Full color single pixel including doublet or quadruplet si nanowires for image sensors

Abstract

An image sensor comprising a substrate and one or more of pixels thereon. The pixels have subpixels therein comprising nanowires sensitive to light of different color. The nanowires are functional to covert light of the colors they are sensitive to into electrical signals.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is related to U.S. patent application Ser. Nos. 12/204,686 (granted as U.S. Pat. No. 7,646,943), 12/648,942 (granted as U.S. Pat. No. 8,229,255), 12/270,233 (granted as U.S. Pat. No. 8,274,039), 12/472,264 (granted as U.S. Pat. No. 8,269,985), 12/472,271, 12/478,598, 12/573,582, 12/575,221, 12/633,323, 12/633,318, 12/633,313, 12/633,305, 12/621,497, 12/633,297, 61/266,064, 61/357,429, 61/306,421, 12/945,492, 12/910,664, 12/966,514, 12/966,535 and 12/966,573, the disclosures of which are hereby incorporated by reference in their entirety.

BACKGROUND

An image sensor may be fabricated to have a large number of sensor elements (pixels), generally more than 1 million, in a (Cartesian) square grid. The pixels may be photodiodes, or other photosensitive elements, that are operable to convert electromagnetic radiation (light) into electrical signals.

Recent advances in semiconductor technologies have enabled the fabrication of nanostructures such as nanotubes, nanocavities and nanowires. Optical properties of nanostructures have been one of the recent research focuses. Among the available nanostructures, nanowires have drawn a lot of interest because of their usefulness as an optoelectronic sensor element. An image sensor that harness unique optical properties of nanowires is therefore desirable.

SUMMARY

Described herein is an image sensor comprising a substrate and one or more of pixels thereon, wherein each of the pixels comprises a first subpixel and a second subpixel; the first subpixel comprises a first nanowire operable to generate an electrical signal upon exposure to light of a first wavelength; the second subpixel comprises a second nanowire operable to generate an electrical signal upon exposure to light of a second wavelength different from the first wavelength; the first and second nanowires extend essentially perpendicularly from the substrate. The term “image sensor” as used herein means a device that converts an optical image to an electric signal. An image sensor can be used in digital cameras and other imaging devices. Examples of image sensors include a charge-coupled device (CCD) or a complementary metal-oxide-semiconductor (CMOS) active pixel sensor. The term “pixel” as used herein means the smallest addressable light-sensing element of an image sensor. Each pixel is individually addressable. Pixels in an image sensor can be arranged in a two-dimensional grid. Each pixel samples characteristics such as intensity and color of a small area of an image projected onto the image sensor. The color sampled by a pixel can be represented by three or four component intensities such as red, green, and blue, or cyan, magenta, yellow, and black. Many image sensors are, for various reasons, not capable of sensing different colors at the same location. Therefore, each pixel is divided into regions known as “subpixels”, each of the regions being capable of sensing a single color. The color sampled by a pixel can be calculated from the single colors sensed by the subpixels in the pixel. The term nanowires “extending essentially perpendicularly from the substrate” as used herein means that angles between the nanowires and the substrate are from 85° to 90°. The term “nanowire” as used herein means a structure that has a size constrained to at most 1000 nm in two dimensions and unconstrained in the other dimension.

According to an embodiment, each pixel of the image sensor can further comprise one or more photodiodes located between the substrate and the nanowires. The term “photodiode” as used herein means a type of photodetector capable of converting light into either current or voltage. A photodiode can have a p-n junction or p-i-n junction. When a photon of sufficient energy strikes the photodiode, it excites an electron, thereby creating a free electron and a hole. The electron and hole can be collected to at electrodes of the photodiode as a current or voltage.

According to an embodiment, the substrate comprises silicon, silicon oxide, silicon nitride, sapphire, diamond, silicon carbide, gallium nitride, germanium, indium gallium arsenide, lead sulfide and/or a combination thereof.

According to an embodiment, at least one pixel of the image sensor comprises a clad; the first subpixel and the second subpixel of the at least one pixel are embedded in the clad. The term “clad” as used herein means a layer of substance surrounding the subpixels. The term “embed” as used herein means to surround or cover something closely.

According to an embodiment, the image sensor further comprises a material in space between the pixels.

