1. Field of the Invention
This invention relates to high-Q micromechanical resonator devices and filters utilizing same.
2. Background Art
The following references are referenced herein:
Today's wireless transceivers are generally designed under a mandate to minimize or eliminate the use of high-Q passives. The reasons for this are quite simple: cost and size. Specifically, the ceramic filters, SAW filters, quartz crystals, and now FBAR filters, capable of achieving the Q's from 500 to 10,000 needed for RF and IF bandpass filtering, and frequency generation functions, are all off-chip components that must interface with transistor circuits at the board-level, consuming excessive area and costing too much [1].
Pursuant to reducing the off-chip parts in modern cellular handsets, direct-conversion receiver architectures [2] have removed the IF filter, and integrated inductor technologies are removing some of the off-chip inductors used for bias and matching networks [3]. Although these methods can lower cost, they often do so at the expense of increased transistor circuit complexity and more stringent requirements on circuit performance, both of which degrade the robustness and power efficiency of the overall system. In addition, the removal of the IF filter does little to relax the requirements of future multi-band reconfigurable handsets that will likely require high-Q RF filters in even larger quantities.
Recent advances in vibrating RF micromechanical systems (“MEMS”) technology that have yielded on-chip resonators operating past GHz frequencies with Q's in excess of 10,000, may now not only provide an attractive solution to present day communication systems, but might also enable a paradigm-shift in transceiver design where the advantages of high-Q are emphasized, rather than suppressed [4][5]. In particular, like transistors, micromechanical elements can be used in large quantities without adding significant cost. This not only brings more robust superheterodyne architectures back into contention, but also encourages modifications to take advantage of a new abundance of low loss ultra-high-Q frequency shaping at GHz frequencies. For example, an RF channel select filter bank may now be possible, capable of eliminating not only out-of-band interferers, but also out-of-channel interferers, and in doing so, relaxing the dynamic range requirements of the LNA and mixer, and the phase noise requirements of the local oscillator, to the point of perhaps allowing complete transceiver implementations using very low cost transistor circuits.
A major impetus behind MEMS technology stems from the fact that mechanical mechanisms benefit from the same scaling-based advantages that have driven the integrated circuit revolution in recent decades. Specifically, small size leads to faster speed, lower power consumption, higher complexity, and lower cost. And it does so not only in the electrical domain, but in virtually all other domains, including and especially mechanical. Although many examples of this from all physical domains exist, vibrating RF MEMS resonators perhaps provide the most direct example of how small size leads to faster speed in the mechanical domain. Basically, further scaling down to nano-dimensions does indeed yield frequencies in excess of 1 GHz [6]. However, as with nanoelectronics in the electrical domain, there are issues in the mechanical domain that might hinder the use of nanomechanical vibrating resonators for today's communication purposes. In particular, excessive scaling may lead to “scaling-induced limitations,” such as adsorption-desorption noise [7], temperature fluctuation noise, and insufficient power handling, with the last of these perhaps being the most serious for present day applications. As with nanoelectronics, the power handling issue with nanomechanical resonators really boils down to an impedance matching problem. In brief, nanostructures would rather operate at higher impedance levels than macroscopic counterparts, and in order to interface the nano with the macro (e.g., the antenna), impedance matching strategies like massive arraying of nanostructures to add their responses might be required.
Fortunately, massive-scale arraying isn't really needed, at least not for the frequency range used by present day commercial wireless standards. In particular, GHz frequencies can be attained mechanically without the need for nano-scale dimensions, and thus, without its associated power handling issues, by merely using ring resonator geometry that operate in modes more amenable to higher frequency.
