MavEx=r2/(rm22−rm12) (5)
As shown in
For example, in the left half from the fringe center, the fringe with MavEx being 1.21 is the only fringe with MavEx being between 0.5 and 1.5. This property of the fringe order makes it possible to calculate the center wavelength and the spectral line width by selecting a fringe in a specific range.
The output coupling mirror 30 and the line narrowing module 32 configure a laser resonator. The chamber 20 is arranged on the optical path of the laser resonator. The line narrowing module 32 includes a plurality (e.g., two) of prisms 34, a grating 36, and a rotation stage 38.
The prism 34 is arranged to function as a beam expander. The grating 36 is arranged in the Littrow arrangement so that the incident angle and the diffraction angle coincide with each other. The prism 34 is installed on the rotation stage 38, and is arranged such that the incident angle of on the grating 36 changes by the rotation of the prism 34 with the rotation stage 38.
The chamber 20 includes windows 22a, 22b and a pair of electrodes 24a, 24b. The chamber 20 contains a laser gas. The laser gas may include, for example, an Ar gas or a Kr gas as a rare gas, an F2 gas as a halogen gas, and an Ne gas as a buffer gas.
The electrodes 24a, 24b are arranged in the chamber 20 so as to face each other in a direction (V direction) perpendicular to the paper surface of
The power source 26 includes a switch 28, and applies a high voltage between the electrodes 24a, 24b in the chamber 20 when the switch 28 is turned on.
The windows 22a, 22b are arranged such that the laser light amplified by discharge excitation between the electrodes 24a, 24b passes therethrough.
The output coupling mirror 30 is coated with a film that reflects a part of the laser light and transmits the other part.
The monitor module 40 includes a beam splitter 41, a beam splitter 42, a light concentrating lens 43, a pulse energy monitor 44, a sealed chamber 45, a line sensor 52, and a line sensor 53.
The beam splitter 41 is arranged, on the optical path of the laser light output from the output coupling mirror 30, such that the laser light reflected by the beam splitter 41 is incident on the beam splitter 42. The laser light transmitted through the beam splitter 41 is output from the laser device 101. An exposure apparatus 302 is arranged such that the laser light output from the laser device 101 enters the exposure apparatus 302.
The beam splitter 42 is arranged, on the optical path of the laser light reflected by the beam splitter 41, such that the laser light reflected by the beam splitter 42 enters the pulse energy monitor 44. The pulse energy monitor 44 may be a photodiode, a photoelectric tube, or a pyro-element.
The light concentrating lens 43 is arranged such that the laser light transmitted through the beam splitter 42 is incident thereon.
The sealed chamber 45 includes a diffusion plate 46, a fine etalon 47, a coarse etalon 48, a beam splitter 49, a light concentrating lens 50, and a light concentrating lens 51.
The diffusion plate 46 is arranged in the vicinity of the concentration position of the light concentrating lens 43. The diffusion plate 46 is an optical element made of synthetic quartz having one surface flat and the other surface processed into a ground glass shape. The diffusion plate 46 is sealed to the sealed chamber 45 with an O-ring (not shown).
The fine etalon 47 is arranged such that the laser light transmitted through the diffusion plate 46 is transmitted through the beam splitter 49 and enters the fine etalon 47. The beam splitter 49 is arranged, on the optical path between the diffusion plate 46 and the fine etalon 47, such that the laser light partially reflected by the beam splitter 49 enters the coarse etalon 48. Each of the fine etalon 47 and the coarse etalon 48 may be an air gap etalon in which two mirrors each coated with a partial reflection film are joined via a spacer.
A free spectral range FSRf of the fine etalon 47 and a free spectral range FSRc of the coarse etalon 48 satisfy the following Expression (6).
FSRf<FSRc (6)
A free spectral range FSR is expressed by the following Expression (7).
FSR=λ2/(2nd) (7)
Generally, when the finesse of the etalon is F, the resolution R is expressed by R=FSR/F. When the finesse F is fixed, the resolution R becomes large as FSR becomes small. However, when FSR becomes small, the interference fringes become substantially the same in a case where the wavelength changes by the amount of the FSR, and thus it cannot be distinguished by measurement using one etalon having small FSR.
