Claims
- 1. A semiconductor superlattice structure comprising: first and second different semiconductor materials forming a plurality of alternate layers, each interfaced to its adjacent layer in a semiconductor heterojunction; each said layer having a thickness of from 30 to 60 angstroms; the bottom of the conduction bands of said first and second materials being at different energy levels and the tops of said valence bands of said first and second materials being at different energy levels; the bottoms of said conduction bands of said first and second materials forming a plurality of serially arranged potential wells and barriers; said potential wells and barriers caused by differences in the band structures of said different materials forming said alternate layers and the interfacing of said layers in said heterojunctions; and the distance between the bottoms of said potential wells in said conduction band and the tops of said potential wells in said valence band being less than the depth of said potential wells.
- 2. The semiconductor superlattice structure according to claim 1 wherein said first semiconductor material is an alloy including a first Group III material and a first Group V material and said second material is an alloy including a second Group III material different from said first Group III material and a second Group V material different from said first Group V material.
- 3. The semiconductor superlattice structure as defined in claim 2, in which said first Group III material is In, said first Group V material is As, said second Group III material is Ga, and said second Group V material is Sb.
- 4. The semiconductor superlattice structure as defined in claim 2, in which the first layer is an alloy of In.sub.1-x Ga.sub.x As and the second layer is an alloy of GaSb.sub.1-y As.sub.y, and wherein y=0.918x+0.082.
- 5. The semiconductor superlattice structure according to claim 1 and wherein the bottoms of said potential wells in said conduction band are at a higher energy level than the tops of said potential wells in said valance band.
- 6. The semiconductor superlattice structure according to claim 1 and wherein said tops and bottoms of said potential wells in said valance and conduction bands respectively overlap, with said valance-band potential well tops being at a level between the bottoms of said potential wells and the tops of said potential barriers in said conduction band, and said conduction-band potential well bottoms being at a level between the tops of said potential wells and bottoms of said potential barriers in said valance band; and said potential wells in said conduction band being located in said layers formed by said first material and said potential wells in said valance band being located in said layers formed by said second material.
Government Interests
The invention described herein may be manufactured and used by or for the government for governmental purposes without the payment of any royalties thereon or therefor.
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
3626257 |
Esaki et al. |
Dec 1971 |
|
4103312 |
Chang et al. |
Jul 1978 |
|
4137542 |
Chang et al. |
Jan 1979 |
|
Non-Patent Literature Citations (1)
Entry |
Sai-Halasz et al., Applied Physics Letters, 30 pp. 651-653 (15 Jun. 1977). |