Wireless communication receivers could be greatly simplified if communication channels (rather than bands of channels) could be selected right at RF, immediately after the antenna, with out-of-channel noise and interferers removed before the received signal reaches any transistor circuits. With such an RF channel-selection capability, a wireless receiver might dispense with multi-stage down-conversion circuits, and instead, utilize a direct sub-sampling A/D converter right at the front end. Unfortunately, RF channel-selection is extremely difficult, because it requires at least 0.1% bandwidth selectivity, which, in turn, requires filters using resonators with Q's>10,000 to maintain acceptable insertion loss (below 1 dB). Although on-chip MEMS-based vibrating resonators have very recently reached frequencies past 1 GHz [8], they have so far not done so with Q's as high as 10,000. Even off-chip resonators in use today, such as SAW's or FBAR's, exhibit Q's about an order of magnitude lower than the needed 10,000.
An object of the present invention is to provide improved high-Q micromechanical resonator devices and filters utilizing same.
In carrying out the above object and other objects of the present invention, a micromechanical resonator device having a desired mode shape is provided. The device includes a substrate and a hollow resonator having a central cavity and a stationary surface area. The desired mode shape is characterized by a plurality of interior nodal points located between the cavity and an outer periphery of the resonator. The desired mode shape involves movement of only a fraction of the stationary surface area at resonance. A non-intrusive support structure is anchored to the substrate and includes a hub disposed within the cavity and a plurality of spokes which radiate from the hub and support the resonator above the substrate to reduce mechanical losses to the substrate.
The resonator may have a desired resonance frequency, and the spokes may have a length based on the desired resonance frequency to reduce mechanical losses to the substrate.
The spokes may have inner and outer ends, and the outer ends of the spokes may extend into the resonator adjacent the interior nodal points to reduce mechanical losses to the substrate.
The device may further include a drive electrode structure adjacent the resonator for driving the resonator so that the resonator changes shape at resonance.
The resonator may be an extensional mode device having a compound mode that involves both radial and tangential displacement.
The resonator may be a hollowed-out disk resonator, or a ring resonator.
The spokes may have inner and outer ends and the ring resonator may have an inner periphery. Interfaces between the outer ends and the inner periphery may be acoustically matched.
The non-invasive support structure may force the resonator to vibrate in the desired mode shape while suppressing any undesired mode shapes.
The desired mode shape may be a contour mode shape.
The device may further include a drive electrode structure formed on the substrate at a position to allow electrostatic excitation of the resonator so that the resonator is driven in the desired mode shape. The resonator and the drive electrode structure may define a capacitive gap therebetween.
The drive electrode structure may be disposed with the central cavity of the resonator.
The capacitive gap may be a sub-micron, lateral, capacitive gap.
The drive electrode structure may include a plurality of split electrodes.
The support structure may include a single anchor positioned within the central cavity of the resonator.
The device may further include a sense electrode structure formed on the substrate at a position to sense output current based on motion of the resonator.
The drive electrode structure may include a plurality of separate input drive electrodes and the sense electrode structure may include a plurality of separate output sense electrodes.
The device may be silicon-based or may be a composite material having high acoustic velocity.
The spokes may have inner and outer ends, and the outer ends of the spokes may extend into the resonator adjacent the interior nodal points to reduce mechanical losses to the substrate.
The resonator may be a ring resonator having inner and outer peripheries. The drive electrode structure may include an inner set of electrodes disposed about the inner periphery between the spokes.
The desired mode shape may be a compound mode shape such as a wine-glass mode shape.
The compound mode may be a wine-glass mode.
The desired mode shape may be a wine-glass ring mode shape.
Further in carrying out the above object and other objects of the present invention, a micromechanical resonator device having a desired mode shape is provided. The device includes a substrate and a resonator having a stationary surface area. The desired mode shape is characterized by a plurality of interior nodal points located within the interior of the resonator. The desired mode shape involves movement of only a fraction of the stationary surface area at resonance. A non-intrusive support structure is anchored to the substrate to support the resonator above the substrate. Portions of the support structure extend into the resonator adjacent the interior nodal points to reduce mechanical losses to the substrate.
The portions of the support structure may include spokes, and the resonator may have a desired resonance frequency. The spokes may have a length based on the desired resonance frequency to reduce mechanical losses to the substrate.