According to an embodiment, the clad comprises silicon nitride, silicon oxide, and/or a combination thereof.

According to an embodiment, the clad is substantially transparent to visible light.

According to an embodiment, the first and second nanowires have refractive indexes equal to or greater than a refractive index of the clad.

According to an embodiment, the material has a refractive index smaller than a refractive index of the clad.

According to an embodiment, the first nanowire and the second nanowire have different absorption spectra. The term “absorptance” as used herein means a fraction of light absorbed at a specified wavelength. The term “absorption spectrum” as used herein means absorptance as a function of wavelength.

According to an embodiment, the first nanowire and the second nanowire have a distance of at least 100 nm.

According to an embodiment, each of the first and second nanowires has a p-n or p-i-n junction therein. The term “p-i-n junction” as used herein means a structure of a lightly doped or intrinsic semiconductor region sandwiched between a p-type semiconductor region and an n-type semiconductor region. The p-type and n-type regions can be heavily doped for Ohmic contacts. The term “p-n junction” as used herein means a structure with a p-type semiconductor region and an n-type semiconductor region in contact with each other.

According to an embodiment, the electrical signal comprise an electrical voltage, an electrical current, an electrical conductance or resistance, and/or a change thereof.

According to an embodiment, the first nanowire and/or the second nanowire has a surface passivation layer. The terms “passivation” and “passivate” as used herein means a process of eliminating dangling bonds (i.e., unsatisfied valence on immobilized atoms).

According to an embodiment, the image sensor is operable to absorb substantially all (e.g. >50%, >70%, or >90%) visible light (light with wavelengths of about 390 to 750 nm.) impinged thereon. Absorbing >50%, 70% or 90% of all visible light as used herein means that the image sensor has absorptance greater than 50%, greater than 70%, or greater than 90% across the entire visible spectrum (about 390 to 750 nm wavelength), respectively.

According to an embodiment, the image sensor further comprises electronic circuitry operable to detect electrical signals generated by the first and second nanowires.

According to an embodiment, the first and second nanowires comprise silicon.

According to an embodiment, the first nanowire has a radius of about 25 nm (e.g. from 23 to 27 nm) and the second nanowire has a radius of about 40 nm (e.g. from 38 to 42 nm).

According to an embodiment, the clad has a cylindrical shape with a diameter of about 300 nm (e.g. 280 to 320 nm).

According to an embodiment, the pixels have different orientations. The term “different orientations” as used herein is illustrated in FIGS. 1B and 2B and means a pixel is rotated and offset laterally relative to a neighbor pixel thereof.

According to an embodiment, the photodiodes have absorption spectra different from absorption spectra of the first and second nanowires. Two absorption spectra being “different” as used herein means the absorption spectra have different absorptance at one or more one wavelength.

According to an embodiment, each of the pixels further comprises a third subpixel and the third subpixel comprises a third nanowire operable to generate an electrical signal upon exposure to light of a third wavelength different from the first and second wavelengths, wherein the third nanowire extends essentially perpendicularly from the substrate.

According to an embodiment, the third nanowire comprises silicon.

According to an embodiment, the third nanowire has a radius of about 45 nm (e.g. from 42 to 48 nm).

According to an embodiment, the image sensor further comprises couplers above each of the pixels, each of the couplers having a convex surface and being effective to focus substantially all visible light impinged thereon into the clad.

According to an embodiment, each of the couplers has substantially the same footprint as the pixel underneath. The term “footprint” as used herein means an area perpendicularly projected by a structure such as a pixel or a coupler on the substrate.

According to an embodiment, the image sensor further comprises an infrared filter operable to prevent infrared light from reaching the pixels. The term “infrared light” as used herein means electromagnetic radiation with a wavelength between 0.7 and 300 micrometers. The term “infrared filter” as used herein means a device operable to reflect or block infrared light while allowing visible light to pass through.

According to an embodiment, the image sensor does not comprise an infrared filter.

According to an embodiment, the first nanowire and/or the second nanowire has a transistor therein or thereon. A “transistor” as used herein means a semiconductor device used to amplify and switch electronic signals. It is made of a solid piece of semiconductor material, with at least three terminals for connection to an external circuit. A voltage or current applied to one pair of the transistor's terminals changes the current flowing through another pair of terminals.

