Patent Grant
8298733
The Applicant claims the foreign priority benefit of Japanese application JP PA 2003-380293, filed on Nov. 10, 2003, the entire contents of which are entirely incorporated herein by reference.
1. Field of the Invention
The invention relates to an electrophotographic photosensitive member adapted for use in a printer, a facsimile apparatus, or similar electrophotographic type device utilizing a laser beam as an exposure light source, and more particularly to an electrophotographic photosensitive member improved with respect to generation of interference fringes and other electrophotographic characteristics.
2. Background Art
In the invention, a printer or facsimile apparatus of the electrophotographic type preferably utilizing a laser beam as an exposure light is typified by a dry-process electrophotographic apparatus utilizing the electrophotographic process of C. F. Carlson, in which an internal electrophotographic photosensitive member is charged on a surface thereof and is subjected to exposure to form an electrostatic latent image, toner supplied from a developing device is electrostatically deposited thereon under the application of a bias voltage in a developing step, and the toner is then transferred onto paper in a transfer step, thereby obtaining an image.
In such a dry-process electrophotographic apparatus, optical interference is often generated because of the use of a coherent (monochromatic) laser beam as the exposure light source. An interference fringe pattern, such as a moiré pattern or a zebra pattern formed on a printed output image, deteriorates the image quality.
The interference fringe pattern is generated because monochromatic light reflected at a top surface of a photosensitive layer interferes with light reflected at interfaces of internal layers, including a surface of a substrate, causing optical interference due to unevenness in the layer thickness, which leads to an undulating intensity of the reflected light. In an electrophotographic photosensitive member, the largest influence is usually interference between the laser beam reflected at the surface of the conductive substrate and the laser beam reflected at the outermost surface of the photosensitive layer.
Various proposals have been made regarding the drawback of such interference fringes. It is already known, for example, to form fine irregularities on the surface of the conductive substrate by a sand blasting process, in order to cause random reflection and reduce the amount of light reflected in a particular direction, thereby suppressing or preventing the interference fringes. This is described in Japanese patent publications JP-A-2001-75299, JP-A-2001-249477, JP-A-2000-66428 and JP-A-2000-75528.
Japanese patent publications JP-A-2002-296822 and JP-A-2002-296824 describe the use of a conductive substrate having a roughened surface, which is obtained by sampling surface roughness data for a predetermined area, determining a power spectrum by a Fourier transformation, and roughening the surface so as to obtain plural peaks, and to form a photosensitive layer thereon. The resultant photosensitive member is free from image streaks.
Japanese patent publication JP-A-2002-174921 describes a photosensitive member utilizing a conductive substrate on which surface roughness is regulated to a predetermined average surface roughness and a predetermined maximum surface roughness.
The aforementioned methods for preventing interference fringes by forming fine irregularities on the surface of the conductive substrate are associated with the following drawbacks. The present inventors have conducted investigations with an organic photosensitive member in which an undercoat layer and a photosensitive layer formed by coating on a sand blasted conductive substrate have a layered structure including an undercoat layer, a charge generation layer, and a charge transport layer (such a photosensitive member being hereinafter called a “laminate organic photosensitive member”). They found that with such an organic photosensitive member the methods described in the aforementioned patent references have a certain effect for preventing interference fringes. However, they also found that the fringes cannot be eliminated to a satisfactory level by simply working the conductive substrate to a predetermined surface roughness.
For example, even on a conductive substrate which is appropriately sand blasted to prevent the interference fringes, an increase in the thickness of the undercoat layer formed by coating again gradually onto such a conductive substrate enhances interference fringes on the image. It is also known that, for such a thicker undercoat layer, the interference fringes can be suppressed to a certain extent by employing a conductive substrate in which the sand blasting treatment is applied stronger to obtain larger surface irregularities corresponding to the thickness of the undercoat layer. However, for confirming the presence or absence of interference fringes, it is necessary to: coat a photosensitive layer on the undercoat layer thereby obtaining a photosensitive drum; then to mount necessary components such as flanges on both ends of the drum; mount the photosensitive member on an image forming apparatus (actual apparatus); and to form an image. Such a method has the drawbacks of requiring time and labor and being unable to provide a result immediately. Furthermore, there is another drawback in that the interference fringes cannot always be prevented by the roughening the surface of just the conductive substrate, because s conditions inducing the interference fringes are also affected by the photosensitive layer formed on the undercoat layer.
Based on the foregoing, an analysis of the factors causing the interference fringes has led to the following consideration. In the case where an organic photosensitive member, formed by laminating a charge generation layer and a charge transport layer in succession as a photosensitive layer onto a conductive substrate provided with an undercoat layer, is irradiated with a monochromatic laser beam, the charge generation layer usually employs organic pigment particles capable of absorbing a coherent wavelength of the laser beam, as the required charge generation material. Such organic pigment particles, usually being insoluble in organic solvents, are uniformly dispersed in a resinous binder to form the charge generation layer of a satisfactory charge generating function.
A laser beam entering the photosensitive layer of such photosensitive member, upon passing the upper charge transport layer and reaching the charge generation layer, is partially absorbed by the charge generating material but also passes through the gaps between the particles of the organic pigment, thus irradiating the undercoat layer. The light irradiating the undercoat layer is divided into a light intruding into the undercoat layer and a light reflected from the surface of the undercoat layer. The light reflected at the surface of the undercoat layer reaches the outermost surface of the photosensitive layer and in turn is divided into a component outgoing from the outermost surface and a component reflected inwards at the outermost surface and directed again to the charge generation layer.
On the other hand, the light intruding into the undercoat layer, upon reflection by the conductive substrate, enters the charge generation layer again and is divided into a component absorbed by the organic pigment in the charge generation layer and a component passing through the gaps between the organic pigment particles to reach the outermost surface of the photosensitive layer. Some of this latter component goes out from this outer surface, and some is reflected inwards at the outermost surface and directed again to the charge generation layer.
Thus, in the photosensitive layer, an entering laser beam not only intrudes into a certain layer but also has a component reflected at a surface of such layer. Such reflected a component significantly influences the optical interference. A detailed consideration clarifies that the reflections which contribute to interference fringes include reflections from plural surfaces.
A first reflection factor is a superposition of a first component of the laser beam, reflected at the surface of the undercoat layer, then reaching the outermost surface of the photosensitive layer and going out to the exterior and a second component of the laser beam, reaching and reflected at the outermost surface of the photosensitive layer. The optical intensity becomes stronger in such superposing position and weaker in a non-superposing position thereby generating an unevenness in the optical intensity and causing interference fringes on the image.
