the radio frequency energy being inductively coupled to the plasma

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/321the radio frequency energy being inductively coupled to the plasma

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Patents Grantslast 30 patents

Information Patent Grant
Plasma treatment apparatus, a method of monitoring a process of man...
- Patent number 12,170,233
- Issue date Dec 17, 2024
- Samsung Electronics Co., Ltd.
- Meehyun Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-frequency, direct-drive inductively coupled plasma source
- Patent number 12,165,841
- Issue date Dec 10, 2024
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fleetwide impedance tuning performance optimization
- Patent number 12,165,843
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor mask reshaping using a sacrificial layer
- Patent number 12,165,878
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control circuit for impedance match
- Patent number 12,165,844
- Issue date Dec 10, 2024
- Lam Research Corporation
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and etching method
- Patent number 12,165,849
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a material layer for semiconductor applications
- Patent number 12,165,877
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Zhigang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating apparatus and method for operating same
- Patent number 12,159,766
- Issue date Dec 3, 2024
- EN2CORE technology, Inc.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching device and method of manufacturing display device using the...
- Patent number 12,161,041
- Issue date Dec 3, 2024
- Samsung Display Co., Ltd.
- Dae Soo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma generation
- Patent number 12,159,765
- Issue date Dec 3, 2024
- MKS Instruments, Inc.
- Ron Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooled shield for ICP source
- Patent number 12,159,770
- Issue date Dec 3, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,159,771
- Issue date Dec 3, 2024
- Tokyo Electron Limited
- Yuki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Power supply and method of supplying power to load
- Patent number 12,155,320
- Issue date Nov 26, 2024
- EN2CORE technology, Inc.
- Yeong-Hoon Sohn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus to control a waveform
- Patent number 12,154,759
- Issue date Nov 26, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively-coupled plasma processing apparatus
- Patent number 12,154,760
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Hitoshi Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,761
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,765
- Issue date Nov 26, 2024
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,154,790
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 12,154,792
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,154,767
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency power supply device
- Patent number 12,148,596
- Issue date Nov 19, 2024
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma uniformity control in pulsed DC plasma chamber
- Patent number 12,148,595
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control and prediction of multiple plasma coupling surfaces and cor...
- Patent number 12,142,461
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF SELECTIVELY ETCHING SILICON NITRIDE
- Publication number 20240420962
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Doreen Wei Ying Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240420923
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Manabu ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA
- Publication number 20240420937
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Yu Cheng LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR CARBON PLUG FORMATION
- Publication number 20240420927
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...
- Publication number 20240420929
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Rajesh Dorai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
- Publication number 20240420922
- Publication date Dec 19, 2024
- TRUMPF Huettinger Sp. z o. o.
- Andrzej KLIMCZAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DRY ETCHING USING PLASMA
- Publication number 20240412979
- Publication date Dec 12, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME
- Publication number 20240412960
- Publication date Dec 12, 2024
- Samsung Electronics Co., Ltd.
- Jawon KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING
- Publication number 20240412947
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240412951
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- DONG-HUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER DELIVERY USING MICROWAVE SOURCE
- Publication number 20240404791
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PROCESSING APPARATUS USING PLASMA PHASE SHIFT
- Publication number 20240404790
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Jeongsu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reference Box for Direct-Drive Radiofrequency Power Supply
- Publication number 20240404804
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240404860
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Fu Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...
- Publication number 20240404789
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexei M. Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pulsed RF Plasma Generator With High Dynamic Range
- Publication number 20240404788
- Publication date Dec 5, 2024
- MKS Instruments, Inc.
- Ky LUU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Junction System for Direct-Drive Radiofrequency Power Supply
- Publication number 20240396372
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...
- Publication number 20240395503
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MATCH WITH AN ELONGATED RF STRAP
- Publication number 20240395504
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Felix Leib Kozakevich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
- Publication number 20240395509
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20240395515
- Publication date Nov 28, 2024
- SPP TECHNOLOGIES CO., LTD.
- Kazuya OTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Enclosure Including Spectral Reflectometry System for Pla...
- Publication number 20240395519
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Alexander Miller Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
- Publication number 20240395501
- Publication date Nov 28, 2024
- Samsung Electronics Co., Ltd.
- Hyojin PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTRODUCTION OF METAL IN HARD MASK FOR HIGH ASPECT RATIO DEVICE PAT...
- Publication number 20240395561
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Han WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM
- Publication number 20240395505
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240387144
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
- Publication number 20240387151
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- BENJAMIN ALEXANDROVICH
- H01 - BASIC ELECTRIC ELEMENTS

the radio frequency energy being inductively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma treatment apparatus, a method of monitoring a process of man...

Substrate processing apparatus and interlock method thereof

Dual-frequency, direct-drive inductively coupled plasma source

Fleetwide impedance tuning performance optimization

Methods and systems for advanced ion control for etching processes

Semiconductor mask reshaping using a sacrificial layer

Control method and plasma processing apparatus

Uniformity control circuit for impedance match

Plasma processing apparatus and etching method

Methods for etching a material layer for semiconductor applications

Spatial control of plasma processing environments

Plasma generating apparatus and method for operating same

Etching device and method of manufacturing display device using the...

Method and apparatus for plasma generation

Cooled shield for ICP source

Plasma processing apparatus

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Power supply and method of supplying power to load

Apparatus to control a waveform

Etching apparatus and etching method

Inductively-coupled plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Etching method and plasma processing apparatus

Plasma etching method

Substrate processing apparatus and substrate processing method

High-frequency power supply device

Plasma uniformity control in pulsed DC plasma chamber

Symmetric plasma source to generate pie-shaped treatment

Control and prediction of multiple plasma coupling surfaces and cor...

Patents Applicationslast 30 patents

METHODS OF SELECTIVELY ETCHING SILICON NITRIDE

PLASMA PROCESSING APPARATUS

GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA

SYSTEM AND METHOD FOR CARBON PLUG FORMATION

EXTREME EDGE FEATURE PROFILE TILT CONTROL BY ALTERING INPUT VOLTAGE...

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES

METHOD FOR DRY ETCHING USING PLASMA

SENSOR DEVICE AND SEMICONDUCTOR PROCESSING APPARATUS USING THE SAME

RADIO-FREQUENCY (RF) MATCHING NETWORK FOR FAST IMPEDANCE TUNING

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

POWER DELIVERY USING MICROWAVE SOURCE

WAFER PROCESSING APPARATUS USING PLASMA PHASE SHIFT

Reference Box for Direct-Drive Radiofrequency Power Supply

PLASMA PROCESSING APPARATUS AND METHOD

SYSTEMS AND METHODS FOR DETERMINING A PHASE DIFFERENCE BETWEEN RF S...

Pulsed RF Plasma Generator With High Dynamic Range

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

Junction System for Direct-Drive Radiofrequency Power Supply

Symmetric Coupling of Coil to Direct-Drive Radiofrequency Power Sup...

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

IMPEDANCE MATCH WITH AN ELONGATED RF STRAP

APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING

Substrate Processing Apparatus

Metrology Enclosure Including Spectral Reflectometry System for Pla...

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

INTRODUCTION OF METAL IN HARD MASK FOR HIGH ASPECT RATIO DEVICE PAT...

SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM

PLASMA PROCESSING APPARATUS

INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD