Claims
- 1. A fluid-permeable filter for a semiconductor processing tool comprising:a porous particulate divinyl benzene styrene material formed with a copolymer having a sulfonic acid group such that the group can react with a reagent; and a filter element having the porous particulate material, the filter being mounted within a gas flow path of a semiconductor processing tool to remove molecular bases from a gas flow.
- 2. The filter of claim 1 wherein the acidic group has an acidity level of at least 1 milliequivalent/gram.
- 3. The filter of claim 1 wherein the material has a pore size in the range of 50-400 angstroms.
- 4. The filter of claim 1 wherein the filter comprises a pleated filter.
- 5. The filter of claim 1 wherein the filter element has a surface area of 20 m2/g or higher.
- 6. A porous filter for a semiconductor processing tool comprising:a filter positioned within a gas flow path of a semiconductor processing tool, the filter having a porous divinyl benzene styrene material selected from the group of particles, threads, yarns, ribbons, fibers or filaments of a polymer, the polymer comprising a sulfonic acid, such that the filter removes molecular bases from gases within the semiconductor processing tool.
- 7. The filter of claim 6 wherein the material has an area of 20 m2/g.
- 8. An adsorptive filter composite for a semiconductor processing tool comprising:a filter composite positioned within a gas flow-path of a semiconductor processing tool, the filter composite including a non-woven carrier material; and a plurality of porous sulfonated divinyl benzene styrene copolymer beads having sulfonic acid functional side groups used to remove molecular bases from gases within the semiconductor processing tool.
- 9. The filter composite of claim 8 wherein the beads have a surface area of 20 m2/g or greater.
- 10. The filter composite of claim 8 further comprising a binder material.
- 11. A filter element for a semiconductor processing tool comprising a plurality of alternating layers of a divinyl benzene styrene copolymer particulate material and a binder, the filter being mounted within a gas flow path of a semiconductor processing tool such that the filter removes molecular bases from gases within the semiconductor processing tool.
- 12. The filter element of claim 11 wherein the binder includes an acid-polymerizable or acid-cross-linkable liquid.
- 13. The filter element of claim 11 wherein the semiconductor processing tool includes a deep-ultraviolet photolithography device.
RELATED APPLICATION
This application claims the benefit of U.S. Provisional Application No. 60/097,215, filed on Aug. 20, 1998, the entire teachings of which are incorporated herein by reference.
US Referenced Citations (41)
Non-Patent Literature Citations (1)
Entry |
Kishkovich et al., An Accelerated Testing Technique for Evaluating Performance of Chemical Air Filters for DUV Photolithographic Equipment, 3677 SPIE 857-65 (Part of the SPIE Conference on Metrology, Inspection and Process Control for Microlighography XIII, Santa Clara, CA) (Mar. 1999). |
Provisional Applications (1)
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Number |
Date |
Country |
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60/097215 |
Aug 1998 |
US |