The present invention relates to a dielectric filter including a plurality of dielectric resonators.
The standardization of fifth-generation mobile communication systems (hereinafter referred to as 5G) is currently ongoing. For 5G, the use of frequency bands of 10 GHz or higher, particularly a quasi-millimeter wave band of 10 to 30 GHz and a millimeter wave band of 30 to 300 GHz, is being studied to expand the frequency band.
Among electronic components for use in communication apparatuses are band-pass filters each including a plurality of resonators. Dielectric filters each including a plurality of dielectric resonators are promising as band-pass filters usable in the frequency bands of 10 GHz or higher.
One of favorable characteristics of the band-pass filters is a steep change in insertion loss in at least one of two frequency regions, i.e., a first passband-neighboring region and a second passband-neighboring region, the first passband-neighboring region being a frequency region close to the passband and lower than the passband, the second passband-neighboring region being a frequency region close to the passband and higher than the passband. Such a characteristic can be achieved by, for example, generating an attenuation pole in at least one of the first and second passband-neighboring regions in the frequency response of the insertion loss.
For a band-pass filter that includes three or more resonators configured so that two resonators adjacent to each other in circuit configuration are electromagnetically coupled to each other, one method for generating one or more attenuation poles in the frequency response of the insertion loss is to establish electromagnetic coupling between two resonators that are not adjacent to each other in circuit configuration.
JP2000-013107A describes a technique for generating one or more attenuation poles in the frequency response of the insertion loss of a dielectric filter that includes a plurality of dielectric blocks configured so that two dielectric blocks adjacent to each other in circuit configuration are electromagnetically coupled to each other. According to the technique, the one or more attenuation poles are generated by electromagnetically coupling two dielectric blocks that are not adjacent to each other in circuit configuration.
Conventionally, in a dielectric filter including a plurality of dielectric resonators, some structural contrivance is needed for providing electromagnetic coupling between tow dielectric resonators that are not adjacent to each other in circuit configuration. Disadvantageously, this has resulted in increase in complexity of the structure of the dielectric filter.
It is an object of the present invention to provide a dielectric filter that is able to provide two attenuation poles in the frequency response of the insertion loss while being simple in structure.
A dielectric filter of the present invention includes a first input/output port, a second input/output port, an even number of dielectric resonators, and a capacitor for capacitively coupling the first input/output port and the second input/output port. The even number of dielectric resonators are provided between the first input/output port and the second input/output port in circuit configuration, and are configured so that two dielectric resonators adjacent to each other in circuit configuration are magnetically coupled to each other.
In the dielectric filter of the present invention, the even number of dielectric resonators may include a first input/output stage resonator which is closest to the first input/output port in circuit configuration, and a second input/output stage resonator which is closest to the second input/output port in circuit configuration. In such a case, the dielectric filter may further include a first phase shifter provided between the first input/output port and the first input/output stage resonator in circuit configuration, and a second phase shifter provided between the second input/output port and the second input/output stage resonator in circuit configuration.
The first phase shifter may be configured to be capacitively coupled to the first input/output stage resonator, and the second phase shifter may be configured to be capacitively coupled to the second input/output stage resonator.
The dielectric filter of the present invention may further include a structure for constructing the even number of dielectric resonators and the capacitor. The structure may include an even number of resonator body portions corresponding to the even number of dielectric resonators, and a peripheral dielectric portion lying around the even number of resonator body portions. Each of the even number of resonator body portions is formed of a first dielectric having a first relative permittivity. The peripheral dielectric portion is formed of a second dielectric having a second relative permittivity lower than the first relative permittivity.
The structure may further include a shield portion formed of a conductor. The shield portion lies around the even number of resonator body portions such that at least part of the peripheral dielectric portion is interposed between the shield portion and the even number of resonator body portions. In such a case, each of the even number of resonator body portions may be in non-contact with the shield portion.
The structure may include a separation conductor layer formed of a conductor and separating an area where the even number of resonator body portions lie from an area where the capacitor lies.
When the dielectric filter includes the structure mentioned above, the even number of dielectric resonators may include: a first input/output stage resonator which is closest to the first input/output port in circuit configuration; a second input/output stage resonator which is closest to the second input/output port in circuit configuration; and two or more intermediate resonators lying between the first input/output stage resonator and the second input/output stage resonator in circuit configuration. In such a case, the even number of resonator body portions may include: a first input/output stage resonator body portion corresponding to the first input/output stage resonator; a second input/output stage resonator body portion corresponding to the second input/output stage resonator; and two or more intermediate resonator body portions corresponding to the two or more intermediate resonators. The first input/output stage resonator body portion and the second input/output stage resonator body portion may be physically adjacent to each other with none of the two or more intermediate resonator body portions interposed therebetween. The structure may further include a partition that is formed of a conductor and arranged to pass between the first and second input/output stage resonator body portions.
The dielectric filter of the present invention is able to provide two attenuation poles in the frequency response of the insertion loss while being simple in structure.
