The present disclosure relates generally to instruments and techniques for measuring charged sample particles, and further to such instruments and techniques for measuring charges of such particles over at least one range of differing physical and/or chemical conditions in which the sample particles undergo structural changes.
Spectrometry instruments provide for the identification of chemical components of a substance by measuring one or more molecular characteristics of the substance. Some such instruments are configured to analyze the substance in solution and others are configured to analyze charged particles of the substance in a gas phase. Molecular information produced by many such charged particle measuring instruments is limited because such instruments lack the ability to measure particle charge or to process particles based on their charge.
The present disclosure may comprise one or more of the features recited in the attached claims, and/or one or more of the following features and combinations thereof. In one aspect, an instrument for analyzing charged particles may comprise an ion generator configured to generate charged particles from a sample of particles, a mass spectrometer configured to receive the charged particles generated by the ion generator and to measure masses and charge magnitudes of the generated charged particles, a thermal energy source configured to transfer thermal energy to at least one of the sample particles and the charged particles generated by the ion generator, a processor, and a memory having instructions stored therein executable by the processor to cause the processor to (a) control the thermal energy source to cause the charged particles to enter the mass spectrometer at each of a plurality of different temperatures within a range of temperatures over which the sample particles undergo structural changes, (b) control the mass spectrometer to measure at least the charge magnitudes of the generated charged particles at each of the plurality of different temperatures, (c) determine an average charge magnitude of the generated charged particles at each of the plurality of different temperatures based on the measured charge magnitudes, and (d) determine an average charge magnitude profile over the range of temperatures based on the determined average charge magnitudes.
In another aspect, an instrument for analyzing charged particles may comprise an ion generator configured to generate charged particles from a sample of particles, a mass spectrometer configured to receive the charged particles generated by the ion generator and to measure masses and charge magnitudes of the generated charged particles, a thermal energy source configured to transfer thermal energy to at least one of the sample particles and the charged particles generated by the ion generator, a processor, and a memory having instructions stored therein executable by the processor to cause the processor to (a) control the thermal energy source to cause the charged particles to enter the mass spectrometer at each of a plurality of different temperatures within a range of temperatures over which the sample particles undergo structural changes, (b) control the mass spectrometer to measure the masses and charge magnitudes of the generated charged particles at each of the plurality of different temperatures, and (c) within a selected range of the measure masses, (i) identify all charge magnitude peaks of the measured charge magnitudes at a first one of the plurality of temperatures, and (ii) identify additional charge magnitudes of the measured charge magnitudes at each of one or more additional ones of the plurality of temperatures each having a higher temperature than that of the first one of the plurality of temperatures.
In yet another aspect, an instrument for analyzing charged particles may comprise an ion generator within or coupled to an ion source region, the ion generator configured to generate charged particles from a sample of particles, a mass spectrometer coupled to the ion source region, the mass spectrometer configured to receive the charged particles generated by the ion generator and to measure masses and charge magnitudes of the generated charged particles, a first pump coupled to the ion source region and configured to control an operating pressure of the ion source region, a second pump coupled to the mass spectrometer and configured to control an operating pressure of the mass spectrometer, a processor, and a memory having instructions stored therein executable by the processor to cause the processor to (a) control at least one of the first and second pumps to cause the charged particles to enter or pass through the mass spectrometer at each of a plurality of different pressures within a range of pressures over which the sample particles undergo structural changes, (b) control the mass spectrometer to measure at least the charge magnitudes of the generated charged particles at each of the plurality of different pressures, (c) determine an average charge magnitude of the generated charged particles at each of the plurality of different pressures based on the measured charge magnitudes, and (d) determine an average charge magnitude profile over the range of pressures based on the determined average charge magnitudes.
In still another aspect, an instrument for analyzing charged particles may comprise an ion generator within or coupled to an ion source region, the ion generator configured to generate charged particles from a sample of particles, a mass spectrometer coupled to the ion source region, the mass spectrometer configured to receive the charged particles generated by the ion generator and to measure masses and charge magnitudes of the generated charged particles, a first pump coupled to the ion source region and configured to control an operating pressure of the ion source region, a second pump coupled to the mass spectrometer and configured to control an operating pressure of the mass spectrometer, a processor, and a memory having instructions stored therein executable by the processor to cause the processor to (a) control at least one of the first and second pumps to cause the charged particles to enter or pass through the mass spectrometer at each of a plurality of different pressures within a range of pressures over which the sample particles undergo structural changes, (b) control the mass spectrometer to measure the masses and charge magnitudes of the generated charged particles at each of the plurality of different pressures, and (c) within a selected range of the measure masses, (i) identify all charge magnitude peaks of the measured charge magnitudes at a first one of the plurality of pressures, and (ii) identify additional charge magnitudes of the measured charge magnitudes at each of one or more additional ones of the plurality of pressures each having one of a higher or lower pressure than that of the first one of the plurality of pressures.