According to an embodiment, the image sensor further comprises electronic circuitry operable to detect electrical signals from the photodiodes.

According to an embodiment, a method of manufacturing an image sensor, comprising dry etching or VLS growth, wherein the image sensor comprises a substrate and one or more of pixels thereon, wherein each of the pixels comprises at a first subpixel and a second subpixel, the first subpixel comprises a first nanowire operable to generate an electrical signal upon exposure to light of a first wavelength, the second subpixel comprises a second nanowire operable to generate an electrical signal upon exposure to light of a second wavelength different from the first wavelength, wherein the first and second nanowires extend essentially perpendicularly from the substrate. The VLS growth is a method for the growth of one-dimensional structures, such as nanowires, from chemical vapor deposition. Growth of a crystal through direct adsorption of a gas phase on to a solid surface is generally very slow. The VLS growth circumvents this by introducing a catalytic liquid alloy phase which can rapidly adsorb a vapor to supersaturation levels, and from which crystal growth can subsequently occur from nucleated seeds at the liquid-solid interface. The physical characteristics of nanowires grown in this manner depend, in a controllable way, upon the size and physical properties of the liquid alloy.

According to an embodiment, a method of sensing an image comprises: projecting the image onto an image sensor, wherein the image sensor comprises a substrate and one or more of pixels thereon, wherein each of the pixels comprises at a first subpixel and a second subpixel, the first subpixel comprises a first nanowire operable to generate an electrical signal upon exposure to light of a first wavelength, the second subpixel comprises a second nanowire operable to generate an electrical signal upon exposure to light of a second wavelength different from the first wavelength, wherein the first and second nanowires extend essentially perpendicularly from the substrate; detecting the electrical signals from the first nanowire and the second nanowire; calculating a color of each pixel from the electrical signals.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the present disclosure will now be disclosed, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, in which:

FIG. 1A shows a schematic cross-sectional view of an image sensor according to an embodiment.

FIG. 1B shows a schematic top view of the image sensor of FIG. 1A.

FIG. 1C shows exemplary absorption spectra of two nanowires in two subpixels in a pixel of the image sensor of FIG. 1A and a photodiode on the substrate of the image sensor of FIG. 1A.

FIG. 2A shows a schematic cross-sectional view of an image sensor according to an embodiment.

FIG. 2B shows a schematic top view of the image sensor of FIG. 2A.

FIG. 2C shows exemplary absorption spectra of three nanowires in three subpixels in a pixel of the image sensor of FIG. 2A and the substrate of the image sensor of FIG. 2A.

FIG. 2D shows exemplary absorption spectra of four nanowires in four subpixels in a pixel of the image sensor of FIG. 2A and the substrate of the image sensor of FIG. 2A.

FIG. 3 shows a schematic of couplers and an infrared filter.

FIG. 4 shows exemplary color-matching functions of three subpixels in the image sensor, and color-matching functions the CIE standard observer.

DETAILED DESCRIPTION

In the following detailed description, reference is made to the accompanying drawings, which form a part thereof. In the drawings, similar symbols typically identify similar components, unless the context dictates otherwise. The illustrative embodiments described in the detail description, drawings, and claims are not meant to be limiting. Other embodiments may be utilized, and other changes may be made, without departing from the spirit or scope of the subject matter presented here.

The human eye has photoreceptors (called cone cells) for medium- and high-brightness color vision, with sensitivity peaks in short (S, 420-440 nm), middle (M, 530-540 nm), and long (L, 560-580 nm) wavelengths (there is also the low-brightness monochromatic “night-vision” receptor, called rod cell, with peak sensitivity at 490-495 nm). Thus, in principle, three parameters describe a color sensation. The tristimulus values of a color are the amounts of three primary colors in a three-component additive color model needed to match that test color. The tristimulus values are most often given in the CIE 1931 color space, in which they are denoted X, Y, and Z.

In the CIE XYZ color space, the tristimulus values are not the S, M, and L responses of the human eye, but rather a set of tristimulus values called X, Y, and Z, which are roughly red, green and blue, respectively (note that the X, Y, Z values are not physically observed red, green, blue colors. Rather, they may be thought of as ‘derived’ parameters from the red, green, blue colors). Two light sources, made up of different mixtures of various wavelengths, may appear to be the same color; this effect is called metamerism. Two light sources have the same apparent color to an observer when they have the same tristimulus values, no matter what spectral distributions of light were used to produce them.