Therefore, when the wavelength is changed by about 400 pm and measured with high accuracy as in the case of an excimer laser, the wavelength can be measured with high accuracy by measuring the interference fringes of the fine etalon 47 and the coarse etalon 48 by the line sensor 52 and the line sensor 53, respectively. FSRf of the fine etalon 47 may be, for example, 10 pm, and FSRc of the coarse etalon 48 may be, for example, 400 pm.
The light concentrating lens 50 is arranged on the optical path of the laser light transmitted through the fine etalon 47, and is sealed with an O-ring (not shown) to the sealed chamber 45. The light concentrating lens 51 is arranged on the optical path of the laser light transmitted through the coarse etalon 48, and is sealed with an O-ring (not shown) to the sealed chamber 45. The focal length of the light concentrating lens 51 is shorter than the focal length of the light concentrating lens 50.
The line sensor 52 and the line sensor 53 are arranged at the focal plane positions of the light concentrating lens 50 and the light concentrating lens 51, respectively. Each of the line sensor 52 and the line sensor 53 has a plurality of light receiving elements arranged one-dimensionally, and outputs a detection signal corresponding to the light intensity of the received interference fringes. Each of the line sensor 52 and the line sensor 53 includes a signal processing circuit including an A/D converter that converts a detection signal corresponding to the received light amount into digital data. The light amount detected by the respective light receiving elements of the line sensors 52, 53 is output respectively from the line sensors 52, 53 as a signal value represented by, for example, a 12 bit digital value.
The light receiving element corresponds to a “pixel”, and each of the plurality of light receiving elements is referred to as a sensor channel. The position of the interference fringes on the detection plane can be represented by a sensor channel number indicating the position of the sensor channel.
The interference fringes of the etalon are expressed by Expression (8) from Expression (1).
mλ=2nd·cos θ (8)
The wavelength control unit 60 is configured to be capable of communicating with the line sensor 52, the line sensor 53, the laser control unit 61, and the driver 62. The wavelength control unit 60 and the laser control unit 61 are realized by using a processor. The processor of the present disclosure is a processing device including a storage device in which a control program is stored and a central processing unit (CPU) that executes the control program. The processor is specifically configured or programmed to perform various processes included in the present disclosure. The processor functioning as the wavelength control unit 60 and the processor functioning as the laser control unit 61 may be separately provided, or both functions may be realized by one processor.
The laser control unit 61 is configured to be capable of communicating with the power source 26, the switch 28, the pulse energy monitor 44, and the exposure apparatus control unit 310 of the exposure apparatus 302. The driver 62 is configured to be capable of communicating with the rotation stage 38.
The laser control unit 61 reads data of a target pulse energy Et and a target wavelength λt from the exposure apparatus control unit 310. The laser control unit 61 transmits a charge voltage V to the power source 26 and the target wavelength λt to the wavelength control unit 60 so that the pulse energy of the pulse laser light becomes the target pulse energy Et and the oscillation wavelength becomes the target wavelength λt. The laser control unit 61 turns on the switch 28 based on an oscillation trigger transmitted from the exposure apparatus control unit 310.
When the switch 28 is turned on, a high voltage is applied between the electrodes 24a, 24b, and discharge occurs to excite the laser gas. When the laser gas is excited, laser oscillation occurs in the laser resonator configured by the line narrowing module 32 and the output coupling mirror 30, and line narrowed pulse laser light is output from the output coupling mirror 30.
The pulse laser light output from the output coupling mirror 30 and sampled by the beam splitter 41 is incident on the beam splitter 42. The reflection light of the beam splitter 42 enters the pulse energy monitor 44, and the transmission light of the beam splitter 42 is incident on the diffusion plate 46 of the sealed chamber 45.
The laser control unit 61 controls the charge voltage V of the power source 26 based on the detection result of the pulse energy monitor 44 so that the pulse energy of the pulse laser light becomes the target pulse energy Et.
