Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers

Information

  • Patent Grant
  • D616393
  • Patent Number
    D616,393
  • Date Filed
    Wednesday, September 2, 2009
    15 years ago
  • Date Issued
    Tuesday, May 25, 2010
    14 years ago
Abstract
Description


FIG. 1 is front perspective view of a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers illustrating my new design;



FIG. 2 is a front view thereof;



FIG. 3 is a rear view thereof;



FIG. 4 is a right side view thereof;



FIG. 5 is a left side view thereof;



FIG. 6 is a top plan view thereof;



FIG. 7 is a bottom plan view thereof; and,



FIG. 8 is a front perspective view of a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers in use.


The broken lines are shown for illustrative purposes only and form no part of the claimed design.


Claims
  • The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.
Priority Claims (1)
Number Date Country Kind
2009-004988 Mar 2009 JP national
US Referenced Citations (8)
Number Name Date Kind
D404372 Ishii Jan 1999 S
6056123 Niemirowski et al. May 2000 A
6062853 Shimazu et al. May 2000 A
6110285 Kitazawa et al. Aug 2000 A
7033168 Gupta et al. Apr 2006 B1
7484958 Kobayashi Feb 2009 B2
D600220 Sato Sep 2009 S
20020113027 Minami et al. Aug 2002 A1