Fusao Shimokawa et al., "Reactive-fast-atom beam etching of GaAs using Cl.sub.2 gas", J.Appln.Phys., vol. 66, No. 6, pp. 2613-2618, American Institute of Physics, 1989. |
Patent Abstracts of Japan, vol. 095, No. 001, 28 Feb. 1995 & JP 06 289198 A (Ebara Corporation), 18 Oct. 1994 * abstract *. |
Journal of Vacuum Science and Technology: Part A, vol. 13, No. 5, 1 Sep. 1995, pp. 2508-2512, XP000550444, Imai, F. et al.: "Performance Characteristics of an Oxygen Radical Beam Radio-Frequency Source" * p. 2508, right-hand column, paragraph 1; figure 1 *. |
IBM Technical Disclosure Bulletin, vol. 36, No. 10, 1 Oct. 1993, pp. 501/502 XP000412462 "Compact High-Density Radical Generator" * the whole document *. |