On the other hand, the wavelength control unit 60 measures the light intensity distribution of the interference fringes generated by the coarse etalon 48 and the fine etalon 47 for each pulse using the line sensor 53 and the line sensor 52, and reads the data thereof. The wavelength control unit 60 calculates the measurement wavelength λ of the pulse laser light for each pulse from the data of the light intensity distribution of the interference fringes read for each pulse. The calculation of the measurement wavelength λ may be performed from data obtained by performing integration or averaging of a plurality of pulses instead of each pulse. The wavelength control unit 60 controls the rotation stage 38 of the prism 34 via the driver 62 based on the measurement wavelength λ so that the oscillation wavelength of the pulse laser light becomes the target wavelength λt.
As described above, the pulse energy and the oscillation wavelength of the laser device 101 are stabilized to the target pulse energy Et and the target wavelength λt given by the exposure apparatus 302. Here, since the sealed chamber 45 is sealed, the difference in the refractive index n of the air gap in Expression (1) between the coarse etalon 48 and the fine etalon 47 is suppressed to be small, and the error of the wavelength measurement due to the drift of the coarse etalon 48 and the fine etalon 47 is reduced.
The beam splitter 70 is arranged on the optical path of the laser light having passed through the light concentrating lens 43. The aperture 71 is arranged in the vicinity of the concentration position of the light concentrating lens 43 such that the laser light reflected by the beam splitter 70 is incident thereon.
The mirror 72 is arranged such that the laser light having passed through the aperture 71 is incident thereon. The collimating lens 73 is arranged such that the laser light reflected by the mirror 72 is incident thereon. The coarse grating 74 is arranged so as to reflect the laser light incident from the collimating lens 73 toward the collimating lens 73.
The line sensor 53 is arranged such that the laser light reflected by the coarse grating 74 and having passed through the collimating lens 73 enters. Other configurations may be similar to those in
The pulse laser light output from the output coupling mirror 30 and sampled by the beam splitter 41 is incident on the beam splitter 42. The transmission light from the beam splitter 42 is transmitted through the light concentrating lens 43 and is incident on the beam splitter 70.
The reflection light of the beam splitter 70 is incident on the aperture 71. The transmission light of the beam splitter 70 is incident on the diffusion plate 46 of the sealed chamber 45.
The pulse laser light having passed through the aperture 71 is reflected by the mirror 72, is collimated by the collimating lens 73, and is incident on the coarse grating 74. The pulse laser light diffracted by the coarse grating 74 is transmitted through the collimating lens 73 and generates interference fringes at the position of the light receiving surface of the line sensor 53.
As described above, according to the laser device 102, the wavelength range corresponding to the free spectral range FSRc of the coarse etalon 48 can be measured by the grating spectrometer. Therefore, similarly to the laser device 101, the laser device 102 shown in
The line sensors 52, 53 of the monitor module 40 each have a lifetime. The line sensors 52, 53 deteriorate due to long term use, and the sensor sensitivity thereof is decreased.
As can be seen from the comparison between
In the laser devices 101, 102 shown in the first comparative example and the second comparative example, the monitor module 40 used in excess of a number of shots (shot limit) determined in advance assuming this deterioration was replaced uniformly.
However, it has been found that, depending on the usage conditions of the monitor module 40 and individual differences between the line sensors 52, 53, even when used in excess of the shot limit, the linearity error is within an allowable range and many monitor modules 40 are sufficiently usable.
Therefore, it is economically desirable to evaluate the deterioration of the uniformity of the sensor sensitivity of the line sensors 52, 53 or the measurement linearity error of the etalon measurement instrument in a field of a semiconductor manufacturing factory or the like, and replace only the monitor module 40 having a problem. Accordingly, there has been a demand for a method of individually evaluating the deterioration state of the line sensors 52, 53 to determine whether or not replacement is necessary.
Operation of the sensor data management unit 160 will be described. Here, the deterioration evaluation method is exemplified using the line sensor 52 as an example, but the deterioration evaluation method for other line sensors such as the line sensor 53 is also similar.
