Claims
- 1. In a method of recording information whereby a modulated beam of electrons is scanned across a surface of a resist material which becomes more soluble in a developer solvent when impinged upon by the beam of electrons and the resist material is developed with the developer solvent so as to remove the solubilized portions thereof, the improvement which comprises employing as the resist material a polymer of 1-methylvinyl methyl ketone.
- 2. A method according to claim 1 wherein the polymer is a 1-methylvinyl methyl ketone homopolymer.
- 3. A method according to claim 1 wherein the polymer is a copolymer of 1-methylvinyl methyl ketone and a comonomer having vinyl unsaturation.
- 4. A method according to claim 3 wherein the polymer is a copolymer of 1-methylvinyl methyl ketone and an acrylate or methacrylate monomer.
- 5. A method according to claim 4 wherein the copolymer is derived from 1-methylvinyl vinyl ketone and ethyl acrylate.
- 6. A method according to claim 1 wherein the polymer is on an electrically conductive substrate.
- 7. A method according to claim 1 wherein the polymer has an electrically conductive layer thereon.
Parent Case Info
This is a division of application Ser. No. 314,975, filed Dec. 14, 1972, now abandoned.
US Referenced Citations (14)
Non-Patent Literature Citations (1)
Entry |
Wissbron, "The Photolysis of Polymethylvinyl Ketone and Polymethyl Isoproponyl Ketone", JACS, vol. 81, 1959, p. 58. |
Divisions (1)
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Number |
Date |
Country |
Parent |
314975 |
Dec 1972 |
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