Due to the nature of the distribution of cones in the eye, the tristimulus values depend on the observer's field of view. To eliminate this variable, the CIE defined the standard (colorimetric) observer. Originally this was taken to be the chromatic response of the average human viewing through a 2° angle, due to the belief that the color-sensitive cones resided within a 2° arc of the fovea. Thus the CIE 1931 Standard Observer is also known as the CIE 1931 2° Standard Observer. A more modern but less-used alternative is the CIE 1964 10° Standard Observer, which is derived from the work of Stiles and Burch, and Speranskaya.

The color matching functions are the numerical description of the chromatic response of the observer as described above.

The CIE has defined a set of three color-matching functions, called, x(λ), y(λ), and z(λ), which can be thought of as the spectral sensitivity curves of three linear light detectors that yield the CIE XYZ tristimulus values X, Y, and Z. These functions are known collectively as the CIE standard observer.

The tristimulus values for a color with a spectral power distribution I(λ) are given in terms of the standard observer by:

$X={\int }_0^{\infty }I\left(\lambda \right)\stackrel{\_}{x}\left(\lambda \right)d\lambda ,Y={\int }_0^{\infty }I\left(\lambda \right)\stackrel{\_}{y}\left(\lambda \right)d\lambda ,Z={\int }_0^{\infty }I\left(\lambda \right)\stackrel{\_}{z}\left(\lambda \right)d\lambda ,$ wherein λ is the wavelength of the equivalent monochromatic light (measured in nanometers).

Examples

FIG. 1A shows a schematic partial cross-sectional view of an image sensor 100, according to an embodiment. The image sensor 100 comprises a substrate 110, one or more pixels 150. At least one pixel 150 comprises a clad 140 and a plurality of subpixels embedded in the clad 140. Two subpixels 151 and 152 are shown in FIG. 1A as an example. Each of the subpixels comprises a nanowire (e.g. a nanowire 151a in the subpixel 151 and a nanowire 152a in the subpixel 152) extending essentially perpendicularly from the substrate 110. Space between the pixels 150 is preferably filled with a material 160. Each pixel 150 can further comprise one or more photodiodes 120 located between the substrate 110 and the nanowires 151a and 152a.

The substrate 110 can comprise any suitable material such as silicon, silicon oxide, silicon nitride, sapphire, diamond, silicon carbide, gallium nitride, germanium, indium gallium arsenide, lead sulfide, and/or a combination thereof.

The photodiode 120 can be any suitable photodiode. The photodiode 120 can have a p-n junction of a p-i-n junction and any suitable circuitry. The photodiode 120 preferably has a footprint that completely encloses a footprint of the clad 140.

The clad 140 can comprise any suitable material, such as silicon nitride, silicon oxide, and/or a combination thereof. The clad 140 is preferably substantially transparent to visible light, preferably with a transmittance of at least 50%, more preferably at least 70%, most preferably at least 90%. In one example, the clad 140 is silicon nitride and has a cylindrical shape with a diameter of about 300 nm.

The material 160 can comprise any suitable material such as silicon dioxide. A refractive index of the material 160 is preferably smaller than a refractive index of the clad 140.

The nanowires (e.g. 151a and 152a) in the subpixels (e.g. 151 and 152) have refractive indexes equal to or greater than the refractive index of the clad 140. The nanowires and the photodiode 120 have different absorption spectra. For example, the nanowire 151a has strong absorptance in blue wavelengths, as shown by an exemplary absorption spectrum 181 in FIG. 1C; the nanowire 152a has a strong absorptance in green wavelengths, as shown by an exemplary absorption spectrum 182 in FIG. 1C; the photodiode 120 has strong absorptance in red wavelengths, as shown by an exemplary absorption spectrum 180 in FIG. 1C. The nanowires can have different diameters and/or different materials. Each nanowire in one pixel 150 preferably has a distance of at least 100 nm, preferable at least 200 nm, to a nearest neighboring nanowire in the same pixel. The nanowires can be positioned at any suitable positions in the clad 140.