Another reflection factor is interference between a light reflected at the surface of the conductive substrate and a component of the entering light reflected at the outermost surface of the photosensitive layer.
Thus, the interference fringes are principally generated in two modes, namely by a reflection from the surface of the conductive substrate and by a reflection from the surface of the undercoat layer.
The foregoing explanation on the generation of interference fringes indicates that (in the case of an organic photosensitive member having a photosensitive layer, across an undercoat layer, on a conductive substrate with a roughened surface formed by a sand blasting process) a complete prevention of interference fringes is difficult to achieve through a simple reduction of the reflection intensity in a particular direction from the surface of the conductive substrate by a random reflection caused by surface roughening, unless the surface of the undercoat layer is also roughened. In that case, the influence of the light reflected from the surface of such undercoat layer is not negligible (for example, in case a thick undercoat layer is formed).
However, in the case of most prior members, the roughening of the surface of the undercoat layer need not be considered. This is because when a thin undercoat layer is formed by coating, the surface of such an undercoat layer spontaneously has irregularities following the irregularities of the sand blasted surface of the conductive substrate, even without additional roughening of the surface of such a thin undercoat layer.
Nevertheless, a thin undercoat layer decreases the total film thickness after the formation of the photosensitive layer, thus reducing electrical resistance across the total film thickness. This structure results in a drawback of easily causing a leak in the photosensitive layer during the charging process, particularly in an image forming apparatus, such as a printer, utilizing a contact charging process. Since such a leak causes a trace of the leak on the image or a stripe-shaped image defect having a periodicity of the drum periphery, a thick undercoat layer has been required for an electrophotographic photosensitive member for use in a printer or the like.
In the case of forming a thick undercoat layer by coating, in order to prevent the aforementioned leak phenomenon, it is necessary, as explained before, to employ a conductive substrate of a surface roughness with enlarged irregularities (a larger average roughness Ra and a larger maximum surface roughness Rmax) so that the roughened state of the substrate surface is reproduced on the surface of even a thick undercoat layer, or to later roughen the surface of the undercoat layer. However, the former method is limited because the layer cannot be made very thick. Also, the latter method of also roughening the surface of the undercoat layer leads to new drawbacks, namely, that fogging or a leak in the form of black spots on a white background tends to be generated corresponding to protruding parts on the surface of the undercoat layer, and that uneven density corresponding to the irregularities results in a halftone image.
Still another cause for interference fringes is deviation in the film thickness of each of the undercoat layer, the charge generation layer, and the charge transport layer. Among these, deviation in the film thickness of the charge transport layer, constituting the outermost surface of the photosensitive layer, has the largest influence. This is because the charge transport layer usually has the largest thickness, thus constituting the largest factor generating such deviation in the film thickness. As to the thickness deviation of the charge transport layer, for a semiconductor laser of a wavelength of 780 nm, a theoretically zero deviation is not necessary required, and the interference fringes of a practically unacceptable level are not generated at a film thickness deviation of 0.3 μm or less.
An experiment was conducted for confirming a correlation between the film thickness deviation and the generation of interference fringes. The experiment utilized a photosensitive drum, having a coated charge transport layer with a film thickness deviation of 1-5 μm and formed by employing a non-sand blasted conductive mirror-surface substrate (plain pipe), a coating liquid having a viscosity for forming a charge transport layer, and a seal coating method which tends to generate film thickness deviation, in order to intentionally cause interference fringes. In this experiment different interference fringe patterns were obtained according to the film thickness deviations. In order to prevent interference fringes with such mirror-surfaced plain pipe, it is at least necessary to employ a dip coating method capable of providing little film thickness deviation, thereby maintaining the film thickness deviation of the coated charge transport layer within a printing area in the axial direction and the circumferential direction of the drum at 0.3 μm or less. In practice, however, the dip coating usually provides a film thickness deviation of 0.5 to 3 μm/axial direction, or 0.5 to 1.5 μm/axial direction even under a careful operation, so that a film thickness deviation of 0.3 μm or less is, even if possible experimentally, difficult to achieve in an effective mass production. Therefore, interference fringes have been prevented by employing, as a conductive substrate as described in the aforementioned patent references, a substrate (plain pipe) which is roughened to a predetermined roughness by a sand blasting instead of a mirror-surface substrate.
In order to achieve a stable mass production of an electrophotographic photosensitive member free from interference fringes, there is desired a production method capable of avoiding interference fringes even with a somewhat larger film thickness deviation, rather than aiming at a reduction in the film thickness deviation<which is extremely difficult to achieve in mass production.
It is known, as described in the foregoing Japanese patent publications JP-A-2002-296822 and JP-A-2002-296824, to determine the relation of a substrate with a roughened surface to generation of interference fringes by sampling surface roughness data of a predetermined area and by obtaining a power spectrum through Fourier transformation, but such a relation is a function only of the surface roughness of the substrate. As will be explained later, generation of the interference fringes is also affected by conditions for forming the undercoat layer and the photosensitive layer on the substrate.
The invention has been made in consideration of the aforementioned situation, and is to provide a judging method (discriminating method) for interference fringes of an electrophotographic photosensitive member, capable of exactly confirming presence/absence of interference fringes, on a photosensitive member which is provided, on a roughened surface of a substrate, with an undercoat layer containing a metal oxide and formed by coating with a certain film thickness deviation and a photosensitive layer, without an actual image formation. The invention also provides an electrophotographic photosensitive member substantially free from generation of interference fringes, and an electrophotographic photosensitive member which is free from interference fringes and can also suppress a black spot fog on a white background, a black spot on an image by a leak phenomenon, a stripe-shaped image defect and a density unevenness.
In a first aspect of the invention, the aforementioned object can be attained by a judging method for interference fringes induced by an electrophotographic photosensitive member which is adapted to be mounted in an electrophotographic apparatus including a coherent exposure light source and which is formed by coating a metal oxide-containing undercoat layer and an organic photosensitive layer in succession on a roughened surface of a conductive substrate. The judging method includes:
wherein n and m represent integers, and N represents N=2s (s=1, 2, . . . , u)
and
The reflectance Iopc is determined by a method to be explained later. The power spectrum correlates a spectrum of the reflectance Iopc with a wavelength in the abscissa and interference fringes, and reflects a layered structure (a combination of a reflectance and a surface roughness of the conductive substrate, a film thickness and a reflectance of the undercoat layer, and a film thickness and a thickness deviation of the charge generation layer and the charge transport layer) of the photosensitive member. Also, the maximum peak value Sp varies according to presence/absence of the interference fringes on an image. More specifically, the Sp value tends to increase with a higher intensity of the interference fringes generated on the image.