Other and further objects, features and advantages of the invention will appear more fully from the following description.
Preferred embodiments of the present invention will now be described in detail with reference to the drawings. First, reference is made to
The dielectric filter 1 according to the present embodiment has a band-pass filter function. As shown in
The capacitor C10 is provided between the first input/output port 5A and the second input/output port 5B, and has a first end connected to the first input/output port 5A and a second end connected to the second input/output port 5B.
The even number of dielectric resonators are provided between the first input/output port 5A and the second input/output port 5B in circuit configuration, and are configured so that two dielectric resonators adjacent to each other in circuit configuration are magnetically coupled to each other. As used herein, the phrase “in circuit configuration” is to describe layout in a circuit diagram, not in a physical configuration.
The present embodiment presents an example in which the dielectric filter 1 includes four dielectric resonators 2A, 2B, 2C, and 2D, as shown in
Hereinafter, the dielectric resonator 2A which is closest to the first input/output port 5A in circuit configuration will also be referred to as the first input/output stage resonator 2A, and the dielectric resonator 2D which is closest to the second input/output port 5B in circuit configuration will also be referred to as the second input/output stage resonator 2D. The other two dielectric resonators 2B and 2C lying between the first and second input/output stage resonators 2A and 2D in circuit configuration will also be referred to as the intermediate resonators 2B and 2C.
As shown in
The first phase shifter 11A is provided between the first input/output port 5A and the first input/output stage resonator 2A in circuit configuration. The first phase shifter 11A is configured to be capacitively coupled to the first input/output stage resonator 2A. In
The second phase shifter 11B is provided between the second input/output port 5B and the second input/output stage resonator 2D in circuit configuration. The second phase shifter 11B is configured to be capacitively coupled to the second input/output stage resonator 2D. In
As shown in
The structure 20 includes an even number of resonator body portions corresponding to the even number of dielectric resonators, and a peripheral dielectric portion 4 lying around the even number of resonator body portions. Each of the even number of resonator body portions is formed of a first dielectric having a first relative permittivity. The peripheral dielectric portion 4 is formed of a second dielectric having a second relative permittivity lower than the first relative permittivity. In the present embodiment, specifically, the structure 20 includes four resonator body portions 3A, 3B, 3C, and 3D corresponding to the four dielectric resonators 2A, 2B, 2C, and 2D, respectively.
Hereinafter, the resonator body portion 3A corresponding to the first input/output stage resonator 2A will also be referred to as the first input/output stage resonator body portion 3A, and the resonator body portion 3D corresponding to the second input/output stage resonator 2D will also be referred to as the second input/output stage resonator body portion 3D. The resonator body portions 3B and 3C corresponding to the intermediate resonators 2B and 2C will also be referred to as the intermediate resonator body portions 3B and 3C.
In the present embodiment, the peripheral dielectric portion 4 is formed of a multilayer stack of a plurality of dielectric layers. Now, we define X, Y and Z directions as shown in
The peripheral dielectric portion 4 is in the shape of a rectangular solid and has an external surface. The external surface of the peripheral dielectric portion 4 includes a top surface 4b and a bottom surface 4a opposite to each other in the Z direction, and four side surfaces 4c, 4d, 4e and 4f connecting the top surface 4b and the bottom surface 4a. The side surfaces 4c and 4d are opposite to each other in the Y direction. The side surfaces 4e and 4f are opposite to each other in the X direction.
In the example shown in
The resonator body portions 3A to 3D are configured so that the resonator body portions 3A and 3B are magnetically coupled to each other, the resonator body portions 3B and 3C are magnetically coupled to each other, and the resonator body portions 3C and 3D are magnetically coupled to each other.
As shown in
The separation conductor layer 6 separates an area where the resonator body portions 3A to 3D lie from an area where the capacitor C10 lies.
The shield portion 7 lies around the resonator body portions 3A to 3D such that at least part of the peripheral dielectric portion 4 is interposed between the shield portion 7 and the resonator body portions 3A to 3D.
In the present embodiment, the separation conductor layer 6 also serves as part of the shield portion 7. The shield portion 7 includes the separation conductor layer 6, a shield conductor layer 72, and a connection portion 71.
The separation conductor layer 6 and the shield conductor layer 72 are spaced apart from each other in the Z direction inside the peripheral dielectric portion 4. The separation conductor layer 6 lies near the bottom surface 4a of the peripheral dielectric portion 4. The shield conductor layer 72 lies near the top surface 4b of the peripheral dielectric portion 4. The resonator body portions 3A to 3D lie in the area between the separation conductor layer 6 and the shield conductor layer 72 within the structure 20. Each of the resonator body portions 3A to 3D has a top end face closest to the shield conductor layer 72 and a bottom end face closest to the separation conductor layer 6. The connection portion 71 electrically connects the separation conductor layer 6 and the shield conductor layer 72. The connection portion 71 includes a plurality of through hole lines 71T. Each of the plurality of through hole lines 71T includes two or more through holes connected in series. The separation conductor layer 6, the shield conductor layer 72 and the connection portion 71 are arranged to surround the resonator body portions 3A to 3D. Each of the resonator body portions 3A to 3D is in non-contact with the shield portion 7.
