Macromolecular compounds which are photodegradable

Industry

CPC
G03F7/039

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/039Macromolecular compounds which are photodegradable

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method and composition
- Patent number 12,332,563
- Issue date Jun 17, 2025
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing microstructure including cured products of...
- Patent number 12,326,662
- Issue date Jun 10, 2025
- Canon Kabushiki Kaisha
- Yohei Hamade
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Micro- and nano-fluidic chip, method of fabricating the same, and a...
- Patent number 12,303,897
- Issue date May 20, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing high-density in-line carbon nanotube thin...
- Patent number 12,303,930
- Issue date May 20, 2025
- BEIJING HUA TAN YUAN XIN ELECTRONICS TECHNOLOGY CO., LTD
- Jie Han
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoacid generator for chemically amplified photoresists for deep...
- Patent number 12,306,535
- Issue date May 20, 2025
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Mask for EUV lithography and method of manufacturing the same
- Patent number 12,298,662
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography
- Patent number 12,298,667
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Meng-Che Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow cells and methods for making the same
- Patent number 12,298,665
- Issue date May 13, 2025
- Illumina, Inc.
- Sahngki Hong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist and method of formation and use
- Patent number 12,287,575
- Issue date Apr 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Keng-Chu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,282,254
- Issue date Apr 22, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,275,693
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,276,910
- Issue date Apr 15, 2025
- DuPont Electronic Materials International, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,276,911
- Issue date Apr 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer material in a redistribution structure of a semiconductor p...
- Patent number 12,265,330
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sih-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent electrode, process for producing transparent electrode,...
- Patent number 12,262,571
- Issue date Mar 25, 2025
- Kabushiki Kaisha Toshiba
- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electronic system of specimen qualification
- Patent number 12,253,473
- Issue date Mar 18, 2025
- NANYA TECHNOLOGY CORPORATION
- Hung-Chih Chang
- G01 - MEASURING TESTING
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and pattern forming method
- Patent number 12,248,249
- Issue date Mar 11, 2025
- Oji Holdings Corporation
- Kimiko Hattori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Print process for color conversion layer using porous host or posit...
- Patent number 12,237,445
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Hou T. Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photo-patternable organic semiconductor (OSC) polymers and methods...
- Patent number 12,227,613
- Issue date Feb 18, 2025
- Corning Incorporated
- Mingqian He
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 12,228,856
- Issue date Feb 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,222,648
- Issue date Feb 11, 2025
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196140
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...
- Publication number 20250199406
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAM...
- Publication number 20250199402
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Susumu TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196139
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...
- Publication number 20250199405
- Publication date Jun 19, 2025
- YCCHEM CO., LTD.
- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION
- Publication number 20250204164
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Yugo TANIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...
- Publication number 20250199401
- Publication date Jun 19, 2025
- TORAY INDUSTRIES, INC.
- Kenta AOSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250199404
- Publication date Jun 19, 2025
- FUJIFILM CORPORATION
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF MANUFACTURING PLATED ARTICLE
- Publication number 20250189895
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...
- Publication number 20250188223
- Publication date Jun 12, 2025
- Fujifilm Electronic Materials U.S.A., Inc.
- Binod B. De
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER MATERIAL IN A REDISTRIBUTION STRUCTURE OF A SEMICONDUCTOR P...
- Publication number 20250189889
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sih-Hao Liao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250189893
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yosuke SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE SURFACE TREATING AGENT, LAMINATE, PATTERN FORMATION...
- Publication number 20250180990
- Publication date Jun 5, 2025
- Nikon Corporation
- Yusuke KAWAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20250180988
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Yasuo SOMEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PRETREATMENT
- Publication number 20250180989
- Publication date Jun 5, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...
- Publication number 20250180991
- Publication date Jun 5, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...
- Publication number 20250172872
- Publication date May 29, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...
- Publication number 20250172873
- Publication date May 29, 2025
- TORAY INDUSTRIES, INC.
- Yusuke KOMORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...
- Publication number 20250172875
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20250172874
- Publication date May 29, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250164878
- Publication date May 22, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250164882
- Publication date May 22, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...
- Publication number 20250164877
- Publication date May 22, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20250164883
- Publication date May 22, 2025
- JSR Corporation
- Motohiro SHIRATANI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY
- Publication number 20250155809
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...
- Publication number 20250155811
- Publication date May 15, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Issei SUZUKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155800
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20250155806
- Publication date May 15, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Makoto SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20250155808
- Publication date May 15, 2025
- ZEON CORPORATION
- Makoto FUJIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155801
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Macromolecular compounds which are photodegradable

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pattern-forming method and composition

Method for manufacturing microstructure including cured products of...

Micro- and nano-fluidic chip, method of fabricating the same, and a...

Treatment liquid and pattern forming method

Method for manufacturing high-density in-line carbon nanotube thin...

Photoacid generator for chemically amplified photoresists for deep...

Mask for EUV lithography and method of manufacturing the same

Lithography

Flow cells and methods for making the same

Photoresist and method of formation and use

Photoresist compositions and pattern formation methods

Onium salt, chemically amplified resist composition and patterning...

Photoresist compositions and pattern formation methods

Positive resist composition and pattern forming process

Radiation-sensitive resin composition and method for forming resist...

Polymer material in a redistribution structure of a semiconductor p...

Radiation-sensitive resin composition, method of forming resist pat...

Transparent electrode, process for producing transparent electrode,...

Electronic system of specimen qualification

Positive resist composition and pattern forming process

Resist material and pattern forming method

Print process for color conversion layer using porous host or posit...

Method for producing actinic ray-sensitive or radiation-sensitive r...

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

Photo-patternable organic semiconductor (OSC) polymers and methods...

Resist composition and patterning process

Photoresist underlayer and method of manufacturing a semiconductor...

Salt, acid generator, resist composition and method for producing r...

Positive resist composition and pattern forming process

Patents Applicationslast 30 patents

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAM...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...

DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION

RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD OF MANUFACTURING PLATED ARTICLE

POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...

POLYMER MATERIAL IN A REDISTRIBUTION STRUCTURE OF A SEMICONDUCTOR P...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

PHOTOSENSITIVE SURFACE TREATING AGENT, LAMINATE, PATTERN FORMATION...

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

COMPOSITION FOR PRETREATMENT

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...

PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...

POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...

RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD

PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND PATTERN FORMING PROCESS