The spokes may have inner and outer ends. The outer ends of the spokes may extend into the resonator adjacent the interior nodal points to reduce mechanical losses to the substrate.
The device may further include a drive electrode structure adjacent the resonator for driving the resonator so that the resonator changes shape at resonance.
The resonator may be an extensional mode device having a compound mode that involves both radial and tangential displacement.
The resonator may be a hollowed-out disk resonator or a ring resonator.
Portions of the support structure may comprise spokes having inner and outer ends. The ring resonator may have an inner periphery. Interfaces between the outer ends and the inner periphery may be acoustically matched.
The non-invasive support structure may force the resonator to vibrate in the desired mode shape while suppressing any undesired mode shapes.
The desired mode shape may be a contour mode shape.
The device may further include a drive electrode structure formed on the substrate at a position to allow electrostatic excitation of the resonator so that the resonator is driven in the desired mode shape. The resonator and the drive electrode structure may define a capacitive gap therebetween.
The drive electrode structure may be disposed with a central cavity of the resonator.
The capacitive gap may be a sub-micron, lateral, capacitive gap.
The drive electrode structure may include a plurality of split electrodes.
The resonator may include a central cavity, and the support structure may include a single anchor positioned within the central cavity of the resonator.
The device may further include a sense electrode structure formed on the substrate at a position to sense output current based on motion of the resonator.
The drive electrode structure may include a plurality of separate input drive electrodes and the sense electrode structure may include a plurality of separate output sense electrodes.
The device may be silicon-based or may be a composite material having high acoustic velocity.
Portions of the support structure may include spokes using inner and outer ends. The outer ends of the spokes may extend into the resonator adjacent the interior nodal points to reduce mechanical losses to the substrate.
The resonator may be a ring resonator having inner and outer peripheries. The drive electrode structure may include an inner set of electrodes disposed about the inner periphery.
The desired mode shape may be a compound mode shape such as a wine-glass mode shape.
The compound mode may be a wine-glass mode.
The desired mode shape may be a wine-glass ring mode shape.
Still further in carrying out the above object and other objects of the present invention, a filter is provided which includes a substrate and a plurality of resonators. Each of the resonators has a desired mode shape and a stationary surface area. The desired mode shape is characterized by a plurality of interior nodal points located within the interior of the resonator. The desired mode shape involves movement of only a fraction of the stationary surface area at resonance. The filter further includes a plurality of non-intrusive support structures. Each of the support structures is anchored to the substrate to support its respective resonator above the substrate. Portions of each support structure extend into its respective resonator adjacent the interior nodal points to reduce mechanical losses to the substrate. The filter further includes a mechanism for coupling the resonators together to form the filter.
Yet still further in carrying out the above object and other objects of the present invention, a filter is provided which includes a substrate and a plurality of hollow resonators. Each of the resonators has a desired mode shape, a central cavity and a stationary surface area. The desired mode shape is characterized by a plurality of interior nodal points located between the cavity and an outer periphery of its resonator. The desired mode shape involves movement of only a fraction of the stationary surface area at resonance. The filter further includes a plurality of non-intrusive support structures. Each of the support structures is anchored to the substrate and includes a hub disposed within its respective cavity and a plurality of spokes which radiate from the hub and support its respective resonator above the substrate to reduce mechanical losses to the substrate. The filter further includes a mechanism for coupling the resonators together to form the filter.
The above object and other objects, features, and advantages of the present invention are readily apparent from the following detailed description of the best mode for carrying out the invention when taken in connection with the accompanying drawings.