[Step 1A] The sensor data management unit 160 integrates the number of times the light amount of the fringe pattern exceeds a threshold for each sensor channel of the line sensor 52, and stores the count value for each sensor channel in the storage unit 166 in the sensor data management unit 160. For example, when the digital output standard of each sensor channel of the line sensor 52 is 12 bits, the signal value output from the sensor channel indicating the light amount measurement value may be a value of 0 to 4095. In this case, since the SN ratio is increased to such an extent that the signal value is not saturated, the signal value is often adjusted so that the fringe peak value becomes 2000 to 3000.
The table shown in
Subsequently, with respect to the fringe waveform of a second pulse, similarly, counting is performed only for the sensor channels exceeding the light amount threshold Th1 and addition is performed to the previously recorded (previous) count value.
In this way, the sensor data management unit 160 integrates the number of times the light amount threshold Th1 is exceeded for each sensor channel. The count value is used as an index (evaluation index of local deterioration) for quantitatively evaluating local deterioration due to accumulation of light reception of each sensor channel. It can be evaluated that the deterioration degree becomes high as the count value becomes large. The count value is an example of the “evaluation value” in the present disclosure.
The integration for each sensor channel exceeding the light amount threshold Th1 may be performed not for all pulses but for every certain number of pulses. For example, the integration for each sensor channel exceeding the light amount threshold Th1 may be performed at a frequency of 1 pulse every 10 pulses.
Further, the integration for sensor channels exceeding the light amount threshold Th1 may be performed not for the fringe waveform obtained by 1 pulse but for the fringe waveform obtained by integration of a certain number of pulses. For example, the integration for the sensor channels exceeding the light amount threshold Th1 may be performed on each fringe waveform obtained by integrating irradiation of 10 pulses.
The determination of whether or not the light amount threshold Th1 has been exceeded is not limited to the process in which the light amount measurement values detected by the respective sensor channels are directly compared with the light amount threshold Th1 as shown in
[Step 2A] The calculation unit 164 of the sensor data management unit 160 calculates, each time, the maximum value of the count values of the respective sensor channels counted by the process in step 1A. Alternatively, the maximum value, the minimum value, and the average value are calculated each time, and the difference between the maximum value and the minimum value or the difference between the maximum value and the average value is calculated each time. Here, “each time” means each time data of the fringe light amount is read from the line sensor 52. In a case in which data is read once per pulse, this means that data is read once each time in units of a pulse, and in a case in which data is read once from the line sensor 52 per the integration of a certain number of pulses, this means that data is read each time in units of a certain number of pulses.
[Step 3A] The sensor data management unit 160 sets a threshold Th2 for the maximum value of the count values obtained by the process in step 2A, and determines that the line sensor 52 is in a deteriorated state in which an accurate fringe pattern cannot be obtained when the maximum value exceeds the threshold Th2. For example, when the threshold Th2 for the maximum value of the count values is set to 50,000,000,000 (50 billion) and the maximum value of the count values of the sensor channels recorded in the sensor data management unit 160 as shown in
The threshold determination method applied to the maximum value may be applied to the value of the difference between the maximum value and the minimum value or the value of the difference between the maximum value and the average value. The threshold Th2 set to 50 billion is an example of the “second threshold” in the present disclosure.
[Step 4A] When the value counted in step 2A or the threshold Th2 for determination causes an overflow, the sensor data management unit 160 may use a value obtained by dividing the counted value or the threshold Th2 by a certain value. For example, the threshold Th2 exemplified in step 3A may be a value obtained by dividing 50 billion by 1,000,000, that is, 50,000. In this case, the count value recorded for each sensor channel of the line sensor 52 may be integrated by similarly dividing the value by 1,000,000, and the threshold determination may be performed by calculating the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value. The divisor 1,000,000 is an example of the “first constant” in the present disclosure.
[Step 5A] The count value of each sensor channel and the result of the threshold determination may be displayed on a user interface that monitors the operation state of the laser device 110. For example, the processor functioning as the sensor data management unit 160 may be connected to a display device (not shown), and the count values and the result of the threshold determination may be displayed on the display device.
