Claims
- 1-8. (canceled)
- 9. An electron beam physical vapor deposition process performed in a coating chamber at an elevated temperature and a subatmospheric pressure, the coating chamber containing a crucible and a coating material surrounded by and contained within the crucible, the coating material having a surface exposed by the crucible, the process comprising the step of:
projecting an electron beam onto the surface of the coating material, the electron beam defining a beam pattern having a higher intensity at an interface of the surface of the coating material with the crucible than at a central region of the surface of the coating material.
- 10. An electron beam physical vapor deposition process according to claim 9, wherein the intensity at the central region of the surface of the coating material is substantially zero.
- 11. An electron beam physical vapor deposition process according to claim 9, wherein the electron beam is also projected onto a surface portion of the crucible contiguous with the surface of the coating material, the beam pattern having a higher intensity on the surface portion of the crucible than at the central region of the surface of the coating material.
- 12. An electron beam physical vapor deposition process according to claim 9, wherein the beam pattern has a perimeter on the surface portion of the crucible, the electron beam being incident on the surface of the coating material at an oblique angle so as to establish relative to the electron beam gun a proximal point and an oppositely-disposed distal point at the perimeter of the beam pattern, the beam pattern having a lower intensity at the proximal and distal points than elsewhere at the perimeter of the beam pattern.
- 13. An electron beam physical vapor deposition process according to claim 12, wherein the intensity of the beam pattern at the proximal and distal points is about 30% to about 70% less than the intensity elsewhere at the perimeter of the beam pattern.
- 14. An electron beam physical vapor deposition process according to claim 9, further comprising the step of projecting a separate beam pattern on the crucible to evaporate droplets of the molten coating material on the crucible, the separate beam pattern having a higher intensity than the beam pattern on the coating material.
- 15. An electron beam physical vapor deposition process according to claim 9, wherein the coating material comprises zirconia stabilized by yttria and the electron beam is operated to evaporate the coating material and deposit the evaporated coating material on a surface of a gas turbine engine component.
- 16. An electron beam physical vapor deposition process performed in a coating chamber at an elevated temperature and a pressure greater than 0.010 mbar, the coating chamber containing a crucible and a coating material surrounded by and contained within the crucible, the coating material having a surface exposed by the crucible, the process comprising the steps of:
projecting an electron beam onto the surface of the coating material and a contiguous surface portion of the crucible, the electron beam forming a beam pattern with a perimeter on the contiguous surface portion of the crucible, the electron beam gun melting the surface of the coating material and evaporating molten coating material, the electron beam having a higher intensity at an interface of the surface of the coating material with the contiguous surface portion of the crucible than at a central region of the surface of the coating material, the electron beam being incident on the surface of the coating material at an oblique angle so as to establish relative to the electron beam gun a proximal point and an oppositely-disposed distal point at the perimeter of the beam pattern, the electron beam having a lower intensity at the proximal and distal points than elsewhere at the perimeter of the beam pattern; and depositing the evaporated molten coating material on a substrate so as to form a coating thereon of the coating material.
- 17. An electron beam physical vapor deposition process according to claim 16, wherein the intensity at the central region of the surface of the coating material is substantially zero.
- 18. An electron beam physical vapor deposition process according to claim 16, wherein the intensity of the beam pattern at the proximal and distal points is about 30% to about 70% less than elsewhere at the perimeter of the beam pattern.
- 19. An electron beam physical vapor deposition process according to claim 16, further comprising the step of projecting a separate beam pattern on the crucible to evaporate droplets of the molten coating material on the crucible, the separate beam pattern having a higher intensity than the beam pattern on the coating material.
- 20. An electron beam physical vapor deposition process according to claim 16, wherein the coating material comprises zirconia stabilized by yttria, and the substrate is a surface of a gas turbine engine component.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2002086789 |
Aug 2002 |
UA |
|
Parent Case Info
[0001] This application claims benefit of U.S. Provisional Patent Application No. 60/147,232, filed Aug. 4, 1999, which is hereby incorporated by reference.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60147232 |
Aug 1999 |
US |
Divisions (1)
|
Number |
Date |
Country |
Parent |
09624810 |
Jul 2000 |
US |
Child |
10754419 |
Jan 2004 |
US |