a is a perspective schematic view of one embodiment of a micromechanical “hollow-disk” ring resonator in a typical two-port bias and excitation configuration with an equivalent LCR circuit model and quarter-wavelength supporting beam;
b is a perspective schematic view of the resonator of
c is a perspective schematic view of the resonator of
a and 2b illustrate finite element simulated modes for the hollow-disk ring resonator and longitudinal supporting beam of
c illustrates a longitudinally vibrational mode shape of a λ/4 supporting beam at the ring's resonance frequency;
a, 4b, 4c and 4d are graphs which illustrate first, second, third, and fourth mode shapes, respectively, for a “hollow-disk” ring with ri/ro=0.5, ro=20 μm; their associated resonance frequencies are also included;
a through 5e are cross-sectional views depicting the stem self-aligned fabrication sequence used to achieve the micromechanical “hollow-disk” ring resonantor constructed in accordance with one embodiment of the present invention;
a is a schematic perspective view of a two-resonator micromechanical “hollow-disk” ring filter with low-velocity coupling in a two-port measurement scheme;
b illustrates an equivalent mechanical circuit to the ring filter of
a, 7b and 7c illustrate models of the extensional coupling spring;
a and 9b illustrate finite element simulated mode shapes for the micromechanical “hollow-disk” ring filter;
a illustrates complete equivalent circuit for the micromechanical filter of
b shows a L-match network utilized to obtain a filter flat passband.
One embodiment of the present invention provides a radial ring resonator that uses a centralized support structure and notching at the support attachment locations that together greatly reduce support losses and allow polysilicon ring resonator Q's in excess of 10,000 at frequencies past 1 GHz. The specific design, shown in
The hollow resonator has a central cavity in which a hub of material is disposed and supported on a stem. The beams or spokes radiate from the hub at their inner ends and support the resonator above the substrate at their outer ends.
Using an un-notched version of this design (i.e.,
With notched support attachments as depicted in
With electrodes both inside and outside the disk ring structure, this design attains electrode overlap advantages similar to that of a previously published annular ring design [9], while offering a much less intrusive support structure that not only enables substantially higher Q, but also enables impedances as low as 282 kΩ, which is 12×smaller than achieved by previous surface-micromachined, pure polysilicon, solid disk resonators operating past 1 GHz [8]. The design and fabrication principles that allow this hollow-disk ring to achieve frequencies and Q's suitable for use in RF channel-select filters are described in detail hereinbelow.
Maximizing Resonator Q
One of the keys to attaining the exceptionally high Q at RF is in the non-intrusive suspension design, shown in
From the mechanical point of view, the supporting beams with quarter-wavelength design in
In particular, although locating anchors at nodal points—as done in [8],[9] and some versions of [10]—does reduce energy transfer from a vibrating resonator to its anchors by virtue of the very little (ideally no) motion occurring at the nodes, some energy is still lost since the anchors are inevitably finite in size, and thus, still attach to non-nodal (i.e., moving) locations immediately around the nodal points. If the resonator and anchor materials are identical, then direct attachment of the anchor (or stem) to the resonator constitutes a nearly perfect impedance match (i.e., a perfect energy transfer path) at the resonator-anchor interface [11], and this only exacerbates the loss issues. On the other hand, the use of quarter-wavelength support beam suspensions as shown in
In addition to quarter-wavelength supports, the design of
Device Operation and Design
The wave differential equation describing the element vibration in the radial direction is:
And substituting the stress components (1a) and (1b) in (2), it becomes:
Assuming that the ring is driven by an AC voltage V=V0ejωt, it follows that:
where
is acoustic velocity.
The general equation of (4) is:
Ur=[AJ1(hr)+BY1(hr)]ejωt (5)
where h=ω/vP is frequency parameter, J1 is the Bessel function of first kind and first order, and Y1 is the Bessel function of second kind and first order. For a solid disk, the radial component of the motion at the original is zero, so that in (5) B=0 must be imposed to avoid a singularity at the origin and this formation is exactly the same with the solid disk derivation in [8]. In this ring case, the origin does not belong to the defined domain and therefore the complete (5) must be used.
The constants A and B can be computed satisfying the stress-free boundary conditions:
Trr=0 at r=ri and r=r=ro. (6)
Combining (5), (1a), and (6), the constant ratio
where
FJ(r)=hrJ0(hr)−J1(hr)(1−σ) (8)
FY(r)=hrY0(hr)−Y1(hr)(1−σ) (9)
And σ=c12E/E11E can be interpreted as a planar Poisson's ratio, since the material of polysilicon is isotropic in the plane normal to the z axis.
