Claims
- 1. An amorphous aluminoborosilicate glass frit which is crystallizable at thick film processing conditions to form a single phase of celsian in a matrix of remainder glass the amorphous glass consisting essentially by weight of 30% SiO.sub.2, 8% TiO.sub.2, ZrO.sub.2 or mixtures thereof, 10% Al.sub.2 O.sub.3, 10% BaO, 10% ZnO, 24% CaO and 8% B.sub.2 O.sub.3.
- 2. A printable thick film dielectric composition consisting essentially of (a) finely divided particles of an amorphous aluminoborosilicate glass which is crystallizable at Thick Film Processing Conditions to form a single phase of celsian in a matrix of remainder glass dispersed in (b) organic medium, the glass consisting essentially by weight of 30%, SiO.sub.2, 8% TiO.sub.2, ZrO.sub.2 or mixtures thereof, 10% Al.sub.2 O.sub.3, 10% BaO, 10% ZnO, 24% CaO and 8% B.sub.2 O.sub.3.
Parent Case Info
This application is a continuation of Ser. No. 885,827, filed July 15, 1986, now abandoned.
US Referenced Citations (8)
Foreign Referenced Citations (1)
Number |
Date |
Country |
233995 |
Mar 1986 |
DDX |
Continuations (1)
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Number |
Date |
Country |
Parent |
885827 |
Jul 1986 |
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