Gas diffusion plate for electrode of semiconductor wafer processing apparatus

Information

  • Patent Grant
  • D411516
  • Patent Number
    D411,516
  • Date Filed
    Tuesday, September 10, 1996
    28 years ago
  • Date Issued
    Tuesday, June 29, 1999
    25 years ago
Abstract
Description
Claims
  • We claim the ornamental design for gas diffusion plate for electrode of semiconductor wafer processing apparatus, as shown and described.
Priority Claims (1)
Number Date Country Kind
8-7276 Mar 1996 JPX
US Referenced Citations (1)
Number Name Date Kind
D363464 Fukasawa Oct 1995
Foreign Referenced Citations (2)
Number Date Country
952210 Apr 1996 JPX
952210 May 1996 JPX