The frequency equation obtained from (5) and (6) is:
[J1(hri)σ−J1(hri)+rihJ0(hri)]×[Y1(hro)σ−Y1(hro)+rohY0(hro)]−[Y1(hri)σ−Y1(hri)+rihY0(hri)]×[J1(hro)σ−J1(hro)+rohJ0(hro)]=0. (10)
To analyze the dynamic behavior of the ring, its frequency spectrum was computed, varying the ratio ri/ro from zero to one.
Pursuant to specifying the operation mode of these devices,
where ωo is its radian resonance frequency, and Rx is the series motional resistance of the device. Recognizing (11) as the transfer function for a classic bandpass biquad, the micromechanical resonator of
More specifically, to excite this device in its two-port configuration (shown in
As indicated in
where E and ρ are the Young's modulus and density, respectively, of the structural material, and n is the odd number of multiple quarter-wavelengths. The value of LS then sets the inner radius of the ring ri; i.e., ri=LS. The outer radius ro, can now be determined by solving the expression (10) where LS, ri, and ro are indicated in
It should be noted from (10) that the frequency of this device is independent of thickness to first order, so the designed frequency is relatively insensitive to process variations in thickness. As such, filters at many different frequencies, such as required by multi-band and RF channel-select applications, can be achieved in a single fabrication run, with one structural film deposition. This is a distinct advantage over most piezoelectric counterparts (e.g., FBARs, crystals) for which frequency is often determined primarily by thickness, making it difficult to manufacture several different multi-band frequencies on the same chip without the need for several structural film depositions, one for each frequency.
Series Motional Resistance
By using the one-port measurement set-up where input voltage is applied to both inner and outer electrodes and the output current is sourced out from the structure via bias-Tee, the total output current can be expressed by the superposition of the inner and outer transducing as:
After the Laplace transform in order to focus on the amplitude of all time-dependent variables,
Io=s(Qinner+Qouter)=jω(ηinnerXinner+ηouterXouter) (14)
where s=j ω is the Laplace parameter and Q denotes the electrical charge only in this equation. The most important concept of the mode displacements expressed in (14) is that the total displacement in the inner surface of a ring can be regarded as the superposition of electrostatically induced motion from inner and outer electrodes. So the displacement of inner surface can be calculated as:
The displacement of inner surface results from not only the inner electrostatic force but also the outer electrostatic force. However, the outer displacement determined by the outer electrostatic force needs to be scaled by the mode shape ratio between the inner and outer positions, and then can contribute to the correct displacement into the inner surface. So is the displacement of the outer surface which is:
Based on the definition of electromechanical coupling coefficient,
Finner=ηinnervi (16a)
Fouter=ηoutervi (16b)
After the manipulation and some arrangements, the output current is on the form of:
The motional resistance is defined as the ratio of input voltage and output current presenting
Assuming the radius of the ring is large enough and ri˜ro, the motion resistance can be reduced to a more intuitive form as:
That's because the coupling coefficient, 7, and stiffness constant, k, of the inner and outer surfaces of the ring are almost the same. According to (19), obtaining smaller motional resistance, the best strategy is to reduce the electrode-to-resonator gap spacing or enlarge the overlap area by increasing the radius of the ring.
Having covered the derivation of the one-port motional resistance, the two-port set-up is depicted in
As (4), the magnitude of the output current can be presented as:
Iout=jωηsenseXsense (21)
In order to transform (21) into the driving part, the relation below is needed:
At resonance, the mode displacement is amplified by quality factor Q and becomes:
As (16), the electrostatic force is expressed as:
Fdrive=ηdrivevi (24)
After the manipulation and some arrangements, the magnitude of output current becomes:
Then, motional resistance can be obtained as
The same procedure as (19), the more intuitive form the two-port motional resistance becomes:
Compared to (19), the two-port Rx is around four times larger than one port Rx.
