Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers

Information

  • Patent Grant
  • D600660
  • Patent Number
    D600,660
  • Date Filed
    Friday, September 26, 2008
    16 years ago
  • Date Issued
    Tuesday, September 22, 2009
    15 years ago
  • US Classifications
    Field of Search
    • US
    • D13 179
    • D13 182
    • 165 080300
    • 165 104330
    • 165 151000
    • 165 122000
    • 165 185000
    • 257 706000
    • 257 707000
    • 257 718-722
    • 361 687000
    • 361 695000
    • 361 697000
    • 361 700000
    • 361 702000
    • 361 704000
    • 361 709000
    • 361 710000
    • 361 711000
    • 361 719000
    • 414 935000
    • 211 041180
    • 118 728000
    • 118 729000
    • 432 241000
    • 432 253000
    • 432 258000
  • International Classifications
    • 1303
    • Term of Grant
      14Years
Abstract
Description


FIG. 1 is a perspective view;



FIG. 2 is a front view;



FIG. 3 is a rear view;



FIG. 4 is a right side view the left side being a mirror image thereof;



FIG. 5 is a plan view the bottom view being a mirror image thereof; and;



FIG. 6 is a sectional view along 66 of a front view of FIG. 2.


Claims
  • The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.
Priority Claims (1)
Number Date Country Kind
2008-007853 Mar 2008 JP national
US Referenced Citations (11)
Number Name Date Kind
5567986 Ishida Oct 1996 A
5718574 Shimazu Feb 1998 A
D404373 Kimura Jan 1999 S
D404374 Kimura Jan 1999 S
6099302 Hong et al. Aug 2000 A
6575231 Wu Jun 2003 B1
6716027 Kim et al. Apr 2004 B2
7163393 Adachi Jan 2007 B2
7204887 Kawamura et al. Apr 2007 B2
20030000472 Lim et al. Jan 2003 A1
20040069453 Tanaka et al. Apr 2004 A1