Claims
- 1. A process for separating and immobilizing radioactive anions and/or radioactive cations from a liquid containing same comprising contacting said liquid with a porous silica glass or gel comprising at least 82 mol percent silica having interconnected pores and (a) non-radioactive cationic organosiloxy groups bonded to silicon of the glass or gel on the internal surfaces of said pores and non-radioactive anions ionically bonded to said cationic organosiloxy groups and displaceable by said radioactive anions; and/or (b) non-radioactive anionic organosiloxy groups bonded to silicon of the glass or gel on the internal surfaces of said pores and non-radioactive cations ionically bonded to said anionic organosiloxy groups and displaceable by said radioactive cations; and/or (c) non-radioactive cationic polyvalent metals bonded to silicon of the glass or gel through divalent oxygen linkages on the internal surfaces of said pores and non-radioactive anions ionically bonded to said cationic metals and displaceable by said radioactive anions, to provide a distribution of radioactive anions and/or cations internally bonded within the pores of said glass or gel and heating the porous silicate glass or gel to collapse said pores containing said internally bonded radioactive anions and/or cations.
- 2. Process as claimed in claim 1 wherein a porous silica glass is used and (a) said non-radioactive organosiloxy groups are ammonium organosiloxy groups; (b) said non-radioactive anionic organosiloxy groups are oxycarbonylorganosiloxy groups; (c) said non-radioactive cationic polyvalent metal is selected from the group consisting of --Zr.sup.3+, --Pb.sup.+, --Th.sup.3+ and --Ti.sup.3+ ; said non-radioactive anions are hydroxyl anions; and said non-radioactive cations are protons.
- 3. Process as claimed in claim 3 wherein said ammonium organosiloxy groups are represented by the formula: ##STR11## said oxycarbonylorganosiloxy groups are represented by the formula ##STR12## wherein in said formulas n is an integer of 1 to 18 and the unfilled valances of silicon in each formula is connected through oxygen to silicon of the glass, and/or are connected to a monovalent hydrocarbon group, and/or is connected through silicon by carbon linkages to additional --C.sub.n H.sub.2n NH.sub.3.sup.+, --C.sub.n H.sub.2n NHC.sub.n H.sub.2n NH.sub.3.sup.+ or --C.sub.n H.sub.2n NHC.sub.n H.sub.2n COO.sup.- groups.
- 4. Process as claimed in claim 3 wherein said ammonium organosiloxy groups are represented by the formula: ##STR13##
- 5. Process as claimed in claim 3 wherein said ammonium organosiloxy groups are represented by the formula: ##STR14##
- 6. Process as claimed in claim 3 wherein said oxycarbonylorganosiloxy groups are represented by the formula: ##STR15##
- 7. Process as claimed in claim 2 wherein the porous silica glass is represented by the formula: ##STR16## wherein M is a tetravalent metal in which the two unfilled valences of M are bonded ionically to additional OH.sup.- anions, are bonded through divalent oxygen linkage to another silicon of the glass and/or are bonded through divalent oxygen linkage to other M atoms.
- 8. Process as claimed in claim 1 wherein porous silica glass containing integral boron is used and some of said groups (a), (b) and (c) are bonded through oxy linkages to boron of said porous glass.
- 9. A process as claimed in claim 1 wherein the resulting glass is buried at sea.
- 10. A process as claimed in claim 1 wherein the resulting glass product is stored beneath the surface of the earth.
- 11. A process as claimed in claim 1 further comprising incorporating the resulting glass product into an instrument as a source of radioactivity.
- 12. A process as claimed in claim 11 further comprising destroying microorganisms employing said device.
- 13. A process as claimed in claim 11 further comprising sterilizing sewage sludge employing said device.
- 14. A sintered silicon dioxide-containing matrix containing radioactive anions internally bonded to internal silicon atoms of said matrix through polyvalent metal oxy groups selected from the group consisting of ##STR17##
- 15. A matrix as claimed in claim 14 wherein said matrix is sintered porous silicate glass having a SiO.sub.2 content of at least 82 mol percent.
- 16. A matrix as claimed in claim 14 containing at least 1 ppb radioactive material encapsulated and immobilized in said matrix.
- 17. A matrix as claimed in claim 14 containing at least 10 ppb radioactive material encapsulated and immobilized in said matrix.
- 18. A matrix as claimed in claim 14 wherein said radioactive anions are chromate, Tc.sup.- and/or molybdate.
- 19. A matrix as claimed in claim 14 characterized by a radiation activity of at least one microcurie per cubic centimeter of said matrix.