[Step 6A] When the value used for the threshold determination (the count value in the first embodiment) exceeds the threshold Th2, a warning may be displayed on the user interface in step 5A, or the occurrence of the warning may be recorded in a log. The sensor data management unit 160 may execute at least one of a process of displaying the determination result on the display device, a process of recording the determination result in the log, and a process of performing notification based on the determination result.
<Others> Although the above operation is described using a fringe pattern formed by the etalon spectroscope, similar operation may be performed not only for an etalon spectroscope but also for a grating spectroscope. Here, although an example in which an etalon spectrometer is used will be described for second to sixth embodiments described below, similar operation as in the second to sixth embodiment may be performed for the grating spectrometer. The etalon spectrometer and the grating spectrometer are examples of the “optical system” in the present disclosure.
According to the first embodiment, since a decrease in sensitivity of a specific sensor channel of the line sensor 52, 53 can be detected, it is possible to replace the line sensor 52 or the line sensor 53 that has deteriorated or the monitor module 40 while the influence is small. Thus, it is possible to maintain a state in which the wavelength and the spectral line width can be appropriately measured.
Further, according to the first embodiment, since the replacement can be performed after detecting that the line sensor 52, 53 is actually in a deteriorated state, it is economically advantageous as compared with a case in which the replacement is uniformly performed based on the shot limit.
The configuration of a second embodiment may be similar to that of the first embodiment shown in
Differences from the first embodiment will be described. In the first embodiment, the number of times the signal value of each sensor channel (a value corresponding to the light amount) output in accordance with the light intensity of the interference fringe exceeds the light amount threshold Th1 is counted for each sensor channel, but in the second embodiment, the signal value of each sensor channel is integrated for each sensor channel, and the deterioration state is evaluated using the light amount integration values. The sensor data management unit 160 of the second embodiment operates as follows.
[Step 1B] The sensor data management unit 160 integrates the light amount of the fringe pattern for each sensor channel of the line sensor 52, and stores the light amount integration value for each sensor channel in the storage unit 166 in the sensor data management unit 160. For example,
Subsequently, when the fringe waveform of the second pulse detected on the same line sensor 52 having 448 channels is obtained as a graph shown in
The light amount integration may be performed not for all pulses but for every certain number of pulses. For example, the light amount integration for each sensor channel may be performed at a frequency of 1 pulse every 10 pulses.
Further, the light amount integration may be performed not for the fringe waveform obtained by 1 pulse but for the fringe waveform obtained by integration of a certain number of pulses. For example, the light amount integration for each sensor channel may be performed on each fringe waveform obtained by integrating 10 pulses of irradiation.
Further, the light amount integration may be performed on the fringe waveform after subtracting the average value of the background noise calculated in advance.
[Step 2B] The calculation unit 164 of the sensor data management unit 160 calculates, each time, the maximum value of the light amount integration values of the respective sensor channels integrated by the process in step 1B. Alternatively, the maximum value, the minimum value, and the average value of the light amount integration value of each sensor channel are calculated each time, and the difference between the maximum value and the minimum value or the difference between the maximum value and the average value is calculated each time.
[Step 3B] The sensor data management unit 160 sets a threshold Th3 for the maximum value of the light amount integration values obtained by the process in step 2B, and determines that the line sensor 52 cannot obtain an accurate fringe pattern when the maximum value of the light amount integration value exceeds the threshold Th3.
The threshold determination method applied to the maximum value may be applied to the difference between the maximum value and the minimum value or the difference between the maximum value and the average value. The threshold Th3 set to 100 trillion is an example of the “second threshold” in the present disclosure.
[Step 4B] When the light amount integration value of step 2B or the threshold Th3 for determination causes an overflow in step 3B, a value obtained by dividing the light amount integration value or the threshold Th3 by a certain constant value may be used. For example, the threshold Th3 for the determination of the light amount integration value in step 2B may be a value obtained by dividing 100 trillion by 1,000,000,000, that is, 100,000. Further, the light amount integration value recorded for each sensor channel of the line sensor 52 may be recorded by similarly dividing the value by 1,000,000,000, and the threshold determination may be performed by calculating the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value. The divisor 1,000,000,000 is an example of the “second constant” in the present disclosure.