The nanowires (e.g. 151a and 152a) in the subpixels (e.g. 151 and 152) are operable to generate electrical signals upon receiving light. One exemplary nanowire is a photodiode with a p-n or p-i-n junction therein, details of which can be found in U.S. patent application Ser. Nos. 12/575,221 and 12/633,305, each of which is hereby incorporated by reference in its entirety. The electrical signals can comprise an electrical voltage, an electrical current, an electrical conductance or resistance, and/or a change thereof. The nanowires can have a surface passivation layer.

Substantially all visible light (e.g. >50%, >70%, or >90%) impinged on the image sensor 100 is absorbed by the subpixels (e.g. 151 and 152) and the photodiode 120. The subpixels and the photodiode absorb light with different wavelengths.

The image sensor 100 can further comprise electronic circuitry 190 operable to detect electrical signals from the subpixels and the photodiode 120.

In one specific example, each pixel 150 has two subpixels 151 and 152. Each subpixel 151 and 152 has only one nanowire 151a and 152a, respectively. The nanowire 151a comprises silicon, has a radius of about 25 nm, and has a strong absorptance in blue wavelengths. The nanowire 152a comprises silicon, has a radius of about 40 nm and has a strong absorptance in cyan wavelengths. The nanowires 151a and 152a are about 200 nm apart but embedded in the same clad 140. Each of the pixels 150 can have more than two subpixels according to an embodiment. The nanowires can comprise other suitable materials such as mercury cadmium telluride. The nanowires can have other suitable radii from 10 nm to 250 nm.

FIG. 1B shows a schematic partial top view of the image sensor 100. As shown in exemplary FIG. 1B, the pixels 150 can have different orientations, which reduces or eliminates effects of directions of incident light.

In one embodiment, the subpixels 151 and 152 and the photodiode 120 in each pixel 150 of the image sensor 100 has color matching functions substantially the same as the color matching functions of the CIE 1931 2° Standard Observer or the CIE 1964 10° Standard Observer.

FIG. 2A shows a schematic partial cross-sectional view of an image sensor 200, according to an embodiment. The image sensor 200 comprises a substrate 210, one or more pixels 250. The substrate 210 preferably does not comprise any photodiode therein. At least one pixel 250 comprises a clad 240 and a plurality of subpixels embedded in the clad 240. Three subpixels 251, 252 and 253 are shown in FIG. 2A as an example. Each of the subpixels comprises a nanowire (e.g. a nanowire 251a in the subpixel 251, a nanowire 252a in the subpixel 252 and a nanowire 253a in the subpixel 253) extending essentially perpendicularly from the substrate 210. Space between the pixels 250 is preferably filled with a material 260.

The substrate 210 can comprise any suitable material such as silicon, silicon oxide, silicon nitride, sapphire, diamond, silicon carbide, gallium nitride, germanium, indium gallium arsenide, lead sulfide and/or a combination thereof.

The clad 240 can comprise any suitable material, such as silicon nitride, silicon oxide, etc. The clad 240 is preferably substantially transparent to visible light, preferably with a transmittance of at least 50%, more preferably at least 70%, most preferably at least 90%. In one example, the clad 240 is silicon nitride and has a cylindrical shape with a diameter of about 300 nm.

The material 260 can comprise any suitable material such as silicon dioxide. A refractive index of the material 260 is preferably smaller than a refractive index of the clad 240.

The nanowires (e.g. 251a, 252a and 253a) in the subpixels (e.g. 251, 252 and 253) have refractive indexes equal to or greater than the refractive index of the clad 240. The nanowires and the substrate 210 have different absorption spectra. For example, the nanowire 251a has strong absorptance in blue wavelengths, as shown by an exemplary absorption spectrum 281 in FIG. 2C; the nanowire 252a has a strong absorptance in green wavelengths, as shown by an exemplary absorption spectrum 282 in FIG. 2C; the nanowire 253a has a strong absorptance across the entire visible spectrum, as shown by an exemplary absorption spectrum 283 in FIG. 2C; the substrate 210 has a strong absorptance in red wavelengths, as shown by an exemplary absorption spectrum 280 in FIG. 2C. The nanowires can have different diameters and/or different materials. Each nanowire in one pixel 250 preferably has a distance of at least 100 nm, preferable at least 200 nm, to a nearest neighboring nanowire in the same pixel. The nanowires in the clad 240 can be positioned at any suitable positions in the clad 240. The nanowires can have a surface passivation layer. The nanowires can comprise other suitable materials such as mercury cadmium telluride. The nanowires can have other suitable radii from 10 nm to 250 nm.

