Claims
- 1. A polishing pad for polishing a surface, comprising:a first member defining a first polishing surface and comprising a structurally degradable abrasive first material, the abrasive first material being loaded into the first member such that larger particles are exposed to the surface first, followed by smaller particles; and a second member defining a second polishing surface; at least a portion of the first member capable of being extended beyond the second polishing surface by a fixed amount.
- 2. The pad of claim 1, further comprising an opposing side formed from at least one of the first member and the second member.
- 3. The pad of claim 1, wherein:the first member includes a plurality of first sections having first polishing surfaces; and the second member includes a plurality of second sections having second polishing surfaces that with the first polishing surfaces define a polishing face.
- 4. The pad of claim 3, wherein the plurality of first and second sections are provided in an alternating arrangement.
- 5. The pad of claim 1, wherein the first material comprises a matrix material containing the larger and the smaller particles, the larger and the smaller particles being more abrasive than the matrix.
- 6. The pad of claim 5, wherein the matrix material is substantially nonabrasive.
- 7. The pad of claim 5, wherein the matrix material is abrasive.
- 8. The pad of claim 1, wherein the second material is substantially nonabrasive.
- 9. The pad of claim 1, wherein the second material is substantially nondegradable.
- 10. A polishing pad for polishing a surface, comprising:a first member defining a first polishing surface and comprising a structurally degradable abrasive first material, the abrasive first material being loaded into the first member such that larger particles are exposed to the surface first, followed by smaller particles; a second member defining a second polishing surface; and an opposing side formed from at least one of the first member and the second member, wherein the first polishing surface is capable of being extended beyond the second polishing surface by a fixed amount.
- 11. The pad of claim 10, wherein:the first member includes a plurality of first sections having first polishing surfaces; and, the second member includes a plurality of second sections having second surfaces that with the first polishing surfaces define a polishing face.
- 12. The pad of claim11, wherein the plurality of first and second sections are provided in an alternating arrangement.
- 13. The pad of claim 10, wherein:the second member includes a second material that is more soluble in a solvent than the first material.
- 14. A polishing pad for polishing a surface, comprising:a first member having a structurally degradable abrasive first material, the abrasive first material being loaded into the first member such that larger particles are exposed to the surface first, followed by smaller particles; and a second member having a second material that is less degradable and less abrasive than the first material; at least a portion of the first member capable of being extended beyond the second polishing surface by a fixed amount.
- 15. The pad of claim 14, further comprising an opposing side formed from at least one of the first member and the second member.
- 16. The pad of claim 14, wherein:the first member includes a plurality of first sections having first polishing surfaces; and the second member includes a plurality of second sections having second polishing surfaces that with the first polishing surfaces define a polishing face.
- 17. The pad of claim 16, wherein the plurality of first and second sections are provided in an alternating arrangement.
- 18. The pad of claim 14, wherein the second member includes a second material is more soluble in a solvent than the first material.
- 19. The pad of claim 14, wherein the second material is substantially nonabrasive.
- 20. The pad of claim 19, wherein the second material is substantially nondegradable.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation of application Ser. No. 09/881,421, filed Jun. 14, 2001 now U.S. Pat. No. 6,527,626, which is a division of application Ser. No. 09/593,045, filed Jun. 12, 2000, now U.S. Pat. No. 6,254,460, which is a division of application Serial No. 09/187,307, filed Nov. 4, 1998, now U.S. Pat. No. 6,409,586, which is a continuation of application Ser. No. 08/917,018, filed Aug. 22, 1997, now U.S. Pat. No. 5,919,082.
Not Applicable
Not Applicable
US Referenced Citations (22)
Continuations (2)
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Number |
Date |
Country |
Parent |
09/881421 |
Jun 2001 |
US |
Child |
10/352668 |
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US |
Parent |
08/917018 |
Aug 1997 |
US |
Child |
09/187307 |
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US |