Number | Date | Country | Kind |
---|---|---|---|
93 05063 | Apr 1993 | FRX |
This application is a division of application Ser. No. 08/234,462, filed Apr. 28, 1994 now U.S. Pat. No. 5,570,076.
Number | Name | Date | Kind |
---|---|---|---|
4419869 | Sando et al. | Dec 1983 | |
5424103 | Ahn | Jun 1995 |
Number | Date | Country |
---|---|---|
0478174 | Apr 1992 | EPX |
4142877 | Jul 1992 | DEX |
1149052 | Apr 1969 | GBX |
WO 9211312 | Jul 1992 | WOX |
Entry |
---|
Patent Abstracts of Japan, vol. 7, No. 40, Feb. 17, 1983 & JP-A-57 192 032 Hitachi Seisakusho KK, Nov. 16, 1982. |
Patent Abstracts of Japan, vol. 8, No. 15, Jan. 21, 1884 & JP-A-58 181 865 (Citizen Tokei KK), Oct. 24, 1983. |
"A Production Reaction for Continuous Deposition of Silicon Dioxide," W.C. Benzing et al., Solid State Technology, vol. 16, No. 11, Nov. 1973, pp. 37-42. |
Number | Date | Country | |
---|---|---|---|
Parent | 234462 | Apr 1994 |