Claims
- 1. A process for preparing an element comprising
- (a) cleaning a metal article,
- (b) electrolyzing said metal article made anodic using direct current in an aqueous electrolytic solution having dissolved therein a mixture of electrolytes comprising:
- i. a water-soluble organic acid or mixture of two or more water-soluble organic acids selected from the group consisting of organic phosphoric acids, sulfonic acids, phosphonic acids, diethylene diamine penta acetic acid, ethylene diamine tetra acetic acid, hydroxyethyl ethylene diamine triacetic acid, and nitrilo triacetic acid; and
- ii. a strong inorganic acid comprising a phosphorus oxo acid having POH groups in which the hydrogen atom is ionizable under electrolytic conditions sufficient to form an insoluble substantially non-porous metal oxide-organic complex, including said organic acid, bonded to the surface of said metal article.
- 2. The process of claim 1, wherein said phosphorus oxo acid is phosphoric acid.
- 3. The process of claim 2, wherein said phosphorus oxo acid is phosphorous acid.
- 4. The process of claim 1, wherein said water-soluble organic acid is selected from the group consisting of the condensation product of benzene phosphonic acid, 2-ethyl hexyl phosphonic acid, and mixtures of these acids.
- 5. The process of claim 1 wherein the metal article is composed of aluminum or one of its alloys.
- 6. The process of claim 1, wherein the metal article is composed of steel.
- 7. The process of claim 5, wherein said water-soluble organic acid is nitrilo triacetic acid.
- 8. The process of claim 5, wherein said water-soluble organic acid is a condensation product of benzene phosphonic acid and formaldehyde.
- 9. The process of claim 5, wherein said water-soluble organic acid is a copolymer of methylvinyl ether and maleic acid.
- 10. The process of claim 5, wherein said water-soluble organic acid is polyvinyl sulfonic acid.
- 11. The process of claim 5, wherein said water-soluble organic acid is polystyrene sulfonic acid.
- 12. The process of claim 5, wherein said water-soluble organic acid is phytic acid.
- 13. The process of claim 5, wherein said water-soluble organic acid is alginic acid.
- 14. The process of claim 5, wherein said water-soluble organic acid is poly-n-butyl benzene sulfonic acid.
- 15. The process of claim 5, wherein said water-soluble organic acid is polydiisopropyl benzene sulfonic acid.
- 16. The process of claim 5, wherein said water-soluble organic acid is polyvinyl phosphonic acid.
- 17. The process of claim 5, wherein said water-soluble organic acid is dodecyl polyoxyethylene phosphonic acid.
- 18. The process of claim 5, wherein said water-soluble organic acid is dinonyl naphthalene disulfonic acid.
- 19. The process of claim 5, wherein said water-soluble organic acid is 2,2'-dinitro-4,4'-stilbene disulfonic acid.
- 20. The process of claim 5, wherein said water-soluble organic acid is diisopropyl polynaphthalene disulfonic acid.
- 21. The process of claim 5, wherein said water-soluble organic acid is 2-ethyl hexyl phosphonic acid.
- 22. The process of claim 5, wherein said water-soluble organic acid is dodecyl naphthalene disulfonic acid.
- 23. The process of claim 5, wherein said water-soluble organic acid is di-n-butyl naphthalene disulfonic acid.
- 24. The process of claim 5, wherein said water-soluble organic acid is polydecyl benzene sulfonic acid.
- 25. The process of claim 5, wherein said water-soluble organic acid is polyacrylic acid.
- 26. The process of claim 5, wherein said water-soluble organic acid is polymethacrylic acid.
- 27. The process of claim 5, wherein said water-soluble organic acid is diethylene diamine pentaacetic acid.
- 28. The process of claim 5, wherein said water-soluble organic acid is polynaphthalene sulfonic acid.
- 29. The process of claim 5, wherein said water-soluble organic acid is ethylenediamine tetraacetic acid.
- 30. The process of claim 5, wherein said water-soluble organic acid is hydroxyethyl ethylene diamine triacetic acid.