As shown in
As shown in
The partition 8 is intended to prevent the occurrence of magnetic coupling between the first input/output stage resonator body portion 3A and the second input/output stage resonator body portion 3D. The partition 8 is arranged to pass between the first input/output stage resonator body portion 3A and the second input/output stage resonator body portion 3D. The partition 8 electrically connects the separation conductor layer 6 and the shield conductor layer 72. The partition 8 includes a plurality of through hole lines 8T. Each of the plurality of through hole lines 8T includes two or more through holes connected in series.
The ground layer 9 is disposed on the bottom surface 4a of the peripheral dielectric portion 4. The connection portion 12 electrically connects the ground layer 9 and the separation conductor layer 6. The connection portion 12 includes a plurality of through hole lines 12T. Each of the plurality of through hole lines 12T includes two or more through holes connected in series.
The ground layer 9, the separation conductor layer 6 and the shield conductor layer 72 are all rectangular in shape as viewed in the Z direction.
As shown in
The coupling adjustment portion 13 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 3A and 3B. The coupling adjustment portion 14 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 3B and 3C. The coupling adjustment portion 15 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 3C and 3D. Each of the coupling adjustment portions 13, 14 and 15 electrically connects the separation conductor layer 6 and the shield conductor layer 72.
In the example shown in
The dielectric resonator 2A is composed of the resonator body portion 3A, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 2B is composed of the resonator body portion 3B, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 2C is composed of the resonator body portion 3C, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 2D is composed of the resonator body portion 3D, at least part of the peripheral dielectric portion 4, and the shield portion 7. In the present embodiment, the resonance mode of each of the dielectric resonators 2A to 2D is a TM mode. An electromagnetic field generated by the dielectric resonators 2A to 2D is present inside and outside the resonator body portions 3A to 3D. The shield portion 7 has a function of confining the electromagnetic field outside the resonator body portions 3A to 3D to within the area surrounded by the shield portion 7.
Reference is now made to
Further, a through hole 31T1 connected to the conductor layer 311, and a through hole 31T2 connected to the conductor layer 312 are formed in the dielectric layer 31. Further formed in the dielectric layer 31 are a plurality of through holes 12T1 constituting respective portions of the plurality of through hole lines 12T. All the through holes in
Further formed in the dielectric layer 32 are a through hole 32T1 connected to a portion of the conductor layer 321 near the second end thereof, and a through hole 32T2 connected to a portion of the conductor layer 322 near the second end thereof. Further formed in the dielectric layer 32 are a plurality of through holes 12T2 constituting respective portions of the plurality of through hole lines 12T. All the through holes in
Further formed in the dielectric layer 33 are through holes 33T1 and 33T2, and through holes 12T3 constituting respective portions of the through hole lines 12T. The through holes 32T1 and 32T2 shown in
Through holes 34T1 and 34T2 are formed in the dielectric layer 34. Further formed in the dielectric layer 34 are through holes 8T1, 13T1, 14T1, 15T1, and 71T1 constituting respective portions of the through hole lines 8T, 13T, 14T, 15T, and 71T. All the through holes in
The through hole 34T1 lies inside the hole 6a, and the through hole 34T2 lies inside the hole 6b. The through holes 33T1 and 33T2 shown in
In
The through holes 34T1, 34T2, 8T1, 13T1, 14T1, 15T1, and 71T1 shown in
Further formed in the dielectric layer 39 are through holes 8T3, 13T3, 14T3, 15T3, and 71T3 constituting respective portions of the through hole lines 8T, 13T, 14T, 15T, and 71T. All the through holes in
The through holes 8T2, 13T2, 14T2, 15T2, and 71T2 formed in the eighth dielectric layer 38 are respectively connected to the through holes 8T3, 13T3, 14T3, 15T3, and 71T3 formed in the dielectric layer 39.
The through holes 8T3, 13T3, 14T3, 15T3, and 71T3 shown in
The resonator body portions 3A to 3D are provided to penetrate the dielectric layers 40 to 60. The conductor layer 391 shown in
The through holes 8T4, 13T4, 14T4, 15T4, and 71T4 formed in the thirtieth dielectric layer 60 are respectively connected to the through holes 8T5, 13T5, 14T5, 15T5, and 71T5 formed in the dielectric layer 61.
The peripheral dielectric portion 4 is formed by stacking the dielectric layers 31 to 62 such that the patterned surface of the dielectric layer 31 shown in
The capacitor C10 shown in
Some of the plurality of through hole lines 12T constituting the connection portion 12 are arranged to surround the conductor layers 321, 322, and 331 constituting the capacitor C10.
As shown in
The first phase shifter 11A is composed of the conductor layer 321 and the through hole line 11AT. The second phase shifter 11B is composed of the conductor layer 322 and the through hole line 11BT.