- 20. A matrix as claimed in claim 14 wherein said radioactive anions are derived from radioactive nuclear waste.
- 21. A method for the prevention of the dissemination of radioactive materials into the environment comprising surrounding radwaste containing radioactive cations and/or radioactive anions in a silica gel or silica glass substrate with an ion exchange backfill comprising a porous silicate glass or silica gel having interconnected pores and non-radioactive cationic and/or anionic groups bonded to silicon of the glass or gel on the internal surfaces of the pores thereof, said non-radioactive cationic and/or anionic groups being capable of being displaced by said radioactive cations and/or anions.
- 22. A method according to claim 21 wherein said ion exchange backfill is an anion exchange medium.
- 23. A method according to claim 21 wherein said ion exchange backfill is a cation exchange medium.
- 24. A method according to claim 21 wherein said ion exchange backfill is an anion exchange medium and a cation exchange medium.
- 25. A method as claimed in claim 21 wherein said radwaste is disposed in an underground site and said backfill surrounds said radwaste.
- 26. A method according to claim 21 wherein said ion exchange backfill comprises a porous silicate glass having interconnected pores and cationic ammonium organosiloxy groups bonded to silicon of the glass and/or anionic organosiloxy groups bonded to silicon of the glass and/or hydrous polyvalent metals bonded to silicon through divalent oxygen linkages on the internal surfaces of said pores.
- 27. A method according to claim 26 wherein said hydrous polyvalent metal is selected from the group consisting of Zr, Pb, Th, and Ti.
- 28. Method as claimed in claim 26 wherein (a) said non-radioactive organosiloxy groups are ammonium organosiloxy groups; (b) said non-radioactive anionic organosiloxy groups are oxycarbonylorganosiloxy groups; (c) said non-radioactive cationic polyvalent metal is selected from the group consisting of --Zr.sup.3+, --Pb.sup.+, --Th.sup.3+ and --Ti.sup.3+ ; said non-radioactive anions are hydroxyl anions; and said non-radioactive cations are protons.
- 29. Method as claimed in claim 28 wherein said ammonium organosiloxy groups are represented by the formula: ##STR18## said oxycarbonylorganosiloxy groups are represented by the formula: ##STR19## wherein in said formulas n is an integer of 1 to 18 and the unfilled valences of silicon in each formula are connected through oxygen to silicon of the glass, and/or is connected to a monovalent hydrocarbon group, and/or is connected through silicon to carbon linkages to additional --C.sub.n H.sub.2n NH.sub.3.sup.+, --C.sub.n H.sub.2n NHC.sub.n H.sub.2n NH.sub.3.sup.+ or --C.sub.n H.sub.2n NHC.sub.n H.sub.2n COO.sup.- groups.
- 30. Method as claimed in claim 29 wherein said ammonium organosiloxy groups are represented by the formula:
- --OSiC.sub.3 H.sub.6 NH.sub.3.sup.+.
- 31. Method as claimed in claim 29 wherein said ammonium organosiloxy groups are represented by the formula: ##STR20##
- 32. Method as claimed in claim 29 wherein said oxycarbonylorganosiloxy groups are represented by the formula: ##STR21##
- 33. Method as claimed in claim 28 wherein the porous silica glass is represented by the formula: ##STR22## wherein M is a tetravalent metal in which the two unfilled valences of M are bonded ionically to additional OH.sup.- anions, are bonded through divalent oxygen linkage to another silicon of the glass and/or are bonded through divalent oxygen linkage to other M atoms.
- 34. A method according to claim 26 wherein said hydrous polyvalent metal is Zr.
- 35. A method according to claim 21 wherein said ion exchange backfill includes a porous silicate glass having interconnected pores and non-radioactive cations selected from the group consisting of alkali metal cations, Group Ib metal cations and/or ammonium cations bonded to silicon through divalent oxygen linkages on the internal surfaces of said pores, said nonradioactive cations being capable of being displaced by said radioactive cations to provide a distribution of internal silicon-bonded radioactive cation oxy groups within the pores of said glass.
- 36. A process for containing a radioactive material which comprises impregnating a porous silicage glass having interconnected pores and non-radioactive organofunctionalsiloxy groups bonded to silicon of the glass and/or having non-radioactive hydrous polyvalent metal oxides bonded to silicon of the glass through divalent oxygen linkages on the internal surfaces of said pores, said a liquid solution containing radioactive anions to dispose said solution within the pores of said glass to provide a distribution of internally bonded radioactive anions within the pores of said glass, and heating the porous glass to collapse said pores containing said internally bonded radioactive anions.