In a further aspect, a method for analyzing charged particles may comprise in or into an ion source region, generating charged particles from a sample of particles, causing the charged particles to enter a mass spectrometer from the ion source region at each of a plurality of differing physical and/or chemical conditions in a range of physical and/or chemical conditions in which the sample particles undergo structural changes, controlling the mass spectrometer to measure at least the charge magnitudes of the generated charged particles at each of the plurality of differing physical and/or chemical conditions, determining, with a processor, an average charge magnitude of the generated charged particles at each of the plurality of differing physical and/or chemical conditions based on the measured charge magnitudes, and determining, with the processor, an average charge magnitude profile over the range of physical and/or chemical conditions based on the determined average charge magnitudes.
For the purposes of promoting an understanding of the principles of this disclosure, reference will now be made to a number of illustrative embodiments shown in the attached drawings and specific language will be used to describe the same.
This disclosure relates to apparatuses and techniques for measuring particle charges of a sample over at least one range of differing physical and/or chemical conditions in which the sample particles undergo structural changes, and for analyzing the resulting measurements to identify new structural subspecies as a function of at least particle charge. For purposes of this document, the terms “charged particle” and “ion” may be used interchangeably, and both terms are intended to refer to any particle having a net positive or negative charge. The term “charge magnitude” should be understood to mean the number of charges, i.e., the number of elemental charges “e,” of a charged particle, such that the terms “charge magnitude” and “number of charges of a charged particle” are synonymous and may be used interchangeably. A charged particle having a charge of 50 e thus has a charge magnitude of 50 e.
The phrase “at least one range of differing physical and/or chemical conditions in which the sample particles undergo structural changes” should be understood to mean any set or progression of changing physical conditions to which the sample particles are subjected before and/or after ionization thereof in or during which the sample particles undergo structural changes, any set or progression of changing chemical conditions to which the sample particles are subjected before and/or after ionization thereof in or during which the sample particles undergo structural changes, and/or any combination of one or more such sets or progressions of changing physical and/or chemical conditions in or during which the sample particles undergo structural changes. An example of such physical conditions may include, but is not limited to, sample and/or charged particle temperature, such that a range of differing physical conditions is defined by a range of differing or changing temperatures to which the sample and/or charged particles are subjected. Another example of such physical conditions may include, but is not limited to, sample and/or charged particle pressure, such that a range of differing physical conditions is defined by a range of differing or changing pressures to which the sample and/or charged particles are subjected, or the like. An example of such chemical conditions may include, but is not limited to, a sample in the form of a mixture or solution in which the content or makeup of the mixture or solution changes, such that a range of differing or changing chemical conditions of the sample mixture or solution is defined by changes in the content or makeup of the sample mixture or solution, e.g., by adding and/or removing components to/from the sample mixture or solution, by changing the relative concentrations in the sample mixture or solution of two or more of its components, etc. Another example of such chemical conditions may include, but is not limited to, a chemical reaction between two or more components of a mixture or solution following combining such components together into, or to form, the mixture or solution, such that a range of differing or changing chemical conditions of the sample mixture or solution is defined by changes in the chemical properties of a newly formed mixture or solution as the components chemically react with one another over some period of time, e.g., up to and including an equilibrium of the mixture or solution. It is to be understood that the phrase “at least one range of differing physical and/or chemical conditions in which the sample particles undergo structural changes” may be or include a single range of a differing physical condition, a single range of a differing chemical condition, two or more ranges of the same or different changing physical conditions, two or more ranges of the same or different changing chemical conditions, or any combination of the foregoing. In any case, the term “structural changes” should be understood to mean any detectable, i.e., measurable, change in the structure(s) of one or more of the sample particles. Examples of such structural changes that a sample particle may undergo may include, but are not limited to, any conformational change, dissociation of a dimer, tetramer or larger macromolecular assembly into fragments, loss of a small ligand (e.g., drug), and/or any change that results in aggregation, assembly or related phenomena. It will be further understood that the term “melting transition” will refer to a structural change that a particle undergoes at a corresponding “melting temperature” thereof, and that the term “melting profile” will refer to the behavior of one or more properties of a particle within a specified temperature range which includes, i.e., which passes through, a melting temperature thereof.
