Claims
- 1. A method of removing soldering flux residues from circuit assemblies comprising:
- a) contacting said assemblies with an aqueous flux removing solution comprising from about 0.5 to 10% by weight of a flux removing composition comprising at least one alkali metal salt, an alkali metal silicate in addition to said one alkali metal salt and a surfactant formulation comprising a mixture of an alkoxylated nonionic surfactant and an N-alkylpyrrolidone, wherein said alkyl group contains 6 to 20 carbon atoms, said alkali metal silicate being characterized by the formula M.sub.2 O:SiO.sub.2, wherein M represents an alkali metal and in which the ratio of M.sub.2 O to SiO.sub.2 is between 1:1.6 and 1:4.0, said N-alkylpyrrolidone comprises 4 to 10 wt. % of said composition, wherein said flux removing composition is devoid of an anionic polymer for the purpose of stabilizing said alkali metal silicate in aqueous solution and said solution having a pH of from about greater than 10 to 12;
- b) allowing the contact to continue for sufficient time to remove said soldering flux residues from said assemblies and,
- c) removing the assembles from the aqueous flux removing solution.
- 2. The method of claim 1 wherein said N-alkylpyrrolidone comprises N-octylpyrrolidone.
- 3. The method of claim 1 wherein said composition comprises 35 to 70% by weight of alkali metal carbonate and 0 to 20% by weight alkali metal bicarbonate as said at least one alkali metal salt, 0.1 to 10 wt. % alkali metal silicate and 2 to 20% by weight of said surfactant formulation including said N-alkylpyrrolidone.
- 4. The method of claim 1 wherein said surfactant formulation includes one or more defoaming agents.
- 5. The method of claim 4 wherein said N-alkylpyrrolidone comprises N-octylpyrrolidone.
- 6. The method of claim 4 wherein said at least one alkali metal salt comprises alkali metal carbonate present in amounts of about 45 to 60 wt. % of said composition, said composition being devoid of alkali metal bicarbonates and a carboxylated polymer for the purpose of stabilizing said alkali metal silicate in aqueous solution.
- 7. The method of claim 4 further including a hydrotrope to maintain said surfactant formulation in aqueous solution.
- 8. The method of claim 4 wherein said one or more defoaming agents comprise 1.5 to 4 wt. % of said composition.
- 9. The method of claim 4 wherein said surfactant formulation further comprises at least one anionic surfactant.
- 10. The method of claim 1 wherein said flux residues comprise a rosin flux.
- 11. The method of claim 1 wherein said flux residues comprise a water soluble flux.
- 12. The method of claim 1 wherein said solution comprises 1 to 3 wt. % of said flux removing composition.
- 13. The method of claim 8 wherein said solution comprises 1 to 3 wt. % of said flux removing composition.
- 14. The method of claim 1 wherein said contacting comprises spraying said assemblies with said flux removing solution.
- 15. The method of claim 14 wherein said assemblies are placed on a conveying means and carried through a spray of said flux removing solution.
Parent Case Info
This application is a division of application Ser. No. 668,148, filed Jun. 21, 1996, now U.S. Pat. No. 5,688,753.
US Referenced Citations (11)
Divisions (1)
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Number |
Date |
Country |
Parent |
668148 |
Jun 1996 |
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