using plasmas

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CPC
H01L21/32136

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/32136using plasmas

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 12,368,031
- Issue date Jul 22, 2025
- HITACHI HIGH-TECH CORPORATION
- Kosa Hirota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam etching chamber with etching by-product redistributor
- Patent number 12,362,154
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Hsien Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of etching metals in semiconductor devices
- Patent number 12,354,881
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 12,356,646
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus, plasma etching method using the same, and...
- Patent number 12,347,657
- Issue date Jul 1, 2025
- Samsung Electronics Co., Ltd.
- Jongchul Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for metal gate cut and structure thereof
- Patent number 12,347,690
- Issue date Jul 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure including graphite and method forming same
- Patent number 12,334,397
- Issue date Jun 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shu-Cheng Chin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching tools and systems
- Patent number 12,334,356
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power control for rf impedance matching network
- Patent number 12,334,307
- Issue date Jun 17, 2025
- ASM IP Holding B.V.
- Ronald Anthony Decker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and formation method of semiconductor device structure
- Patent number 12,328,897
- Issue date Jun 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Che-Cheng Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recessed metal etching methods
- Patent number 12,322,602
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Wangkeun Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isotropic silicon nitride removal
- Patent number 12,315,739
- Issue date May 27, 2025
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Backside metal patterning die singulation systems and related methods
- Patent number 12,315,765
- Issue date May 27, 2025
- SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Michael J. Seddon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor device structures
- Patent number 12,308,292
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Chen Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-etch treatment for metal etch
- Patent number 12,308,250
- Issue date May 20, 2025
- Tokyo Electron Limited
- Scott Lefevre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric MFM capacitor array and methods of making the same
- Patent number 12,302,590
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,300,741
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Teng Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, gas re...
- Patent number 12,293,904
- Issue date May 6, 2025
- Kioxia Corporation
- Horoyuki Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 12,278,111
- Issue date Apr 15, 2025
- Ajou University Industry-Academic Cooperation Foundation
- Chang-Koo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices
- Patent number 12,272,555
- Issue date Apr 8, 2025
- Samsung Electronics Co., Ltd.
- Jinyoung Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing semiconductor structure
- Patent number 12,272,565
- Issue date Apr 8, 2025
- NANYA TECHNOLOGY CORPORATION
- Wei-Chuan Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant filter for solid state RF impedance matching network
- Patent number 12,272,522
- Issue date Apr 8, 2025
- ASM America, Inc.
- Imran Ahmed Bhutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etching for subtractive metal etch
- Patent number 12,266,542
- Issue date Apr 1, 2025
- Lam Research Corpporation
- Wenbing Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having buried word lines
- Patent number 12,267,993
- Issue date Apr 1, 2025
- NANYA TECHNOLOGY CORPORATION
- Min-Chung Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having buried word lines and method of manu...
- Patent number 12,245,416
- Issue date Mar 4, 2025
- NANYA TECHNOLOGY CORPORATION
- Min-Chung Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double patterning approach by direct metal etch
- Patent number 12,243,775
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsi-Wen Tien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Digital pen with enhanced educational and therapeutic feedback
- Patent number 12,233,661
- Issue date Feb 25, 2025
- Lauren Michelle Neubauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming and monitoring quality of the same
- Patent number 12,237,417
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Yin Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process for oxide of alkaline earth metal
- Patent number 12,237,172
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE FILM DEPOSITION
- Publication number 20250239484
- Publication date Jul 24, 2025
- ASM IP HOLDING B.V.
- Paul Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Contact Structures in Semiconductor Devices
- Publication number 20250234629
- Publication date Jul 17, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Chin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226228
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Mitsuaki IWASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250203995
- Publication date Jun 19, 2025
- RENESAS ELECTRONICS CORPORATION
- Tomoki AYANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOUBLE PATTERNING APPROACH BY DIRECT METAL ETCH
- Publication number 20250191973
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsi-Wen TIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT FOR FABRICATING A SEMICONDUCTOR, HAVING PLURALITY OF LAYE...
- Publication number 20250188603
- Publication date Jun 12, 2025
- TOKAI CARBON KOREA CO., LTD.
- JOUNG IL KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH
- Publication number 20250191934
- Publication date Jun 12, 2025
- LAM RESEARCH CORPORATION
- Wenbing YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING STRUCTURE HAVING ELECTRODE AND ANODIZED PART
- Publication number 20250191924
- Publication date Jun 12, 2025
- MIKRO MESA TECHNOLOGY CO., LTD.
- Li-Yi CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING PROCESS, SEMICONDUCTOR DEVICE, AND SUBS...
- Publication number 20250174469
- Publication date May 29, 2025
- SEMES CO., LTD.
- Sang Man PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIGITAL PEN WITH ENHANCED EDUCATIONAL AND THERAPEUTIC FEEDBACK
- Publication number 20250162342
- Publication date May 22, 2025
- Lauren Michelle Neubauer
- B43 - WRITING OR DRAWING IMPLEMENTS BUREAU ACCESSORIES
Information Patent Application
FinFET Device and Method of Forming and Monitoring Quality of the Same
- Publication number 20250169101
- Publication date May 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Yin CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE CONVERSION FOR MEOL AND BEOL APPLICATIONS
- Publication number 20250132146
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Mohammad Mahdi TAVAKOLI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250132203
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Song Yi BAEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR EL...
- Publication number 20250133807
- Publication date Apr 24, 2025
- Toyoda Gosei Co., Ltd.
- Kota YASUNISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Structure Cutting Process and Structures Formed Thereby
- Publication number 20250126883
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chang Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND METHOD OF MANUFACTURING DISPLAY APPARATUS
- Publication number 20250118571
- Publication date Apr 10, 2025
- SAMSUNG DISPLAY CO., LTD.
- Changho YI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250105020
- Publication date Mar 27, 2025
- Hitachi High-Tech Corporation
- Masaya IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...
- Publication number 20250098248
- Publication date Mar 20, 2025
- Kioxia Corporation
- Masaya NAKATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20250087498
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250087497
- Publication date Mar 13, 2025
- HITACHI HIGH-TECH CORPORATION
- Yohei ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCULAR-SHAPED RESISTOR
- Publication number 20250089347
- Publication date Mar 13, 2025
- International Business Machines Corporation
- Ashim Dutta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL
- Publication number 20250079199
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Shiyu YUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...
- Publication number 20250046577
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Syam Parayil VENUGOPALAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250046620
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Kenta NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS WITH HEATED FILTER AND OPERATION METHOD OF THE SAME
- Publication number 20250046584
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Lun LU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHIP AND PREPARATION METHOD THEREOF, AND ELECTRONIC DEVICE
- Publication number 20250038075
- Publication date Jan 30, 2025
- Huawei Technologies Co., Ltd
- Weichuan Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20250022719
- Publication date Jan 16, 2025
- Hitachi High-Tech Corporation
- Thi-Thuy-Nga NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSISTOR WITH CHANNEL-SYMMETRIC GATE
- Publication number 20250006810
- Publication date Jan 2, 2025
- Intel Corporation
- Shao-Ming Koh
- H01 - BASIC ELECTRIC ELEMENTS