[Step 5B] The light amount integration value of each sensor channel and the result of the threshold determination may be displayed on the user interface that monitors the operation state of the laser device 110.
[Step 6B] When the value used for the threshold determination (the light amount integration value in the second embodiment) exceeds the threshold Th3, the sensor data management unit 160 may execute at least one of a process of displaying a warning on the user interface, a process of recording an occurrence of the warning in the log, and a process of performing notification based on the determination result.
According to the second embodiment, the deterioration state of each sensor channel can be grasped more accurately than in the first embodiment.
The configuration of a third embodiment may be similar to that of the first embodiment shown in
Differences from the first embodiment will be described. In the third embodiment, the target range is limited by using the fringe order MavEx, and the target range is grouped into a plurality of sections (groups) and counting is performed for each group. The sensor data management unit 160 of the third embodiment operates as follows.
[Step 1C] The sensor data management unit 160 of the third embodiment performs similar determination as in the first embodiment by counting for each group.
At this time, for example, the target range of MavEx is grouped for each range (section) of “0.1” such that the value of MavEx is grouped into 0.5 to 0.6, 0.6 to 0.7, . . . , 1.3 to 1.4, and 1.4 to 1.5, and counting is performed for each group in accordance with the value of MavEx of the fringe. Each group grouped by the range of “0.1” is an example of the “fringe order group” in the present disclosure. The grouping section of the target range of MavEx may be a value other than “0.1.”
In the case of the example shown in
When the center wavelength is calculated from the fringe, the calculation may be performed by using not only the fringe on one side such as the left half but also the fringe on both the left and right sides. Further, when the spectral line width is calculated from the fringe, the calculation may be performed using the fringe on the right side instead of the left side.
Counting for each fringe order may be performed not for all pulses but for every certain number of pulses. For example, counting may be performed for each fringe order at a frequency of 1 pulse every 10 pulses.
Further, counting for each fringe order may be performed not for the fringe waveform obtained by 1 pulse but for the fringe waveform obtained by integration of a certain number of pulses. For example, counting for each fringe order may be performed on each fringe waveform obtained by integrating 10 pulses.
Further, counting for each fringe order may be performed on the fringe waveform after subtracting the average value of the background noise calculated in advance.
[Step 2C] The calculation unit 164 of the sensor data management unit 160 calculates, each time, the maximum value of the count values of the respective groups of MavEx counted by the process in step 1C. Alternatively, the maximum value, the minimum value, and the average value are calculated each time for the count value of each group, and the difference between the maximum value and the minimum value or the difference between the maximum value and the average value is calculated each time.
[Step 3C] The sensor data management unit 160 sets a threshold Th4 for the maximum value of the count values obtained by the process in step 2C, and determines that the line sensor cannot obtain an accurate fringe pattern when the value exceeds the threshold Th4. The threshold Th4 is an example of the “second threshold” in the present disclosure.
The threshold determination method may be performed on the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value.
[Step 4C] When the value counted in step 2C or the threshold Th4 causes an overflow, a value obtained by dividing the counted value or the threshold Th4 by a certain value may be used. For example, the threshold Th4 may be a value obtained by dividing 50 billion by 1,000,000, that is, 50,000. The count value recorded for each group of the sensor channels of the line sensor 52 may be integrated by similarly dividing the value by 1,000,000, and the threshold determination may be performed by calculating the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value.
[Step 5C] The count value of each group and the result of the threshold determination may be displayed on the user interface that monitors the operation state of the laser device 110.
[Step 6C] When the value used for the threshold determination (the count value in the third embodiment) exceeds the threshold Th4, the sensor data management unit 160 may execute at least one of a process of displaying a warning on the user interface, a process of recording an occurrence of the warning in the log, and a process of performing notification based on the determination result.
The range of the value of MavEx may be associated with the range of sensor channel numbers, and grouping of the value of MavEx by “0.1” may correspond to grouping of sensor channels. The count value of the value of MavEx calculated for each group of MavEx is used as an index for quantitatively evaluating the local deterioration of the sensor channel range (group) corresponding to each group. The count value is an example of the “evaluation value” in the present disclosure.
