This disclosure relates to a glass plate processing method and a glass plate.
In Patent Documents 1 and 2, a glass plate is divided, by a separation line that divides the glass plate's main surface into two regions. To be more specific, first, a laser beam is emitted to a point, and, by moving this irradiation point along the separation line, a crack that extends from the separation line diagonally with respect to the main surface is formed in a cross-section that is orthogonal to the dividing line.
In Patent Document 1, the separation line intersects the peripheral edge of the main surface diagonally, and this intersection is the point where the irradiation point starts moving. By this means, a crack that extends from the separation line diagonally with respect to the main surface can be formed in a cross-section that is orthogonal to the separation line.
Meanwhile, in Patent Document 2, the irradiation point has a power density distribution that is asymmetric in the left-right direction. The left-right direction is a direction that runs parallel to the main surface, and that is orthogonal to the separation line. By this means, a crack that extends from the separation line diagonally with respect to the main surface can be formed in a cross-section that is orthogonal to the separation line.
According to Patent Documents 1 and 2, as described above, a crack that extends from the separation line diagonally with respect to the main surface can be formed in a cross-section that is orthogonal to the separation line, so that an inclined surface that is equivalent to a chamfered surface is obtained, which makes chamfering unnecessary.
Meanwhile, in Patent Documents 3 and 4, a laser beam is concentrated in a linear shape inside a glass plate, and forms a linear damaged portion. The linear damaged portion extends in a direction that is perpendicular to a main surface. By forming a crack that starts from the damaged portion, an end surface to extend vertically from the main surface can be obtained.
According to Patent Documents 1 and 2, as described above, a crack that extends from the separation line diagonally with respect to the main surface is formed in a cross-section that is orthogonal to the separation line. As a result of this, an inclined surface, which is equivalent to a chamfered surface, can be obtained without performing chamfering.
Now, in Patent Documents 1 and 2, after the crack is formed, stress is applied to the glass plate to create a new crack from the tip of that crack. When doing so, however, the new crack sometimes does not extend in a direction that is perpendicular to the main surface.
By contrast with this, according to Patent Documents 3 and 4, the linear damaged portion extends in a direction that is perpendicular to the main surface. Consequently, if a crack to start from the damaged portion is formed, an end surface to extend vertically from the main surface can be obtained. Nevertheless, since the main surface and the end surface are perpendicular to each other at the corners, chamfering needs to be done.
At least one aspect of the present disclosure provides an art, whereby it is possible to develop a crack in a cross-section that is orthogonal to a separation line on a main surface, in a direction that is perpendicular to the main surface, from the tip of a crack that extends from the separation line diagonally with respect to the main surface.
The glass plate processing method according to at least one aspect of the present disclosure is for dividing a glass plate by a separation line that divides a main surface of the glass plate into two regions. This processing method includes following (1) to (3): (1) moving an irradiation point of a first laser beam along the separation line, and forming a crack that extends from the separation line diagonally with respect to the main surface, in a cross-section that is orthogonal to the separation line; (2) after the crack is formed, moving an irradiation point of a second laser beam along the separation line, and forming a modified portion, in the cross-section, on a virtual line that extends in a direction perpendicular to the main surface, from a tip of the crack towards a center of a thickness of the glass plate; and (3) after the modified portion is formed, applying stress to the glass plate and forming a new crack that spans from the tip of the crack to the modified portion.
According to at least one aspect of the present disclosure, it is possible to develop a crack in a cross-section that is orthogonal to a separation line on a main surface, in a direction that is perpendicular to the main surface, from the tip of a crack that extends from the separation line diagonally with respect to the main surface.
Now, embodiments of the present disclosure will be described below with reference to the accompanying drawings. Note that, in each drawing, the same components or corresponding components may be assigned the same or corresponding reference signs, without further explanation. In this specification, when the symbol “-” is used to represent the range of a numerical value, this symbol covers the upper limit and lower limit of that numerical value.