In a second aspect of the invention, according to the interference fringes judging method of the first aspect, the photosensitive layer is preferably formed by laminating in succession a charge generation layer containing a charge generating material and a resinous binder, and a charge transport layer containing a charge transport material and a resinous binder.
In a third aspect of the invention, according to the interference fringes judging method of the first or second aspect, the substrate surface is preferably roughened by a sand blasting process.
In a fourth aspect of the invention, the aforementioned object can be attained by an electrophotographic photosensitive member which is adapted to be mounted in an electrophotographic apparatus including a coherent exposure light source and which is formed by coating a metal oxide-containing undercoat layer and an organic photosensitive layer in succession on a roughened surface of a substrate, wherein a surface reflectance of the electrophotographic photosensitive member is measured at a predetermined wavelength interval Δλ by a coherent light of a predetermined wavelength within a wavelength range of 750 nm≦λ≦812 nm (surface reflectance measurement). Then the obtained surface reflectance is corrected taking a mirror-surface conductive substrate as a reference to obtain a reflectance Iopc of the electrophotographic photosensitive member (corrected reflectance calculation by mirror-surface substrate). Then the reflectance is subjected to a discrete Fourier transformation according to a following equation (1) to calculate a power spectrum |S(n/(N·Δλ))|2 according to a following equation (2) (power spectrum calculation). The surface of the conductive substrate is so roughened and the undercoat layer and the organic photosensitive layer are so formed as to satisfy a condition Sp≦10, in which Sp is a peak value of an evident maximum peak in the power spectrum within a frequency range of 0<n/(N·Δλ)(Hz)≦2.5×108
wherein n and m represent integers, and N represents N=2s (s=1, 2, . . . , u); and
In a fifth aspect of the invention, the electrophotographic photosensitive member according to the fourth aspect is preferably such that the conductive substrate has an average surface roughness (Ra) within a range of 0.23 μm≦Ra≦0.35 μm and a maximum surface roughness (Rmax) within a range of 2.4 μm≦Rmax≦2.7 μm, and a reflectance Isb of the electrophotographic photosensitive member, taking a surface reflectance of a mirror-surface conductive substrate for a monochromatic light of a wavelength λ=780 nm as a reference reflectance, is within a range of Isb≦15%.
In a sixth aspect of the invention, the electrophotographic photosensitive member according to the fifth aspect is preferably such that the undercoat layer has a film thickness (d) within a range of 2 μm≦d≦3.5 μm, and a reflectance Iucl, taking a surface reflectance of a mirror-surface conductive substrate for a monochromatic light of a wavelength λ=780 nm as a reference reflectance, is within a range of Iucl<17%.
In a seventh aspect of the invention, the electrophotographic photosensitive member according to any of the fourth to sixth aspects is preferably such that the photosensitive layer is formed by laminating in succession a charge generation layer containing a charge generation material and a resinous binder and a charge transport layer containing a charge transport material and a resinous binder.
In an eighth aspect of the invention, the electrophotographic photosensitive member according to any of the fourth to seventh aspects is preferably such that the surface of the substrate is roughened by a sand blasting process.
Also, an electrophotographic photosensitive member without an image defect such as interference fringes can be provided by a producing process employing the judging method of the first aspect and judging a satisfactory product without interference fringe generation in case of Sp≦10. This is accomplished by incorporating the judging method of the first aspect into a process for producing an electrophotographic photosensitive member adapted to be mounted in an electrophotographic apparatus including a coherent exposure light source and which is formed by coating a metal oxide-containing undercoat layer and an organic photosensitive layer in succession on a roughened surface of a substrate.
According to the invention, there is provided a judging method for interference fringes induced by an electrophotographic photosensitive member which is adapted to be mounted in an electrophotographic apparatus including a coherent exposure light source and which is formed by coating a metal oxide-containing undercoat layer and an organic photosensitive layer in succession on a roughened surface of a substrate. A surface reflectance of the electrophotographic photosensitive member is measured at a predetermined wavelength interval Δλ by a coherent light of a predetermined wavelength within a wavelength range of 750 nm≦λ≦812 nm. Then the obtained surface reflectance is corrected taking a mirror-surface conductive substrate as a reference to obtain a reflectance Iopc of the electrophotographic photosensitive member. Then the reflectance is subjected to a discrete Fourier transformation according to the foregoing equation (1) to calculate a power spectrum |S(n/(N·Δλ))|2 according to the foregoing equation (2), and, based on a peak value Sp of an evident maximum peak in the power spectrum within a frequency range of 0<n/(N·Δλ)(Hz)≦2.5×108, there are judged no generation of interference fringes in case of Sp≦10, and a generation of interference fringes in case of Sp>10. Also provided by the invention is a judging method for presence/absence of interference fringes of an electrophotographic photosensitive member which is provided, on a roughened surface of a substrate, with an undercoat layer containing a metal oxide and formed by coating with a certain film thickness deviation and a photosensitive layer, and in which the surface of the conductive substrate is so roughened and the undercoat layer and the organic photosensitive layer are so formed that the peak value Sp of the power spectrum satisfies a condition Sp≦10, the method being capable of confirming presence/absence of the interference fringes without an actual image formation. Also according to the invention there is provided an electrophotographic photosensitive member which is substantially free from generation of interference fringes, which can also suppress a black spot fog on a white background, a black spot on an image by a leak phenomenon, a stripe-shaped image defect and a density unevenness.
In the following, the electrophotographic photosensitive member of the invention and evaluation methods thereof will be explained with reference to the accompanying drawings. The invention is not limited to experimental examples to be explained in the following.
The conductive substrate 1 serves as an electrode for the photosensitive member and also as a support for the layers constituting the photosensitive member. It may have for example any of a cylindrical shape, a plate shape, and a film shape, and is constituted for example of a metal such as aluminum, stainless steel or nickel. The conductive substrate preferably is subjected, on a surface thereof, to a roughening process such as sand blasting in order to prevent interference fringes. A medium employed for sand blasting can be, for example, alumina, zirconia, or glass beads.