The nanowires (e.g. 251a, 252a and 253a) in the subpixels (e.g. 251, 252 and 253) are operable to generate electrical signals upon receiving light. One exemplary nanowire is a photodiode with a p-n or p-i-n junction therein, details of which can be found in U.S. patent application Ser. Nos. 12/575,221 and 12/633,305, each of which is hereby incorporated by reference in its entirety. The electrical signals can comprise an electrical voltage, an electrical current, an electrical conductance or resistance, and/or a change thereof.

Substantially all visible light impinged on the image sensor 200 is absorbed by the subpixels (e.g. 251, 252 and 253). The subpixels absorb light with different wavelengths.

The image sensor 200 can further comprise electronic circuitry 290 operable to detect electrical signals from the subpixels.

In one specific example, each pixel 250 has three subpixels 251, 252 and 253. Each subpixel 251, 252 and 253 has only one nanowire 251a, 252a and 253a, respectively. The nanowire 251a comprises silicon, has a radius of about 25 nm, and has a strong absorptance in blue wavelengths. The nanowire 252a comprises silicon, has a radius of about 40 nm and has a strong absorptance in green wavelengths. The nanowire 253a comprises silicon, has a radius of about 45 nm and has a strong absorptance across the entire visible spectrum. The nanowires 251a, 252a and 253a are about 200 nm apart but embedded in the same clad 240. The clad 140 is cylindrical in shape with a diameter of about 400 nm. Each of the pixels 250 can have more than three subpixels according to an embodiment.

In another specific example, each pixel 250 has four subpixels 251, 252, 253 and 254. Each subpixel 251, 252, 253 and 254 has only one nanowire 251a, 252a, 253a and 254a respectively. The nanowire 251a comprises silicon, has a radius of about 25 nm, and has a strong absorptance in blue wavelengths. The nanowire 252a comprises silicon, has a radius of about 40 nm and has a strong absorptance in green wavelengths. The nanowire 253a comprises silicon, has a radius of about 45 nm and has a strong absorptance across the entire visible spectrum. The nanowire 254a comprises silicon, has a radius of about 35 nm and has a strong absorptance in blue green wavelength (e.g. 400 to 550 nm). The nanowires 251a, 252a, 253a and 254a are about 200 nm apart but embedded in the same clad 240. The clad 140 is cylindrical in shape with a diameter of about 400 nm. FIG. 2D shows exemplary absorption spectra 291, 292, 293 and 294 of the nanowires 251a, 252a, 253a and 254a, respectively.

FIG. 2B shows a schematic partial top view of the image sensor 200. As shown in exemplary FIG. 2B, the pixels 250 can have different orientations, which reduces or eliminates effects of directions of incident light.

According to an embodiment, the image sensor 100 or 200 can further comprise couplers 350 above each pixel 150 or 250, as shown in FIG. 3. Each of the couplers 350 preferably has substantially the same footprint as the pixel underneath and has a convex surface. The coupler 350 is effective to focus substantially all visible light impinged thereon into the clad 140 or 240.

According to an embodiment, as shown in FIG. 3, the image sensor 100 or 200 can further comprise an infrared filter 360, which is operable to prevent infrared light, such as light with wavelengths above 650 nm, from reaching the pixels. According to an embodiment, the image sensor 100 or 200 does not comprise an infrared filter.

According an embodiment, the nanowires can be made by a dry etching process or a Vapor Liquid Solid (VLS) growth method. Of course, it will be appreciated that other materials and/or fabrication techniques may also be used for fabricating the nanowires in keeping with the scope of the invention. For instance, nanowires fabricated from an indium arsenide (InAs) wafer or related materials could be used for IR applications.

The nanowires can also be made to have a strong absorption in wavelengths not in the visible spectrum, such as in the ultraviolet (UV) or infrared (IR) spectra. In an embodiment, each nanowire can have transistor (e.g., transistor 151ab in FIG. 1A) therein or thereon.

In one embodiment, the subpixels 251, 252 and 253 in each pixel 250 of the image sensor 200 has color matching functions substantially the same as the color matching functions of the CIE 1931 2° Standard Observer or the CIE 1964 10° Standard Observer.