As shown in
First, referring to S1 of
The shapes of the first main surface 11 and the second main surface 12 are, for example, rectangular. Note that the shapes of the first main surface 11 and the second main surface 12 may be trapezoidal, circular, elliptical, and so forth, and are not particularly limited.
The glass plate 10 is used for or as, for example, an automotive window glass, an instrument panel, a head-up display (HUD), a dashboard, a center console, a cover glass for automotive interior parts such as a shift knob, a building window glass, a display substrate, a cover glass for a display, and so forth. The thickness of the glass plate 10 is appropriately set according to the use of the glass plate 10, and is, for example, 0.01 cm to 2.5 cm.
The glass plate 10 may be laminated with another glass plate via an interlayer, after S1 to S4 in
The glass plate 10 is, for example, soda lime glass, non-alkali glass, chemically-strengthened glass, and so forth. Chemically-strengthened glass is used, for example, as cover glass, after being subjected to chemically-strengthening processing. The glass plate 10 may be thermally-strengthened glass as well.
The glass plate 10 may be subjected to bending forming, after S1 to S4 in
Next, referring to S2 in
When the first crack CR 1 is formed, a second crack CR 2 is also formed. The second crack is formed along a second separation line BL 2. The second separation line BL 2 divides a second main surface 12 into two regions. The second crack CR 2, in a cross-section that is orthogonal to the second separation line BL 2, extends from the second separation line BL 2 diagonally with respect to the second main surface 12.
The first laser beam LB 1 penetrates the glass plate 10 from the irradiation point on the first main surface 11 to the irradiation point on the second main surface 12. The first crack CR 1 and the second crack CR 2 are formed at the same time by the thermal stress of the glass. As for their forming method, for example, the method described in Patent Document 1 or Patent Document 2 is used.
Note that, in this embodiment, both the first crack CR 1 and the second crack CR 2 are created at the same time by irradiation of the first laser beam LB 1, but it is equally possible to create only one of them. In that case, the first crack CR 1 and the second crack CR 2 may be produced in order. However, it is equally possible to create only one of the first crack CR 1 and the second crack CR 2, and not create the other.
The irradiation of the first laser beam LB 1 upon the glass plate 10 primarily causes linear absorption. To say that linear absorption is primarily caused means that the amount of heat produced by linear absorption is greater than the amount of heat produced by non-linear absorption. Non-linear absorption need not appreciably occur. The heat produced by the first laser beam LB 1 forms the first crack CR 1 and the second crack CR 2.
Non-linear absorption is also referred to as “multiphoton absorption.” The likelihood that multiphoton absorption occurs is non-linear with respect to the photon density (the power density of the first laser beam LB 1), and the higher the photon density, the significantly higher is that likelihood. For example, the likelihood that two-photon absorption will occur is proportional to the square of the photon density. At any position on the glass plate 10, the photon density may be less than 1×108 W/cm2. In this case, little non-linear absorption occurs.
Meanwhile, linear absorption is also referred to as “one-photon absorption.” The likelihood that one-photon absorption occurs is proportional to the photon density. In the case of one-photon absorption, the following equation 1 holds in accordance with Lambert-Beer's law:
I=I
0×exp(−α×L) (Equation 1)
In above equation 1, I0 is the intensity of the first laser beam LB 1 on the first main surface 11, I is the intensity of the first laser beam LB 1 on the second main surface 12, L is the propagation distance of the first laser beam LB 1 from the first main surface 11 to the second main surface 12, α is the glass's absorption coefficient for the first laser beam LB 1. α is the absorption coefficient of linear absorption, and is determined by the wavelength of the first laser beam LB 1, the chemical composition of the glass, and so forth.
α×L represents the internal transmittance. The internal transmittance is the transmittance on assumption that the first laser beam LB 1 is not reflected by the first main surface 11. The smaller α×L, the larger the internal transmittance. α×L is, for example, 3.0 or less, more preferably 2.3 or less, even more preferably 1.6 or less. In other words, the internal transmittance is, for example, 5% or higher, preferably 10% or higher, and more preferably 20% or higher. When α×L is 3.0 or less, the internal transmittance is 5% or higher, so that the first main surface 11 and the second main surface 12 are both sufficiently heated.