The conductor layer 391 is opposed to the bottom end face of the resonator body portion 3A with the dielectric layer 39 interposed therebetween. The capacitive coupling C11A between the first phase shifter 11A and the first input/output stage resonator 2A is thereby provided. The conductor layer 392 is opposed to the bottom end face of the resonator body portion 3D with the dielectric layer 39 interposed therebetween. The capacitive coupling C11B between the second phase shifter 11B and the second input/output stage resonator 2D is thereby provided.
It should be noted that the dielectric layers 31, 32 and 33 need not necessarily be used as constituents of the peripheral dielectric portion 4, and the peripheral dielectric portion 4 may thus be constituted of the dielectric layers 34 to 62 stacked. In such a case, the dielectric forming the dielectric layers 31, 32 and 33 may have a relative permittivity higher than or equal to the first relative permittivity of the first dielectric forming the resonator body portions 3A to 3D.
Now, the magnetic coupling between two dielectric resonators adjacent to each other in circuit configuration will be described with reference to
Arrows in
Next, a manufacturing method for the dielectric filter 1 according to the present embodiment will be described. This manufacturing method includes a step of fabricating an unfired multilayer stack which is to be fired later into the structure 20, and a step of subjecting the unfired multilayer stack to firing to complete the structure 20.
In the step of fabricating the unfired multilayer stack, a plurality of unfired ceramic sheets, which are to become the dielectric layers 31 to 62 later, are fabricated first. Next, a plurality of unfired through holes are formed in ones of the ceramic sheets that correspond to ones of the dielectric layers that each have a plurality of through holes formed therein. Further, one or more unfired conductor layers are formed on ones of the ceramic sheets that correspond to ones of the dielectric layers that each have one or more conductor layers formed thereon. Hereinafter, a ceramic sheet having either a plurality of unfired through holes formed therein or one or more unfired conductor layers formed thereon, or both, will be referred to as an unfired sheet.
In the step of fabricating the unfired multilayer stack, a plurality of unfired sheets corresponding to the dielectric layers 40 to 60 shown in
Next, the operation and effect of the dielectric filter 1 according to the present embodiment will be described. The dielectric filter 1 has a band-pass filter function. The dielectric filter 1 is designed and configured to have a passband in, for example, a quasi-millimeter wave band of 10 to 30 GHz or a millimeter wave band of 30 to 300 GHz. Note that the passband refers to, for example, a frequency band between two frequencies at which the insertion loss is higher by 3 dB than the minimum value of the insertion loss.
The dielectric filter 1 includes the even number of dielectric resonators 2A to 2D configured so that two dielectric resonators adjacent to each other in circuit configuration are magnetically coupled to each other, and the capacitor C10 for capacitively coupling the first input/output port 5A and the second input/output port 5B. The dielectric filter 1 of such a configuration is able to provide a first attenuation pole and a second attenuation pole in the frequency response of the insertion loss. The first attenuation pole occurs in a first passband-neighboring region, which is a frequency region close to the passband and lower than the passband. The second attenuation pole occurs in a second passband-neighboring region, which is a frequency region close to the passband and higher than the passband.
The two frequencies at which the first and second attenuation poles occur in the frequency response of the insertion loss of the dielectric filter 1 are two frequencies at which the absolute value of a difference between an even mode impedance Ze of the dielectric filter 1 and an odd mode impedance Zo of the dielectric filter 1, i.e., |Ze−Zo|, takes on a minimum value. For the dielectric filter 1 according to the present embodiment, one of the two frequencies at which the absolute value |Ze−Zo| takes on a minimum value is present in the first passband-neighboring region, and the other is present in the second passband-neighboring region. Accordingly, the dielectric filter 1 is able to cause the first attenuation pole and the second attenuation pole to occur in the first passband-neighboring region and the second passband-neighboring region, respectively. By virtue of this, the present embodiment achieves such a characteristic of the dielectric filter 1 that the insertion loss changes steeply in the first and second passband-neighboring regions.
If the number of the dielectric resonators provided between the first input/output port 5A and the second input/output port 5B is an odd number, an attenuation pole occurs only in the first passband-neighboring region even if the first input/output port 5A and the second input/output port 5B are capacitively coupled to each other.
On the other hand, an attenuation pole occurs only in the second passband-neighboring region if the number of the dielectric resonators provided between the first input/output port 5A and the second input/output port 5B is an even number greater than or equal to four and magnetic coupling is established between one of the dielectric resonators that is closest to the first input/output port 5A in circuit configuration and another one of the dielectric resonators that is closest to the second input/output port 5B in circuit configuration.
The frequency response of the insertion loss of the dielectric filter 1 is adjustable by adjusting the phase change amounts to be obtained at the first and second phase shifters 11A and 11B. The phase change amounts at the first and second phase shifters 11A and 11B are changeable by changing the lengths of the first and second phase shifters 11A and 11B.