- 31. The process of claim 1, wherein said electrolyte solution has dissolved therein a mixture of two or more said organic acids.
- 32. The process of claim 1, wherein said inorganic acid is phosphoric acid and said electrolyte further comprises sulfuric acid.
- 33. The process of claim 30, wherein said organic acid is present at a concentration of between about 0.5% and about 30% and said electrolysis is conducted at a voltage of at least about 5 volts, an average current density of between about 0.2 amperes/dm.sup.2 and about 6 amperes/dm.sup.2, a time of between 0.8 minutes and about 5 minutes, and a temperature of between about -2.degree. C. and about 60.degree. C.
- 34. The process of claim 30, wherein said organic acid is present at a concentration of at least about 0.5%, said eiectrolysis is conducted at a voltage of between about 10 volts and about 30 volts, the average current density is between about 0.2 amperes/dm and about 6 amperes/dm.sup.2, the time is between about 0.16 minutes and about 1 minute, and the temperature is between about 10.degree. C. and about 35.degree. C.
- 35. The process of claims 32, wherein said organic acid is the condensation product of benzene phosphonic acid and formaldehyde.
- 36. The process of claims 32, wherein said organic acid is a phytic acid.
- 37. The process of claims 32, wherein said organic acid is polyvinyl phosphonic acid.
- 38. The process of claims 32, wherein said organic acid is 2-ethyl hexyl phosphonic acid.
- 39. The process of claim 3, wherein said metal article is lithographic aluminum sheet, and as an additional step, a light sensitive coating is applied to the surface of said insoluble metal oxide-organic complex.
- 40. The process of claim 39, wherein the light sensitive coating contains a sensitizer selected from the group consisting of o-quinone diazides condensation products of the condensation of aromatic diazonium compounds, and photopolymers.
- 41. The process of claim 39, wherein said sensitizer is an o-quinone diazide.
- 42. The process of claim 39, wherein said sensitizer is a product of the condensation of aromatic of a diazonium compound.
- 43. The process of claim 39 wherein said sensitizer is a photopolymer.
- 44. The process of claim 40, wherein said organic acid is polyvinyl phosphonic acid.
- 45. The product produced by the process of claim 5.
- 46. The product produced by the process of claim 4.
- 47. The product produced by the process of claim 16.
- 48. The product produced by the process of claim 33.
- 49. The product produced by the process of claim 34.
- 50. The product produced by the process of claim 39.
- 51. The product produced by the process of claim 40.
- 52. The product produced by the process of claim 41.
- 53. The product produced by the process of claim 42.
- 54. A metal article having a substantially nonporous, insoluble metal oxide-organic layer comprising anodic oxide combined with one or more organic acids selected from the group consisting of sulfonic acid, phosphonic acid, organic phosphoric acids; diethylene diamine penta acetic acid, ethylene diamine tetra acetic acid, hydroxyethyl ethylene diamine triacetic acid, and nitrilo triacetic acid.
- 55. A metal article having a substantially nonporous insoluble metal oxide-organic layer thereupon, said layer comprising anodic oxide combined with an organic acid selected from the group consisting of the condensation product of benzene phosphonic acid and formaldehyde, phytic acid, polyvinyl phosphonic acid, 2-ethyl hexyl phosphonic acid and mixtures of these acids.
- 56. The product of claim 54, wherein said article is composed of a metal selected from the group consisting of aluminum and its alloys, and steel.
- 57. The product of claim 55, wherein said metal is aluminum and said metal oxide-organic layer has a light sensitive coating thereupon.
- 58. The product of claim 57, wherein said light sensitive coating contains a sensitizer selected from the group consisting of o-quinone diazides, condensation products of an aromatic diazonium compound and photopolymers.
Parent Case Info
This application is a continuation of U.S. patent application Ser. No. 188,091 filed on Sept. 26, 1980 now abandoned.
US Referenced Citations (9)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1251616 |
Apr 1968 |
DEX |
Continuations (1)
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Number |
Date |
Country |
Parent |
188091 |
Sep 1980 |
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