From the perspective of the efficiency of heating, α×L is preferably 0.002 or greater, more preferably 0.01 or greater, and even more preferably 0.02 or greater. In other words, the internal transmittance is preferably 99.8% or lower, more preferably 99% or lower, even more preferably 98% or lower.
If the temperature of the glass exceeds the annealing point, the glass becomes more prone to plastic deformation, which might limit the generation of thermal stress. Therefore, the beam wavelength, the output, the beam diameter, and so forth on the first main surface 11 are adjusted so that the temperature of the glass stays below the annealing point.
The first laser beam LB 1 is, for example, a continuous wave beam. The light source of the first laser beam LB 1 is not particularly limited, and, for example, a Yb fiber laser may be used. The Yb fiber laser is a Yb-doped optical fiber core, and outputs a continuous wave beam having a wavelength of 1070 nm.
However, the first laser beam LB 1 may be a pulse beam instead of a continuous wave beam.
The first laser beam LB 1 is emitted to the first main surface 11 by an optical system including a condenser lens or the like. By moving that irradiation point along the first separation line BL 1, the first crack CR 1 is formed across the entirety of the first separation line BL 1. In doing this, the second crack CR 2 is also formed across the entirety of the second separation line BL 2.
The irradiation point is moved by using, for example, a 2D galvano scanner or a 3D galvano scanner. Note that the irradiation point may be moved by moving or rotating the stage holding the glass plate 10. For the stage, for example, an XY stage, an XYθ stage, an XYZ stage, or an XYZθ stage is used. The X axis, the Y axis and the Z axis are orthogonal to each other, the X axis and the Y axis are parallel to the first main surface 11, and the Z axis is perpendicular to the first main surface 11.
Next, in S3 of
The second laser beam LB 2 is a pulse beam, and forms the modified portions D by non-linear absorption. For the pulse beam, it is preferable to use a pulse laser beam having a wavelength range of 250 nm to 3000 nm and a pulse width of 10 fs to 1000 ns. A laser beam having a wavelength range of 250 nm to 3000 nm penetrates the glass plate 10 to some extent, so that the modified portions D can be formed by causing non-linear absorption inside the glass plate 10. The wavelength range is preferably 260 nm to 2500 nm. Also, if the pulse laser beam has a pulse width of 1000 ns or less, the photon density can be increased with ease, so that the modified portions D can be formed by causing non-linear absorption inside the glass plate 10. The pulse width is preferably 100 fs to 100 ns. Note that the second laser beam LB 2 may also be a pulse beam that forms multiple beam focal points at the same time in the optical axis direction by means of a multifocal optical system.
In the modified portion D, the density or refractive index of the glass is changed. A modified portion D is a void, a modified layer, or the like. A modified layer is a layer where the density or the refractive index is changed by a structural change, or by melting and resolidification.
The second laser beam LB 2 is concentrated in a linear shape inside the glass plate 10, for example, and forms the modified portions D in a linear shape. The light source of the second laser beam LB 2 may output a set of pulses, referred to as a “burst.” One set of pulses includes multiple pulse beams (for example, 3 to 50 pulse beams), and each pulse beam has a pulse width of less than 10 nanoseconds. In one pulse set, the energy of pulse beams may decline gradually.
The pulse beam may be concentrated in a linear shape by self-focusing induced by non-linear Kerr effect. Note that the pulse beam may be concentrated in a linear shape in the optical axis direction by using an optical system. To name a specific example of the optical system, for example, an Axikon lens may be used.
The pulse beam creates the modified portions D. The modified portions D are formed across the entirety of the plate's thickness direction, from the first main surface 11 to the second main surface 12. Note that, although this will be described later again, the modified portions D may be formed only in part in the plate's thickness direction, and may be formed, for example, only on the first main surface 11 side with respect to the center of the plate's thickness.
