The invention relates to imaging measurement systems with periodic pattern illumination, also known as structured illumination or Moire techniques and more specifically to improving the throughput of such systems.
Imaging and measurement systems with periodic pattern commonly use sinusoidal periodic illumination to improve the imaging resolution, to distinguish image information at the focal plane and to measure the heights of objects. These techniques have the potential of being more light efficient, faster and of providing better resolution than standard confocal imaging microscopy or standard triangulation height measurement systems. See for example, Rainer Heintzmann, Handbook of Biologic Confocal Microscopy 3rd edition, chapter 13 “Structured Illumination Methods”, Springer 2006. The main limitations to throughput come from insufficient light intensity, the need to image the same object several times while changing the phase of the illumination and the multiple calculations required to extract the information from the optical images.
Whether used to extract an image or to measure height, most of the systems using periodic pattern illumination include the elements of:
U.S. Pat. No. 05,867,604 discloses a method to improve lateral resolution of optical imaging system by scanning the object with periodic pattern illumination. According to the teaching of U.S. Pat. No. 05,867,604, if an object is illuminated with periodic pattern illumination, two synthetic images can be extracted by numerical processing the optical image namely S1 and S2. S1 is a linear transformation of the reflectivity of the object with a better transfer function than the optical Modulation Transfer Function (MTF), in the high frequencies range. Therefore S1 has a better resolution to identify details of the object than the optical image by itself. S2 is the Hilbert transform of S1. S1 and S2 can distinguish information in focus only (slicing quality), because out of focus, the modulation of the periodic pattern illumination fades.
Beyond slicing and resolution improvement of imaging, industrial metrology machines use periodic pattern illumination technique for height measurement of object like semiconductors bumps. If the object is illuminated with periodic pattern illumination from one direction at angle α and imaged from a different direction at angle β, the phase of the pattern at the image plane will depend on the height of the object. This configuration for height measurement is also called Moire technology, because of the use of gratings and illumination with tilted angles. U.S. Pat. No. 07,023,559 discloses a measurement system with periodic pattern illumination to measure height of objects such as solder bumps. According to the teaching of U.S. Pat. No. 07,023,559, a grid of light is projected on an object creating a periodic pattern illumination and a camera images the object from different angle. The height of the object is analyzed from several images taken by the camera, wherein each image has a different position of the grid (different phase). The height of the object is related to the phase measured in this process through calibration with a known target.
U.S. Pat. No. 06,603,103 discloses a measurement system with periodic pattern illumination and using continuous scanning. According to the teaching of U.S. Pat. No. 06,603,103, the object is illuminated by a grid of light and imaged by three lines of CCD (trilinear array). The object is moved with constant velocity, so any point of the object is imaged three times, each time by a different CCD line and each time in different phase. Fourier analysis of the three images can analyze the phase of the signal and thus measure the height of the object.
It is common to use a Time Delayed Integration (TDI) sensor in continuous scanning with uniform illumination, but not with periodic patterned illumination. U.S. Pat. No. 04,877,326 discloses an inspection system including an illumination apparatus designed to provide substantially uniform focused illumination along a narrow line and a TDI sensor for imaging the object. According to the teachings of U.S. Pat. No. 04,877,326, the application of TDI to inspection is attractive because inspection processes tend to be light limited and TDI allows the integration time to be increased without slowing down inspection.
Most scanning systems with a TDI sensor such as described by U.S. Pat. No. 04,877,326 cannot use periodic pattern illumination because the process of Time Delay Integration will eventually eliminate any information of the original pattern of the illumination.
U.S. Pat. No. 06,714,283 discloses a sensor and method for range measurements using a TDI device with structured illumination. To avoid losing the range information in the TDI process, the exposure of the device to the reflection of the light beam is restricted to the first integration period of the acquisition cycle of the TDI device. By restricting the TDI to only one integration period according to the teaching of U.S. Pat. No. 06,714,283 the loss of phase information is avoided, but it also prevents using the TDI in light limiting applications because only a fraction of the potential integration time of the sensor is used.
The present invention overcomes the limitations of the prior art by providing an optical scanning imaging system that illuminate the object with a periodic pattern light and images the object with a patterned sensitivity Time Delayed Integration (TDI) sensor. The patterned sensitivity TDI sensor includes an array of pixels whose light sensitivity varies periodically across the array, having the same period as the illumination when imaged to the sensor. For example, the sensor can be masked, so that some of the pixels are completely or partially blocked from light. The integration process of the TDI sensor with patterned sensitivity becomes part of the mathematical analysis required in structured illumination to extract phase and amplitude, therefore it saves calculation time and enhances throughput.
The invention discloses a patterned TDI sensor for imaging an object, including an array of pixels, having respective sensitivities to light that vary according to a periodic pattern across the array. The invention further provides a method of inspecting the object including the steps of scanning the object with illumination that varies periodically across the object, imaging the object with a patterned sensitivity TDI sensor with a repetition length matched with a repetition length of the illumination and analyzing the output signal of the TDI sensor to extract information about the object. Such information may be an image or height of the object.
