Claims
- 1. A fluid storage and dispensing system, comprising:
a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid, wherein the vessel includes a fluid flow port; a fluid dispensing assembly coupled in fluid flow communication with the port; a fluid pressure regulator in fluid flow communication with the port, and arranged to maintain a predetermined pressure of gas discharged from the vessel, deriving from fluid in the interior volume of the vessel; the fluid dispensing assembly comprising a flow control element which is selectively actuatable to flow gas, deriving from the fluid in the interior volume of the vessel, through the fluid pressure regulator, for discharge of the gas from the vessel.
- 2. A fluid storage and dispensing system, comprising:
a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid, wherein the vessel includes a fluid flow port; a fluid dispensing assembly coupled in fluid flow communication with the port; a fluid pressure regulator in fluid flow communication with the port, and arranged to maintain a predetermined pressure of gas discharged from the vessel, deriving from fluid in the interior volume of the vessel; the fluid dispensing assembly comprising a flow control element which is selectively actuatable to flow gas, deriving from the fluid in the interior volume of the vessel, through the fluid pressure regulator, for discharge of the gas from the vessel; so that gas during said discharge flows through the fluid pressure regulator prior to flow through the flow control element.
- 3. A fluid storage and dispensing system, comprising:
a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid, wherein the vessel includes a fluid flow port; a fluid dispensing assembly coupled in fluid flow communication with the port; a fluid pressure regulator in fluid flow communication with the port; a controller for selectively actuating the dispensing assembly to effect flow of gas deriving from the fluid in the vessel, through the fluid pressure regulator and the dispensing assembly, for discharge of the gas from the system.
- 4. A semiconductor manufacturing system comprising a semiconductor manufacturing apparatus utilizing a gas, and a source of said gas, wherein said source comprises a fluid storage and dispensing system according to claim 1.
- 5. A method of manufacturing a semiconductor product, comprising:
containing a fluid in a confined state in a fluid storage and dispensing system according to claim 1; selectively dispensing the confined fluid by actuating the flow control element in said system to discharge the fluid from the vessel at a rate determined by the fluid pressure regulator; and using the discharged fluid in the manufacture of the semiconductor product.
- 6. A fluid storage and dispensing system according to claim 1, wherein the fluid pressure regulator is arranged for discharge of the gas from the vessel at a subatmospheric pressure.
- 7. A fluid storage and dispensing system according to claim 1, further comprising a fluid contained in the vessel interior volume, wherein said fluid comprises a toxic, corrosive, and/or pyrophoric gas.
- 8. A gas control device for use with a container of compressed gas, comprising:
a gas flow path, said path having a high pressure gas delivery inlet and a low pressure gas delivery outlet, said inlet adapted to be in fluid communication with said container; a pressure regulator for providing gas at said low pressure gas delivery outlet at a selected pressure substantially lower than that in said container; and, a shut-off valve in said gas flow path.
- 9. A gas control device for use with a container of compressed gas, comprising:
a gas flow path, said path having a high pressure gas delivery inlet and a low pressure gas delivery outlet, said inlet adapted to be in fluid communication with said container; a pressure regulator for providing gas at said low pressure gas delivery outlet at a selected pressure substantially lower than that in said container; and, a shut-off valve in said gas flow path downstream of said pressure regulator and upstream of said low pressure gas delivery outlet.
- 10. A gas control device for use with a container of compressed gas, comprising:
a gas flow path, said path having a high pressure gas delivery inlet and a low pressure gas delivery outlet, said inlet adapted to be in fluid communication with said container; a pressure regulator for providing gas at said low pressure gas delivery outlet at a selected pressure substantially lower than that in said container; a shut-off valve in said gas flow path; and a controller for selectively actuating said shut-off valve to discharge gas from said container.
- 11. An integrated circuit manufacturing system comprising an integrated circuit manufacturing apparatus utilizing a gas, and a source of said gas, wherein said source comprises a gas control device according to claim 8 attached to a container of compressed gas.
- 12. A method of manufacturing an integrated circuit product, comprising:
containing a compressed gas in a compressed gas container having mounted thereon a gas control device according to claim 8; selectively discharging the compressed gas by actuating the shut-off valve in said device; and using the discharged gas in the manufacture of the integrated circuit product.
- 13. A gas control device according to claim 8, wherein said pressure regulator provides gas at said low pressure gas delivery outlet at a subatmospheric pressure.
- 14. A gas control system comprising:
a container for containing compressed gas having mounted thereon a gas control device according to claim 8; and a compressed gas contained in said container, wherein said compressed gas comprises a toxic, corrosive, and/or pyrophoric gas.
Priority Claims (1)
Number |
Date |
Country |
Kind |
9724168.1 |
Nov 1997 |
GB |
|
Parent Case Info
[0001] This application is a continuation of U.S. patent application Ser. No. 09/189,562 filed Nov. 11, 1998 entitled “Gas Control Device and Method of Supplying Gas”. The '562 application claims foreign priority benefits under 35 U.S.C. § 119(a)-(d) of Great Britain application GB 9724168.1 filed Nov. 14, 1997 entitled “Gas Control Device and Method of Supplying Gas”. The '562 application is incorporated herein by reference in its entirety.
Continuations (1)
|
Number |
Date |
Country |
Parent |
09189562 |
Nov 1998 |
US |
Child |
09907020 |
Jul 2001 |
US |