Claims
- 1. A process for preparing a substrate for a magnetic disc, comprising subjecting a glass substrate to a chemical etching treatment using an aqueous solution containing hydrofluoric acid at a concentration of 0.15 to 0.9N and potassium fluoride at a concentration of 2 to 6N, wherein the temperature of the solution is 5.degree. to 20.degree. C.
- 2. A process as claimed in claim 1, wherein the glass substrate is subjected to the chemical etching treatment using the aqueous solution containing hydrofluoric acid at a concentration of 0.3 to 0.9N and potassium fluoride.
- 3. A process as claimed in claim 2, wherein after the chemical etching treatment, the glass substrate is washed with water at the temperature of 15.degree. C. or less in order to prepare the substrate by forming a magnetic film thereon for preparing a magnetic disc.
- 4. A process for preparing a substrate for a magnetic disc, comprising subjecting a glass substrate to a chemical etching treatment using an aqueous solution containing hydrofluoric acid at a concentration of 0.15 to 0.9N and potassium fluoride at a concentration of 2 to 6N, wherein the temperature of the solution is 5.degree. to 20.degree. C. and then washing the water at the temperature of 15.degree. C. or less.
Priority Claims (1)
Number |
Date |
Country |
Kind |
4-234695 |
Sep 1992 |
JPX |
|
Parent Case Info
This is a divisional of application Ser. No. 08/111,223 filed on Aug. 24, 1993.
US Referenced Citations (9)
Foreign Referenced Citations (3)
Number |
Date |
Country |
60-136035 |
Jul 1985 |
JPX |
63-160010 |
Jul 1988 |
JPX |
1-37722 |
Aug 1989 |
JPX |
Divisions (1)
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Number |
Date |
Country |
Parent |
111223 |
Aug 1993 |
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