Macromolecular compounds which are photodegradable

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CPC
G03F7/039

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/039Macromolecular compounds which are photodegradable

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 12,222,648
- Issue date Feb 11, 2025
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition and display device using...
- Patent number 12,216,403
- Issue date Feb 4, 2025
- DONJIN SEMICHEM CO., LTD.
- Kyoungsoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,216,404
- Issue date Feb 4, 2025
- FUJIFILM Corporation
- Masafumi Kojima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, chemically amplified resist composition, and patter...
- Patent number 12,216,401
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition, resin sheet, cured film, method for producing cu...
- Patent number 12,210,285
- Issue date Jan 28, 2025
- Toray Industries, Inc.
- Keika Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantum dot light emitting panel, display device, and manufacturing...
- Patent number 12,213,332
- Issue date Jan 28, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Aidi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition
- Patent number 12,210,284
- Issue date Jan 28, 2025
- XSYS Germany GmbH
- Thomas Paulöhrl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 12,204,245
- Issue date Jan 21, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and method of forming photoresist pattern
- Patent number 12,189,287
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Po Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist compositions and semiconductor fabrication methods using the...
- Patent number 12,181,799
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Thanh Cuong Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,164,228
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Michihiro Ogawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 12,164,229
- Issue date Dec 10, 2024
- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,164,230
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Taro Miyoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,140,867
- Issue date Nov 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 12,111,574
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, quencher, resist composition and method for producing resist...
- Patent number 12,105,419
- Issue date Oct 1, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 12,085,854
- Issue date Sep 10, 2024
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,085,855
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 12,072,627
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
- Publication number 20250051501
- Publication date Feb 13, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Minoru Adegawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250053087
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053091
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Ahra CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053090
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Hwayoung JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...
- Publication number 20250053088
- Publication date Feb 13, 2025
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20250053089
- Publication date Feb 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044688
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20250044690
- Publication date Feb 6, 2025
- DUKSAN NEOLUX CO., LTD
- Yeon Joon Chung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20250044686
- Publication date Feb 6, 2025
- Samsung SDI Co., Ltd.
- Yaeun SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250044687
- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...
- Publication number 20250044699
- Publication date Feb 6, 2025
- Riken
- Harumi Hayakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING...
- Publication number 20250044701
- Publication date Feb 6, 2025
- JSR Corporation
- Kazunori SAKAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20250036027
- Publication date Jan 30, 2025
- NISSAN CHEMICAL CORPORATION
- Kosuke IGATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250036028
- Publication date Jan 30, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION
- Publication number 20250028245
- Publication date Jan 23, 2025
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...
- Publication number 20250028244
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250028243
- Publication date Jan 23, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...
- Publication number 20250021003
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Cheol KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION
- Publication number 20250021000
- Publication date Jan 16, 2025
- Merck Patent GmbH
- Seishi SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...
- Publication number 20250021002
- Publication date Jan 16, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...
- Publication number 20250021004
- Publication date Jan 16, 2025
- MERCK ELECTRONICS LTD.
- TETSUMASA TAKAICHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...
- Publication number 20250013150
- Publication date Jan 9, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...
- Publication number 20250014901
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250013148
- Publication date Jan 9, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Uehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...
- Publication number 20250004366
- Publication date Jan 2, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20250004374
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20250004377
- Publication date Jan 2, 2025
- FUJIFILM CORPORATION
- Eiji FUKUZAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-Sensitive Composition, Pattern Formation Method, and Phot...
- Publication number 20250004375
- Publication date Jan 2, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST MATERIAL AND PATTERN FORMING METHOD
- Publication number 20250004376
- Publication date Jan 2, 2025
- OJI HOLDINGS CORPORATION
- Kimiko HATTORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Macromolecular compounds which are photodegradable

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoresist underlayer and method of manufacturing a semiconductor...

Salt, acid generator, resist composition and method for producing r...

Positive resist composition and pattern forming process

Positive photosensitive resin composition and display device using...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Sulfonium salt, chemically amplified resist composition, and patter...

Resin composition, resin sheet, cured film, method for producing cu...

Quantum dot light emitting panel, display device, and manufacturing...

Photosensitive composition

Positive resist composition and patterning process

Positive photosensitive resin composition, positive photosensitive...

Photoresist composition and method of forming photoresist pattern

Resist compositions and semiconductor fabrication methods using the...

Resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Resist composition and method for producing resist pattern

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Chemically amplified positive resist composition and resist pattern...

Resist composition and resist pattern forming method

Sulfonium salt, photoacid generator, curable composition and resist...

Resist composition, method of forming resist pattern, compound, and...

Salt, quencher, resist composition and method for producing resist...

Resist composition and method of forming resist pattern

Radiation-sensitive resin composition, method for forming resist pa...

Positive photosensitive resin composition, positive photosensitive...

Photoresist compositions and pattern formation methods

Resin, photoresist composition, and method of manufacturing semicon...

Resist composition and patterning process

Patents Applicationslast 30 patents

RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKE...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

PHOTOSENSITIVE COMPOSITION

METHOD OF FORMING PATTERNS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING DEVICE, AND FILM D...

METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POSITIVE TONE ULTRA THICK PHOTORESIST COMPOSITION

ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

COMPOSITION

BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...

ION IMPLANTATION THICK FILM RESIST COMPOSITION, A METHOD FOR MANUFA...

RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOT...

WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, ACID...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

Radiation-Sensitive Composition, Pattern Formation Method, and Phot...

RESIST MATERIAL AND PATTERN FORMING METHOD