Macromolecular compounds which are photodegradable

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CPC
G03F7/039

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/039Macromolecular compounds which are photodegradable

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 12,265,331
- Issue date Apr 1, 2025
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer material in a redistribution structure of a semiconductor p...
- Patent number 12,265,330
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sih-Hao Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transparent electrode, process for producing transparent electrode,...
- Patent number 12,262,571
- Issue date Mar 25, 2025
- Kabushiki Kaisha Toshiba
- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electronic system of specimen qualification
- Patent number 12,253,473
- Issue date Mar 18, 2025
- NANYA TECHNOLOGY CORPORATION
- Hung-Chih Chang
- G01 - MEASURING TESTING
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and pattern forming method
- Patent number 12,248,249
- Issue date Mar 11, 2025
- Oji Holdings Corporation
- Kimiko Hattori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Print process for color conversion layer using porous host or posit...
- Patent number 12,237,445
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Hou T. Ng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing actinic ray-sensitive or radiation-sensitive r...
- Patent number 12,235,579
- Issue date Feb 25, 2025
- FUJIFILM Corporation
- Keiyu Ou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-patternable organic semiconductor (OSC) polymers and methods...
- Patent number 12,227,613
- Issue date Feb 18, 2025
- Corning Incorporated
- Mingqian He
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 12,228,856
- Issue date Feb 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,222,648
- Issue date Feb 11, 2025
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition and display device using...
- Patent number 12,216,403
- Issue date Feb 4, 2025
- DONJIN SEMICHEM CO., LTD.
- Kyoungsoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,216,404
- Issue date Feb 4, 2025
- FUJIFILM Corporation
- Masafumi Kojima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 12,216,401
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition, resin sheet, cured film, method for producing cu...
- Patent number 12,210,285
- Issue date Jan 28, 2025
- Toray Industries, Inc.
- Keika Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantum dot light emitting panel, display device, and manufacturing...
- Patent number 12,213,332
- Issue date Jan 28, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Aidi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition
- Patent number 12,210,284
- Issue date Jan 28, 2025
- XSYS Germany GmbH
- Thomas Paulöhrl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 12,204,245
- Issue date Jan 21, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist compositions and semiconductor fabrication methods using the...
- Patent number 12,181,799
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Thanh Cuong Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,164,228
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Michihiro Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116929
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250116931
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui Weng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAK...
- Publication number 20250114981
- Publication date Apr 10, 2025
- Panther Life Sciences Corporation
- Ashutosh Shastry
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116924
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116925
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250116926
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THIOL-CONTAINING PHOTORESIST COMPOSITIONS FOR EXTREME ULTRAVIOLET L...
- Publication number 20250116932
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Po YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
- Publication number 20250116933
- Publication date Apr 10, 2025
- DuPont Electronic Materials International, LLC
- Wenxu Zhang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...
- Publication number 20250116934
- Publication date Apr 10, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20250116935
- Publication date Apr 10, 2025
- JSR Corporation
- Daichi WATANABE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...
- Publication number 20250110405
- Publication date Apr 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20250110400
- Publication date Apr 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250110404
- Publication date Apr 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Masato MIYAZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PAT...
- Publication number 20250110406
- Publication date Apr 3, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma KANAMARU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC P...
- Publication number 20250110403
- Publication date Apr 3, 2025
- PROMERUS, LLC
- TAKANOBU MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...
- Publication number 20250110407
- Publication date Apr 3, 2025
- JSR Corporation
- Hiroyuki KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITION AND METALLIZATION METHOD
- Publication number 20250102910
- Publication date Mar 27, 2025
- DuPont Electronic Materials International, LLC
- Mitsuru Haga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102911
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF...
- Publication number 20250102914
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Honggu Im
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102912
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND
- Publication number 20250102913
- Publication date Mar 27, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250093777
- Publication date Mar 20, 2025
- Samsung SDI Co., Ltd.
- Byeonggyu HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20250093775
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li-Po YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THICK FILM RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST F...
- Publication number 20250085633
- Publication date Mar 13, 2025
- Merck Patent GmbH
- Masato SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS
- Publication number 20250085631
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chung SU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UV NANOIMPRINTED LITHOGRAPHIC DEVICES MADE FROM POLYCYCLOOLEFINIC P...
- Publication number 20250085632
- Publication date Mar 13, 2025
- PROMERUS, LLC
- LARRY F. RHODES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...
- Publication number 20250087443
- Publication date Mar 13, 2025
- Saudi Arabian Oil Company
- Dong Kyu Cha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
- Publication number 20250076759
- Publication date Mar 6, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Koshi Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076760
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20250068067
- Publication date Feb 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Macromolecular compounds which are photodegradable

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radiation-sensitive resin composition and method for forming resist...

Polymer material in a redistribution structure of a semiconductor p...

Radiation-sensitive resin composition, method of forming resist pat...

Transparent electrode, process for producing transparent electrode,...

Electronic system of specimen qualification

Positive resist composition and pattern forming process

Resist material and pattern forming method

Print process for color conversion layer using porous host or posit...

Method for producing actinic ray-sensitive or radiation-sensitive r...

Pattern formation methods

Photo-patternable organic semiconductor (OSC) polymers and methods...

Solution, solution storage body, actinic ray-sensitive or radiation...

Resist composition and patterning process

Photoresist underlayer and method of manufacturing a semiconductor...

Salt, acid generator, resist composition and method for producing r...

Positive resist composition and pattern forming process

Positive photosensitive resin composition and display device using...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Sulfonium salt, chemically amplified resist composition, and patter...

Resin composition, resin sheet, cured film, method for producing cu...

Quantum dot light emitting panel, display device, and manufacturing...

Photosensitive composition

Positive resist composition and patterning process

Positive photosensitive resin composition, positive photosensitive...

Photoresist composition and method of forming photoresist pattern

Resist compositions and semiconductor fabrication methods using the...

Resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTORESIST COMPOSITION

HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAK...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

THIOL-CONTAINING PHOTORESIST COMPOSITIONS FOR EXTREME ULTRAVIOLET L...

MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITIO...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

METHOD OF PRODUCING RESIST COMPOSITION PURIFIED PRODUCT, RESIST PAT...

PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC P...

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...

PHOTORESIST COMPOSITION AND METALLIZATION METHOD

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTORESIST COMPOSITIONS INCLUDING A SULFONATE GROUP AND METHODS OF...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

THICK FILM RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST F...

PHOTORESIST UNDERLAYER MATERIALS AND ASSOCIATED METHODS

UV NANOIMPRINTED LITHOGRAPHIC DEVICES MADE FROM POLYCYCLOOLEFINIC P...

NANOFLUIDIC CELL FOR CHARACTERIZATION OF NANO-BUBBLES IN A SIMULATE...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...