The undercoat layer 2 is formed principally of an organic resinous binder and a metal oxide which regulates conductivity of the layer, functioning as a light scattering material thereby controlling charge transfer between the photosensitive layer and the substrate even at a certain film thickness. It has the purposes of covering any defect on the substrate surface and improving adhesion between the photosensitive layer and the substrate. The resinous material to be employed in the undercoat layer can be an insulating polymer such as casein, polyvinyl alcohol, polyamide, melamine, or cellulose, or a conductive polymer such as polythiophene, polypyrole or polyaniline, and such resins may be employed singly or in a suitable combination. The metal oxide to be dispersed as a light scattering material in such resin is preferably titanium dioxide or zinc oxide.
The charge generation layer 4 is formed by coating and drying a coating liquid in which particles of a charge generation material are dispersed in a resinous binder and a solvent, and generates a charge upon receiving light. It is important that the layer 4 has a high charge generating efficiency and a property of efficiently injecting thus-generated charge into the charge transport layer 5, and it is desirable that the layer 4 has a low dependence on an electric field and has satisfactory charge injection even in a low electric field. The charge generation material can be various phthalocyanine compounds or derivatives thereof, such as a metal-free phthalocyanine. The resinous binder can be polyester resin, polyvinyl acetate, polyacrylate ester, polymethacrylate ester, polyester, polycarbonate, polyvinyl acetacetal, polyvinyl propional, polyvinyl butyral, phenoxy resin, epoxy resin, urethane resin, cellulose ester, or cellulose ether which can be used in a suitable combination.
A ratio of the resinous binder and the charge generation material is 5 to 500 parts by weight of the charge generation material (preferably 10 to 100 parts by weight) to 10 parts by weight of the resinous binder. A thickness of the charge generation layer 4, which is overcoated by the charge transport layer 5, is determined by an optical absorption coefficient of the charge generation material and is generally 5 μm or less, preferably 1 μm or less.
The charge transport material can be a hydrazone compound, a butadiene compound, a diamine compound, an indole compound, an indoline compound, a stilbene compound, or a distilbene compound, which can be employed singly or in a suitable combination. Specific examples include compounds described in JP-A-2002-131938. The resinous binder can be, for example, a polycarbonate resin such as of bisphenol-A type, bisphenol-Z type or a bisphenol-A-biphenyl copolymer, a polystyrene resin or a polyphenylene, which can be employed singly or in a suitable combination. Specific examples include compounds described in JP-A-2002-131938. An amount of use of such compounds is 20 to 50 parts by weight of the charge transport material (preferably 3 to 30 parts by weight) to 10 parts by weight of the resinous binder. In order to maintain a practical effective surface potential, the charge transport layer has a film thickness within a range preferably of 3 to 50 μm, more preferably 15 to 40 μm.
An antioxidant, a photostabilizer, etc., may be added to the undercoat layer and the charge transport layer, if necessary, for the purpose of improving environmental resistance and stability against harmful light.
An amount of such antioxidant or photostabilizer is usually 0.05 to 10 parts by weight (preferably 0.2 to 5 parts by weight) to 100 parts by weight of the charge transport material.
Also, there may be added to the photosensitive layer a leveling agent such as a silicone oil or a fluorinated oil, for the purposes of improving a leveling property of the formed film and improving a lubricating property.
(Measurement of Reflectance)
In the following description, reflectance means a ratio in percentage (%) of a surface reflectance of a measured object, with respect to a reference reflectance which is a surface reflectance of a mirror-surface substrate (a reference object).
A procedure for measuring the reflectance by the reflectance measuring apparatus 16 is as follows:
As the surface reflectance I0 measured by the apparatus 16 includes Iref and Idark, a reflectance I1 of the measured object excluding these factors can be obtained from a following equation (3). In the following, this equation is utilized for calculating reflectances (Iopc, Isb, Iucl):
A mirror-surface treated plain pipe was used as the reference object measured in the foregoing step 2). This reference mirror-surface plain pipe was surface treated to an average roughness of 0.01-0.03 μm and a maximum roughness Rmax of 0.1-0.3 μm according to the JIS standard (preparation of electrophotographic photosensitive members for experiment for judging presence/absence of interference fringes, image evaluation and experiment for evaluating electrophotographic characteristics).
Samples of electrophotographic photosensitive members for experiments were prepared with layer structures shown in Examples 1-54 and Comparative Examples 1-54. Principal preparing conditions are dividedly shown in Tables 1-3. The names “Examples” and “Comparative Examples” are merely given for the convenience of detailed description of the invention and have no important meanings.
An experiment relating to the interference fringe judging method of a first aspect of the invention relates to all of Examples 1-54 and Comparative Examples 1-54. Tables 1-3 show layer structures of the photosensitive members prepared in Examples and Comparative Examples. Tables 4-6 show results of judgment of presence/absence of the interference fringes through a comparison of a maximum peak value Sp of the power spectrum with a threshold value (10) and electrophotographic characteristics. Tables 7-9 show a rank of interference fringes by visual observation and results of other image evaluations.
The photosensitive member of a third aspect of the invention is a photosensitive member free from interference fringes, to which Examples 4-18, 22-36, 40-54 and Comparative Examples 1-18, and 22-36 belong.
Among Examples 1-54, the photosensitive members of Examples 4-18, 22-36 and 40-54 belong the electrophotographic photosensitive member of the third aspect of the invention, but the photosensitive members of Comparative Examples 1-54 were prepared with specifications not belonging to any of the electrophotographic photosensitive members of the third and fourth aspects of the invention. The term Comparative Example is used merely in this sense. Among the photosensitive members of Examples 1-54, those other than of Examples 1-3, 16-18, 19-21, 34-36, 37-39 and 52-54, namely those of 4-15, 22-23 and 40-41 belong to the fourth aspect of the invention.
In the following there will be explained the samples of the electrophotographic photosensitive members of Examples 1-54 and Comparative Examples 1-54, used for experiments on judging presence/absence of interference fringes, image evaluation, and experiments for evaluating electrophotographic characteristics.
