Claims
- 1. An optical apparatus for focussing light from a light source onto a slit, said optical relay comprising:
- a first simple lens;
- a second simple lens through which light from the light source passes, after passing through the first lens; and
- a first opaque barrier defining a first aperture through which light from the light source passes after passing through the first lens, the distance of the first opaque barrier from the first lens being selected to produce through the slit a flux of light that is substantially flat as a function of wavelength over a range of wavelengths of interest.
- 2. An optical apparatus as in claim 1 further comprising:
- at least one additional opaque barrier defining an aperture, the location of this additional opaque barrier being selected in conjunction with the choice of location of the first opaque barrier to produce through the slit a flux of light that is substantially flat as a function of wavelength over a range of wavelengths of interest.
- 3. An optical apparatus as in claim 1 further comprising:
- a light source;
- an opaque barrier defining a slit;
- said first lens being located relative to the light source such that light at a reference wavelength w.sub.r within the range of wavelengths of interest is collimated after the light passes through the first lens.
- 4. An optical apparatus as in claim 3 further comprising:
- a dispersive element on which the light is incident after passing through the slit;
- a plurality of detectors for detecting the flux of light through the slit at a plurality of wavelengths; and
- a mask located between the dispersive element and the detectors
- said mask having a shape such that it corrects for deviations from a flat spectral distribution of light flux from the light source as a function of wavelength.
- 5. An optical apparatus as in claim 4 wherein said mask further corrects for deviations from a flat spectral distribution of light flux through the slit resulting from chromatic aberrations of the first and second simple lenses.
- 6. An optical apparatus as in claim 1 further comprising:
- a light source;
- an opaque barrier defining a slit;
- said first lens being located relative to the light source such that light at a reference wavelength w.sub.r within the range of wavelengths of interest is focussed at a point of focus located between the first and second lenses.
- 7. An optical apparatus as in claim 6 further comprising:
- a dispersive element on which the light is incident after passing through the slit;
- a plurality of detectors for detecting the flux of light through the slit at a plurality of wavelengths; and
- a mask located between the dispersive element and the detectors
- said mask having a shape such that it corrects for deviations from a flat spectral distribution of light flux from the light source as a function of wavelength.
- 8. An optical apparatus as in claim 7 wherein said mask further corrects for deviations from a flat spectral distribution of light flux through the slit resulting from chromatic aberrations of the first and second simple lenses.
- 9. An optical apparatus as in claim 1 wherein said first aperture has a linear dimension D that is selected to optimize the flatness of the flux of light as a function of wavelength over said range of interest.
- 10. An optical apparatus as in claim 3 wherein said range of interest extends from a wavelength w.sub.1 to a wavelength w.sub.2 and wherein the reference wavelength w.sub.r is selected to obey substantially the relation:
- n(w.sub.r)=[n(w.sub.1)+n(w.sub.2)]/2
- where n(w) is the index of refraction of said first lens as a function of the wavelength w of light through it.
- 11. An optical apparatus as in claim 3 wherein the distances from the source of the first lens, the second lens and the opaque barrier defining the slit are selected to focus light of a wavelength w.sub.f from said source onto said barrier defining the slit, and
- wherein w.sub.f is selected in conjunction with the distance of the first opaque barrier from the source to optimize the flatness of the flux of light as a function of wavelength over the range of wavelengths of interest.
CROSS REFERENCE TO RELATED APPLICATION
This application is a continuation, of application Ser. No. 837,458, filed 3/07/86, now abandoned.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
2630736 |
Beitz |
Mar 1953 |
|
3547542 |
Bulpitt et al. |
Dec 1970 |
|
3886331 |
Schierer, Jr. |
May 1975 |
|
Non-Patent Literature Citations (2)
Entry |
Kingslake, "Lens Design Fundamentals" Academic Press (1978) pp. 89-92. |
Gilbert, Jr., "Optimizing Monochromator Performance" Electro-Opt. Syst. Des. (U.S.A.) vol. 7, #2, Feb. 1975, pp. 25-31. |
Continuations (1)
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Number |
Date |
Country |
Parent |
837458 |
Mar 1986 |
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