The series motional resistance, Rx, is perhaps the most important of the elements in the equivalent circuit of
where X(r) is the peak vibration displacement amplitude at radius r, ωo is the angular resonance frequency, and where
where ε0 is the permittivity in vacuum; r and H are the radius and thickness, respectively, of the ring; d0 is the electrode-to-resonator gap spacing; and VP is the DC-bias voltage.
For a ring with ri=11.8 μm, ro=18.7 μm, d0=100 nm, Q=15,000, and a DC-bias voltage VP of 10V, (28) yields Rx=274 k Ω. Even lower values of Rx can be achieved with higher values of VP. For example, a VP of 100V would yield an Rx of 2.7 k Ω. Table 1 illustrates the wide range of series motional resistances Rx achievable by rings with various characteristics, illustrating the importance of structural radii, ri (ro), gap spacing, d0, bias voltage, VP, and quality factor, Q.
(a) Standard case.
(b) Large electrode overlap area.
(c) Small gap spacing.
(d) Large bias voltage.
(e) Small Q.
Of these “Rx-control parameters,” the first based on scaling of the average ring radius is unique to ring resonator design, as previously pointed out in [9]. In particular, since the frequency of a ring (given by (10)) is dependent mainly on its width (r0−ri), and relatively independent of its average radius, a ring is capable of achieving a specified frequency with any value of average radius. Thus, for any given frequency, the radius of a ring can be chosen as large as necessary to achieve an electrode-to-resonator overlap capacitance that yields a desired value of Rx. (In doing so, the support structure will need to set at multiple quarterwavelengths, e.g., 3λ/4, 5λ/4, etc., in order to preserve anchor isolation.)
The ability to do this is especially useful in applications where VP is limited, or where the electrode-to-resonator gap spacing cannot be decreased, perhaps due to linearity constraints [16]. However, Rx reduction via radius scaling can be done only at the cost of die area. As illustrated by column (b) of Table 1, the ring radius must be increased by more than 10× to match the Rx reduction attained by a mere halving in electrode-to-resonator gap spacing. In this respect, radius scaling of single rings may not be as effective for RX reduction as summing up the outputs of numerous smaller rings or solid disks, where even larger capacitive overlap areas should achievable in the same amount of die area, and where signal-to-noise advantages also come into play, since signals add directly, but noise only adds as power. The recent mechanically-coupled resonator array technique demonstrated in [13] might be ideal for this latter approach.
Fabrication
2 μm-thick, notched and un-notched (for comparative purposes), contour-mode hollow-disk ring resonators with 100 nm electrode-to-resonator gaps were fabricated via a three-polysilicon self-aligned-and-filled stem process used previously to achieve GHz frequency (but with lower Q) solid disk resonators [8]. Given the importance of stem alignment described in [8], the fabrication process is designed to eliminate the possibility of disk-to-stem misalignment, by removing the need for alignment. The present process defines both the stem position and structural edges all in one mask, effectively eliminating the possibility of misalignment.
a through 5e present cross-sections that achieve self-aligned-stem “hollow-disk” ring resonators having: silicon substrate 50; n+ layer 51; oxide layers 52, 53 and 54; nitride layer 55; polysilicon layers 56 and 57; and polysilicon structures 58, 59, 60, 61 and 62.