Now, an example of the characteristic of the dielectric filter 1 determined by simulation will be described with reference to
As can be seen from
As can be seen from
The two attenuation poles in the frequency response of the insertion loss of the dielectric filter 1 are generated by capacitively coupling the first input/output port 5A and the second input/output port 5B, instead of electromagnetically coupling two dielectric resonators that are not adjacent to each other in circuit configuration. The capacitive coupling between the first input/output port 5A and the second input/output port 5B is provided by the capacitor C10 of a simple structure.
By virtue of the foregoing, the dielectric filter 1 according to the present embodiment is able to provide two attenuation poles in the frequency response of the insertion loss while being simple in structure.
In the present embodiment, the structure 20 includes the separation conductor layer 6 which separates the area where the resonator body portions 3A to 3D lie from the area where the capacitor C10 lies. This enables the capacitive coupling between the first input/output port 5A and the second input/output port 5B to occur without affecting any electromagnetic field around the resonator body portions 3A to 3D.
In the present embodiment, the first input/output stage resonator body portion 3A and the second input/output stage resonator body portion 3D are physically adjacent to each other with neither of the intermediate resonator body portions 3B and 3C interposed therebetween. This enables the first and second input/output ports 5A and 5B to be brought close to each other, thus making it easy to construct the capacitor C10.
A second embodiment of the invention will now be described.
As shown in
The dielectric resonators 102A, 102B, 102C, 102D, 102E, and 102F are arranged in this order, from closest to farthest, from the first input/output port 5A in circuit configuration. The dielectric resonators 102A to 102F are configured so that: the dielectric resonators 102A and 102B are adjacent to each other in circuit configuration and are magnetically coupled to each other; the dielectric resonators 102B and 102C are adjacent to each other in circuit configuration and are magnetically coupled to each other; the dielectric resonators 102C and 102D are adjacent to each other in circuit configuration and are magnetically coupled to each other; the dielectric resonators 102D and 102E are adjacent to each other in circuit configuration and are magnetically coupled to each other; and the dielectric resonators 102E and 102F are adjacent to each other in circuit configuration and are magnetically coupled to each other. Each of the dielectric resonators 102A to 102F has an inductance and a capacitance.
Hereinafter, the dielectric resonator 102A which is closest to the first input/output port 5A in circuit configuration will also be referred to as the first input/output stage resonator 102A, and the dielectric resonator 102F which is closest to the second input/output port 5B in circuit configuration will also be referred to as the second input/output stage resonator 102F. The other four dielectric resonators 102B, 102C, 102D and 102E lying between the first and second input/output stage resonators 102A and 102F in circuit configuration will also be referred to as the intermediate resonators 102B, 102C, 102D and 102E.
In the present embodiment, the first phase shifter 11A is provided between the first input/output port 5A and the first input/output stage resonator 102A in circuit configuration. The first phase shifter 11A is configured to be capacitively coupled to the first input/output stage resonator 102A. In
The second phase shifter 11B is provided between the second input/output port 5B and the second input/output stage resonator 102F in circuit configuration. The second phase shifter 11B is configured to be capacitively coupled to the second input/output stage resonator 102F. In
As shown in
The structure 20 includes six resonator body portions 103A, 103B, 103C, 103D, 103E and 103F corresponding to the six dielectric resonators 102A, 102B, 102C, 102D, 102E and 102F, respectively, and a peripheral dielectric portion 4 lying around the six resonator body portions 103A to 103F. Each of the six resonator body portions 103A to 103F is formed of a first dielectric having a first relative permittivity. The peripheral dielectric portion 4 is formed of a second dielectric having a second relative permittivity lower than the first relative permittivity.
Hereinafter, the resonator body portion 103A corresponding to the first input/output stage resonator 102A will also be referred to as the first input/output stage resonator body portion 103A, and the resonator body portion 103F corresponding to the second input/output stage resonator 102F will also be referred to as the second input/output stage resonator body portion 103F. The resonator body portions 103B, 103C, 103D and 103E corresponding to the intermediate resonators 102B, 102C, 102D and 102E will also be referred to as the intermediate resonator body portions 103B, 103C, 103D and 103E.
The shape and configuration of each of the resonator body portions 103A to 103F are the same as those of one of the resonator body portions 3A to 3D of the first embodiment.
The resonator body portions 103A to 103F are configured so that the resonator body portions 103A and 103B are magnetically coupled to each other, the resonator body portions 103B and 103C are magnetically coupled to each other, the resonator body portions 103C and 103D are magnetically coupled to each other, the resonator body portions 103D and 103E are magnetically coupled to each other, and the resonator body portions 103E and 103F are magnetically coupled to each other.
In the present embodiment, the structure 20 includes a separation conductor layer 6 and a shield portion 7 each formed of a conductor, as in the first embodiment. The separation conductor layer 6 also serves as part of the shield portion 7. The shield portion 7 includes the separation conductor layer 6, a shield conductor layer 72, and a connection portion 71.
The separation conductor layer 6 separates the area where the resonator body portions 103A to 103F lie from the area where the capacitor C10 lies.