- 37. A method for preparing an anion exchange medium for the removal of radioactive anions from a liquid stream comprising bonding anion exchange groups to silicon-bonded oxygen of a porous silicate glass or porous silica-gel having interconnected pores, said anion exchange groups being polyvalent hydrous metal oxide groups exhibiting anion exchange properties involving surface hydroxyl groups, the hydrous metal oxide groups being bonded to silicon via divalent oxygen linkages by converting silicon-bonded hydroxyl groups of said porous glass or silica gel to alkali metal oxy groups, displacing the alkali metal ions with polyvalent metal nitrate groups, and replacing the nitrate groups with hydroxyl groups.
- 38. A method as claimed in claim 37 wherein the polyvalent metal nitrate group are selected from the group consisting of --Zr(NO.sub.3), --PbNO, --Ti(NO.sub.3), and --Th(NO.sub.3).
- 39. A method as claimed in claim 38 wherein the silicon-bonded hydroxyl groups are converted to sodium oxy groups in an NH.sub.4 OH medium, the sodium atoms are displaced in a slightly acidic medium, and the nitrate groups are replaced by treatment with an NH.sub.4 OH solution.
- 40. A method in accordance with claim 39 wherein the nitrate groups are replaced with hydroxyl groups by heating to decompose the metal nitrate to the oxide and hydrating the oxide.
- 41. An underground reservoir for storing radioactive ionic wastes which are contained in a silica gel or silica glass substrate comprising a container containing said wastes disposed within an underground cavity and a backfill surrounding said container, said backfill comprising particles of silica glass or gel having interconnected pores and nonradioactive ions ionically bonded to ionic groups or atoms bonded to silicon of said glass or gel on the internal surfaces of said pores, said non-radioactive ions being displaceable bu said radioactive ions of said waste.
- 42. A package for storing radioactive ionic wastes which are contained in a silica gel or silica-glass substrate comprising a container containing said wastes and an overpack surrounding said wastes, said overpack comprising particles of silica glass or gel having interconnected pores and non-radioactive ions ionically bonded to ionic groups or atoms bonded to silicon of said glass or gel on the internal surfaces of said pores, said non-radioactive ions being displaceable by said radioactive ions of said waste.
- 43. Package as claimed in claim 42 wherein said radwaste is contained in a first container, said overpack surrounds said first container and a second container contains said first container and said overpack.
- 44. A process for separating and immobilizing radioactive anions and/or radioactive cations from a liquid containing same comprising contacting said liquid with a porous silica glass or gel comprising at least 82 mol percent silica having interconnected pores and (a) non-radioactive cationic organosiloxy groups bonded to silicon of the glass or gel on the internal surfaces of said pores and non-radioactive anions ionically bonded to said cationic organosiloxy groups and displaceable by said radioactive anions; and/or (b) non-radioactive anionic organosiloxy groups bonded to silicon of the glass or gel on the internal surfaces of said pores and non-radioactive cations ionically bonded to said anionic organosiloxy groups and displaceable by said radioactive cations to provide a distribution of radioactive anions and/or cations internally bonded within the pores of said glass or gel.
- 45. Process as claimed in claim 44 wherein a porous glass is used and (a) a non-radioactive organosiloxy groups are ammonium organosiloxy groups; and (b) said non-radioactive anionic organosiloxy groups are oxycarbonylorganosiloxy groups; said non-radioactive anions are hydroxyl anions, and said non-radioactive cations are protons.
- 46. Process as claimed in claim 45 wherein said ammonium organosiloxy groups are represented by the formula: ##STR23## said oxycarbonylorganosiloxy groups are represented by the formula: ##STR24## wherein in said formulas n is an integer of 1 to 18 and the unfilled valences of silicon in each formula is connected through oxygen to silicon of the glass, and/or are connected to a monovalent hydrocarbon group, and/or is connected through silicon by carbon linkages to additional --C.sub.n H.sub.2n NH.sub.3 +, --C.sub.n H.sub.2n NHC.sub.n H.sub.2n NH.sub.3 .sup.+ or --C.sub.n H.sub.2n NHC.sub.n H.sub.2n COO.sup.- groups.
- 47. Process as claimed in claim 46 wherein said ammonium organosiloxy groups are represented by the formula: ##STR25##
- 48. Process as claimed in claim 46 wherein said ammonium organosiloxy groups are represented by the formula: ##STR26##
- 49. Process as claimed in claim 46 wherein said oxycarbonylorganosiloxy groups are represented by the formula: ##STR27##
- 50. Process as claimed in claim 44 wherein porous silica glass containing integral boron is used and some of said groups (a) and (b) are bonded through oxy linkages to boron of said porous glass.