Referring now to
In the illustrated embodiment, a voltage source VS1 is electrically connected to a processor 20 via a number, J, of signal paths, where J may be any positive integer, and is further electrically connected to the ion source region 12 via a number, K, of signal paths, where K may likewise be any positive integer. In some embodiments, the voltage source VS1 may be implemented in the form of a single voltage source, and in other embodiments the voltage source VS1 may include any number of separate voltage sources. In some embodiments, the voltage source VS1 may be configured or controlled to produce and supply one or more time-invariant (i.e., DC) voltages of selectable magnitude. Alternatively or additionally, the voltage source VS1 may be configured or controlled to produce and supply one or more switchable time-invariant voltages, i.e., one or more switchable DC voltages. Alternatively or additionally, the voltage source VS1 may be configured or controllable to produce and supply one or more time-varying signals of selectable shape, duty cycle, peak magnitude and/or frequency.
The processor 20 is illustratively conventional and may include a single processing circuit or multiple processing circuits. The processor 20 illustratively includes or is coupled to a memory 22 having instructions stored therein which, when executed by the processor 20, cause the processor 20 to control the voltage source VS1 to produce one or more output voltages for selectively controlling operation of the ion generator 16. In some embodiments, the processor 20 may be implemented in the form of one or more conventional microprocessors or controllers, and in such embodiments the memory 22 may be implemented in the form of one or more conventional memory units having stored therein the instructions in a form of one or more microprocessor-executable instructions or instruction sets. In other embodiments, the processor 20 may be alternatively or additionally implemented in the form of a field programmable gate array (FPGA) or similar circuitry, and in such embodiments the memory 22 may be implemented in the form of programmable logic blocks contained in and/or outside of the FPGA within which the instructions may be programmed and stored. In still other embodiments, the processor 20 and/or memory 22 may be implemented in the form of one or more application specific integrated circuits (ASICs). Those skilled in the art will recognize other forms in which the processor 20 and/or the memory 22 may be implemented, and it will be understood that any such other forms of implementation are contemplated by, and are intended to fall within, this disclosure. In some alternative embodiments, the voltage source VS1 may itself be programmable to selectively produce one or more constant and/or time-varying output voltages.
In the illustrated embodiment, the voltage source VS1 is illustratively configured to be responsive to control signals produced by the processor 20 to produce one or more voltages to cause the ion generator 16 to generate ions from the sample 18. In some embodiments, the sample 18 is positioned within the ion source region 12, as illustrated in
In the illustrated embodiment, the instrument 10 includes a thermal energy source 24 is configured to selectively thermally energize, i.e., transfer thermal energy to, the sample 18 and/or to the charged particles exiting the ion generator 16 prior to entrance of the charged particles into the mass spectrometer 14. In some embodiments, examples of which will be described below, the thermal energy source 24 may not be utilized, and in such embodiments the thermal energy source 24 may be omitted. In some embodiments, the thermal energy may be in the form of heat transferred from the source 24 to the sample particles, and in other embodiments the thermal energy may be in the form of heat transferred from the sample particles to the source 24, i.e., cooling of the sample particles. In some embodiments, the source 24 may include both heating and cooling capabilities so that the sample temperature may be swept through ambient temperature from warmer to cooler or from cooler to warmer, or may be swept from any of cold to colder, colder to less cold, cold or cool to warm or hot, warm or hot to cool or cold, warm to warmer, warmer to less warm, warm to hot, hot to warm, etc. Example heat sources 24 may include, but are not limited to, conventional solution heaters and heating units, one or more sources of radiation, e.g., infrared, laser, microwave or other, at any radiation frequency, one or more heated gasses or other fluid(s) or the like, and example cooling sources 24 may include, but are not limited to, conventional solution chillers, one or more chilled gasses or other fluid(s), or the like.
