Colden et al. "Directional reactive ion etching of InP with Cl.sub.2 containing gases" Journal Vacuum Sci. Tech 19(2), Jul/Aug. 1981, pp. 225-230. |
G. Hasnain et al. "High Temperature and High Frequency . . . " Electronics Letters, vol. 27, No. 11, May 23, 1991, pp. 915-916. |
G. Hasnain, et al., "Performance of Gain-Guided Surface . . . " IEEE Jrnl. Quantum Elec., vol. 27, No. 6, Jun. 1991, pp. 1377-1385. |
T. Takamori et al., "Angled etching of GaAs/AlGaAs by conventional Cl.sub.2 reactive ion etching", Appl. Phys. Lett., 53 (25), 19 Dec. 1988, pp. 2549-2551. |