- 51. A method for the preparation of the dissemination of radioactive materials into the environment comprising surrounding radwaste containing radioactive cations and/or radio-active anions with an ion exchange backfill comprising a porous silicate glass or silica gel having interconnected pores and (a) non-radioactive cationic organosiloxy groups bonded to silicon of the glass or gel on the internal surfaces of said pores and non-radioactive anions ionically bonded to said cationic organosiloxy groups and displaceable by said radioactive anions; and/or (b) non-radioactive anionic organosiloxy groups bonded to silicon of the glass or gel on the internal surfaces of said pores and non-radioactive cations ionically bonded to said anionic organosiloxy groups and displaceable by said radioactive cations.
- 52. A method according to claim 51 wherein said ion exchange backfill is an anion exchange medium.
- 53. A method according to claim 51 wherein said ion exchange backfill is a cation exchange medium.
- 54. A method according to claim 51 wherein said ion exchange backfill is an anion exchange medium and a cation exchange medium.
- 55. A method as claimed in claim 51 wherein said radwaste is disposed in an underground site and said backfill surrounds said radwaste.
- 56. A method according to claim 51 wherein said ion exchange backfill comprises a porous silicate glass having interconnected pores and cationic ammonium organosiloxy groups bonded to silicon of the glass and/or anionic organosiloxy groups bonded to silicon of the glass on the internal surfaces of said pores.
- 57. Method as claimed in claim 56 wherein (a) said nonradioactive organosiloxy groups are ammonium organosiloxy groups; and (b) said non-radioactive anionic organosiloxy groups are oxycarbonylorganosiloxy groups; said non-radioactive anions are hydroxyl anions; and said non-radioactive cations are protons.
- 58. Method as claimed in claim 56 wherein said ammonium organosiloxy groups are represented by the formula: ##STR28## said oxycarbonylorganosiloxy groups are represented by the formula: ##STR29## wherein in said formulas n is an integer of 1 to 18 and the unfilled valences of silicon in each formula are connected through oxygen to silicon of the glass, and/or is connected to a monovalent hydrocarbon group, and/or is connected through silicon to carbon linkages to additional --C.sub.n H.sub.2n NH.sub.3.sup.+, --C.sub.n H.sub.2n NHC.sub.n H.sub.2n NH.sub.3.sup.+ or --C.sub.n H.sub.2n NHC.sub.n H.sub.2n COO.sup.- groups.
- 59. Method as claimed in claim 58 wherein said ammonium organosiloxy groups are represented by the formula:
- --OSiC.sub.3 H.sub.6 NH.sub.3.sup.+.
- 60. Method as claimed in claim 58 wherein said ammonium organosiloxy groups are represented by the formula: ##STR30##
- 61. Method as claimed in claim 58 wherein said oxycarbonylorganosiloxy groups are represented by the formula: ##STR31##
- 62. A method according to claim 51 wherein said ion exchange backfill includes a porous silicate glass having interconnected pores and non-radioactive cations selected from the group consisting of alkali metal cations, Group Ib metal cations and/or ammonium cations bonded to silicon through divalent oxygen linkages on the internal surfaces of said pores, said nonradioactive cations being capable of being displaced by said radioactive cations to provide a distribution of internal silicon-bonded radioactive cation oxy groups within the pores of said glass.
RELATED APPLICATIONS
This application is a continuation-in-part of U.S. application Ser. No. 34,567, filed Apr. 30, 1979 which, in turn, is a continuation-in-part of U.S. application Ser. No. 959,220, filed Nov. 9, 1978 abandoned.
US Referenced Citations (8)
Non-Patent Literature Citations (5)
Entry |
Mizutani et al., "Determination of Some Inorganic Cations . . . " J. Non-Cryst. Solids 30 (1978) pp. 23-27. |
W. A. Patrick and E. H. Barclay, J. Phys. Chem., vol. 29, p. 1400. |
L. V. Ponomareva et al., Zhurnal Prikladnoi Khimii, vol. 48, No. 10, pp. 2150-2155. |
Amphlett et al., J. Inorg. Nucl. Chem., vol. 6, pp. 236-245 (1958). |
The 1979-1980 Pierce Handbook & General Catalog, pp. 355-379. |
Continuation in Parts (2)
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Number |
Date |
Country |
Parent |
34567 |
Apr 1979 |
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Parent |
959220 |
Nov 1978 |
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