Number | Date | Country | Kind |
---|---|---|---|
62-79165 | Mar 1987 | JPX |
Number | Name | Date | Kind |
---|---|---|---|
4412885 | Wang et al. | Nov 1983 | |
4505782 | Jacob et al. | Mar 1985 | |
4618398 | Nawata et al. | Oct 1986 | |
4659426 | Fuller et al. | Apr 1987 |
Number | Date | Country |
---|---|---|
020935 | Jan 1981 | EPX |
53-20769 | Apr 1978 | JPX |
53-146939 | Dec 1978 | JPX |
58-153334 | Dec 1983 | JPX |
60-228687 | Nov 1985 | JPX |
62-37382 | Feb 1987 | JPX |
2081160 | Feb 1982 | GBX |
Entry |
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Broydo, "Important Considerations in Selecting Anisotropic Plasma Etching Equipment," Solid State Technology, Apr. 1983, pp. 159-165. |
Schaible et al., "Preferential Lateral Chemical Etching in Reactive Ion Etching of Aluminum and Aluminum Alloys," J. Vac. Sci. Technol., 16(2), Mar./Apr. 1979, pp. 377-380. |
Downey et al., "Introduction to Reactive Ion Beam Etching," Solid State Technology, Feb. 1981, pp. 121-127. |