This is a continuation of application Ser. No. 08/301,114, filed Sep. 6, 1994, now abandoned.
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4466877 | McKelvey | Aug 1984 | |
4478702 | Gillery et al. | Oct 1984 | |
4744880 | Gillery et al. | May 1988 | |
4849087 | Meyer | Jul 1989 | |
5106474 | Dickey et al. | Apr 1992 | |
5108574 | Kirs et al. | Apr 1992 | |
5158660 | Devigne et al. | Oct 1992 | |
5178743 | Kumar | Jan 1993 |
Number | Date | Country |
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WO9201081 | Jan 1992 | WOX |
WO9209718 | Jun 1992 | WOX |
Entry |
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Patent Abstracts of Japan vol. 018 No. 201 (C-188), 8 Apr. 1994 & JP-A-06-002123 (Mitsubishi Heavy Ind Ltd) 11 Jan. 1994, "abstract". |
"Cosputtering and Serial Cosputtering Using Cylindrical Rotatable Magnetrons", A. Belkind, J. Vac. Sci. Technol. A vol. 11(4), Jul./Aug. 1993, pp 1501-1509. |
Article of: Sieck, P., "Effect of Anode Location on Deposition Profiles for Long Rotatable Magnetrons," 37th Annual Technical conference of the Society of Vacuum Coaters, Boston, May 8-13, 1994, pp. 233-236. |
Number | Date | Country | |
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Parent | 301114 | Sep 1994 |