The light source of the second laser beam LB 2 may include, for example, a Nd-doped YAG crystal (Nd:YAG), and output a pulse beam having a wavelength of 1064 nm. Note that the wavelength of the pulse beam is by no means limited to 1064 nm. Nd; YAG second harmonic laser (wavelength 532 nm), Nd; YAG third harmonic laser (wavelength 355 nm); and so forth may be used as well.
The second laser beam LB 2 is emitted upon the first main surface 11 by an optical system including a condenser lens and the like. By moving that irradiation point along the first separation line BL 1, the modified portions D are formed across the entirety of the first separation line BL 1. When doing so, the modified portions D are formed along the entirety of the second separation line BL 2.
The irradiation point is moved by using, for example, a 2D galvano scanner or a 3D galvano scanner. Note that the irradiation point may be moved by moving or rotating the stage holding the glass plate 10. For the stage, for example, an XY stage, an XYθ stage, an XYZ stage, or an XYZθ stage may be used.
Next, in S4 of
To create the third crack CR 3, for example, the irradiation point of the first laser beam LB 1 is moved again along the first separation line BL 1, and thermal stress is applied to the glass plate 10. Note that a roller may be pressed against the glass plate 10 and moved along the first separation line BL 1, and apply stress to the glass plate 10.
According to the first example, the modified portions D are formed on the virtual line VL before the third crack CR 3 is formed. Unlike the extension of the first crack CR 1 and the extension of the second crack CR 2, the virtual line VL extends perpendicularly with respect to the first main surface 11 and the second main surface 12. The modified portions D guide the third crack CR 3 to the virtual line VL. Therefore, it is possible to create the third crack CR 3, from the tips of the first crack CR 1 and the second crack CR 2, in a direction that is perpendicular to the first main surface 11 and the second main surface 12.
After S4 in
The first inclined surface 13 may be equivalent to and referred to as a “chamfered surface.” The first inclined surface 13 intersects the first main surface 11 at an obtuse angle, in a cross-section that is orthogonal to the peripheral edge of the first main surface 11. The internal angle between the first inclined surface 13 and the first main surface 11 is the obtuse angle. The outer angle θ1 between the first inclined surface 13 and the first main surface 11 is, for example, 20 degrees to 80 degrees, preferably 30 degrees to 60 degrees.
Meanwhile, the second inclined surface 14 intersects the second main surface 12 at an obtuse angle, in a cross-section that is orthogonal to the peripheral edge of the second main surface 12. The internal angle between the second inclined surface 14 and the second main surface 12 is the obtuse angle. The outer angle θ2 between the second inclined surface 14 and the second main surface 12 is, for example, 20 degrees to 80 degrees, preferably 30 degrees to 60 degrees.
The first inclined surface 13 is created by the first crack CR 1. The first crack CR 1, following the movement of the irradiation point of the first laser beam LB 1, develops in the direction of that movement. Therefore, the first inclined surface 13 includes Wallner lines or Arrest lines. A “Wallner line” is a striped line that indicates the direction in which a crack develops. An “Arrest line” is a striped line that indicates a pause in a crack's development. Note that, similar to the first inclined surface 13, the second inclined surface 14 also includes Wallner lines or Arrest lines.
From the perspective of improving the breaking strength of the glass plate 10, the arithmetic average roughness Ra of the first inclined surface 13 is, for example, less than 0.1 μm, preferably 50 nm or less, and more preferably 10 nm or less. The arithmetic average roughness Ra of the first inclined surface 13 is, for example, 1 nm or greater, preferably 2 nm or greater. The arithmetic average roughness Ra is measured in accordance with Japanese Industrial Standards JIS B0601: 2013. The arithmetic average roughness Ra of the second inclined surface 14 is the same as the arithmetic average roughness Ra of the first inclined surface 13. The breaking strength of the glass plate 10 improves as long as the arithmetic average roughness Ra of the first inclined surface 13 of the glass plate 10 and/or the arithmetic average roughness Ra of the second inclined surface 14 are in the above range. In particular, it is preferable when using the glass plate 10 for a window glass for an automobile or a cover glass for automotive interior parts.