using plasmas

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing method

Ion beam etching chamber with etching by-product redistributor

Methods of etching metals in semiconductor devices

Semiconductor device and method for manufacturing the same

Plasma etching apparatus, plasma etching method using the same, and...

Method for metal gate cut and structure thereof

Interconnect structure including graphite and method forming same

Plasma etching tools and systems

Power control for rf impedance matching network

Structure and formation method of semiconductor device structure

Recessed metal etching methods

Isotropic silicon nitride removal

Backside metal patterning die singulation systems and related methods

Methods of forming semiconductor device structures

Pre-etch treatment for metal etch

Ferroelectric MFM capacitor array and methods of making the same

Semiconductor device and method

Substrate processing apparatus, substrate processing method, gas re...

Plasma etching method

Methods of forming semiconductor devices

Method for preparing semiconductor structure

Resonant filter for solid state RF impedance matching network

Atomic layer etching for subtractive metal etch

Semiconductor structure having buried word lines

Etching method and etching apparatus

Semiconductor structure having buried word lines and method of manu...

Double patterning approach by direct metal etch

Digital pen with enhanced educational and therapeutic feedback

FinFET device and method of forming and monitoring quality of the same

Etch process for oxide of alkaline earth metal

Patents Applicationslast 30 patents

SELECTIVE FILM DEPOSITION

Contact Structures in Semiconductor Devices

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

DOUBLE PATTERNING APPROACH BY DIRECT METAL ETCH

COMPONENT FOR FABRICATING A SEMICONDUCTOR, HAVING PLURALITY OF LAYE...

ATOMIC LAYER ETCHING FOR SUBTRACTIVE METAL ETCH

METHOD OF MANUFACTURING STRUCTURE HAVING ELECTRODE AND ANODIZED PART

SEMICONDUCTOR MANUFACTURING PROCESS, SEMICONDUCTOR DEVICE, AND SUBS...

DIGITAL PEN WITH ENHANCED EDUCATIONAL AND THERAPEUTIC FEEDBACK

FinFET Device and Method of Forming and Monitoring Quality of the Same

METAL OXIDE CONVERSION FOR MEOL AND BEOL APPLICATIONS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES

SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR EL...

Semiconductor Structure Cutting Process and Structures Formed Thereby

PLASMA ETCHING METHOD AND METHOD OF MANUFACTURING DISPLAY APPARATUS

PLASMA PROCESSING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR MANUFAC...

TIN OXIDE MANDRELS IN PATTERNING

PLASMA PROCESSING METHOD

CIRCULAR-SHAPED RESISTOR

ONE CHAMBER MULTI-STATION SELECTIVE METAL REMOVAL

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

METHOD OF PATTERNING A TARGET LAYER, APPARATUS FOR PATTERNING A TAR...

PLASMA PROCESSING METHOD

APPARATUS WITH HEATED FILTER AND OPERATION METHOD OF THE SAME

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

CHIP AND PREPARATION METHOD THEREOF, AND ELECTRONIC DEVICE

ETCHING METHOD

TRANSISTOR WITH CHANNEL-SYMMETRIC GATE