In some embodiments, as illustrated by example in
Alternatively or additionally, the thermal energy source 24 may be implemented in the form of one or more devices for thermally energizing charged particles exiting the ion generator 16 and prior to entrance into the mass spectrometer 14. In this embodiment, the thermal energy source 24 is responsive to one or more voltages produced by the voltage source VS1 and/or to one or more control signals produced by the processor 20, to control the temperature of the charged particles exiting the ion generator 16 to a target temperature by heating or cooling the charged particles prior to entry into the mass spectrometer 14. As with the sample temperature control embodiment, the charged particles generated by the ion generator 16 likewise enter the mass spectrometer 14 at the target temperature. In any case, it will be understood that the target temperature may be any temperature above or below ambient. Some examples of such a thermal energy source 24 and operation thereof for heating the ionized particles are disclosed in co-pending International Application No. PCT/US2018/064005, filed Dec. 5, 2018, the disclosure of which is incorporated herein by reference in its entirety. Those skilled in the art will recognize other structures and/or techniques for controlling the temperature of charged particles entering the mass spectrometer 14, by heating or cooling prior to or after inducing charge thereon, and it will be understood that any such other structures and/or techniques are intended to fall within the scope of this disclosure.
In some embodiments, one or more conventional sensors 25 may optionally be operatively coupled to the ion source region 12 and electrically coupled to the processor 20 as illustrated in
The mass spectrometer 14 illustratively includes two sections coupled together; an ion processing region 26 and an ion detection region 28. A second voltage source VS2 is electrically connected to the processor 20 via a number, L, of signal paths, where L may be any positive integer, and is further electrically connected to the ion processing region 26 via a number, M, of signal paths, where M may likewise be any positive integer. In some embodiments, the voltage source VS2 may be implemented in the form of a single voltage source, and in other embodiments the voltage source VS2 may include any number of separate voltage sources. In some embodiments, the voltage source VS2 may be configured or controlled to produce and supply one or more time-invariant (i.e., DC) voltages of selectable magnitude. Alternatively or additionally, the voltage source VS2 may be configured or controlled to produce and supply one or more switchable time-invariant voltages, i.e., one or more switchable DC voltages. Alternatively or additionally, the voltage source VS2 may be configured or controllable to produce and supply one or more time-varying signals of selectable shape, duty cycle, peak magnitude and/or frequency. As one specific example of the latter embodiment, which should not be considered to be limiting in any way, the voltage source VS2 may be configured or controllable to produce and supply one or more time-varying voltages in the form of one or more sinusoidal (or other shaped) voltages in the radio frequency (RF) range.
In some embodiments, the mass spectrometer 14 is configured to measure both mass and charge magnitudes of charged particles generated by the ion generator 16 as illustrated by example in
In one embodiment in which the mass spectrometer 14 is provided in the form of a mass spectrometer configured to measure both mass and charge magnitudes of charged particles generated by the ion generator 16, the mass spectrometer 14 may be implemented in the form of a charge detection mass spectrometer (CDMS), wherein the ion processing region 26 is or includes a conventional mass spectrometer or mass analyzer and the ion detection region 28 illustratively includes one or more corresponding CDMS charge detectors. In some embodiments, the one or more CDMS charge detectors may be provided in the form of one or more electrostatic linear ion traps (ELITs), and in other embodiments the one or more CDMS charge detectors may be provided in the form of at least one orbitrap. In some embodiments, the CDMS charge detector(s) may include at least one ELIT and at least one orbitrap. CDMS is illustratively a single-particle technique typically operable to measure mass and charge magnitude values of single ions, although some CDMS detectors have been designed and/or operated to measure mass and charge of more than one charged particle at a time. Some examples of CDMS instruments and/or techniques, and of CDMS charge detectors and/or techniques, which may be implemented in the mass spectrometer 14 of
In another embodiment in which the mass spectrometer is provided in the form of a mass spectrometer configured to measure both mass and charge magnitudes of charged particles generated by the ion generator 16, the mass spectrometer 14 may be implemented in the form of a mass spectrometer configured to measure mass-to-charge ratios of charged particles and further configured to simultaneously measure charge magnitudes of the charged particles. In such embodiments, the ion processing region 26 is or includes an ion acceleration region and/or a scanning mass-to-charge ratio filter, and the ion detection region 28 illustratively includes a charge detector array disposed in an electric field-free drift region or drift tube. In such embodiments, a conventional ion detector 30, e.g., a conventional microchannel plate detector or other conventional ion detector, is positioned at the outlet end of the drift region or drift tube and is electrically connected to the processor as illustrated by dashed-line representation in