The end surface 15 extends from the respective tips of the first inclined surface 13 and the second inclined surface 14, in a direction perpendicular to the first main surface 11. Here, “a direction perpendicular to the first main surface 11” refers to any direction in which the angle formed with the normal to the first main surface 11 is 10 degrees or less.
The end surface 15 is created by the third crack CR 3, and matches with the virtual line VL. The virtual line VL is a straight line in the cross-section orthogonal to the peripheral edge of the first main surface 11, but may also be a rounded, curved line, as will be described later.
The end surface 15 includes the modified portions D formed on the virtual line VL, and therefore has a larger arithmetic average roughness Ra than the first inclined surface 13 and the second inclined surface 14. The arithmetic average roughness Ra of the end surface 15 is, for example, 0.1 μm or greater, preferably 0.2 μm or greater. When the arithmetic average roughness Ra of the end surface is 0.1 μm or greater, it is possible to reduce the slippage when holding the end surface 15. The arithmetic average roughness Ra of the end surface 15 is, for example, 5 μm or less, preferably 3 μm or less.
Next, second examples of S3 and S4 of
As shown in
The beam wavelength, the pulse width, and so forth are adjusted so that multiphoton absorption occurs only near the beam focal point.
The light source of the second laser beam LB 2 may include, for example, an Nd-doped YAG crystal (Nd:YAG), and output a pulse beam having a wavelength of 1064 nm. Note that the wavelength of the pulse beam is not limited to 1064 nm. Nd; YAG second harmonic laser (wavelength 532 nm), Nd; YAG third harmonic laser (wavelength 355 nm), and so forth can also be used.
The second laser beam LB 2 is focused in a dot-like shape by an optical system including a condenser lens and the like. A distribution of modified portions D is arranged by repeating moving the beam focal point two-dimensionally within a plane at a certain depth from the first main surface 11 and changing the depth of the beam focal point from the first main surface 11. The beam focal point is moved by using, for example, a 3D galvano scanner. If the depth of the beam focal point is changed by moving the stage, a 2D galvano scanner may be used.
The stage holds the glass plate 10. The beam focal point may be moved by moving or rotating the stage holding the glass plate 10. For the stage, for example, an XY stage, an XYG stage, an XYZ stage, or an XYZG stage is used. The X axis, the Y axis and the Z axis are orthogonal to each other, the X axis and the Y axis are parallel to the first main surface 11, and the Z axis is perpendicular to the first main surface 11.
The modified portions D are formed across the entirety of the plate's thickness direction, from the tip of the first crack CR 1 to the tip of the second crack CR 2. Note that, although this will be described later again, the modified portions D may be formed only in part in the plate's thickness direction, and may be formed, for example, only on the first main surface 11 side with respect to the center of the plate's thickness.
Next, as shown in
According to the second example, as in the first example, the modified portions D are formed on the virtual line VL before the third crack CR 3 is formed. The modified portions D guide the third crack CR 3 to the virtual line VL. This makes it possible to create the third crack CR 3, from the tips of the first crack CR 1 and the second crack CR 2, in a direction that is perpendicular to the first main surface 11 and the second main surface 12.
Next, third examples of S3 and S4 of
In S3 of
Next, as shown in
According to the third example, as in the first example, the modified portions D are formed on the virtual line VL before the third crack CR 3 is formed. The modified portions D guide the third crack CR 3 to the virtual line VL. This makes it possible to create the third crack CR 3, from the tips of the first crack CR 1 and the second crack CR 2, in a direction that is perpendicular to the first main surface 11 and the second main surface 12.
Now, as shown in
First, as shown in
Next, as shown in
After S4 in
The first end surface portion 151 includes the modified portions D. Consequently, the arithmetic average roughness Ra of the first end surface portion 151 is, for example, 0.1 μm or greater, preferably 0.2 μm or greater. The arithmetic average roughness Ra of the first end surface portion 151 is, for example, 5 μm or less, preferably 3 μm or less.