A surface of a cylindrical aluminum conductive substrate, employed as the conductive substrate, was sand blasted to form a rough surface having a reflectance Isb=13.6%, an average surface roughness Ra (JIS)=0.35 μm and a maximum surface roughness Rmax (JIS)=2.7 μm. The reflectance Isb is a ratio (%) of a surface reflectance of a roughened substrate and a surface reflectance of a mirror-surface treated plain pipe, and was measured with a reflectance measuring apparatus 16 as shown in
(Formation of Undercoat Layer)
Then, an undercoat layer is provided on the surface of the conductive substrate roughened by the sand blasting. The undercoat layer is produced by applying a coating liquid prepared by dispersing 1.8 parts by weight of a phenolic resin (MARKALINKA MH-2 (trade name), manufactured by Maruzen Petrochemical Co.), 1.2 parts by weight of a melamine resin (UBAN 20HS (trade name), manufactured by Mitsui Toatsu Chemical Co.) and 7 parts by weight of titanium oxide particles treated with aminosilane in 80 parts by weight of tetrahydrofuran and 20 parts by weight of butanol. The roughened substrate surface is dip coated with the coating liquid and dried for 30 minutes at 145° C. to obtain the undercoat layer with a film thickness of 4.0 μm, and a reflectance Iucl=16.0%.
The reflectance Iucl, determined by the aforementioned method, is a ratio (%) of a surface reflectance of an undercoat layer formed by coating on a conductive substrate roughened by sand blasting to a surface reflectance of a mirror-surface plain pipe. In the following, there will be explained a purpose of evaluating the reflectance Iucl. An undercoat layer coated on a sand blasted conductive substrate, with increase in the film thickness, becomes gradually unable to follow the irregularities of the sand blasted surface, whereby the surface of the UCL (undercoat layer formed by coating, utilizing an organic resin as a resinous binder) becomes smoother with an increase in the film thickness, thereby tending to generate interference fringes. Thus, an increase in the reflective intensity of the incident light to a particular direction by surface smoothing of the undercoat layer is considered as a factor for interference fringe generation. Based on this fact, in addition to the surface reflectance Isb of the conductive substrate roughened by sand blasting, the surface reflectance Iucl of the undercoat layer coated on the surface of the conductive substrate roughened by sand blasting is considered necessary and is employed as an evaluation parameter.
(Formation of Charge Generation Layer)
Then, on the aforementioned undercoat layer, a coating liquid, prepared by dispersing and dissolving 1 part by weight of metal-free phthalocyanine, represented by the chemical formula shown (I) as a charge generation material and 1 part by weight of a polyvinylbutyral resin (S-LEC BM-1 (trade name), manufactured by Sekisui Chemical Co.) as a resinous binder in 98 parts by weight of dichloromethane, was dip coated and dried for 30 minutes at 80° C. to obtain a charge generation layer of a thickness of 0.2 μm.
(Formation of Charge Transport Layer)
On the aforementioned charge generation layer, a coating liquid is coated and dried for 60 minutes at 90° C. to obtain a charge transport layer. This coating liquid is prepared by dissolving 9 parts by weight of a stilbene compound represented by the chemical formula (II) as a charge transport material and 11 parts by weight of a polycarbonate resin represented by a following chemical formula (III) as a resinous binder in 110 parts by weight of dichloromethane. By this procedure, a charge transport layer of a thickness of 20 μm is obtained, thereby completing a laminate organic photosensitive member of Example 1.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the charge transport layer employed in Example 1 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the charge transport layer employed in Example 1 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the undercoat layer employed in Example 1 was changed to a film thickness of 3.5 μm and to a reflectance Iucl=15.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 4, except that the charge transport layer employed in Example 4 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 4, except that the charge transport layer employed in Example 4 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the undercoat layer employed in Example 1 was changed to a film thickness of 3.0 μm and to a reflectance Iucl=15.7%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 7, except that the charge transport layer employed in Example 7 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 7, except that the charge transport layer employed in Example 7 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the undercoat layer employed in Example 1 was changed to a film thickness of 2.5 μm and to a reflectance Iucl=14.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 10, except that the charge transport layer employed in Example 10 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 10, except that the charge transport layer employed in Example 10 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the undercoat layer employed in Example 1 was changed to a film thickness of 2.0 μm and to a reflectance Iucl=14.7%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 13, except that the charge transport layer employed in Example 13 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 13, except that the charge transport layer employed in Example 13 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the undercoat layer employed in Example 1 was changed to a film thickness of 1.5 μm and to a reflectance Iucl=14.3%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 16, except that the charge transport layer employed in Example 16 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 16, except that the charge transport layer employed in Example 16 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the sand blasted conductive substrate was changed to a surface reflectance Isb=14.5%, and to a surface roughness of sand blasted irregularities of Ra=0.26 μm and Rmax=2.5 μm, and the undercoat layer was changed to a reflectance Iucl=16.5%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 19, except that the charge transport layer employed in Example 19 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 19, except that the charge transport layer employed in Example 19 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 19, except that the undercoat layer employed in Example 19 was changed to a film thickness of 3.5 μm and to a reflectance Iucl=16.0%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 22, except that the charge transport layer employed in Example 22 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 22, except that the charge transport layer employed in Example 22 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 19, except that the undercoat layer employed in Example 19 was changed to a film thickness of 3.0 μm and to a reflectance Iucl=15.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 25, except that the charge transport layer employed in Example 25 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 25, except that the charge transport layer employed in Example 25 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 19, except that the undercoat layer employed in Example 19 was changed to a film thickness of 2.5 μm and to a reflectance Iucl=15.7%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 28, except that the charge transport layer employed in Example 28 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 28, except that the charge transport layer employed in Example 28 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 19, except that the undercoat layer employed in Example 19 was changed to a film thickness of 2.0 μm and to a reflectance Iucl=15.5%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 31, except that the charge transport layer employed in Example 31 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 31, except that the charge transport layer employed in Example 31 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 19, except that the undercoat layer employed in Example 19 was changed to a film thickness of 1.5 μm and to a reflectance Iucl=15.0%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 34, except that the charge transport layer employed in Example 34 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 34, except that the charge transport layer employed in Example 34 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that the sand blasted conductive substrate was changed to a surface reflectance Isb=15%, and to a surface roughness of sand blasted irregularities of Ra=0.23 μm and Rmax=2.4 μm, and the undercoat layer was changed to a reflectance Iucl=16.8%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 37, except that the charge transport layer employed in Example 37 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 37, except that the charge transport layer employed in Example 37 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 37, except that the undercoat layer employed in Example 37 was changed to a film thickness of 3.5 μm and to a reflectance Iucl=16.5%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 40, except that the charge transport layer employed in Example 40 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 40, except that the charge transport layer employed in Example 40 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 37, except that the undercoat layer employed in Example 37 was changed to a film thickness of 3.0 μm and to a reflectance Iucl=16.2%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 43, except that the charge transport layer employed in Example 43 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 43, except that the charge transport layer employed in Example 43 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 37, except that the undercoat layer employed in Example 37 was changed to a film thickness of 2.5 μm and to a reflectance Iucl=15.4%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 46, except that the charge transport layer employed in Example 46 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 46, except that the charge transport layer employed in Example 46 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 37, except that the undercoat layer employed in Example 37 was changed to a film thickness of 2.0 μm and to a reflectance Iucl=14.