Claims
- 1. A process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups;
- A. 0.005 to 40 grams per liter of an aryl N-heteroaromatic or N-heteroaliphatic ring compound or salt exhibiting the structure ##EQU17## wherein R is selected from the group consisting of phenyl, benzyl and p-xylyl and the N-Ring is selected from the group consisting of substituted and unsubstituted N-heteroaliphatic rings and substituted and unsubstituted N-heteroaromatic rings; Y is present or absent; Y, when present, represents an anionic moiety, n is save when R is p-xylyl n is 2; and
- B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram-equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms in an amount of 0.01 milligrams per liter to 1000 milligrams per liter.
- 2. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC3##
- 3. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC4##
- 4. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC5##
- 5. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC6##
- 6. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC7##
- 7. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC8##
- 8. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC9##
- 9. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC10##
- 10. The process as claimed in claim 1 wherein the cooperating amine is of the formula: ##SPC11##
Parent Case Info
This application is a continuation in part of U.S. Patent application Ser. No. 315,112 filed Dec. 14, 1972, now abandoned.
US Referenced Citations (11)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
315112 |
Dec 1972 |
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