Number | Name | Date | Kind |
---|---|---|---|
4626312 | Tracy | Dec 1986 | |
4871421 | Ogle et al. | Oct 1989 | |
4892753 | Wang et al. | Jan 1990 | |
4948458 | Ogle | Aug 1990 | |
4982140 | Witting | Jan 1991 | |
5346578 | Benzing et al. | Sep 1994 | |
5401350 | Patrick et al. | Mar 1995 | |
5405480 | Benzing et al. | Apr 1995 | |
5436528 | Paranjpe | Jul 1995 | |
5477975 | Rice | Dec 1995 | |
5494522 | Moriya et al. | Feb 1996 | |
5522934 | Suzuici et al. | Jun 1996 | |
5529657 | Ishii | Jun 1996 | |
5556501 | Collins et al. | Sep 1996 | |
5573595 | Dible | Nov 1996 | |
5589041 | Lantsman | Dec 1996 | |
5753044 | Hanawa et al. | May 1998 | |
5964949 | Savas | Oct 1999 |
Number | Date | Country |
---|---|---|
552491-A1 | Jul 1993 | EP |
596551-A1 | May 1994 | EP |
601468-A1 | Jun 1994 | EP |
680072-A2 | Nov 1995 | EP |
690666-A1 | Jan 1996 | EP |
792091-A1 | Aug 1997 | EP |
6-196446 | Jul 1994 | JP |
97-3330 | Sep 1997 | WO |
Entry |
---|
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Patent Abstracts of Japan, 62-195124, Aug. 27, 1987. |
Patent Abstracts of Japan, 03-030424, Feb. 8, 1991. |
Lii, “Etching”, ULSI Technology, eds. Chang et al. (McGraw-Hill, 1996), pp. 330-333. |
Chapman, Glow Discharge Processes: Sputtering and Plasma Etching (Wiley-Interscience, 1980), pp. 156-171. |
Copy of the Original filed drawings of U. S. Patent application 08/811893 (U.S. Patent 5,964,949) Copy. |