FIG. 4 shows exemplary color-matching functions 451, 452 and 453 of the subpixels 251, 252 and 253, respectively. The color-matching functions 461, 462 and 463 are the x(λ), y(λ), and z(λ) of the CIE standard observer.

The image sensor 100 or 200 can be used to sense and capture images. A method of sensing an image comprises projecting the image onto the image sensor 100 or 200 using any suitable optics such as lenses and/or mirrors; detecting an electrical signal from the nanowire in each subpixel in each pixel using suitable circuitry; calculating a color of each pixel from the electrical signals of the subpixels therein.

The foregoing detailed description has set forth various embodiments of the devices and/or processes by the use of diagrams, flowcharts, and/or examples. Insofar as such diagrams, flowcharts, and/or examples contain one or more functions and/or operations, it will be understood by those within the art that each function and/or operation within such diagrams, flowcharts, or examples can be implemented, individually and/or collectively, by a wide range of hardware, software, firmware, or virtually any combination thereof.

Those skilled in the art will recognize that it is common within the art to describe devices and/or processes in the fashion set forth herein, and thereafter use engineering practices to integrate such described devices and/or processes into data processing systems. That is, at least a portion of the devices and/or processes described herein can be integrated into a data processing system via a reasonable amount of experimentation.

The subject matter described herein sometimes illustrates different components contained within, or connected with, other components. It is to be understood that such depicted architectures are merely exemplary, and that in fact many other architectures can be implemented which achieve the same functionality. In a conceptual sense, any arrangement of components to achieve the same functionality is effectively “associated” such that the desired functionality is achieved. Hence, any two components herein combined to achieve a particular functionality can be seen as “associated with” each other such that the desired functionality is achieved, irrespective of architectures or intermediate components.

With respect to the use of substantially any plural and/or singular terms herein, those having skill in the art can translate from the plural to the singular and/or from the singular to the plural as is appropriate to the context and/or application. The various singular/plural permutations may be expressly set forth herein for sake of clarity.

All references, including but not limited to patents, patent applications, and non-patent literature are hereby incorporated by reference herein in their entirety.

While various aspects and embodiments have been disclosed herein, other aspects and embodiments will be apparent to those skilled in the art. The various aspects and embodiments disclosed herein are for purposes of illustration and are not intended to be limiting, with the true scope and spirit being indicated by the following claims.

Claims

1. An image sensor comprising a substrate and one or more of pixels thereon, wherein each of the pixels comprises a first subpixel and a second subpixel; the first subpixel comprises a first nanowire operable to generate an electrical signal upon exposure to light of a first wavelength; the second subpixel comprises a second nanowire operable to generate an electrical signal upon exposure to light of a second wavelength different from the first wavelength; the first and second nanowires extend essentially perpendicularly from the substrate, wherein the first nanowire and/or the second nanowire has a transistor therein or thereon.

2. The image sensor of claim 1, wherein each pixel of the image sensor further comprises one or more photodiodes located between the substrate and the first and second nanowires.

3. The image sensor of claim 1, wherein the substrate comprises silicon, silicon oxide, silicon nitride, sapphire, diamond, silicon carbide, gallium nitride, germanium, indium gallium arsenide, lead sulfide and/or a combination thereof.

4. The image sensor of claim 1, wherein at least one pixel comprises a clad; the first subpixel and the second subpixel of the at least one pixel are embedded in the clad.

5. The image sensor of claim 4, further comprising a material in space between the pixels.

6. The image sensor of claim 4, wherein the clad comprises silicon nitride, silicon oxide, and/or a combination thereof.

7. The image sensor of claim 4, wherein the clad is substantially transparent to visible light.

8. The image sensor of claim 4, wherein the first and second nanowires have refractive indexes equal to or greater than a refractive index of the clad.

9. The image sensor of claim 5, wherein the material has a refractive index smaller than a refractive index of the clad.

10. The image sensor of claim 1, wherein the first nanowire and the second nanowire have different absorption spectra.

11. The image sensor of claim 1, wherein the first nanowire and the second nanowire have a distance of at least 100 nm.

12. The image sensor of claim 1, wherein each of the first and second nanowires has a p-n or p-i-n junction therein.

13. The image sensor of the claim 1, wherein the electrical signal comprise an electrical voltage, an electrical current, an electrical conductance or resistance, and/or a change thereof.