On the other hand, the second end surface portion 152 does not include the modified portions D. Consequently, the arithmetic average roughness Ra of the second end surface portion 152 is, for example, less than 0.1 μm, preferably 50 nm or less, and more preferably 10 nm or less. The arithmetic average roughness Ra of the second end surface portion 152 is, for example, 1 nm or greater, preferably 2 nm or greater.
Next, as shown in
The average particle size D50 of the abrasive grains of the grindstone 20 is, for example, 20 μm to 40 μm, preferably 10 μm to 20 μm. D50 is a particle size that corresponds with a cumulative number of 50% in the distribution of particle size. The distribution of particle size is measured with a laser diffraction-type particle size distribution meter.
After S5 in
The first inclined surface 13 is roughened with the grindstone 20. Consequently, the arithmetic average roughness Ra of the first inclined surface 13 is, for example, 0.1 μm or greater, preferably 0.2 μm or greater. The arithmetic average roughness Ra of the first inclined surface 13 is, for example, 5 μm or less, preferably 3 μm or less.
Meanwhile, the second inclined surface 14 is not roughened with the grindstone 20. Consequently, the arithmetic average roughness Ra of the second inclined surface 14 is, for example, less than 0.1 μm, preferably 50 nm or less, and more preferably 10 nm or less. The arithmetic average roughness Ra of the second inclined surface 14 is, for example, 1 nm or greater, preferably 2 nm or greater.
The side surface of the glass plate 10 shown in
Note that the first inclined surface 13 is obtained by forming the first crack CR 1 in S2 of
Note that the first end surface portion 151 is not ground in S5 of
The glass plate 10 shown in
The antireflection film suppresses the reflection of light, and is obtained by, for example, alternately stacking a high refractive index layer and a low refractive index layer, having a lower refractive index than the high refractive index layer. The material of the high refractive index layer is, for example, niobium oxide, titanium oxide, zirconium oxide, tantalum oxide or silicon nitride. On the other hand, the material of the low refractive index layer is, for example, silicon oxide, a mixed oxide of Si and Sn, a mixed oxide of Si and Zr, or a mixed oxide of Si and Al.
When the passengers of the vehicle hit the first main surface 11, compressive stress works on the first main surface 11 side, and tensile stress works on the second main surface 12 side, with respect to the center of the thickness of the glass plate 10. Consequently, of the side surfaces of the glass plate 10, compressive stress works on the rough surface 101, and tensile stress works on the mirror surface 102.
According to the present embodiment, since tensile stress works on the mirror surface 102, greater strength is achieved than when tensile stress works on the rough surface 101. This is because the mirror surface 102 has smaller irregularities, which are the starting points of fracture, than the rough surface 101 does. Note that, in general, materials fracture by tensile stress, rather than by compressive stress, and therefore compressive stress working on the rough surface 101 is not an issue.
Furthermore, according to the present embodiment, the first inclined surface 13 is the rough surface 101. Therefore, compared to the case where the first inclined surface 13 is the mirror surface 102, it is possible to prevent the antireflection film on the first inclined surface 13 from looking iridescent due to interference of light.
Now, as shown in
First, as shown in
As shown in
As shown in
Next, as shown in
Note that, although, as described above, in S3 of
Next, in S6 of
As shown in
As shown in
Note that the removing surface 17 is a linear taper in this embodiment, but may be a non-linear taper as well. In that case, β would be the angle formed between the normal N to the first main surface 11 and the tangent to the removing surface 17. It suffices if β is in the above range.
S6 in
A distribution of modified portions D is arranged on the removing surface 17 by repeating moving the beam focal point two-dimensionally within a plane at a certain depth from the first main surface 11 and changing the depth of the beam focal point from the first main surface 11. The beam focal point is moved by using, for example, a 3D galvano scanner. If the depth of the beam focal point is changed by moving the stage, a 2D galvano scanner may be used.
