Claims
- 1. An intrinsically antistatic resin composition consisting essentially of (A) 5 to 40% of a polyether ester amide, (B) 95 to 60 weight % of a thermoplastic resin selected from the group consisting of styrene-based resins which are free of carboxyl groups and polycarbonate resins, (C) 0.1 to 20 weight % of a vinyl polymer containing carboxyl groups and (D) 1 to 60 weight % of an organic halogen compound, said weight % being based on the weight of the entire composition.
- 2. The composition defined in claim 1 wherein said organic halogen compound (D) contains a halogen atom selected from the group consisting of fluorine and bromine.
- 3. The composition defined in claim 1 wherein said organic halogen compound (D) is selected from the group consisting of low molecular weight organic bromine compounds and halogenated polymers and oligomers.
- 4. The composition defined in claim 3 wherein said low molecular weight organic bromine compounds are selected from the group consisting of hexabromobenzene, pentabromotoluene, hexabromobisphenyl, decabromobisphenyl, hexabromocyclodecane, decabromodiphenyl ether, octabromodiphenyl ether, hexabromodiphenyl ether, bis(pentabromophenoxy)ethane, ethylenebis(tetrabromophthalimide) and tetrabromobisphenol A.
- 5. The composition defined in claim 3 wherein the halogenated polymers and oligomers are selected from the group consisting of brominated polycarbonates, brominated epoxy compounds, brominated polyphenylene ether, brominated bisphenol A, condensation products of cyanuric chloride and brominated bisphenol, brominated polystyrene and mixtures thereof.
- 6. The composition as defined in claim 1, wherein said composition has a volume resistivity of 7.times.10.sup.10 -1.times.10.sup.12 .OMEGA. cm.
- 7. An intrinsically antistatic resin composition defined in claim 1, wherein said polyether ester amide is formed from i) an aminocarboxylic acid having six or more carbon atoms or a lactam or a diamine-dicarboxylate having six or more carbon atoms, ii) a polyethylene glycol of 200 to 6,000 in number average molecular weight and iii) a dicarboxylic acid with 4 to 20 carbon atoms, with components ii) and iii) accounting for 95 to 10 weight % wherein said composition has a volume resistivity of 7.times.10.sup.10 -1.times.10.sup.12 .OMEGA. cm.
- 8. A housing for optical or magnetic recording media comprising a molded structure prepared by molding an intrinsically antistatic resin composition consisting essentially of (A) 5 to 40 weight % of a polyether ester amide, (B) 95 to 60 weight % of a thermoplastic resin selected from the group consisting of styrene-based resins which are free of carboxyl groups and polycarbonate resins, (C) 0.1 to 20 weight % of a vinyl polymer containing carboxyl groups and (D) 1 to 60 weight % of an organic halogen compound, said weight % being based on the weight of the entire housing.
- 9. The composition defined in claim 8 wherein said organic halogen compound (D) contains a halogen atom selected from the group consisting of fluorine and bromine.
- 10. The composition defined in claim 8 wherein said organic halogen compound (D) is selected from the group consisting of low molecular weight organic bromine compounds and halogenated polymers and oligomers.
- 11. The composition defined in claim 10 wherein said low molecular weight organic bromine compounds are selected from the group consisting of hexabromobenzene, pentabromotoluene, hexabromobisphenyl, decabromobisphenyl, hexabromocyclodecane, decabromodiphenyl ether, octabromodiphenyl ether, hexabromodiphenyl ether, bis(pentabromophenoxy)ethane, ethylenebis(tetrabromophthalimide) and tetrabromobisphenol A.
- 12. The composition defined in claim 10 wherein the halogenated polymers and oligomers are selected from the group consisting of brominated polycarbonates, brominated epoxy compounds, brominated polyphenylene ether, brominated bisphenol A, condensation products of cyanuric chloride and brominated bisphenol, brominated polystyrene and mixtures thereof.
- 13. The composition as defined in claim 8, wherein said composition has a volume resistivity of 7.times.10.sup.10 -1.times.10.sup.12 .OMEGA. cm.
Priority Claims (3)
Number |
Date |
Country |
Kind |
61-84338 |
Apr 1986 |
JPX |
|
61-115528 |
May 1986 |
JPX |
|
61-108503 |
May 1986 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 08/595,644, filed on Feb. 2, 1996, now abandoned which is a divisional of Ser. No. 08/240,270 filed May 10, 1994, now U.S. Pat. No. 5,500,478, which is a divisional of Ser. No. 07/980,106, filed Nov. 23, 1992, now U.S. Pat. No. 5,338,795, which is a continuation of Ser. No. 07/747,469 filed Aug. 13, 1991, now abandoned which is a continuation of Ser. No. 07/295,239 filed Jan. 9, 1989, now abandoned which is a divisional of application Ser. No. 07/036,088 filed Apr. 9, 1987 now abandoned.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
4683255 |
Sugio et al. |
Jul 1987 |
|
5616418 |
Vasselin et al. |
Apr 1997 |
|
Foreign Referenced Citations (1)
Number |
Date |
Country |
61-73753 |
Apr 1986 |
JPX |
Divisions (3)
|
Number |
Date |
Country |
Parent |
240270 |
May 1994 |
|
Parent |
980106 |
Nov 1992 |
|
Parent |
36088 |
Apr 1987 |
|
Continuations (3)
|
Number |
Date |
Country |
Parent |
595644 |
Feb 1996 |
|
Parent |
747469 |
Aug 1991 |
|
Parent |
295239 |
Jan 1989 |
|