Claims
- 1. Apparatus for transferring a semiconductor workpiece comprising:
a cone; a chuck adapted to support the workpiece thereon; and a flexible member coupling the cone to the chuck.
- 2. The apparatus of claim 1 further comprising:
a cone support plate movably connected to the cone by a pin assembly; and a plurality of springs captured between the cone support plate and the cone.
- 3. The apparatus of claim 1 wherein the cone further comprises:
a lip disposed on an outer diameter of the cone; and, a guide disposed on a radially inner side of the lip.
- 4. The apparatus of claim 2 wherein the pin assembly further comprises:
a pin set partially in a first counter bore of the cone and partially in a hole in the cone support plate; a pad disposed in a counter bore concentric with the hole of the cone support plate; a bolt passing through the pin, the pad, the cone and the cone support plate, having a head set within a first counter bore of the cone; and, a nut disposed on the bolt capturing the pad within the counter bore, the nut adjustably setting the limit of separation between the cone and the cone support plate.
- 5. The apparatus of claim 1 further wherein the flexible member further comprises:
a center connected to the chuck; and, a plurality of legs radiating from the center, each of the legs having outer members connected to the center and an inner member connected to the cone.
- 6. The apparatus of claim 5 wherein the plurality of legs is three.
- 7. The apparatus of claim 1 wherein the chuck is a polymer.
- 8. The apparatus of claim 1 wherein the chuck further comprises:
a wafer sensor.
- 9. The apparatus of claim 1 further comprising:
a chemical mechanical polisher having one or more polishing stations.
- 10. The apparatus of claim 1, wherein the flexible member prevents lateral motion of the chuck relative to the cone.
- 11. The apparatus of claim 1, wherein the flexible member allows an angular change in planar orientation between the cone and the chuck.
- 12. Apparatus for polishing a semiconductor workpiece comprising:
a chemical mechanical polisher having one or more polishing stations; one or more retaining rings for transferring the workpiece to the polishing stations and holding the workpiece during polishing; and, a cup assembly disposed within the chemical mechanical polisher and having a cone flexibly coupled to a chuck that is adapted to support the workpiece during transfer between the cup assembly and the retaining ring.
- 13. The apparatus of claim 10 wherein the cup assembly comprises:
a flat spring coupling the cone to the chuck.
- 14. The apparatus of claim 13 wherein the cup assembly further comprises:
a wafer sensor.
- 15. The apparatus of claim 14 wherein the sensor further comprises:
at least one portal disposed in the chuck.
- 16. The apparatus of claim 14 wherein the at least one portal is adapted to provide a fluid layer between the workpiece and the cup assembly.
- 17. The apparatus of claim 13 wherein the flat spring prevents lateral motion between the cone and the chuck.
- 18. The apparatus of claim 13 wherein the flat spring allows an angular change in planar orientation between the cone and the chuck.
- 19. The apparatus of claim 12 further comprising:
a cone support plate; a pin set partially in a first counter bore of the cone and partially in a hole in the cone support plate; a pad disposed in a counter bore concentric with the hole of the cone support plate; a bolt passing through the pin, the pad, the cone and the cone support plate, having a head set within a first counter bore of the cone; and, a nut disposed on the bolt capturing the pad within the counter bore, the nut adjustably setting the limit of separation between the cone and the cone support plate.
- 20. The apparatus of claim 13 further wherein the flat spring further comprises:
a center connected to the chuck; and, a plurality of legs radiating from the center, each the legs each having outer members connected to the center and an inner member connected to the cone.
- 21. The apparatus of claim 20 wherein the plurality of legs is three.
- 22. The apparatus of claim 12 wherein the chuck further comprises:
a wafer sensor having a working fluid passing through a restrictor creating a pressure drop measured by a sensor.
- 23. Apparatus for transferring a semiconductor workpiece comprising:
a cone; a chuck adapted to support the workpiece; and, a means for coupling the chuck to the cone, the coupling means adapted to prevent the chuck from moving laterally in relation to the cone and adapted to allow angular change in planar orientation of the chuck relative to the cone.
- 24. Apparatus for transferring a semiconductor workpiece comprising:
a chuck having a support surface adapted to support the workpiece; at least one nozzle formed in the supporting surface and adapted to flow a fluid therefrom that maintains the workpiece and supporting surface in a spaced apart relation.
- 25. The apparatus of claim 24 wherein the loadcup further comprises a lip extending from a perimeter of the supporting surface.
- 26. The apparatus of claim 25 wherein the at least one nozzle is disposed within about 3 mm of the lip.
- 27. The apparatus of claim 24 further comprising:
a cone; and a flexible member connecting the chuck to the cone.
- 28. Apparatus for polishing a semiconductor workpiece comprising:
a chemical mechanical polisher having one or more polishing stations; one or more retaining rings for transferring the workpiece to the polishing stations and holding the workpiece during polishing; a cup assembly coupled to the chemical mechanical polisher, the cup assembly having a support surface and a lip protruding from an outer perimeter of the support surface; and at least one nozzle disposed in the support surface, the nozzle adapted to flow a fluid therefrom to maintain the workpiece the support surface in a spaced apart relation.
- 29. Apparatus for polishing a semiconductor workpiece comprising:
a chemical mechanical polisher having one or more polishing stations; one or more retaining rings for transferring the workpiece to the polishing stations and holding the workpiece during polishing; a cup assembly coupled to the chemical mechanical polisher, the cup assembly having a support surface and a lip protruding from an outer perimeter of the support surface; and a fluid layer disposed on the support surface and adapted to maintain the workpiece the support surface in a spaced apart relation.
- 30. The apparatus of claim 29, wherein the cup assembly further comprises:
a cone; a chuck having the support surface; and a flexible member coupling the chuck to the cone.
- 31. The apparatus of claim 30, wherein the flexible member prevents lateral motion of the chuck relative to the cone.
- 32. The apparatus of claim 30, wherein the flexible member allows an angular change in planar orientation between the cone and the chuck.
- 33. The apparatus of claim 30 further comprising at least one nozzle disposed in the cup assembly and adapted to flow fluid therethrough to create the fluid layer.
- 34. The apparatus of claim 33 further comprising a sensor adapted to sense a metric of flow out of at least one nozzle.
- 35. The apparatus of claim 34 wherein the metric is pressure.
Parent Case Info
[0001] This application is a continuation of co-pending U.S. patent application Ser. No. 09/414,907, filed Oct. 8, 1999, by Tobin, which claims the benefit of U.S. Provisional Application No. 60/139,144, filed Jun. 14, 1999, both of which are hereby incorporated herein by reference in their entireties.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60139144 |
Jun 1999 |
US |
Continuations (1)
|
Number |
Date |
Country |
Parent |
09414907 |
Oct 1999 |
US |
Child |
10229840 |
Aug 2002 |
US |