The stage holds the glass plate 10. The beam focal point may be moved by moving or rotating the stage holding the glass plate 10. For the stage, for example, an XY stage, an XYθ stage, an XYZ stage, or an XYZθ stage is used.
The modified portions D are formed across the entirety of the plate's thickness direction, from the first main surface 11 to the second main surface 12. Here, the entirety of the plate's thickness direction means covering 80% or more of the region of the plate's thickness. In S62, which will be described later, a fourth crack CR 4 can be formed across the entirety of the plate's thickness direction.
Next, as shown in
To form the fourth crack CR 4, thermal stress is applied to the glass plate 10 by, for example, emitting the first laser beam LB 1. Note that the method of applying stress to the glass plate 10 is not particularly limited. It is equally possible to press a roller against the glass plate 10 and apply stress to the glass plate 10.
Finally, in S63 of
Note that, before the portion and the remaining portion of the glass plate 10 are shifted in the direction normal to the first main surface 11, a difference in temperature may be produced between the portion and the remaining portion of the glass plate 10, and a gap may be created between the portion and the remaining portion of the glass plate 10. This makes it possible to prevent these portions of the glass plate 10 from rubbing against each other.
A gap can be created as long as, with respect to the first line of intersection 18, the portion on the curvature center C side has a lower temperature than the portion on the opposite side of the curvature center C. It is possible to cool the portion on the curvature center C side, or heat the portion on the opposite side of curvature center C.
The remaining portion of the glass plate 10 is the portion to include the first crack CR 1 and the second crack CR 2. By removing a portion of the glass plate 10 thus, the remaining portion of the glass plate 10 can be deformed with ease, which makes the subsequent processes easy.
Next, as shown in
According to the present embodiment, similarly to the first embodiment and the second embodiment, the modified portions D are formed on the virtual line VL before the third crack CR 3 is formed. The modified portions D guide the third crack CR 3 to the virtual line VL. Therefore, it is possible to create the third crack CR 3, from the tips of the first crack CR 1 and the second crack CR 2, in a direction that is perpendicular to the first main surface 11 and the second main surface 12.
Also, according to this embodiment, as shown in
Also, according to this embodiment, as shown in
When the portion on the opposite side of the curvature center C with respect to the curved portion BL 1a becomes the product, aligning multiple modified portions D in the curved portion BL 1a and guiding the third crack CR 3 in the direction of that alignment carries a great technical significance. This is because, if, at a certain point in the curved portion BL 1a, the third crack CR 3 develops straight in the tangential direction, the third crack CR 3 might end up impairing the product.
The radius of curvature of the curved portion BL 1a is, for example, 0.5 mm or greater, preferably 1 mm or greater, so that the third crack CR 3 can bend along the curved portion BL 1a with greater ease. Also, the radius of curvature of the curved portion BL 1a is, for example, 1000 mm or less, preferably 500 mm or less.
After S4 in
Below, specific examples of the glass plate processing method according to the present disclosure will be described.
With Example 1, S1 to S4 in
In S2, as shown in
The conditions of irradiation of the laser beam LB 1 in S2 were as follows:
Oscillator: Yb fiber laser (YLR500 manufactured by IPG Photonics)
Oscillation mode: continuous wave oscillation
Beam wavelength: 1070 nm
Output: 440 W
In-plane scanning speed: 70 mm/s
Beam diameter on the first main surface 11: 0.6 mm
In S3, as shown in
The conditions of irradiation of the second laser beam LB 2 in S3 were as follows:
Oscillator: Picosecond pulsed laser (StarPico3 manufactured by Rofin)
Oscillation mode: Pulse oscillation (burst)
Beam wavelength: 1064 nm
Output: 35.6 W
Oscillation frequency: 75 kHz
In-plane scanning speed: 187.5 mm/s
In-plane irradiation pitch: 5 μm
Pulse energy: 475 μJ
In S4, as shown in
After S4, the glass plate 10 shown in
The arithmetic average roughness Ra of the first inclined surface 13 was 5.2 nm. The arithmetic average roughness Ra of the second inclined surface 14 was also 5.2 nm. Meanwhile, the arithmetic average roughness Ra of the end surface 15 was 0.4 μm.