Regardless of the particular form in which the mass spectrometer 14 is provided, the various sections of the instrument 10 are controlled to sub-atmospheric pressure for operation thereof as is conventional. In the illustrated embodiment, for example, a so-called vacuum pump P1 is operatively coupled to the ion source region 12, another vacuum pump P2 is operatively coupled to the ion processing region 26 of the mass spectrometer 14 and yet another vacuum pump P2 is operatively coupled to the ion detection region 28 of the mass spectrometer. In the illustrated embodiment, each of the pumps P1, P2 and P3 is electrically coupled to the processor 20 such that the processor 20 is configured to control operation of each of the pumps P1, P2 and P3 and therefore independently control the pressures in each of the three respective regions 12, 26 and 28. In alternate embodiments, one or more of the pumps P1, P2 and/or P3 may be manually controlled. In still other embodiments, more or fewer pumps may be implemented to control the pressure in more or fewer respective portions of the instrument 10. In some embodiments in which the thermal energy source 24 is omitted, the sensor 25 may be provided in the form of a pressure sensor operable to provide a pressure signal to the processor 20 from which the processor 20 is operable to determine or estimate the pressure within the ion source region 12. In embodiments in which the thermal energy source 24 is included, the sensor 25 may include a temperature sensor and a pressure sensor. In any case, one or more additional pressure sensors may be operatively coupled to the ion processing region 26 and/or to the ion detection region 28 for determination by the processor 20 of the pressure(s) in this/these region(s).
In other embodiments, one or more examples of which will be described further below, the mass spectrometer 14 may be provided in the form of any conventional mass spectrometer configured to measure mass-to-charge ratios of charged particles generated by the ion generator 16. In such embodiments, the ion processing region 26 may typically be implemented in the form of a conventional ion acceleration region, the ion detection region 28 will be implemented in the form of one or more conventional drift tubes, the charge amplifier(s) CA will be omitted and the ion detector 30 or other ion detector suitably positioned in the mass spectrometer will be included.
Referring now to
In other embodiments in which the thermal energy source 24 is configured and positioned relative to the ion source region 12 to operate on the charged particles exiting the ion generator 16, step 54 of the process 50 illustratively includes step 60 followed by step 56. The processor 20 is operable at step 60 to control the voltage source VS1 to produce one or more voltages to cause the ion generator 16 to generate charged particles, and is then operable at step 56 to control the voltage source VS1 to produce one or more voltages, and/or to control the thermal energy source 24 directly, to cause the thermal energy source 24 to control the temperature of the charged particles exiting the ion generator 16 and entering the mass spectrometer 14 to the temperature T(i). In embodiments which include the one or more sensors 25, the processor 20 may be further operable at step 56 to control the voltage source VS1 and/or the thermal energy source 24 based on feedback signal(s) produced by the one or more sensors 25. In any case, charged particles generated from the sample 18 by the ion generator 16 enter the mass spectrometer 14 at the target temperature T(i).
Following step 54, the processor 20 is illustratively operable at step 62 to control the voltage source VS2 to supply the charged particles at the target temperature T(i) exiting the ion source region 12 and entering the ion processing region 26 of the mass spectrometer 14 to the charge detection region 28 of the mass spectrometer 14. Based on the signals produced by the one or more charge amplifiers CA, and in some embodiments on signals produced by the ion detector 30 as described above, the processor 20 is operable thereafter at steps 64-68 to determine mass and charge magnitude values of the charged particles at the target temperature T(i), and to store the particle mass and charge magnitude measurements at T(i) in the memory 22. In embodiments in which the mass spectrometer 14 is a CDMS, steps 62-68 are illustratively repeated until all, or at least a desired subset, of the different charged particles generated from the sample 18 are processed.
Following step 68, the process 50 advances to step 70 where the processor 20 is operable to determine whether the current count value i has advanced to an end count value S. If not, the process 50 advances to step 72 where the count value i is incremented by 1 and the process 50 then loops back to step 54 to re-execute the process 50 at another temperature. The temperature range over which the process 50 is executed may be any temperature range in which the particles generated from the sample 18 undergo structural changes. In one example implementation of the process 50, the temperature range over which the process 50 is executed is a temperature range which spans the melting temperatures of the particles generated from the sample 18, and the total number of incremental temperatures within the selected temperature range over which the process 50 is executed may be any integer number such that the step size between incremental temperatures may be any desired step size. It will be understood that the temperature range may illustratively be advanced in the process 50 from the coolest temperature to the warmest, or vice versa, or the temperature may instead be controlled non-linearly.