The shield portion 7 lies around the resonator body portions 103A to 103F such that at least part of the peripheral dielectric portion 4 is interposed between the shield portion 7 and the resonator body portions 103A to 103F.
The resonator body portions 103A to 103F lie in the area between the separation conductor layer 6 and the shield conductor layer 72 within the structure 20. Each of the resonator body portions 103A to 103F has a top end face closest to the shield conductor layer 72 and a bottom end face closest to the separation conductor layer 6.
The connection portion 71 electrically connects the separation conductor layer 6 and the shield conductor layer 72. The connection portion 71 includes a plurality of through hole lines 71T. The separation conductor layer 6, the shield conductor layer 72 and the connection portion 71 are arranged to surround the resonator body portions 103A to 103F. Each of the resonator body portions 103A to 103F is in non-contact with the shield portion 7.
As shown in
As shown in
The partition 108 is intended to prevent the occurrence of magnetic coupling between the first input/output stage resonator body portion 103A and the second input/output stage resonator body portion 103F. The partition 108 is arranged to pass between the first input/output stage resonator body portion 103A and the second input/output stage resonator body portion 103F. The partition 108 electrically connects the separation conductor layer 6 and the shield conductor layer 72. The partition 108 includes a plurality of through hole lines 108T. Each of the plurality of through hole lines 108T includes two or more through holes connected in series.
The partition 109 is intended to prevent the occurrence of magnetic coupling between the resonator body portion 103B and the resonator body portion 103E. The partition 109 is arranged to pass between the resonator body portion 103B and the resonator body portion 103E. The partition 109 electrically connects the separation conductor layer 6 and the shield conductor layer 72. The partition 109 includes a plurality of through hole lines 109T. Each of the plurality of through hole lines 109T includes two or more through holes connected in series.
The connection portion 12 electrically connects the ground layer 9 and the separation conductor layer 6. The connection portion 12 includes a plurality of through hole lines 12T.
As shown in
The coupling adjustment portion 111 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 103A and 103B. The coupling adjustment portion 112 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 103B and 103C. The coupling adjustment portion 113 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 103C and 103D. The coupling adjustment portion 114 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 103D and 103E. The coupling adjustment portion 115 is intended to adjust the magnitude of the magnetic coupling between the resonator body portions 103E and 103F. Each of the coupling adjustment portions 111 to 115 electrically connects the separation conductor layer 6 and the shield conductor layer 72.
In the example shown in
The dielectric resonator 102A is composed of the resonator body portion 103A, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 102B is composed of the resonator body portion 103B, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 102C is composed of the resonator body portion 103C, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 102D is composed of the resonator body portion 103D, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 102E is composed of the resonator body portion 103E, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 102F is composed of the resonator body portion 103F, at least part of the peripheral dielectric portion 4, and the shield portion 7.
The resonance mode of each of the dielectric resonators 102A to 102F is a TM mode. An electromagnetic field generated by the dielectric resonators 102A to 102F is present inside and outside the resonator body portions 103A to 103F. The shield portion 7 has a function of confining the electromagnetic field outside the resonator body portions 103A to 103F to within the area surrounded by the shield portion 7.
Reference is now made to
Further, a through hole 31T1 connected to the conductor layer 311, and a through hole 31T2 connected to the conductor layer 312 are formed in the dielectric layer 131. Further formed in the dielectric layer 131 are a plurality of through holes 12T1 constituting respective portions of the plurality of through hole lines 12T. All the through holes in
Further formed in the dielectric layer 132 are a through hole 32T1 connected to a portion of the conductor layer 321 near the second end thereof, and a through hole 32T2 connected to a portion of the conductor layer 322 near the second end thereof. Further formed in the dielectric layer 132 are a plurality of through holes 12T2 constituting respective portions of the plurality of through hole lines 12T. All the through holes in
Further formed in the dielectric layer 133 are through holes 33T1 and 33T2, and through holes 12T3 constituting respective portions of the through hole lines 12T. The through holes 32T1 and 32T2 shown in
Through holes 34T1 and 34T2 are formed in the dielectric layer 134. Further formed in the dielectric layer 134 are through holes 71T1, 108T1, 109T1, 111T1, 1112T1, 113T1, 114T1, and 115T1 constituting respective portions of the through hole lines 71T, 108T, 109T, 111T, 112T, 113T, 114T, and 115T. All the through holes in
The through hole 34T1 lies inside the hole 6a, and the through hole 34T2 lies inside the hole 6b. The through holes 33T1 and 33T2 shown in
In
The through holes 34T1, 34T2, 71T1, 108T1, 109T1, 111T1, 1112T1, 113T1, 114T1, and 115T1 shown in
Further formed in the dielectric layer 139 are through holes 71T3, 108T3, 109T3, 111T3, 112T3, 113T3, 114T3, and 115T3 constituting respective portions of the through hole lines 71T, 108T, 109T, 111T, 112T, 113T, 114T, and 115T. All the through holes in
The through holes 71T2, 108T2, 109T2, 111T2, 112T2, 113T2, 114T2, and 115T2 formed in the eighth dielectric layer 138 are respectively connected to the through holes 71T3, 108T3, 109T3, 111T3, 112T3, 113T3, 114T3, and 115T3 formed in the dielectric layer 139.