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 49, except that the charge transport layer employed in Example 49 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 49, except that the charge transport layer employed in Example 49 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 37, except that the undercoat layer employed in Example 37 was changed to a film thickness of 1.5 μm and to a reflectance Iucl=14.6%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 52, except that the charge transport layer employed in Example 52 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 52, except that the charge transport layer employed in Example 52 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that a sand blasting condition employed in Example 1 was so changed as to obtain, in the sand blasted conductive substrate, a surface reflectance Isb=10.4%, and a surface roughness of sand blasted irregularities of Ra=0.57 μm and Rmax=4.5 μm, and the undercoat layer was changed to a reflectance Iucl=12.5%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 1, except that the charge transport layer employed in Comparative Example 1 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 1, except that the charge transport layer employed in Comparative Example 1 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 1, except that the undercoat layer employed in Comparative Example 1 was changed to a film thickness of 3.5 μm and to a reflectance Iucl=12.3%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 4, except that the charge transport layer employed in Comparative Example 4 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 4, except that the charge transport layer employed in Comparative Example 4 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 1, except that the undercoat layer employed in Comparative Example 1 was changed to a film thickness of 3.0 μm and to a reflectance Iucl=12.1%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 7, except that the charge transport layer employed in Comparative Example 7 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 7, except that the charge transport layer employed in Comparative Example 7 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 1, except that the undercoat layer employed in Comparative Example 1 was changed to a film thickness of 2.5 μm and to a reflectance Iucl=11.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 10, except that the charge transport layer employed in Comparative Example 10 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 10, except that the charge transport layer employed in Comparative Example 10 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 1, except that the undercoat layer employed in Comparative Example 1 was changed to a film thickness of 2.0 μm and to a reflectance Iucl=11.6%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 13, except that the charge transport layer employed in Comparative Example 13 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 13, except that the charge transport layer employed in Comparative Example 13 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 1, except that the undercoat layer employed in Comparative Example 1 was changed to a film thickness of 1.5 μm and to a reflectance Iucl=11.3%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 16, except that the charge transport layer employed in Comparative Example 16 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 16, except that the charge transport layer employed in Comparative Example 16 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that a sand blasting condition employed in Example 1 was so changed as to obtain, in the sand blasted conductive substrate, a surface reflectance Isb=12.9%, and a surface roughness of sand blasted irregularities of Ra=0.39 μm and Rmax=3.4 μm, and the undercoat layer was changed to a reflectance Iucl=14.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 19, except that the charge transport layer employed in Comparative Example 19 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 19, except that the charge transport layer employed in Comparative Example 19 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 19, except that the undercoat layer employed in Comparative Example 19 was changed to a film thickness of 3.5 μm and to a reflectance Iucl=14.6%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 22, except that the charge transport layer employed in Comparative Example 22 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 22, except that the charge transport layer employed in Comparative Example 22 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 19, except that the undercoat layer employed in Comparative Example 19 was changed to a film thickness of 3.0 μm and to a reflectance Iucl=14.3%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 25, except that the charge transport layer employed in Comparative Example 25 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 25, except that the charge transport layer employed in Comparative Example 25 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 19, except that the undercoat layer employed in Comparative Example 19 was changed to a film thickness of 2.5 μm and to a reflectance Iucl=14.0%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 28, except that the charge transport layer employed in Comparative Example 28 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 28, except that the charge transport layer employed in Comparative Example 28 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 19, except that the undercoat layer employed in Comparative Example 19 was changed to a film thickness of 2.0 μm and to a reflectance Iucl=13.3%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 31, except that the charge transport layer employed in Comparative Example 31 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 31, except that the charge transport layer employed in Comparative Example 31 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 19, except that the undercoat layer employed in Comparative Example 19 was changed to a film thickness of 1.5 μm and to a reflectance Iucl=12.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 34, except that the charge transport layer employed in Comparative Example 34 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 34, except that the charge transport layer employed in Comparative Example 34 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Example 1, except that a sand blasting condition employed in Example 1 was so changed as to obtain, in the sand blasted conductive substrate, a surface reflectance Isb=17%, and a surface roughness of sand blasted irregularities of Ra=0.18 μm and Rmax=2.2 μm, and the undercoat layer was changed to a reflectance Iucl=17.9%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 37, except that the charge transport layer employed in Comparative Example 37 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 37, except that the charge transport layer employed in Comparative Example 37 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 37, except that the undercoat layer employed in Comparative Example 37 was changed to a film thickness of 3.5 μm and to a reflectance Iucl=17.5%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 40, except that the charge transport layer employed in Comparative Example 40 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 40, except that the charge transport layer employed in Comparative Example 40 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 37, except that the undercoat layer employed in Comparative Example 37 was changed to a film thickness of 3.0 μm and to a reflectance Iucl=16.8%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 43, except that the charge transport layer employed in Comparative Example 43 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 43, except that the charge transport layer employed in Comparative Example 43 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 37, except that the undercoat layer employed in Comparative Example 37 was changed to a film thickness of 2.5 μm and to a reflectance Iucl=16.0%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 46, except that the charge transport layer employed in Comparative Example 46 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 46, except that the charge transport layer employed in Comparative Example 46 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 37, except that the undercoat layer employed in Comparative Example 37 was changed to a film thickness of 2.0 μm and to a reflectance Iucl=15.4%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 49, except that the charge transport layer employed in Comparative Example 49 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 49, except that the charge transport layer employed in Comparative Example 49 was changed to a film thickness of 14 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 37, except that the undercoat layer employed in Comparative Example 37 was changed to a film thickness of 1.5 μm and to a reflectance Iucl=15.0%.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 52, except that the charge transport layer employed in Comparative Example 52 was changed to a film thickness of 18 μm.
An organic electrophotographic photosensitive member was prepared in the same manner as in Comparative Example 52, except that the charge transport layer employed in Comparative Example 52 was changed to a film thickness of 14 μm.
