Claims
- 1. A thin film for receiving a sample for analysis by matrix-assisted laser desorption mass spectrometry comprising crystals of a matrix material dispersed in a support material, said film promoting resolution and/or reproducibility of mass spectrometry analysis.
- 2. The thin film of claim 1 wherein said solid support limits the growth of matrix crystals.
- 3. The thin film of claim 2 wherein said solid comprises a polymer.
- 4. The thin film of claim 1 wherein said solid comprises a microreticulated surface.
- 5. A thin film for receiving a sample for analysis by matrix-assisted laser desorption mass spectrometry, comprising a matrix material polymer composition disposed upon a substrate wherein the matrix material is dispersed within said polymer as crystals, said film promoting resolution and/or reproducibility of mass spectrometry analysis.
- 6. The thin film of claim 5 wherein said matrix-polymer composition has a thickness of not greater than 1 μm.
- 7. The thin film of claim 5 wherein said matrix selected from the group consisting of Sinapinic acid or α-cyano-4-hydroxycinnamic acid.
- 8. The thin film of claim 5 wherein said matrix polymer composition comprises a polymer selected from the group consisting of cellulose acetate, cellulose nitrate, and polycarbonate.
- 9. The thin film of claim 5 wherein said matrix-polymer composition ranges from about 70% polymer to about 30% polymer.
- 10. A device for performing matrix-assisted laser desorption mass spectrometry of sample molecules, comprising a substrate capable of receiving on its surface said thin film of claim 5.
- 11. The device of claim 10 in combination with a solution of sample molecules wherein the sample and matrix are substantially coplanar.
- 12. The device of claim 10 wherein said substrate is selected from the group consisting of glass, ceramic, plastic, or metal.
- 13. The device of claim 10 wherein said thin film is resistant to decreased mass resolution and sensitivity.
- 14. A method for making a thin film, said film for receiving a sample for analysis by matrix-assisted laser desorption mass spectrometry, said film comprising a matrix material dispersed within a support material comprising the steps of;
(a) depositing a solution containing matrix material, a support material and solvent upon a substrate; and (b) evaporating said solvent, thereby forming a dispersion of said matrix material and said support material in a thin film on said substrate.
- 15. The method of claim 14 wherein said support material limits the growth of matrix material crystals.
- 16. The method of claim 15 wherein said support material comprises a polymer.
- 17. The method of claim 15 wherein said support material comprises a microreticulated surface.
- 18. A method for making a thin film for receiving sample for analysis by matrix-assisted laser desorption mass spectrometry, said thin film comprising a matrix material support material dispersion disposed on a substrate, comprising the step of depositing a solution containing a matrix material, a support material and solvent upon a spinning substrate at a deposition rate sufficient to allow evaporation of said solvent, thereby forming a film comprising the matrix material dispersed within a support material on the substrate.
- 19. The method of claim 18 wherein said matrix material support material dispersion has a thickness of not of not greater then 1 μm.
- 20. The method of claim 18 wherein said matrix material is selected from the group consisting of sinapinic acid and α-cyano-4-hydrocinnamic acid.
- 21. The method of claim 18 wherein said matrix material-support material dispersion comprises a polymer selected from the group consisting of cellulose acetate, cellulose nitrate, and polycarbonate.
- 22. The method of claim 18 wherein said matrix material support material dispersion is from about 70% support material to about 30% support material.
- 25. A thin film for receiving sample for analysis by matrix-assisted laser desorption mass spectrometry, said thin film comprising a matrix material dispersion disposed on substrate, wherein said thin film is formed by depositing a solution containing matrix material, a support material and solvent upon a spinning substrate at a deposition rate sufficient to allow evaporation of said solvent, thereby forming a thin film of said dispersion of said matrix within said support material on said substrate.
- 26. The thin film of claim 25 wherein said film has a thickness of not greater then 1 μm.
- 27. The thin film of claim 25 wherein said support material limits the size of crystals of matrix material.
- 28. The thin film of claim 25 wherein support material comprises a polymer.
- 29. The thin film of claim 25 wherein said support material comprises a microreticulated surface.
- 30. The thin layer of claim 25 wherein said matrix is selected from the group consisting of sinapinic acid or α-cyano-4-hydrocinnamic acid.
- 31. The thin film of claim 25 wherein said matrix material-support material dispersion comprises a polymer selected from the group consisting of cellulose acetate cellulose nitrate, and polycarbonate.
- 32. The thin film of claim 25 wherein said matrix material-support material dispersion is from about 30% to about 70% support material.
Parent Case Info
[0001] This application is a continuation-in-part of U.S. Ser. No. 08/480,428, filed Jun. 6, 1995, which in turn is a continuation of U.S. Ser. No. 08/151,490, filed now abandoned.
Divisions (1)
|
Number |
Date |
Country |
Parent |
08853205 |
May 1997 |
US |
Child |
09552453 |
Apr 2000 |
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
08480428 |
Jun 1995 |
US |
Child |
08853205 |
May 1997 |
US |