According to the third embodiment, the deterioration state of the line sensor 52, 53 can be grasped more simply than in the first and second embodiments.
The configuration of a fourth embodiment may be similar to that of the first embodiment shown in
In the fourth embodiment, similar determination as in the first or second embodiment is performed for the sensor channels corresponding to the range of MavEx in the third embodiment.
For example, in the example shown in
Integration of the count or integration of the light amount as shown in the first embodiment or the second embodiment is performed only for the sensor channels in this range, and similar threshold determination is performed using the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value thereof (see
Integration of the count or the light amount may be performed not for all pulses but for every certain number of pulses. Integration of the count or the light amount may be performed not for the fringe waveform obtained by 1 pulse but for the fringe waveform obtained by integration of a certain number of pulses. Integration or the count or the light amount may be performed on the fringe waveform after subtracting the average value of the background noise calculated in advance.
In step S11, the sensor data management unit 160 sets the light amount threshold Th1 of the fringe data and the threshold Th2 for the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value of the count value.
In step S12, the light amount data of the fringe pattern is output from the line sensor 52, and the sensor data management unit 160 acquires the light amount data output from the line sensor 52.
In step S13, the sensor data management unit 160 determines whether or not the fringe light amount exceeds the light amount threshold Th1 for each sensor channel.
In step S14, the sensor data management unit 160 counts “1” for the sensor channels with the fringe light amount exceeding the light amount threshold Th1, and “0” for the sensor channels without exceeding, and integrates the values.
In step S15, the sensor data management unit 160 calculates the maximum value of the count value of each sensor channel. Alternatively, the maximum value, the minimum value, and the average value of the count value of each sensor channel are calculated, and the difference between the maximum value and the minimum value or the difference between the maximum value and the average value is calculated.
In step S16, the sensor data management unit 160 determines whether or not the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value of the count value exceeds the threshold Th2 of the count value.
In step S17, the sensor data management unit 160 determines that the fringe pattern cannot be acquired accurately when the threshold Th2 of the count value is exceeded.
In step S21, the sensor data management unit 160 sets the threshold Th3 for the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value of the light amount integration value of the fringe data.
In step S22, the light amount data of the fringe pattern is output from the line sensor 52, and the sensor data management unit 160 acquires the light amount data output from the line sensor 52.
In step S24, the sensor data management unit 160 integrates the fringe light amounts for each sensor channel.
In step S25, the sensor data management unit 160 calculates the maximum value of the light amount integration value of each sensor channel. Alternatively, the maximum value, the minimum value, and the average value of the light amount integration value of each sensor channel are calculated, and the difference between the maximum value and the minimum value or the difference between the maximum value and the average value is calculated.
In step S26, the sensor data management unit 160 determines whether or not the maximum value, the difference between the maximum value and the minimum value, or the difference between the maximum value and the average value of the light amount integration value exceeds the threshold Th3 of the light amount integration.
In step S27, the sensor data management unit 160 determines that the fringe pattern cannot be acquired accurately when the threshold Th3 of the light amount integration is exceeded.
According to the fourth embodiment, the deterioration state of the line sensor can be grasped more simply than in the first and second embodiments. Further, according to the fourth embodiment, the deterioration state of the line sensor can be grasped more accurately than in the third embodiment.
The configuration of a fifth embodiment may be similar to that of the first embodiment shown in
In the fifth embodiment, a process of correcting the deterioration amount that depends on the integration amount of ultraviolet irradiation energy is added to the calculation of the light amount integration value in the second embodiment. The amount of decrease in the sensitivity of the line sensors 52, 53 varies depending on the integration amount of ultraviolet irradiation energy (J/cm2).
