Claims
- 1. An SRD, comprising:
a substrate support adapted to hold and rotate a substrate; a source of fluid adapted to supply fluid to a surface of a substrate positioned on the substrate support; and a shield positioned to receive fluid displaced from a substrate rotating on the substrate support, and comprising a substrate-facing surface at least a portion of which has a particle-blasted finish.
- 2. The SRD of claim 1, wherein the particle-blasted finish has a hydrophilic characteristic.
- 3. The SRD of claim 2, wherein the substrate support holds and rotates the substrate in a vertical orientation.
- 4. The SRD of claim 3, wherein at least part of the shield is at a higher elevation than the substrate support.
- 5. The SRD of claim 4, wherein at least part of the particle-blasted finish is above the substrate when the substrate is held and rotated by the substrate support.
- 6. The SRD of claim 4, wherein the shield is movable between a first position in which at least part of the shield is above the substrate when the substrate is held and rotated by the substrate support and a second position in which the shield does not obstruct placement of the substrate on the substrate support from a position above the substrate support.
- 7. The SRD of claim 4, wherein the particle-blasted finish has a downwardly sloped cross section.
- 8. The SRD of claim 7, wherein a top surface of the shield has a downwardly sloped cross section.
- 9. The SRD of claim 1, wherein the shield comprises polycarbonate.
- 10. The SRD of claim 9, wherein the shield is a unitary piece of molded polycarbonate.
- 11. The SRD of claim 9, wherein the particle-blasted finish is a grit-blasted finish.
- 12. The SRD of claim 1, wherein the shield is a unitary piece of molded polycarbonate.
- 13. The SRD of claim 4, wherein the substrate-facing surface has surface features for directing fluid from an apex of the shield.
- 14. The SRD of claim 4, wherein the substrate-facing surface has a plurality of channels configured to direct fluid circumferentially along the shield.
- 15. The SRD of claim 4, wherein the particle-blasted finish has a downwardly sloped cross section and wherein the channels are configured to direct fluid along the downwardly sloped cross section.
- 16. A vertical SRD, comprising:
a substrate support adapted to hold and rotate a vertically oriented substrate; a source of fluid adapted to supply fluid to the surface of a substrate positioned on the substrate support; and a shield system comprising a plurality of vertically and horizontally staggered shields positioned to receive fluid flung from a substrate rotating on the substrate support, at least one of the shields having a substrate-facing surface that has a particle-blasted finish.
- 17. The SRD of claim 16, wherein the plurality of shields includes:
a main shield wherein the substrate-facing surface is angled from a higher elevation closest to a first side of the substrate to a lower elevation closest to a second side of the substrate so that the fluid flows therealong to a lower edge of the main shield; a lower shield positioned at a lower elevation than the main shield, extending from a point beneath the main shield to a point beyond the lower edge of the main shield, and being angled from a higher elevation closest to the lower edge of the main shield, to a lower elevation farthest from the main shield; and a higher shield positioned at a higher elevation than the main shield, extending from a point above the main shield to a point beyond the higher edge of the main shield and being angled from a lower elevation closest to the higher edge of the main shield, to a higher elevation farthest from the main shield.
- 18. The SRD of claim 16, wherein at least a portion of the at least one particle-blasted finish has a hydrophilic characteristic.
- 19. A vertical SRD, comprising:
a substrate support adapted to hold and rotate a vertically oriented substrate; a source of fluid adapted to supply fluid to the surface of a substrate positioned on the substrate support; and a housing which encloses the substrate support, the housing having a top portion that has a slope adapted to cause fluid to flow therealong away from a region above the substrate support, the top portion having a lower surface that has a particle-blasted finish.
- 20. The SRD of claim 19, wherein at least a portion of the lower surface of the top portion has a hydrophilic characteristic.
- 21. A method of fabricating a component of an SRD, the method comprising:
forming a shield adapted to fit in an SRD housing and having a concave surface adapted to receive fluid displaced from a substrate held and rotated in the housing; and particle-blasting the concave surface of the shield.
- 22. The method of claim 21, wherein the particle-blasting step is performed so as to impart a hydrophilic characteristic to the concave surface of the shield.
- 23. The method of claim 21, wherein the particle-blasting step includes grit-blasting the concave surface of the shield.
- 24. The method of claim 21, wherein the forming step includes molding a polycarbonate material.
- 25. A shield for at least partially surrounding a substrate to be spin dried, the shield comprising:
a concave surface adapted to extend at least partially around a perimeter of a semiconductor substrate and to face toward the semiconductor substrate, and having a particle-blasted finish that exhibits a hydrophilic characteristic.
- 26. The shield of claim 25 wherein the concave surface has a plurality of surface features formed therein so as to increase surface area.
- 27. The shield of claim 26 wherein the surface features are further adapted to direct fluid from an apex of the shield, when the shield is vertically oriented.
- 28. The shield of claim 27 wherein the concave surface has a sloped cross section and the surface features are adapted to direct fluid along the sloped cross section.
- 29. The shield of claim 27 wherein the surface features are adapted to direct fluid circumferentially along the concave surface.
- 30. The shield of claim 27 wherein the surface features have a sinusoidal cross section.
- 31. A shield for at least partially surrounding a substrate to be spin dried, the shield comprising:
a concave surface adapted to extend at least partially around a perimeter of a semiconductor substrate and to face toward the semiconductor substrate, and having a plurality of surface features formed therein so as to increase surface area.
- 32. The shield of claim 31 wherein the surface features are further adapted to direct fluid from an apex of the shield, when the shield is vertically oriented.
- 33. The shield of claim 32 wherein the concave surface has a sloped cross section and the surface features are adapted to direct fluid along the sloped cross section.
- 34. The shield of claim 32 wherein the surface features are adapted to direct fluid circumferentially along the concave surface.
- 35. The shield of claim 34 wherein the surface features have a sinusoidal cross section.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims priority from U.S. Provisional Application Serial No. 60/398,997, filed Jul. 26, 2002, which is related to commonly-owned co-pending U.S. patent application Ser. No. 09/544,660, filed Apr. 6, 2000, and entitled “Spin-Rinse-Dryer”, which claims priority from U.S. Provisional Application Serial No. 60/128,257, filed Apr. 8, 1999. All of the above-referenced patent applications are hereby incorporated by reference herein in their entirety.
Provisional Applications (1)
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Number |
Date |
Country |
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60398997 |
Jul 2002 |
US |