In Example 2, S1 to S5 of
In S2, as shown in
The conditions of irradiation of the laser beam LB 1 in S2 were as follows:
Oscillator: Yb fiber laser (YLR500 manufactured by IPG Photonics)
Oscillation mode: continuous wave oscillation
Beam wavelength: 1070 nm
Output: 440 W
In-plane scanning speed: 70 mm/s
Beam diameter on the first main surface 11: 0.6 mm
In S3, as shown in
The conditions of irradiation of the second laser beam LB 2 in S3 were as follows.
Oscillator: Nanosecond pulsed laser (Explorer 532-2Y manufactured by Spectraphysics)
Oscillation mode: Pulse oscillation (single)
Beam wavelength: 532 nm
Output: 2 W
Oscillation frequency: 10 kHz
Scanning speed in in-plane direction: 100 mm/s
In-plane irradiation pitch: 0.01 mm
Pitch of irradiation in the depth direction: 0.05 mm
Focused beam diameter: 4 μm
Pulse energy: 200 μJ
In S4, as shown in
In S5, as shown in
After S5, the glass plate 10 shown in
For the glass plate 10 shown in
In Example 3, S1 to S4 and S6 in
In S2, as shown in
The conditions of irradiation of the laser beam LB 1 in S2 were as follows:
Oscillator: Yb fiber laser (YLR500 manufactured by IPG Photonics)
Oscillation mode: continuous wave oscillation
Beam wavelength: 1070 nm
Output: 220 W
In-plane scanning speed: 70 mm/s
Beam diameter on the first main surface 11: 1.2 mm
The second laser beam LB 2 is focused in a dot-like shape inside the glass plate 10 to form a modified portion D in a dot-like shape. A distribution of modified portions D was arranged on the removing surface 17 by repeating moving the beam focal point two-dimensionally within a plane at a certain depth from the first main surface 11 and changing the depth of the beam focal point from the first main surface 11. The beam focal point was moved by using an XYZ stage.
The conditions of irradiation of the second laser beam LB 2 in S3 were as follows:
Oscillator: nanosecond pulsed laser (Explorer 532-2Y manufactured by Spectraphysics)
Oscillation mode: pulse oscillation (single)
Beam wavelength: 532 nm
Output: 2 W
Oscillation frequency: 10 kHz
In-plane scanning speed: 100 mm/s
In-plane irradiation pitch: 0.01 mm
Pitch of irradiation in the depth direction: 0.05 mm
Focused beam diameter: 4 μm
Pulse energy: 200 μJ.
In S61 included in S6, as shown in
In S62 included in S6, as shown in
In S63 included in S6, as shown in
In S4, as shown in
After S4 in
Although the glass plate processing method and the glass plate according to the present disclosure have been described above, the present disclosure is by no means limited to the above-described embodiments. Various changes, alterations, replacements, additions, deletions, and combinations are possible within the scope of the following claims, and will obviously belong to the technical scope of the present disclosure.
Number | Date | Country | Kind |
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2019-210499 | Nov 2019 | JP | national |
The present application is a continuation filed under 35 U.S.C. 111(a) claiming the benefit under 35 U.S.C. 120 and 365(c) of PCT International Application No. PCT/JP2020/041372, filed on Nov. 5, 2020, and designating the U.S., which is based on and claims priority to Japanese Patent Application No. 2019-210499, filed on Nov. 21, 2019. The entire contents of PCT International Application No. PCT/JP2020/041372 and Japanese Patent Application No. 2019-210499 are incorporated herein by reference.
Number | Date | Country | |
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Parent | PCT/JP2020/041372 | Nov 2020 | US |
Child | 17747971 | US |