This application claims priority to Indian patent application no. 6222/CHE/2014 filed on Dec. 9, 2014, the complete disclosure of which, in its entirely, is herein incorporated by reference.
1. Technical Field
The embodiments herein generally relate to integrated circuit and, more particularly, a gate array for high-speed CMOS and high-speed CMOS TTL family. Usually each member of 5 volt digital CMOS families requires many unique layers. The present invention manages to get a large number of such chips keeping all base layers common and getting final functionality by changing only one layer of metal. The resulting chip is extremely small. Manufacturing efficiency due to modularity and lower Silicon costs due to small size are realized. The flexibility of the type of base layer allows manufacture of other silicon systems as well.
2. Description of the Related Art
In semiconductor substrate processing, integrated circuit (IC's) are formed on a substrate (also referred to as a wafer), typically composed of silicon or other semiconductor material. In general, thin film layers of various materials which are either semiconducting, conducting, or insulating are utilized to form the ICs. In prior art, each integrated circuit in HC and HCT series had separate set of base layers and separate masks which increases the cost of production and processing time. It also reduced yield. By using more levels and particularly many higher level metals, there is an increase in the production cost. Accordingly, there remains a need an efficient and cost reduction approach for making full chip with an integrated circuit.
In view of the foregoing, an embodiment herein provides a system for implementing an integrated circuit(IC). The system includes one or more base layers. The one or more base layers are processed to implement high-speed CMOS (HC and HCT) families on wafer of silicon semiconductor material. The one or more base layers include one or more transistors and one or more flip-flops. The one or more transistors are used to implement the high-speed CMOS (HC and HCT) families on that wafer with the base layer. Different designs of the high-speed CMOS (HC and HCT) families are obtained by changing only one metal pattern. The metal pattern is processed on the completed wafer by using the metal mask. The base layers have a provision of making one or more flip-flops by using Static Random Accessed Memory (SRAM) cells which are adapted to implement sequential circuits such as (i) a shift register (ii) a counter. The one or more flip-flops use small amount of metal leaving more metal resource for other connections. On the base station, full small systems are made.
In one embodiment, less scarce metal is used for connections on the design of the base layers. In another embodiment, one or more transistors and one or more SRAM based flip-flops, on the wafer of silicon semiconductor material is adapted to implement a decade counter. The decade counter is further interfaced with a seven segment display to provide count value. In another embodiment, the base layer includes a die to communicate to the outside word. The die transistors are arranged to implement (i) an output buffer when the die is an output pin, (ii) an input buffer when the die is an input pin, and (iii) and Input/output (I/O) buffer if the die is the output pin, and the input pin. In another embodiment, the full small systems are formed by using a wafer bank and the base layer and the metal pattern is changed to form many systems.
In one aspect, a method of implementing an integrated circuit(IC) includes the following steps: (i) processing a wafer of silicon semiconductor material with the base layers and storing the wafers after a metal deposit, (ii) the integrated circuit is implemented using one or more transistors, producing high speed CMOS (HC and HCT) families on the processed wafer by changing the metal layer by etching the deposited metal with the metal layer mask, and (iii) by changing only one metal mask, it is possible to implement one or more integrated circuit(IC) on the base layer.
In one embodiment, the base layer includes a die. The die is adapted to implement (i) an output buffer when the die is an output pin, (ii) an input buffer when the die is an input pin, and (iii) an Input/output (I/O) buffer if the die is the output pin, and the input pin.
These and other aspects of the embodiments herein will be better appreciated and understood when considered in conjunction with the following description and the accompanying drawings. It should be understood, however, that the following descriptions, while indicating preferred embodiments and numerous specific details thereof, are given by way of illustration and not of limitation. Many changes and modifications may be made within the scope of the embodiments herein without departing from the spirit thereof, and the embodiments herein include all such modifications.
The embodiments herein will be better understood from the following detailed description with reference to the drawings, in which:
The embodiments herein and the various features and advantageous details thereof are explained more fully with reference to the non-limiting embodiments that are illustrated in the accompanying drawings and detailed in the following description. Descriptions of well-known components and processing techniques are omitted so as to not unnecessarily obscure the embodiments herein. The examples used herein are intended merely to facilitate an understanding of ways in which the embodiments herein may be practiced and to further enable those of skill in the art to practice the embodiments herein. Accordingly, the examples should not be construed as limiting the scope of the embodiments herein.
As mentioned, there remains a need for an efficient and cost reduction approach for making full chip with an integrated circuit. By using one or more single base layers integrated circuit can be made for a high-speed CMOS (HC) and high-speed CMOS TTL (transistor- transistor logic) compatible (HCT) families. A base layers may be fixed and just one or more metal patterns may be changed for respective integrated circuit (IC). A wafer bank includes large number of transistors to implement one or more circuits by changing the metal pattern required and can make the required circuit. Referring now to the drawings, and more particularly to
In one embodiment, a set of one or more base layers 102 is used to make small systems. For example, using one or more transistors and one or more flip-flops present in a wafer bank a decade counter can be implemented and the decade counters can be interfaced with a seven segment display which displays one or more counts. The one or more transistors and the one or more flip-flops may be made in a single chip if one or more transistors are sufficient. The one or more transistors are arranged to implement (i) an output buffer when a die is an output pin, (ii) an input buffer when said die is an input pin, and (iii) an Input/output (I/O) buffer if said die is the output pin, and the input pin. In one embodiment, many systems can be formed using the wafer bank by just changing metal pattern. In one embodiment, an SRAM (Static Random Accessed Memory) based Flip-Flops placed in each die which is used to make counter or shift register.
This solution provides a better and flexible approach to make a full chip since for each die there may be many output buffers which are used as output if the output die is an output of a circuit. A full chip is that for every chip can have a different base layer or have to start each chip with a scratch but by this wafer bank which can fit all the ICs in the same base layer by just changing the metal masks. As the base layer is same and only the metal patters get changed respectively. Only different is metal masks need to be done for each IC. There is no higher level metals are used. This approach results in cost reduction. As SRAM based flip-flops are used there is a major area reduction. By using this SRAM based flip-flop which provide an option for huge area reduction in the counter and shift register IC's.
The foregoing description of the specific embodiments will so fully reveal the general nature of the embodiments herein that others can, by applying current knowledge, readily modify and/or adapt for various applications such specific embodiments without departing from the generic concept, and, therefore, such adaptations and modifications should and are intended to be comprehended within the meaning and range of equivalents of the disclosed embodiments. It is to be understood that the phraseology or terminology employed herein is for the purpose of description and not of limitation. Therefore, while the embodiments herein have been described in terms of preferred embodiments, those skilled in the art will recognize that the embodiments herein can be practiced with modification within the spirit and scope of the appended claims.
Number | Date | Country | Kind |
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6222/CHE/2014 | Dec 2014 | IN | national |