Therefore, in the fifth embodiment, a look-up table (LUT) reflecting the sensor deterioration characteristic is prepared in advance (see
The vertical axis before LUT conversion (
In the fifth embodiment, when the vertical axis of
The sensor deterioration characteristic as shown in
In the fifth embodiment, similarly to the first to fourth embodiments, in the deterioration determination of the sensor, the threshold determination may be performed by calculating the minimum value, the difference between the maximum value and the minimum value, or the difference between the minimum value and the average value of the sensitivity estimation amount. The threshold used for the threshold determination in the fifth embodiment is an example of the “third threshold” in the present disclosure. The sensitivity estimation amount calculated in the fifth embodiment is an evaluation index indicating that the deterioration of the sensor is progressing as the value thereof is smaller, and is an example of the “evaluation value” in the present disclosure.
According to the fifth embodiment, since the sensitivity decrease amount of the sensor can be estimated with higher accuracy, the accuracy of the deterioration determination is further improved.
The configuration of a sixth embodiment may be similar to that of the first embodiment shown in
In the sixth embodiment, a process of correcting the deterioration amount that depends on the integration amount of ultraviolet irradiation energy is added to the calculation of the sensitivity estimation amount in the fifth embodiment. Regarding the operation of the sixth embodiment, differences from that of the fifth embodiment will be described.
In the description of the fifth embodiment, the reason why the vertical axis of the graph of
A curve indicated by a broken line in
According to the sixth embodiment, since the sensitivity decrease amount of the sensor can be estimated with higher accuracy, the accuracy of the deterioration determination is further improved than in the fifth embodiment.
The laser oscillator including the chamber 20, the output coupling mirror 30, and the LNM 32 shown in
A program including instructions for causing a processor to function as the sensor data management unit 160 described in each of the above-described embodiments may be recorded on an optical disk, a magnetic disk, or another non-transitory computer readable medium (tangible non-transitory information storage medium), and the program may be provided through the computer readable medium. Further, the program recorded on the computer readable medium is incorporated in the computer, and a processor executes the instructions of the program, whereby the function of the sensor data management unit 160 can be realized by the computer.
The exposure apparatus 302 includes an illumination optical system 304 and a projection optical system 306. The illumination optical system 304 illuminates a reticle pattern of a reticle (not shown) arranged on a reticle stage RT with laser light incident from the laser device 110. The projection optical system 306 causes the laser light transmitted through the reticle to be imaged as being reduced and projected on a workpiece (not shown) arranged on a workpiece table WT. The workpiece is a photosensitive substrate such as a semiconductor wafer on which photoresist is applied.
The exposure apparatus 302 synchronously translates the reticle stage RT and the workpiece table WT to expose the workpiece to the laser light reflecting the reticle pattern. After the reticle pattern is transferred onto the semiconductor wafer by the exposure process described above, a semiconductor device can be manufactured through a plurality of processes. The semiconductor device is an example of the “electronic device” in the present disclosure.
In each of the above-described embodiments, an example in which the deterioration evaluation of the line sensors 52, 53 used in the monitor module 40 is performed has been described, but the line sensor to be evaluated is not limited to this example, and may be a line sensor applied to a detection unit other than the monitor module 40. The technique of the present disclosure is widely applicable as a technique for evaluating local deterioration of a line sensor used for detection of interference fringes of pulse laser light.
The description above is intended to be illustrative and the present disclosure is not limited thereto. Therefore, it would be obvious to those skilled in the art that various modifications to the embodiments of the present disclosure would be possible without departing from the spirit and the scope of the appended claims. Further, it would be also obvious to those skilled in the art that embodiments of the present disclosure would be appropriately combined.
The terms used throughout the present specification and the appended claims should be interpreted as non-limiting terms unless clearly described. For example, terms such as “comprise”, “include”, “have”, and “contain” should not be interpreted to be exclusive of other structural elements. Further, indefinite articles “a/an” described in the present specification and the appended claims should be interpreted to mean “at least one” or “one or more.” Further, “at least one of A, B, and C” should be interpreted to mean any of A, B, C, A+B, A+C, B+C, and A+B+C as well as to include combinations of any thereof and any other than A, B, and C.
The present application claims the benefit of International Application No. PCT/JP2021/017881, filed on May 11, 2021, the entire contents of which are hereby incorporated by reference.
Number | Date | Country | |
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Parent | PCT/JP2021/017881 | May 2021 | US |
Child | 18482411 | US |