Hence, disclosed herein is a TDI sensor for imaging an object, including an array of pixels, the pixels having respective sensitivities to light that vary according to a periodic pattern across the array.
In many embodiments, the pixels are arranged in a plurality of columns and a phase shift of the periodic pattern is introduced between adjacent columns. In one such embodiment, the pattern has a period length of six pixels along each column and the phase of the pattern shifts by two pixels between adjacent columns. In another such embodiment, the pattern has a period length of four pixels along each column and the phase of the pattern shifts by one pixel between adjacent columns.
Also disclosed herein is a method of inspecting an object, including the steps of: (a) scanning the object with illumination that varies periodically across the object; (b) imaging the object with a patterned sensitivity TDI sensor that includes a plurality of pixels having a periodically varying light sensitivity, the light sensitivity having a repetition length matched with a repetition length of the illumination; and (c) analyzing an output signal of the TDI sensor to extract information about the object.
Normally, the information includes the height of the object and/or an image of the object. In some embodiments the image includes only in-focus information of the object. In other embodiments, the image includes information in phase with the periodic pattern illumination and/or information 90 degrees out of phase with the periodic pattern illumination.
Also disclosed herein is an imaging apparatus including the disclosed TDI sensor and an illuminator for illuminating an object with a periodic pattern illumination, wherein the periodic pattern illumination is matched with the periodic pattern of the TDI pixels.
The invention is herein described, by way of example only, with reference to the accompanying drawings, wherein:
The invention can be better understood from
where G is the optical magnification and p is the pixel size. All columns of the TDI pixel array have the same periodic pattern but there is a shift between adjacent columns of M pixels, which creates a phase shift (in radians) between adjacent columns of:
ξ=2 π M/L (2)
The integer N defined by:
N=M/L (3)
N is the repetition length along the line of the pixels array, meaning that the pattern of active and inactive pixels is identical every N columns. L and M should be so chosen that N is an integer. An example having L=6, M=2 and N=3 pixels is shown in
Mathematical Formulations
To better understand the imaging system of
I(i,j)=B0+B1 cos(2 π i/L+θI) i=1, 2, 3 . . . i(t) . . . iMax (4)
where B0 and B1 are constants that are independent of time, θI is the phase at the image plane and i=1, 2, 3 . . . is the line index of the pixel to which point 6 is imaged. The index i varies in time while point 6 is moving with velocity V. Any pixel (i,j) creates charge according to the intensity of the image and the electrical sensitivity of the pixel to light. As the active and inactive pixels of the TDI create a periodic pattern with period L, the sensitivity q(i,j) of the TDI pixels, in term of charge created in response to image intensity, can be written in form of series of harmonics:
q(i,j)=C0+C1 cos(2 π i/L+θj)+C2 cos(4 π i/L+2θj)+ . . . (5)
Where C0, C1, . . . are constants, and θj is the phase of the TDI pattern along column j. To evaluate the total charge output by the TDI sensor, resulting from imaging of point 6, we have to multiply the intensity of equation (4) with the sensitivity of equation (5) and sum up for i=1, 2, 3 . . . to imax. The resulting charge at column j is Q(j) satisfying:
Q(j)=Σ {C0+C1 cos(2 π i/L+θj)+C2 cos(4 π i/L+2θ)+ . . . }*{B0+B1 cos(2 π i/L+θ)} (6)
After summation, the resulting Q(j) can be written in the form of:
Q(j)=D0+D1 cos(ψ) (7)
ψ=θI−θj
In equation (7), D0 is the charge resulting from B0, the uniform component of the optical image of point 6 in equation (4). D0 is related to the object as an image, through the Modulation Transfer Function (MTF) of optical system 3 of
where N, ξ are defined in equations (2) and (3) and where:
N ξ=2 π (9)
From (8) and (9), a Fourier analysis of N data points Q(j), Q(j+1), . . . Q(j+N−1) extracts estimation of D0, D1 and ψ.
For example, consider the patterned pixels array of
{D1}2=˜{Q(j−1)sin(−2π/3)+Q(j+1)sin(2π/3)}2+{Q(j−1)cos(−2π/3)+Q(j)+Q(j+1)cos(2π/3)}2 (10)
and the same set Q(j−1), Q(j) and Q(j+1) for estimation of ψ:
The synthetic image in phase with the illumination S1 and the synthetic image 90 degrees out of phase with the illumination S2 as defined by U.S. Pat. No. 05,867,604 are estimated:
S
1
=D
1 cos(ψ−ψm) (12)
S
2
=D
1 sin(ψ−ψm) (13)
where ψm is a reference phase, that can be calibrated by measuring over a mirror target because a mirror target does not introduce phase shifts and the phase of the image is the same phase of the illumination.
While the invention has been described with respect to a limited number of embodiments, it will be appreciated that many variations, modifications and other applications of the invention may be made. Therefore, the claimed invention as recited in the claims that follow is not limited to the embodiments described herein.
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/IL08/00475 | 4/6/2008 | WO | 00 | 3/15/2010 |
Number | Date | Country | |
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60972802 | Sep 2007 | US |