Claims
- 1. A method for removing photoresist from a substrate comprising contacting said substrate with a stripping solution for a time sufficient to remove said photoresist from said substrate, said stripping solution consisting essentially of:
- (a) from about 5% to about 95% by weight of one or more dibasic esters having the general formula:
- R.sub.1 CO.sub.2 --(CH.sub.2).sub.n --CO.sub.2 R.sub.2
- where R.sub.1 and R.sub.2 are alkyl groups of 1-4 carbons and n=1-5;
- (b) from about 1% to about 65% by weight of tetrahydrofurfuryl alcohol or a water soluble alcohol, glycol, glycol ether, or mixture thereof, the water soluble alcohol, glycol, glycol ether having the general formula:
- R--(CHOH).sub.n --R'
- where R and R' are selected from the group consisting of a hydrogen atom, an alkyl group of 1 to 7 carbon atoms, and or an alkoxyl group of 1 to 4 carbon atoms, n=1-3; and
- (c) from about 5% to about 60% by weight deionized water.
- 2. The method of claim 1 where the dibasic ester is present in amount of from about 25% to about 50% by weight.
- 3. The method of claim 1 where the tetrahydrofurfuryl alcohol or the water soluble alcohol, glycol, glycol ether, or mixture thereof, is present in an amount of from about 30% to about 50% by weight.
- 4. The method of claim 1 where the deionized water is present in an amount of from about 25% to about 55% by weight.
- 5. The method of claim 1 where the dibasic ester is selected from the group consisting of dimethyl adipate, dimethyl glutarate and dimethyl succinate.
- 6. The method of claim 1 where the water soluble alcohol is selected from the group consisting of ethanol, methanol, 2-propanol, n-propanol, n-butanol, n-pentanol, n-hexanol, and n-heptanol.
- 7. The method of claim 1 where the glycol or glycol ether is selected from the group consisting of ethylene glycol, or propylene glycol, ethylene glycol ethers, and propylene glycol ethers.
- 8. The method of claim 1 where
- the dibasic esters are present in an amount of from about 25% to about 50% by weight, and are selected from the group consisting of dimethyl adipate, dimethyl glutarate and dimethyl succinate;
- the tetrahydrofurfuryl alcohol or the water soluble alcohol, glycol, glycol ether, or mixture thereof is present in an amount of from about 30% to about 50% by weight, and are selected from the group consisting of ethanol, methanol, 2-propanol, n-propanol, n-butanol, n-pentanol, n-hexanol, n-heptanol, tetrahydrofurfuryl alcohol, ethylene glycol, propylene glycol, ethylene glycol ethers, and propylene glycol ethers; and
- the deionized water is present in an amount of from about 25% to about 55% by weight.
- 9. The method of claim 1 where the time sufficient to remove said photoresist is from about 1 minute to about 30 minutes.
- 10. The method of claim 1 where the time sufficient to remove said photoresist is from about 1 minute to about 5 minutes.
- 11. The method of claim 8 where the time sufficient to remove said photoresist time is from about 1 minute to about 30 minutes.
- 12. The method of claim 8 where the time sufficient to remove said photoresist time is from about 1 minute to about 5 minutes.
- 13. A method for removing photoresist from a substrate comprising contacting said substrate with a stripping solution for a time sufficient to remove said photoresist from said substrate, wherein said stripping solution comprises:
- (a) from about 5% to about 95% by weight of one or more dibasic esters having the general formula:
- R.sub.1 CO.sub.2 --(CH.sub.2).sub.n --CO.sub.2 R.sub.2
- where R.sub.1 and R.sub.2 are alkyl groups of 1-4 carbons and n=1-5;
- (b) from about 1% to about 65% by weight of tetrahydrofurfuryl alcohol or a water soluble alcohol, glycol, glycol ether, or mixture thereof, the water soluble alcohol, glycol, glycol ether having the general formula:
- R--(CHOH).sub.n --R'
- where R and R' are selected from the group consisting of a hydrogen atom, an alkyl group of 1 to 7 carbon atoms, and or an alkoxyl group of 1 to 4 carbon atoms, n=1-3; and
- (c) from about 5% to about 60% by weight deionized water; and
- (d) said stripping solution is essentially free of amines.
- 14. The method of claim 13 where the dibasic ester is present in an amount of from about 25% to about 50% by weight.
- 15. The method of claim 13 where the tetrahydrofurfuryl alcohol or the water soluble alcohol, glycol, glycol ether, or mixture thereof, is present in an amount of from about 30% to about 50% by weight.
- 16. The method of claim 13 where the deionized water is present in an amount of from about 25% to about 55% by weight.
- 17. The method of claim 13 where the dibasic ester is selected from the group consisting of dimethyl adipate, dimethyl glutarate and dimethyl succinate.
- 18. The method of claim 13 where the alcohol is selected from the group consisting of ethanol, methanol, 2-propanol, n-propanol, n-butanol, n-pentanol, n-hexanol, and n-heptanol.
- 19. The method of claim 13 where the glycol or glycol ether is selected from the group consisting of ethylene glycol, or propylene glycol, ethylene glycol ethers, and propylene glycol ethers.
- 20. The method of claim 12 where
- the dibasic esters are present in an amount of from about 25% to about 50% by weight, and are selected from the group consisting of dimethyl adipate, dimethyl glutarate and dimethyl succinate;
- the tetrahydrofurfuryl alcohol or the water soluble alcohol, glycol, glycol ether, or mixture thereof is present in an amount of from about 30% to about 50% by weight, and are selected from the group consisting of ethanol, methanol, 2-propanol, n-propanol, n-butanol, n-pentanol, n-hexanol, n-heptanol, tetrahydrofurfuryl alcohol, ethylene glycol, propylene glycol, ethylene glycol ethers, and propylene glycol ethers; and
- the deionized water is present in an amount of from about 25% to about 55% by weight.
- 21. The method of claim 13 where the time sufficient to remove said photoresist time is from about 1 minute to about 30 minutes.
- 22. The method of claim 13 where the time sufficient to remove said photoresist time is from about 1 minute to about 5 minutes.
- 23. The method of claim 20 where the time sufficient to remove said photoresist time is from about 1 minute to about 30 minutes.
- 24. The method of claim 20 where the time sufficient to remove said photoresist time is from about 1 minute to about 5 minutes.
Parent Case Info
This application is a continuation-in-part of application Ser. No. 08/593,628 filed on Jan. 30, 1996 (now U.S. Pat. No. 5,741,368).
US Referenced Citations (20)
Foreign Referenced Citations (2)
Number |
Date |
Country |
0 163 202 |
May 1985 |
EPX |
267 540 |
Oct 1986 |
EPX |
Continuation in Parts (1)
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Number |
Date |
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Parent |
593628 |
Jan 1996 |
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