Conditions of preparation of the foregoing Examples 1-54 and Comparative Examples 1-54 are summarized in Tables 1-3.
On the photosensitive members of Examples 1-54 and Comparative Examples 1-54, electrophotographic characteristics (shown in Tables 4-6) were evaluated in the following manner.
After a photosensitive member was charged to −800 V in a dark place, a retention rate Vk1 after 1 second of a surface potential of the drum, in a state where the drum rotation is stopped, was determined. Subsequently, the surface of the photosensitive member was continuously irradiated with light, and an exposure amount required for the charged potential to reach −400 V from −800 V was determined as a sensitivity E1/2, and an exposure amount required for the charged potential to reach −100 V from −800 V was determined as a sensitivity E100. Also in the aforementioned sensitivity measurement, a surface potential of the photosensitive member immediately after an irradiation with exposing light of a total light amount of 5.0 μJ/cm2 was determined as a residual potential Vr50.
Subsequently, evaluations were made of a solution (one-dot reproducibility, and fine white line resolution), interference fringes, density unevenness resulting from fine irregularities on the sand blasted surface (hereinafter referred to as “SB irregularity density unevenness”), an OPC (organic photosensitive layer) leak trace, and a stripe-shaped unevenness on an actual apparatus, as shown in Tables 7-9.
The apparatus employed in the evaluations was a commercially available printer, in which a surface of a photosensitive member, contacted by a brush charger, was charged negatively by application of a DC voltage of 1.2 kV to the brush charger, and an electrostatic latent image corresponding to a resolution of 600 dpi was formed by a laser beam emitted by a laser unit, and a print on a paper was obtained through developing and transfer processes. However, the apparatus was not equipped with a charge-eliminating light and cleaning blade.
In the evaluation of resolution, one-dot reproducibility was evaluated by a visual observation of a printed image of a one-dot pattern of 600 dpi, and fine white line resolution was evaluated by a visual observation of an image having a fine white line on a black image.
The interference fringes were evaluated by visual observation of an interference fringe pattern on a halftone image, in five levels with a pitch of 0.5 (the levels running from 0: no interference fringes, to 5: clear and strong generation of interference fringes).
Sand blast (SB) irregularity density unevenness was evaluated by a visual observation of a spot-shaped unevenness on a halftone image, resulting from fine irregularities of the sand blasting, in 5 levels with a pitch of 0.5 (0: no SB irregularity density unevenness, 5: clear and strong generation of SB irregularity density unevenness).
The stripe-shaped unevenness was evaluated in a visual observation by presence/absence of a stripe-shaped unevenness appearing, on a halftone image, at a circumferential cycle of the drum in an axial direction thereof with a width of about 5 mm and having a density higher than the halftone density. Simultaneous with this evaluation, the OPC drum was taken out from a cartridge, and presence/absence of a leak trace on the photosensitive layer was evaluated by a visual observation.
The stripe-shaped unevenness and the OPC (organic photosensitive layer) leak trace were evaluated in two environmental conditions of temperature/humidity=24° C./43% and 35° C./85%, while other evaluations were in one environmental condition of temperature/humidity=24° C./43%.
The results of the above-described preparing conditions, electrophotographic characteristics and image evaluations on the photosensitive members are shown in Tables 1-9.
On all the photosensitive member samples of Examples 1-54 and Comparative Examples 1-54, a reflectance Iopc was measured by the method described in Example 1, in a laser beam wavelength range of 750≦λ≦812 nm, and was subjected to a discrete Fourier transformation according to a following equation (1). Since the number N of data to be employed for the discrete Fourier transformation has to be an exponential of 2, namely N=2s (s=1, 2, . . . , u) because of an algorithm of such transformation, data of the reflectance Iopc were sampled by the aforementioned reflectance measuring apparatus (
A Fourier transformation result S(n/(N·Δλ)), obtained as a complex number, is converted by a following equation (2) into a real number through calculation of |S(n/(N·Δλ))|2, which is plotted in the ordinate as a function of a frequency component (n/(N·Δλ)) in the abscissa to obtain a power spectrum. On representative ones among the photosensitive members prepared in the foregoing Examples and Comparative Examples, spectra showing reflectance Iopc measured at a wavelength interval of 2 nm in the aforementioned wavelength range are shown in
wherein n and m represent integers, and N represents N=2s (s=1, 2, . . . , u); and
For Examples 1-54 as shown in Tables 1, 2, 7 and 8, the 1-dot reproducibility and the fine white line resolution were satisfactory within a range of an undercoat layer thickness of 1.5-3.5 μm, but, at 4.0 μm, the 1-dot reproducibility test showed a faint dot edge, and the fine white line resolution test showed a broadened width because of a faint edge of a fine line. The interference fringes were not generated within a range of an undercoat layer thickness of 1.5-3.5 μm, but were slightly generated at 4.0 μm by a visual confirmation. The SB irregularity density unevenness was not generated in any of the undercoat layer thicknesses of 1.5-4.0 μm. The OPC (organic photosensitive layer) leak trace and the accompanying stripe-shaped unevenness were not generated, in an environmental condition of temperature/humidity=24° C./43%, in all undercoat layer thicknesses of 1.5-4.0 μm, but in an environmental condition of temperature/humidity=35° C./85%, the leak trace and the stripe-shaped unevenness were visually confirmed at a surface roughness Ra of 0.23 or 0.26 μm and an undercoat layer thickness of 1.5 μm.
Similarly, the leak trace and the stripe-shaped unevenness were visually confirmed at a surface roughness Ra of 0.35 μm and an undercoat layer thickness of 2.0 μm.
In Comparative Examples 1-18, as shown in Tables 2 and 8, the 1-dot reproducibility and the fine white line resolution were satisfactory within a range of an undercoat layer thickness of 1.5-3.0 μm, but, at 3.5 μm or larger, the 1-dot reproducibility test showed a faint dot edge, and the fine white line resolution test showed a broadened width because of a faint edge of a fine line. It was confirmed visually that interference fringes were not generated any of the undercoat layer thicknesses of 1.5-4.0 μm. The SB irregularity density unevenness was generated in all the undercoat layer thicknesses of 1.5-4.0 μm. The OPC (organic photosensitive layer) leak trace and the accompanying stripe-shaped unevenness were not generated, in an environmental condition of temperature/humidity=24° C./43%, in all the undercoat layer thickness of 1.5-4.0 μm, but in an environmental condition of temperature/humidity=35° C./85%, the leak trace and the stripe-shaped unevenness were confirmed to be generated not only at all the undercoat layer thickness of 1.5 and 2.0 μm but also even at the undercoat layer thickness of 3.0 μm.
