the radio frequency energy being inductively coupled to the plasma

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H01J37/321

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/321the radio frequency energy being inductively coupled to the plasma

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Patents Grantslast 30 patents

Information Patent Grant
Multi-state RF pulsing to control mask shape and breaking selectivi...
- Patent number 12,322,571
- Issue date Jun 3, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anomalous plasma event detection and mitigation in semiconductor pr...
- Patent number 12,322,582
- Issue date Jun 3, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing assembly and power supply arrangement
- Patent number 12,322,570
- Issue date Jun 3, 2025
- TRUMPF Huettinger Sp. z o. o.
- Andrzej Klimczak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for tuning a MHz RF generator within a cycle of...
- Patent number 12,322,572
- Issue date Jun 3, 2025
- Lam Research Corporation
- Arthur M. Howald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for medical plasma treatment and generation of...
- Patent number 12,318,499
- Issue date Jun 3, 2025
- Peter F. Vandermeulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsing plasma treatment for film densification
- Patent number 12,322,573
- Issue date Jun 3, 2025
- Applied Materials, Inc.
- Rui Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for growth of one or more crystalline materials
- Patent number 12,322,574
- Issue date Jun 3, 2025
- Sigma Carbon Technologies
- Tarun Sharda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal contamination reduction in substrate processing systems with...
- Patent number 12,322,579
- Issue date Jun 3, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for use in generating plasma
- Patent number 12,315,697
- Issue date May 27, 2025
- Dyson Technology Limited
- Sean Michael Carley
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for etching a semiconductor substrate in a pla...
- Patent number 12,315,732
- Issue date May 27, 2025
- Applied Materials, Inc.
- Daisuke Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Large-area high-density plasma processing chamber for flat panel di...
- Patent number 12,312,689
- Issue date May 27, 2025
- Applied Materials, Inc.
- Suhail Anwar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,315,698
- Issue date May 27, 2025
- Tokyo Electron Limited
- Cedric Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 12,315,701
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yasuhiko Kojima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ adsorbate formation for plasma etch process
- Patent number 12,308,212
- Issue date May 20, 2025
- Tokyo Electron Limited
- Du Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,308,208
- Issue date May 20, 2025
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 12,308,209
- Issue date May 20, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active switch on time control for bias supply
- Patent number 12,308,210
- Issue date May 20, 2025
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus
- Patent number 12,308,240
- Issue date May 20, 2025
- SPTS Technologies Limited
- Janet Hopkins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical emission spectroscopy for advanced process characterization
- Patent number 12,306,044
- Issue date May 20, 2025
- Tokyo Electron Limited
- Sergey Voronin
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for use of low frequency harmonics in bias radi...
- Patent number 12,308,211
- Issue date May 20, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF immune sensor probe for monitoring a temperature of an electrost...
- Patent number 12,308,265
- Issue date May 20, 2025
- Lam Research Corporation
- Siyuan Tian
- G01 - MEASURING TESTING
Information Patent Grant
Complex modality reactor for materials production and synthesis
- Patent number 12,296,312
- Issue date May 13, 2025
- LytEn, Inc.
- Michael W. Stowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of low temperature plasma enhanced chemical va...
- Patent number 12,300,497
- Issue date May 13, 2025
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for low temperature selective epitaxy in a dee...
- Patent number 12,297,559
- Issue date May 13, 2025
- Applied Materials, Inc.
- Abhishek Dube
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Robust tensorized shaped setpoint waveform streaming control
- Patent number 12,300,464
- Issue date May 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,300,465
- Issue date May 13, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for automated frequency tuning of radiofrequency...
- Patent number 12,300,463
- Issue date May 13, 2025
- Lam Research Corporation
- Mathew Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced film formation method
- Patent number 12,300,466
- Issue date May 13, 2025
- Tokyo Electron Limited
- Toshihiko Iwao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of uniformity control
- Patent number 12,300,468
- Issue date May 13, 2025
- Tokyo Electron Limited
- Shyam Sridhar
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250183004
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Hwasoo SEOK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...
- Publication number 20250183006
- Publication date Jun 5, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20250183020
- Publication date Jun 5, 2025
- SAMSUNG DISPLAY CO., LTD.
- Gi Woon SUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIQUID COOLING PLATE FOR COOLING OF DIELECTRIC WINDOW OF A SUBSTRAT...
- Publication number 20250183011
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Hanry ISSAVI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250183012
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250183005
- Publication date Jun 5, 2025
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Splitting Current from Direct-Drive Radiof...
- Publication number 20250174431
- Publication date May 29, 2025
- LAM RESEARCH CORPORATION
- Matthew Lowell Talley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE COUPLED COIL, RADIO FREQUENCY PROVISION APPARATUS, RADIO...
- Publication number 20250174432
- Publication date May 29, 2025
- JIANGSU LEUVEN INSTRUMENTS CO., LTD.
- Haiyang LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM
- Publication number 20250174434
- Publication date May 29, 2025
- TOKYO ELECTRON LIMITED
- Kota SHIHOMMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Source Tuning With Pulsed DC Bias
- Publication number 20250174436
- Publication date May 29, 2025
- MKS Instruments, Inc.
- Aaron RADOMSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL DEVICE AND METHOD FOR ACTUATING AN IMPEDANCE MATCHING CIRCU...
- Publication number 20250174437
- Publication date May 29, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Florian A. Maier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20250174433
- Publication date May 29, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...
- Publication number 20250174430
- Publication date May 29, 2025
- Applied Materials, Inc.
- Abdul Aziz KHAJA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSIENT CONTROL OF AN ASYMMETRIC WAVEFORM
- Publication number 20250174435
- Publication date May 29, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IGNITING AND SUPPLYING A LASER OR PLASMA WITH POWER, AND...
- Publication number 20250174438
- Publication date May 29, 2025
- TRUMPF Hüttinger GmbH + Co. KG
- Christian Thome
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY CONTROL FOR PLASMA PROCESSING
- Publication number 20250174444
- Publication date May 29, 2025
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER AFTER A STATE TRAN...
- Publication number 20250166969
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- RANADEEP BHOWMICK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LATERAL AND VERTICAL DIELECTROPHORESIS METHOD FOR MICRO/NANO-SCALE...
- Publication number 20250164442
- Publication date May 22, 2025
- Zhejiang Normal University
- CLARENCE AUGUSTINE TECK HUO TEE
- B03 - SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES O...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20250166971
- Publication date May 22, 2025
- ASM IP HOLDING B.V.
- Songwhe Herr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...
- Publication number 20250166965
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CHAMBER FOR WAFER ETCHING AND WAFER ETCHING METHOD USING PLA...
- Publication number 20250166968
- Publication date May 22, 2025
- Nam Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH PHASE-LOCKED WAVEFORMS
- Publication number 20250166966
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Pingshan Luan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING VARIABILITY IN FEATURES OF A SUBST...
- Publication number 20250166967
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...
- Publication number 20250157790
- Publication date May 15, 2025
- Applied Materials, Inc.
- Bencherki MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250154649
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Kenichi KOTE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POWER AMPLIFIER, RADIO FREQUENCY GENERATOR, AND WIRELESS POWER TRAN...
- Publication number 20250158581
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Sunwoo Nam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUB-MILLISECOND OPTICAL DETECTION OF PULSED PLASMA PROCESSES
- Publication number 20250157801
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Francisco Machuca
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD
- Publication number 20250157787
- Publication date May 15, 2025
- TOKYO ELECTRON LIMITED
- Masakazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...
- Publication number 20250157788
- Publication date May 15, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING

