Claims
- 1. A method for producing a large high-quality single crystal of CdIn.sub.2 Te.sub.4, said method comprising the steps of:
- (a) preparing a mixture of high-purity cadmium, indium and tellurium corresponding to a mixture of from about 62 mole % to about 90 mole % In.sub.2 Te.sub.3 and from about 38 mole % to about 10 mole % CdTe, respectively;
- (b) sealing said mixture in a clean evacuated ampoule, said ampoule having a dependent cone-shaped tip to initiate growth of a single crystal therein;
- (c) melting said mixture by heating said sealed ampoule to a temperature in excess of the melting point of said mixture; and
- (d) slowly cooling said melted mixture within said sealed ampoule through said melting point of said mixture to both initiate and maintain to completion the growth of a single crystal of CdIn.sub.2 Te.sub.4 within said ampoule.
- 2. The method of claim 1 wherein the mole percentage of In.sub.2 Te.sub.3 in said mixture is between about 62 mole % to about 72 mole %.
- 3. The method of claim 2 wherein the mole percentage of In.sub.2 Te.sub.3 in said mixture is about 64 mole %.
- 4. The method of claim 1 wherein said melting point of said mixture is between about 785.degree. C. to about 702.degree. C.
- 5. The method of claim 1 wherein said ampoule is heated to a temperature between about 785.degree. C. to about 900.degree. C. to melt said mixture.
- 6. The method of claim 1 wherein said ampoule is heated in a vertical resistance-heated furnace.
- 7. The method of claim 6 wherein said resistance-heated furnace has about a 76 mm bore.
- 8. The method of claim 7 wherein said melted mixture is cooled through said melting point via a thermal gradient ranging between about 1.1.degree. C./mm of furnace travel and about 3.5.degree. C./mm of furnace travel in said resistance-heated furnace.
- 9. The method of claim 8 wherein the ampoule containing said melted mixture is lowered through said thermal gradient of said vertical resistance-heated furnace at a rate between about 0.05 mm/hr. to about 0.6 mm/hr.
- 10. The method of claim 1 wherein said dependent cone shaped tip of the crystal growth ampoule has been truncated and a seed crystal implanted within the ampoule at the point of truncation in order to permit seed-crystal-initiated crystal growth.
- 11. The method of claim 1 wherein the diameter of said ampoule prior to said dependent cone-shaped tip ranges between 19 to 55 mm.
- 12. A large high-quality single crystal of CdIn.sub.2 Te.sub.3 produced by the method of claim 1.
- 13. A method for producing a large high-quality single crystal of CdIn.sub.2 Te.sub.4, said method comprising the steps of:
- (a) preparing a mixture of high-purity Cd, In and Te, the relative content of Cd, In and Te corresponding in amount to that of a mixture of from about 62 mole % to about 90 mole % In.sub.2 Te.sub.3 and from about 38 mole % to about 10 mole % CdTe, respectively;
- (b) sealing said mixture in a clean evacuated ampoule, said ampoule having a dependent cone-shaped tip to initiate growth of a single crystal therein;
- (c) melting said mixture by heating said sealed ampoule to a temperature in excess of the melting point of said mixture; and
- (d) slowly cooling said melted mixture within said sealed ampoule through said melting point of said mixture to both initiate and maintain to completion the growth of a single crystal of CdIn.sub.2 Te.sub.4.
- 14. The method of claim 13 wherein the Cd, In and Te in said high purity mixture correspond in amounts to the relative content of Cd, In and Te in a mixture of In.sub.2 Te.sub.3 and CdTe wherein 62 mole % to 75 mole % is In.sub.2 Te.sub.3 and 38 mole % to 25 mole % is CdTe, respectively.
- 15. The method of claim 14 wherein the Cd, In and Te in said high purity mixture correspond in amounts to the relative content of Cd, In and Te in a mixture of In.sub.2 Te.sub.3 and CdTe wherein about 64 mole % of the mixture in In.sub.2 Te.sub.3.
- 16. The method of claim 13 wherein said melting point is between about 702.degree. C. to about 785.degree. C.
- 17. The method of claim 13 wherein said ampoule is heated to a temperature between about 785.degree. C. to about 900.degree. C. to melt said mixture.
- 18. The method of claim 13 wherein said ampoule is heated in a vertical resistance-heated furnace.
- 19. The method of claim 18 wherein said resistance-heated furnace has about a 76 mm bore.
- 20. The method of claim 19 wherein said melted mixture is cooled through said melting point via a thermal gradient ranging between about 1.1.degree. C./mm of furnace travel and about 3.5.degree. C./mm of furnace travel in said resistance-heated furnace.
- 21. The method of claim 20 wherein the ampoule containing said melted mixture is lowered through said thermal gradient of vertical resistance-heated furnace at a rate between about 0.05 mm/hr. to about 0.6 mm/hr.
- 22. The method of claim 13 wherein said dependent cone shaped tip of the crystal growth ampoule has been truncated and a seed crystal implanted within the ampoule at the point of truncation in order to permit seed-crystal-initiated crystal growth.
- 23. The method of claim 13 wherein the diameter of said ampoule prior to said dependent cone-shaped tip ranges between 19 to 55 mm.
- 24. A large high-quality single crystal of CdIn.sub.2 Te.sub.3 produced by the method of claim 13.
- 25. A method for producing a large high-quality single crystal of CdIn.sub.2 Te.sub.4, said method comprising the steps of:
- (a) preparing a mixture of high-purity cadmium, indium and tellurium corresponding to a mixture of from about 62 mole % to about 90 mole % In.sub.2 Te.sub.3 and from about 38 mole % to about 10 mole % CdTe, respectively;
- (b) sealing said mixture in a clean evacuated fused silica ampoule, said ampoule having a diameter ranging between 19 mm to 50 mm, and a dependent cone-shaped tip to initiate growth of a single crystal therein;
- (c) melting said mixture by heating said sealed ampoule in a vertical resistance-heated furnace to a temperature between about 785.degree. C. and about 900.degree. C.;
- (d) slowly cooling said melted mixture within said sealed ampoule by lowering said mixture through its melting point, wherein said sealed ampoule is lowered through a temperature gradient ranging between 1.1.degree. C./mm of furnace travel and about 3.5.degree. C./mm of furnace travel in said resistance-heated furance at a rate of between about 0.05 mm/hr. to about 0.6 mm/hr. to both initiate and maintain to completion the growth of a single crystal of CdIn.sub.2 Te.sub.4 within said ampoule, said melting point being at a temperature between about 785.degree. C. to about 702.degree. C.; and
- (e) further cooling said single crystal to room temperature.
- 26. The method of claim 25 wherein said dependent cone shaped tip of the crystal growth ampoule has been truncated and a seed crystal implanted within the ampoule at the point of truncation in order to permit seed-crystal-initiated crystal growth.
- 27. A large high-quality single crystal of CdIn.sub.2 Te.sub.3 produced by the method of claim 25.
RIGHTS OF THE UNITED STATES GOVERNMENT
The Government has rights in this invention pursuant to Contract No. F19628-81-C-0081, awarded by the Department of the Air Force.
US Referenced Citations (5)
Foreign Referenced Citations (2)
Number |
Date |
Country |
1434439 |
May 1976 |
GBX |
2051607 |
Jan 1981 |
GBX |
Non-Patent Literature Citations (1)
Entry |
A. L. Gentile et al., Melt Growth of Ternary Chalcogenides, Mat. Res. Bull. vol. 4, pp. 869-876, 1969. |