The through holes 71T3, 108T3, 109T3, 111T3, 112T3, 113T3, 114T3, and 115T3 shown in
The resonator body portions 103A to 103F are provided to penetrate the dielectric layers 140 to 160. The conductor layer 391 shown in
The through holes 71T4, 108T4, 109T4, 111T4, 112T4, 113T4, 114T4, and 115T4 formed in the thirtieth dielectric layer 160 are respectively connected to the through holes 71T5, 108T5, 109T5, 111T5, 112T5, 113T5, 114T5, and 115T5 formed in the dielectric layer 161.
The peripheral dielectric portion 4 is formed by stacking the dielectric layers 131 to 162 such that the patterned surface of the dielectric layer 131 shown in
The capacitor C10 shown in
Some of the plurality of through hole lines 12T constituting the connection portion 12 are arranged to surround the conductor layers 321, 322, and 331 constituting the capacitor C10.
As in the first embodiment, the first phase shifter 11A is composed of the conductor layer 321 and a through hole line constituted of the through holes 32T1, 33T1, 34T1 and 35T1. The second phase shifter 11B is composed of the conductor layer 322 and a through hole line constituted of the through holes 32T2, 33T2, 34T2 and 35T2.
The conductor layer 391 is opposed to the bottom end face of the resonator body portion 103A with the dielectric layer 139 interposed therebetween. The capacitive coupling C11A between the first phase shifter 11A and the first input/output stage resonator 102A is thereby provided. The conductor layer 392 is opposed to the bottom end face of the resonator body portion 103F with the dielectric layer 139 interposed therebetween. The capacitive coupling C11B between the second phase shifter 11B and the second input/output stage resonator 102F is thereby provided.
The configuration, operation and effects of the present embodiment are otherwise the same as those of the first embodiment.
A third embodiment of the invention will now be described.
As shown in
The dielectric resonators 202A and 202B are arranged in this order, the dielectric resonator 202A being closer to the first input/output port 5A in circuit configuration. The dielectric resonators 202A and 202B are adjacent to each other in circuit configuration and configured to be magnetically coupled to each other. Each of the dielectric resonators 202A and 202B has an inductance and a capacitance.
Hereinafter, the dielectric resonator 202A which is closer to the first input/output port 5A in circuit configuration will also be referred to as the first input/output stage resonator 202A, and the dielectric resonator 202B which is closer to the second input/output port 5B in circuit configuration will also be referred to as the second input/output stage resonator 202B.
In the present embodiment, the first phase shifter 11A is provided between the first input/output port 5A and the first input/output stage resonator 202A in circuit configuration. The first phase shifter 11A is configured to be capacitively coupled to the first input/output stage resonator 202A. In
The second phase shifter 11B is provided between the second input/output port 5B and the second input/output stage resonator 202B in circuit configuration. The second phase shifter 11B is configured to be capacitively coupled to the second input/output stage resonator 202B. In
As shown in
The structure 20 includes two resonator body portions 203A and 203B corresponding to the two dielectric resonators 202A and 202B, respectively, and a peripheral dielectric portion 4 lying around the two resonator body portions 203A and 203B. Each of the two resonator body portions 203A and 203B is formed of a first dielectric having a first relative permittivity. The peripheral dielectric portion 4 is formed of a second dielectric having a second relative permittivity lower than the first relative permittivity.
The shape and configuration of each of the resonator body portions 203A and 203B are the same as those of one of the resonator body portions 3A to 3D of the first embodiment. The resonator body portions 203A and 203B are configured to be magnetically coupled to each other.
As in the first embodiment, the structure 20 includes a separation conductor layer 6 and a shield portion 7 each formed of a conductor. The separation conductor layer 6 also serves as part of the shield portion 7. The shield portion 7 includes the separation conductor layer 6, a shield conductor layer 72, and a connection portion 71.
The separation conductor layer 6 separates an area where the resonator body portions 203A and 203B lie from an area where the capacitor C10 lies.
The shield portion 7 lies around the resonator body portions 203A and 203B such that at least part of the peripheral dielectric portion 4 is interposed between the shield portion 7 and the resonator body portions 203A, 203B.
The resonator body portions 203A and 203B lie in the area between the separation conductor layer 6 and the shield conductor layer 72 within the structure 20. Each of the resonator body portions 203A and 203B has a top end face closest to the shield conductor layer 72 and a bottom end face closest to the separation conductor layer 6.
The connection portion 71 electrically connects the separation conductor layer 6 and the shield conductor layer 72. The connection portion 71 includes a plurality of through hole lines 71T. The separation conductor layer 6, the shield conductor layer 72 and the connection portion 71 are arranged to surround the resonator body portions 203A and 203B. Each of the resonator body portions 203A and 203B is in non-contact with the shield portion 7.