14. The image sensor of claim 1, wherein the first nanowire and/or the second nanowire has a surface passivation layer.

15. The image sensor of claim 1, being operable to absorb at least 50% of all visible light impinged thereon.

16. The image sensor of claim 1, further comprising electronic circuitry operable to detect electrical signals generated by the first and second nanowires.

17. The image sensor of claim 1, wherein the first and second nanowires comprise silicon.

18. The image sensor of claim 1, wherein the first nanowire has a radius of about 25 nm and the second nanowire has a radius of about 40 nm.

19. The image sensor of claim 4, wherein the clad has a cylindrical shape with a diameter of about 300 nm.

20. The image sensor of claim 1, wherein the pixels have different orientations.

21. The image sensor of claim 2, wherein the photodiodes have absorption spectra different from absorption spectra of the first and second nanowires.

22. The image sensor of claim 1, wherein each of the pixels further comprises a third subpixel and the third subpixel comprises a third nanowire operable to generate an electrical signal upon exposure to light of a third wavelength different from the first and second wavelengths, wherein the third nanowire extends essentially perpendicularly from the substrate.

23. The image sensor of claim 22, wherein the third nanowire comprises silicon.

24. The image sensor of claim 22, wherein the third nanowire has a radius of about 45 nm.

25. The image sensor of claim 22, wherein each of the pixels further comprises a fourth subpixel and the fourth subpixel comprises a fourth nanowire operable to generate an electrical signal upon exposure to light of a fourth wavelength different from the first, second and third wavelengths, wherein the fourth nanowire extends essentially perpendicularly from the substrate.

26. The image sensor of claim 25, wherein the fourth nanowire comprises silicon.

27. The image sensor of claim 25, wherein the fourth nanowire has a radius of about 40 nm.

28. The image sensor of claim 4, further comprising couplers above each of the pixels, each of the couplers having a convex surface and being effective to focus substantially all visible light impinged thereon into the clad.

29. The image sensor of claim 28, wherein each of the couplers has substantially the same footprint as the pixel underneath.

30. The image sensor of claim 1, further comprising an infrared filter operable to prevent infrared light from reaching the pixels.

31. The image sensor of claim 1, wherein the image sensor does not comprise an infrared filter.

32. The image sensor of claim 2, further comprising electronic circuitry operable to detect electrical signals from the photodiodes.

33. A method of manufacturing an image sensor, comprising dry etching or VLS growth, wherein the image sensor comprises a substrate and one or more of pixels thereon, wherein each of the pixels comprises at a first subpixel and a second subpixel, the first subpixel comprises a first nanowire operable to generate an electrical signal upon exposure to light of a first wavelength, the second subpixel comprises a second nanowire operable to generate an electrical signal upon exposure to light of a second wavelength different from the first wavelength, wherein the first and second nanowires extend essentially perpendicularly from the substrate, wherein the first nanowire and/or the second nanowire has a transistor therein or thereon.

34. A method of sensing an image comprises: projecting the image onto an image sensor, wherein the image sensor comprises a substrate and one or more of pixels thereon, wherein each of the pixels comprises at a first subpixel and a second subpixel, the first subpixel comprises a first nanowire operable to generate an electrical signal upon exposure to light of a first wavelength, the second subpixel comprises a second nanowire operable to generate an electrical signal upon exposure to light of a second wavelength different from the first wavelength, wherein the first and second nanowires extend essentially perpendicularly from the substrate, wherein the first nanowire and/or the second nanowire has a transistor therein or hereon;detecting the electrical signals from the first nanowire and the second nanowire; andcalculating a color of each pixel from the electrical signals.

35. The image sensor of claim 1, wherein the first nanowire and the second nanowire are embedded in a same clad.

36. The image sensor of claim 1, wherein at least one pixel comprises a clad; wherein the clad covers substantially an entire sidewall of the first nanowire.

37. The image sensor of claim 22, color-matching functions of the first, second and third subpixels are substantially the same as the color matching functions of the CIE 1931 2° Standard Observer or the CIE 196410° Standard Observer.

38. The image sensor of claim 1, wherein different pixels of the one or more of pixels comprise spatially separated clads.