The process starts with a heavy phosphorous diffusion to serve as the substrate ground plane 51. Then a 2 μm-thick oxide film 52 is first deposited over the n+-doped substrate 50 and 51, followed by a 350 nm-thick film 55 of nitride. These two layers 52 and 55 together serve to isolate devices and interconnects from the conductive silicon substrate 50. Interconnect polysilicon 56 is then deposited to a thickness of 350 nm and doped. After patterning this polysilicon layer 56 to form ground planes and interconnects, 650 nm of oxide 54 is deposited to act as a sacrificial layer to temporarily support a subsequent structural polysilicon layer 57 as shown in
Then the composite oxide mask/polysilicon layer (53,57) is patterned in a single mask to define not only the ring structure 60, but also a 2 μm-diameter opening at its center that defines the eventual location of the central stem 61 (i.e., see
A 100 nm-thick sidewall sacrificial oxide 53 is then conformally deposited to define the eventual electrode-to-resonator capacitive gap spacing. Pursuant to eventual refilling of the stem opening, a thick photoresist is spun and patterned to expose the stem and the electrode vias, after which the sidewall sacrificial spacer oxide 53 is removed in the stem opening and the underlying bottom sacrificial oxide 54 etched down to the substrate as shown in
With exposed stem holes and electrode anchor vias, a subsequent (third) 2 μm polysilicon deposition then not only provides the material for the electrodes 58 and 59, but also refills the anchor vias to create very rigid, self-aligned stems 61. The third polysilicon layer is then doped and patterned as shown in
In the next step, the structures 58, 59, 60, 61 and 62 are released in HF to yield the final cross-section of
Micromechanical “Hollow-Disk” Ring Filters
UHF vibrating micromechanical “hollow-disk” ring filters (
The center frequency of a given filter is determined by the resonance frequency of the constituent resonators, while the bandwidth is set by the coupling spring dimensions and its attachment locations between the resonators [15]. For the purpose of filter design,
As shown in
a presents a transformer-based equivalent circuit for the overall filter, where each resonator is modeled via electromechanical analogy. In order to obtain flat passband and low insertion loss, matching networks are necessary to provide impedance matching with properly termination in these filters as shown in
2 and 3-μm-thick hollow-disk ring filters, with 1000 Å and 765 Å respectively, electro-to-resonator gaps were fabricated via a three-polysilicon self-aligned-and-filled stem process previously described to achieve GHz frequency ring resonators.
A “hollow-disk” ring resonator was described that used a centered, impedance-optimizing quarter-wavelength support structure with notched support-to-ring node attachments to achieve a record high Q of 14,603 at 1.2 GHz measured under vacuum. These values correspond to a frequency-Q product of 1.75×1013, which is the highest yet seen for any polysilicon micromechanical resonator past 1 GHz, and which even exceeds the 1×1013 typically posted by some of the best quartz crystals. The sheer performance of this device might now bring the concept of RF channel-select filters for ultra-low-power wireless receivers much closer to reality, and in doing so, could revolutionize the design of wireless RF front-ends. From the results of this work, the minimization of anchor losses through anchor isolation is clearly among the most important design criteria when designing micromechanical resonators for frequencies past 1 GHz, and will likely continue to dominate among Q-limiting dissipation mechanisms as frequencies are pushed towards 10 GHz and beyond.
The resonator may also exhibit an extensional wine-glass mode shape. Again, with the balanced supporting beams anchored in the center, the Q is greatly improved. Low frequency operation of the hollow resonator may also be provided. The ring of the hollow disk deforms like in the wine-glass mode. The length of the support beams can be designed to be multiple quarter wavelengths to maximize the Q (in this case, quarter wavelength of the flexural mode).
While embodiments of the invention have been illustrated and described, it is not intended that these embodiments illustrate and describe all possible forms of the invention. Rather, the words used in the specification are words of description rather than limitation, and it is understood that various changes may be made without departing from the spirit and scope of the invention.
This application claims the benefit of U.S. provisional application Ser. No. 60/537,822, filed Jan. 21, 2004 and entitled “Hollow Disk Micromechanical Resonator.” This application is related to co-pending application Publication No. 2004/0207492 A1 and U.S. application Ser. No. 10/990,785, filed Nov. 17, 2004 and entitled “Micromechanical Resonator Device Having a Desired Mode Shape,” both of which are incorporated in their entirety by reference herein.
This invention was made with Government support from the National Science Foundation under Contract No. 9986866. The Government has certain rights in the invention.
Number | Date | Country | |
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60537822 | Jan 2004 | US |