As one example, which should not be considered to be limiting in any way, the temperature range over which the process 50 is executed may be 65 degrees C., which may illustratively begin at 25 degrees C. and end at 90 degrees C., with a step size of 5 degrees C. between each execution of the process 50 so that mass and charge values of the charged particles generated from the sample 18 are measured at 25 degrees C., 30 degrees C., 35 degrees C., . . . , 85 degrees C. and 90 degrees C. It will be understood that in other embodiments, the temperature range may be greater or lesser than 65 degrees C., the coolest temperature may be greater or lesser than 25 degrees C., the warmest temperature may be greater or lesser than 90 degrees C. and/or the steps size between temperatures may be greater or less than 5 degrees C.
Referring to
From the plots illustrated in
Referring now to
Following step 80, the processor 20 is operable at step 82 to compute an average charge magnitude melting profile over the temperature range T(1)-T(S) based on the average charge magnitudes CHAV computed at step 80 for each temperature in the temperature range T(1)-T(S). Thereafter at step 84, the processor 20 is operable to store the average charge magnitude melting profile computed at step 82 and, in some embodiment, to display the same. Again referring to the example described above with respect to
Referring now to
Referring now to
At step 160, the processor 20 is illustratively operable to display the identified subspecies peaks/groupings for one or more of the temperatures Tk-TY. Thereafter at step 162, the processor 20 is illustratively operable to compute charge magnitude abundance profiles for each such subspecies peak/grouping over the temperature range Tk-TY. Thereafter at step 164, the processor 20 is illustratively operable to store the results of the previous steps and, in some embodiments, to display the charge magnitude abundance profiles.
In some embodiments, the processor 20 may be operable to execute step 152 by analyzing only the charge magnitude measurements within the selected mass range subpopulation, although in other embodiments it may be useful to analyze abundance peaks of the measurements converted to mass-to-charge ratio values. The latter case is illustrated by an example execution of step 160 of the process 74C in
An example of steps 162 and 164 of the process 74C is illustrated in
Average charge magnitude melting profiles of the types illustrated in
As described at the outset, this disclosure relates to apparatuses and techniques for measuring particle charges of a sample over at least one range of differing physical and/or chemical conditions in which the sample particles undergo structural changes, and for analyzing the resulting measurements to identify new structural subspecies as a function of at least particle charge. In this regard, the processes illustrated in
In one alternate embodiment, the particle charges may be instead be measured over a range of changing instrument pressures via control of one or more of the pumps P1, P2, P3 depicted in
In another alternate embodiment, the particle charges may be instead be measured over a range of changing sample compositions (i.e. changing sample content or makeup), with each one or more sample composition changes being carried out by adding one or more components to the sample 18, removing one or more components from the sample 18, changing the relative concentration of one or more components relative to one or more other components, or the like. In this embodiment, step 56 of the process 50 illustrated in
In still another alternate embodiment, the particle charges may be instead be measured over reaction time range following a mixing together of two or more components to form, or alter, the sample 18. In this embodiment, step 56 of the process 50 illustrated in
While this disclosure has been illustrated and described in detail in the foregoing drawings and description, the same is to be considered as illustrative and not restrictive in character, it being understood that only illustrative embodiments thereof have been shown and described and that all changes and modifications that come within the spirit of this disclosure are desired to be protected.
This international patent application claims the benefit of, and priority to, U.S. Provisional Patent Application Ser. No. 62/837,373, filed Apr. 23, 2019, U.S. Provisional Patent Application Ser. No. 62/839,080, filed Apr. 26, 2019, and U.S. Provisional Patent Application Ser. No. 62/950,103, filed Dec. 18, 2019, the disclosures of which are all expressly incorporated herein by reference in their entireties.
This invention was made with government support under GM121751, and GM131100 awarded by the National Institutes of Health. The United States Government has certain rights in the invention.
Filing Document | Filing Date | Country | Kind |
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PCT/US2020/029287 | 4/22/2020 | WO | 00 |
Number | Date | Country | |
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62837373 | Apr 2019 | US | |
62839080 | Apr 2019 | US | |
62950103 | Dec 2019 | US |