As shown in
As shown in
The dielectric resonator 202A is composed of the resonator body portion 203A, at least part of the peripheral dielectric portion 4, and the shield portion 7. The dielectric resonator 202B is composed of the resonator body portion 203B, at least part of the peripheral dielectric portion 4, and the shield portion 7.
The resonance mode of each of the dielectric resonators 202A and 202B is a TM mode. An electromagnetic field generated by the dielectric resonators 202A and 202B is present inside and outside the resonator body portions 203A and 203B. The shield portion 7 has a function of confining the electromagnetic field outside the resonator body portions 203A and 203B to within the area surrounded by the shield portion 7.
Reference is now made to
Further, a through hole 31T1 connected to the conductor layer 311, and a through hole 31T2 connected to the conductor layer 312 are formed in the dielectric layer 231. Further formed in the dielectric layer 231 are a plurality of through holes 12T1 constituting respective portions of the plurality of through hole lines 12T. All the through holes in
Further formed in the dielectric layer 232 are a through hole 32T1 connected to a portion of the conductor layer 321 near the second end thereof, and a through hole 32T2 connected to a portion of the conductor layer 322 near the second end thereof. Further formed in the dielectric layer 232 are a plurality of through holes 12T2 constituting respective portions of the plurality of through hole lines 12T. All the through holes in
Further formed in the dielectric layer 233 are through holes 33T1 and 33T2, and through holes 12T3 constituting respective portions of the through hole lines 12T. The through holes 32T1 and 32T2 shown in
Through holes 34T1 and 34T2 are formed in the dielectric layer 234. Further formed in the dielectric layer 234 are through holes 71T1 and 214T1 constituting respective portions of the through hole lines 71T and 214T. All the through holes in
The through hole 34T1 lies inside the hole 6a, and the through hole 34T2 lies inside the hole 6b. The through holes 33T1 and 33T2 shown in
In
The through holes 34T1, 34T2, 71T1, and 214T1 shown in
Further, through holes 71T3 and 214T3 constituting respective portions of the through hole lines 71T and 214T are formed in the dielectric layer 239. All the through holes in
The through holes 71T2 and 214T2 formed in the eighth dielectric layer 238 are respectively connected to the through holes 71T3 and 214T3 formed in the dielectric layer 239.
The through holes 71T3 and 214T3 shown in
The resonator body portions 203A and 203B are provided to penetrate the dielectric layers 240 to 260. The conductor layer 391 shown in
The through holes 71T4 and 214T4 formed in the thirtieth dielectric layer 260 are respectively connected to the through holes 71T5 and 214T5 formed in the dielectric layer 261.
The peripheral dielectric portion 4 is formed by stacking the dielectric layers 131 to 162 such that the patterned surface of the dielectric layer 131 shown in
The capacitor C10 shown in
Some of the plurality of through hole lines 12T constituting the connection portion 12 are arranged to surround the conductor layers 321, 322, and 331 constituting the capacitor C10.
As in the first embodiment, the first phase shifter 11A is composed of the conductor layer 321 and a through hole line constituted of the through holes 32T1, 33T1, 34T1 and 35T1. The second phase shifter 11B is composed of the conductor layer 322 and a through hole line constituted of the through holes 32T2, 33T2, 34T2 and 35T2.
The conductor layer 391 is opposed to the bottom end face of the resonator body portion 203A with the dielectric layer 239 interposed therebetween. The capacitive coupling C11A between the first phase shifter 11A and the first input/output stage resonator 202A is thereby provided. The conductor layer 392 is opposed to the bottom end face of the resonator body portion 203B with the dielectric layer 239 interposed therebetween. The capacitive coupling C11B between the second phase shifter 11B and the second input/output stage resonator 202B is thereby provided.
The configuration, operation and effects of the present embodiment are otherwise the same as those of the first embodiment.
The present invention is not limited to the foregoing embodiments, and various modifications may be made thereto. For example, in the present invention the number of the dielectric resonators to be provided between the first input/output port and the second input/output port in circuit configuration may be an even number greater than or equal to eight.
Obviously, many modifications and variations of the present invention are possible in the light of the above teachings. Thus, it is to be understood that, within the scope of the appended claims and equivalents thereof, the invention may be practiced in other embodiments than the foregoing most preferable embodiments.
Number | Date | Country | Kind |
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2018-015687 | Jan 2018 | JP | national |
Number | Name | Date | Kind |
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20140152403 | Park | Jun 2014 | A1 |
20160072169 | Lin | Mar 2016 | A1 |
20180191045 | Zhang | Jul 2018 | A1 |
Number | Date | Country |
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103718375 | Apr 2014 | CN |
2000-013107 | Jan 2000 | JP |
Entry |
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Translation of Aug. 28, 2020 Office Action issued in Chinese Patent Application No. 201910085238.1. |
Number | Date | Country | |
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20190237838 A1 | Aug 2019 | US |