In Comparative Examples 19-36, as shown in Tables 3 and 9, the 1-dot reproducibility and the fine white line resolution were satisfactory within a range of an undercoat layer thickness of 1.5-3.0 μm, but, at 3.5 μm or larger, the 1-dot reproducibility test showed a faint dot edge, and the fine white line resolution test showed a broadened width because of a faint edge of a fine line. It was confirmed visually that the interference fringes were not generated within the undercoat layer thickness of 1.5-3.5 μm but were slightly generated at the undercoat layer thickness of 4.0 μm. The SB irregularity density unevenness was alleviated in comparison with Comparative Examples 1-18, but was still generated, in all the undercoat layer thicknesses of 1.5-4.0 μm. The OPC (organic photosensitive layer) leak trace and the accompanying stripe-shaped unevenness were not generated, in an environmental condition of temperature/humidity=24° C./43%, in all the undercoat layer thickness of 1.5-4.0 μm, but in an environmental condition of temperature/humidity=35° C./85%, the leak trace and the stripe-shaped unevenness were confirmed to be generated not only at all the undercoat layer thickness of 1.5 and 2.0 μm but also even at the undercoat layer thickness of 3.0 μm.
In Comparative Examples 37-54, as shown in Tables 3 and 9, the 1-dot reproducibility and the fine white line resolution were satisfactory within a range of an undercoat layer thickness of 1.5-3.5 μm, but, at 4.0 μm, the 1-dot reproducibility test showed a faint dot edge, and the fine white line resolution test showed a broadened width because of a faint edge of a fine line. It was confirmed visually that the interference fringes were generated all the undercoat layer thicknesses of 1.5-4.0 μm. The SB irregularity density unevenness was not generated at the undercoat layer thicknesses of 2.0-4.0 μm, thus being better than in Comparative Examples 1-18 and 19-36, but was slightly confirmed at 1.5 μm. The OPC (organic photosensitive layer) leak trace and the accompanying stripe-shaped unevenness were confirmed not to be generated, in both environmental conditions of temperature/humidity=24° C./43% and 35° C./85%, in all the undercoat layer thicknesses of 1.5-4.0 μm.
As explained above, the evaluation results of the images on the actual apparatus are influenced not only by the average surface roughness Ra but also the film thicknesses of the undercoat layer and the charge transport layer.
The spectra of the reflectance Iopc in
The evaluation results of the optical interference, considered from the spectra of the reflectance Iopc shown in
Based on these results, a threshold value is considered to exist for judging whether interference fringes are generated or not, just in case an evident maximum peak is present in the power spectrum. From a visual comparison of the interference fringes generated on the images obtained in the actual apparatus, an Sp range in which the interference fringe generation is within a practically acceptable level was identified as Sp≦10.
On the other hand, as indicated by the evaluation results of the ranks of the interference fringes for Comparative Examples 37-54 in Table 9, the thickness of the undercoat layer within a range of 1.5-4.0 μm causes a variation of the interference fringes over 3 ranks, indicating that the interference fringes are affected more by the thickness of the undercoat layer than by the thickness of the charge transport layer. This is presumably ascribable to the fact that the charge transport layer influences the interference fringes in the actual apparatus not by its film thickness but by a deviation in the thickness of the charge transport layer in the axial and circumferential directions of the cylindrical conductive substrate. For example, the interference fringes are generated at least for a film thickness deviation of about 0.5 μm and a surface roughness Ra of the cylindrical conductive substrate of about 0.13 μm, while the charge transport layers in Examples 1-54 and Comparative Examples 1-54 have film thickness deviations of 0.7-2 μm (an average deviation of 1.5 μm in the axial direction and an average thickness deviation of 1.4 μm in the circumferential direction).
Based on these facts, it can be identified that, even for a charge transport layer with a large thickness deviation (about 2 μm), interference fringes can be suppressed by maintaining the surface of the conductive substrate at an average surface roughness Ra at Ra≧0.23 μm and a maximum surface roughness Rmax at Rmax≧2.4 μm, and a thickness d of the undercoat layer at 1.5 μm≦d≦3.5 μm.
However, even within the aforementioned ranges of the surface roughness, image quality may be affected by the resolution, the SB irregularity density unevenness, and the stripe-shaped unevenness on the halftone image resulting from the OPC (organic photosensitive layer) leak trace, as indicated in the foregoing evaluation results on the actual apparatus (Comparative Examples 1-36).
In contrast to the thick undercoat layer of thickness 1.5 μm or larger employed in the Examples and Comparative Examples, containing a resinous binder and a conductive metal oxide, a thick undercoat layer (1.5 μm or larger) not containing the metal oxide but constituted solely of a resinous binder caused detrimental effects on the electrophotographic characteristics and the image quality, although it could suppress the interference fringes. More specifically, a decrease in the sensitivity and an increase in the residual potential were observed in the electrophotographic characteristics, and these were reflected in the image quality by a decrease in a solid black density and a deterioration in the 1-dot reproducibility. The deterioration in the electrophotographic characteristics is presumably ascribable to the fact that, in a thick undercoat layer not containing the conductive metal oxide, the electrons generated by exposure do not flow into the substrate but cause a charge accumulation in the charge generation layer and at the interface of the charge generation layer and the undercoat layer, thereby inducing a decrease in the sensitivity and an increase in the residual potential. Based on this fact, the thick undercoat layer requires not only the resinous binder but also the conductive metal oxide in such resinous binder, for avoiding charge accumulation.
Based on the foregoing, in order not only to suppress the interference fringes but also to obtain satisfactory electrophotographic characteristics and to avoid detrimental effects on the image quality, it is preferable to have a surface roughness and a reflectance for the conductive substrate within ranges of 0.23 μm≦Ra≦0.35 μm and 2.4 μm≦Rmax≦2.7 μm, and a reflectance of the roughened conductive substrate at an incident wavelength λ=780 nm within a range of Isb≦15% (Examples 1-54), and more preferably to have, in the undercoat layer formed by coating on the roughened conductive substrate, a film thickness d within a range of 2 μm≦d≦3.5 μm and a reflectance within a range of Iucl<17% (Examples 4-15, 22-33 and 40-51).
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