Claims
- 1. An internal latent image-forming direct positive silver halide photographic light-sensitive material wherein the direct positive silver halide is an internal latent, image-forming silver halide which has not been pre-fogged, containing a weak electron donative, adsorptive compound represented by the formula (I) or (II):
- D--L--X (I)
- D--X (II)
- wherein L represents a linking group selected form the group consisting of alkylene group, an alkenylene group, an arylene group, --O--, --S--, --CO--, --NH-- and --N.dbd. which is unsubstituted or substituted, alone of in combination;
- X represents a group which is adsorptive with respect to silver halide and contains at least one of C, N, S, O and Se; and
- D represents an electron donative group comprising an aromatic ring or hetero ring, which is unsubstituted or substituted, having the following skeleton: ##STR11## wherein M represents a heavy metal such as Zn, Pd, Cu, Ni or Fe; said adsorptive compound represented by formula (I) of (II) being effective for depressing formation of a re-reversed negative image and not being a spectral sensitizing agent for silver halide or a nucleating agent.
- 2. A light-sensitive material as in claim 1, which contains the compound represented by formula (I) or (II) and a nucleating agent in combination.
- 3. A light-sensitive material as in claim 1, wherein X represents a group which is adsorptive with respect to silver halide and contains a quaternized N.
- 4. A light-sensitive material as in claim 1, wherein
- x represents a group derived from a thiourea, a thioamide, a mercapto-substituted hetero ring compound, a benzotriazole, a thiosemicarbazide, a rhodanine, a thiohydantoin or a thiobarbituric acid, or a mercapto group.
- 5. A light-sensitive material as in claim 1, wherein X is a mercapto group or a group derived from a thiourea, a thioamide, a thiosemicarbazide, or a mercapto-substituted hetero ring compound.
- 6. A light-sensitive material as in claim 1, wherein the compound represented by formula (I) or (II) is used in an amount of from 10.sup.-6 to 10.sup.-2 mol per mol of silver halide in an emulsion layer associated therewith.
- 7. A light-sensitive material as in claim 1, wherein the compound represented by formula (I) or (II) is used in an amount of from 10.sup.-5 to 10.sup.-3 mol per mol of silver halide in an emulsion layer associated therewith.
- 8. A light-sensitive material as in claim 1, wherein the oxidation potential of the compound of formula (I) or (II) with respect to a saturated calomel electrode is from 0 to +1.0 V.
- 9. A light-sensitive material as in claim 1, wherein the oxidation potential of the compound of formula (I) or (II) with respect to a saturated calomel electrode is from 0.4 to 0.7 V.
- 10. A light-sensitive material as in claim 1, wherein the compound of (I) or (II) is incorporated in a silver halide emulsion layer.
- 11. A light-sensitive material as in claim 10, wherein at least one silver halide emulsion layer contains at least one kind of silver halide grains having a mean edge length of 0.5 .mu.m or more.
- 12. A light-sensitive material as in claim 1, wherein the compound of (I) or (II) is an adsorptive compound capable of providing electrons upon exposure.
- 13. A light-sensitive material as in claim 1, wherein the compound of formula (II) shows no spectral absorption in the region of spectral sensitization of the spectral sensitizing dye used.
- 14. A light-sensitizing material as in claim 2, wherein the nucleating agent is used in an amount of from 0.01 mg to 5 g per mol of silver in an internal latent image-forming emulsion associated thereiwth.
- 15. A light-sensitive material as in claim 2, wherein the nucleating agent is used in an amount of from 0.05 mg to 0.5 g per mol of silver in an internal latent image-forming emulsion associated therewith.
- 16. A light-sensitive material as in claim 1, wherein at least one direct positive silver halide emulsion layer constituting the light-sensitive material forms, when it does not contain a compound of formula (I) or (II), a re-reversed negative image having a maximum sensitivity of 30 or more (measured according to the following sensitivity-indicating standard) in high illuminance exposed area under the following coating, exposure and processing conditions:
- Coating condition: one-layer coating on one side of a transparent support in an amount of 5.0 g Ag/m.sup.2 to form a direct positive black-and-white light-sensitive material in which the nucleating agent having the following formula is included in amounts adequate to provide the maximum density of a direct positive image obtained after development being 1.0 or more; ##STR12## Exposure condition: 1/10,000 second exposure to white light of a color temperature of 4,800.degree. K. on the surface of the emulsion layer using a xenon lamp as the light source;
- Processing condition: developing at 20.degree. C. for 10 minutes using a surface developer containing 0.06 wt% of 1-phenyl-3-pyrazolidone, 1.0 wt% of hydroquinone, 3.0 wt% of sodium sulfite, 4.0 wt% of sodium tertiary phosphate and 1.1 wt% of sodium hydroxide and then fixing and washing;
- Negative sensitivity indication: presented as a 100-fold reciprocal of an exposure amount (cd. m.s.) giving a density of (maximum density+minimum density).times.1/2 of the negative image.
- 17. A process for depressing formation of a re-reversed negative image in an internal latent image-forming direct positive silver halide photographic light-sensitive material wherein the direct positive silver halide is an internal latent image-forming silver halide which has not been pre-fogged and which contains a weak electron donative, adsorptive compound represented by formula (I) or (II)
- D--L--X (I)
- D--X (II),
- comprising imagewise exposing and then developing the imagewise exposed photographic light-sensitive material in the presence of a nucleating agent wherein D represents an electron donative group comprising an aromatic ring or hetero ring, which is unsubstituted or substituted, having the following skeleton: ##STR13## wherein M represents a heavy metal such as Zn, Pd, Cu, Ni or Fe;
- L represents a linking group selected from an alkylene group, an alkenylene group, an arylene group, --O--, --S--, --CO--, --NH-- and --N.dbd. which is unsubstituted or substituted, alone or in combination; and
- X represents a group which is adsorptive with respect to silver halide and contains at least one of C, N, S, O and Se.
Priority Claims (1)
Number |
Date |
Country |
Kind |
58-108693 |
Jun 1983 |
JPX |
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Parent Case Info
This is a continuation of application Ser. No. 621,654, filed June 18, 1984, now abandoned.
US Referenced Citations (7)
Foreign Referenced Citations (1)
Number |
Date |
Country |
60-73625 |
Apr 1985 |
JPX |
Continuations (1)
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Number |
Date |
Country |
Parent |
621654 |
Jun 1984 |
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