the radio frequency energy being inductively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Multi-state RF pulsing to control mask shape and breaking selectivi...

Anomalous plasma event detection and mitigation in semiconductor pr...

Pulsing assembly and power supply arrangement

Systems and methods for tuning a MHz RF generator within a cycle of...

Methods and systems for medical plasma treatment and generation of...

Pulsing plasma treatment for film densification

System for growth of one or more crystalline materials

Metal contamination reduction in substrate processing systems with...

Method and apparatus for use in generating plasma

Method and apparatus for etching a semiconductor substrate in a pla...

Large-area high-density plasma processing chamber for flat panel di...

Plasma processing method and plasma processing apparatus

Film forming apparatus

In-situ adsorbate formation for plasma etch process

Substrate processing method and substrate processing apparatus

Workpiece processing apparatus with plasma and thermal processing s...

Active switch on time control for bias supply

Apparatus for preventing contamination of self-plasma chamber

Method and apparatus

Optical emission spectroscopy for advanced process characterization

Systems and methods for use of low frequency harmonics in bias radi...

RF immune sensor probe for monitoring a temperature of an electrost...

Complex modality reactor for materials production and synthesis

Method and apparatus of low temperature plasma enhanced chemical va...

Method and apparatus for low temperature selective epitaxy in a dee...

Robust tensorized shaped setpoint waveform streaming control

Plasma processing apparatus

Method and system for automated frequency tuning of radiofrequency...

Plasma enhanced film formation method

Method of uniformity control

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...

SPUTTERING APPARATUS

LIQUID COOLING PLATE FOR COOLING OF DIELECTRIC WINDOW OF A SUBSTRAT...

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

SUBSTRATE PROCESSING METHOD

Apparatus and Method for Splitting Current from Direct-Drive Radiof...

INDUCTIVE COUPLED COIL, RADIO FREQUENCY PROVISION APPARATUS, RADIO...

PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM

Source Tuning With Pulsed DC Bias

CONTROL DEVICE AND METHOD FOR ACTUATING AN IMPEDANCE MATCHING CIRCU...

METHOD OF PROCESSING A SUBSTRATE

RADIO FREQUENCY SOURCE FOR INDUCTIVELY COUPLED AND CAPACITIVELY COU...

TRANSIENT CONTROL OF AN ASYMMETRIC WAVEFORM

METHOD FOR IGNITING AND SUPPLYING A LASER OR PLASMA WITH POWER, AND...

UNIFORMITY CONTROL FOR PLASMA PROCESSING

SYSTEMS AND METHODS FOR REDUCING REFLECTED POWER AFTER A STATE TRAN...

LATERAL AND VERTICAL DIELECTROPHORESIS METHOD FOR MICRO/NANO-SCALE...

SUBSTRATE PROCESSING APPARATUS USING PLASMA PHASE SHIFT

SURFACE CHARGE AND POWER FEEDBACK AND CONTROL USING A SWITCH MODE B...

PLASMA CHAMBER FOR WAFER ETCHING AND WAFER ETCHING METHOD USING PLA...

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

PLASMA PROCESSING WITH PHASE-LOCKED WAVEFORMS

SYSTEMS AND METHODS FOR REDUCING VARIABILITY IN FEATURES OF A SUBST...

APPARATUS AND METHOD OF DAMAGE MITIGATION AND STEP COVERAGE ENHANCE...

SILICON NITRIDE FILM FORMATION METHOD AND PLASMA PROCESSING APPARATUS

POWER AMPLIFIER, RADIO FREQUENCY GENERATOR, AND WIRELESS POWER TRAN...

SUB-MILLISECOND OPTICAL DETECTION OF PULSED PLASMA PROCESSES

PLASMA PROCESSING APPARATUS AND END POINT DETECTION METHOD

RATING SUBSTRATE SUPPORT ASSEMBLIES BASED ON IMPEDANCE CIRCUIT ELEC...