K. Utsumi, et al., "Drop-on-Demand Ceramic Ink-Jet Head Using Designed-Space Forming Technology,"NEC Research & Development, No. 85, Apr. 1987, pp. 7-14. |
J. M. Zeigler et al., Self-Developing Polysilane Deep-UV Resists-Photochemistry, Photophysics, and Submicron Lithography, SPIE, vol. 539, Advances in Resist Technology and Processing II (1985), pp. 166-174. |
H. Ito et al., "Chemical Amplification in the Design of Dry Developing Resist Materials," Polymer Engineering and Science, vol. 23, No. 18, Dec. 1983 pp. 1012-1018. |
C. G. Willson et al., "Approaches to the Design of Radiation-Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution," J. Electrochem. Soc., vol. 133, No. 1, Jan. 1986, pp. 181-187. |
H. Hiroaka et al., "Deep UV Photolithography with Composite Photoresists Made of Poly(olefin sulfones),"Polymers in Electronics, 1984, pp. 55-64. |
H. Ito et al., "Thermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer Lithography," J. Electrochem. Soc., vol. 136, No. 1, Jan. 1989, pp. 245-249. |
J. M. J. Frechet et al., "Thermally Depolymerizable Polycarbonates V. Acid Catalyzed Thermolysis of Allylic and Benzylic Polycarbonates: A New Route to Resist Imaging," Polymer Journal, vol. 19, No. 1, 1987, pp. 31-49. |
A. Steinmann, "Heat Developable Resist for Multilayer Resist Technology," SPIE, vol. 920, Advances in Resist Technology and Processing V, Feb. 29-Mar. 2, 1988, pp. 13-20. |
M. J. Bowden et al., "Vapor Development of Poly(Olefin Sulfone) Resists," Polymer Engineering and Science, vol. 14, No. 7, Jul. 1974, pp. 525-528. |
M. W. Geis et al., "Nitrocellulose as a Self-Developing Resist with Subicrometer Resolution and Processing Stability," J. Vac. Sci. Technol. B, vol. 1, No. 4, Oct.-Dec. 1983, pp. 1178-1181. |