Claims
- 1. A head structure for writing data on a magnetic media comprising:
- a first pole having an upper surface;
- a first electron cured insulator layer covering a portion of the upper surface;
- a plurality of conductive coils formed on the first electron cured insulator layer;
- a second electron cured insulator layer filling between and covering the plurality of coils; and
- a second pole covering the second electron cured insulator layer so as to define a write gap between the first pole and the second pole.
- 2. The head structure of claim 1 further comprising a giant magnetoresistive read head having a structure and stoichiometry consistent with processing below 150 C.
- 3. The head structure of claim 1 wherein the first and second electron cured insulators comprise photoresist.
- 4. A head structure for writing data on a magnetic media comprising:
- a first pole having an upper surface;
- a first insulator layer comprising an electron curable polymer covering a portion of the upper surface;
- a plurality of conductive coils formed on the first electron cured insulator layer;
- a second insulator layer comprising the electron curable polymer filling between and covering the plurality of coils; and
- a second pole covering the second insulator layer so as to define a write gap between the first pole and the second pole.
- 5. The head structure of claim 4 further comprising a giant magnetoresistive read had having a structure and stoichiometry consistent with processing below 150 C.
- 6. A head structure for accessing data on a magnetic media comprising:
- a plurality of conductive coils;
- an insulator layer comprising electron-cured photoresist surrounding the conductive coils.
- 7. The head structure of claim 6 further comprising a giant magnetoresistive read had formed integrally with the insulator layer having a structure and stoichiometry consistent with processing below 150 C.
Parent Case Info
The present application is a divisional application of U.S. patent application Ser. No. 08/812,592 filed Mar. 7, 1997, incorporated in its entirety herein by reference, with priority under 35 U.S.C. .sctn. 120 therefrom hereby claimed, now U.S. Pat. No. 5,843,537.
US Referenced Citations (8)
Non-Patent Literature Citations (1)
Entry |
Livesay, W.R. et al., Electron beam hardening of photoresist, SPIE vol. 1925 pp. 4126-436 (1993). |
Divisions (1)
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Number |
Date |
Country |
Parent |
812592 |
Mar 1997 |
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