the radio frequency energy being inductively coupled to the plasma

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/321the radio frequency energy being inductively coupled to the plasma

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Patents Grantslast 30 patents

Information Patent Grant
Radio frequency (RF) system with embedded RF signal pickups
- Patent number 12,224,164
- Issue date Feb 11, 2025
- Tokyo Electron Limited
- Chelsea Dubose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,224,157
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuki Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam source, substrate process apparatus including the same, an...
- Patent number 12,224,163
- Issue date Feb 11, 2025
- Samsung Electronics Co., Ltd.
- SeungWan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spheroidal titanium metallic powders with custom microstructures
- Patent number 12,214,420
- Issue date Feb 4, 2025
- 6K Inc.
- Kamal Hadidi
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Systems and methods for processing gases
- Patent number 12,215,026
- Issue date Feb 4, 2025
- Transform Materials LLC
- David S. Soane
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing methods using multiphase multifrequency bias pulses
- Patent number 12,217,935
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Ya-Ming Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,218,222
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency source for inductively coupled and capacitively cou...
- Patent number 12,217,937
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and plasma processing method
- Patent number 12,217,941
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Satoru Kawakami
- B08 - CLEANING
Information Patent Grant
RF tuning systems including tuning circuits having impedances for s...
- Patent number 12,217,939
- Issue date Feb 4, 2025
- Lam Research Corporation
- David French
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sensor data compression in a plasma tool
- Patent number 12,217,940
- Issue date Feb 4, 2025
- Lam Research Corporation
- John Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-state pulsing for achieving a balance between bow control and...
- Patent number 12,217,972
- Issue date Feb 4, 2025
- Lam Research Corporation
- Nikhil Dole
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Performing radio frequency matching control using a model-based dig...
- Patent number 12,211,670
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Tao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning chamber for metal oxide removal
- Patent number 12,211,737
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control for plasma processing
- Patent number 12,211,677
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
High-frequency power supply apparatus
- Patent number 12,205,798
- Issue date Jan 21, 2025
- Daihen Corporation
- Yuichi Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rating substrate support assemblies based on impedance circuit elec...
- Patent number 12,205,791
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Arvind Shankar Raman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for anisotropic pattern etching and treatment
- Patent number 12,205,793
- Issue date Jan 21, 2025
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solid-state switch based high-speed pulser with plasma IEDF modific...
- Patent number 12,205,797
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure-induced temperature modification during atomic scale proce...
- Patent number 12,205,803
- Issue date Jan 21, 2025
- Kurt J. Lesker Company
- Gilbert Bruce Rayner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antenna structure and plasma generating device using same
- Patent number 12,205,794
- Issue date Jan 21, 2025
- EN2CORE TECHNOLOGY INC.
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 12,205,795
- Issue date Jan 21, 2025
- Ulvac, Inc.
- Taichi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,205,801
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Toshiaki Saijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency generator
- Patent number 12,206,372
- Issue date Jan 21, 2025
- Comet AG
- Daniel Gruner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of processing substrate, met...
- Patent number 12,195,854
- Issue date Jan 14, 2025
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
HTCC antenna for generation of microplasma
- Patent number 12,198,897
- Issue date Jan 14, 2025
- Inficon, Inc.
- Shawn Briglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable output impedance RF generator
- Patent number 12,198,898
- Issue date Jan 14, 2025
- Eagle Harbor Technologies, Inc.
- James Prager
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RF SPUTTERING OF MULTIPLE ELECTRODES WITH OPTIMIZED PLAMSA COUPLING...
- Publication number 20250054728
- Publication date Feb 13, 2025
- SPUTTERING COMPONENTS, INC.
- Ken Nauman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...
- Publication number 20250054729
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Shen PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON MASK DEPOSITION
- Publication number 20250054760
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Daniela ANJOS RIGSBY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250051915
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Yuta NAKANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems and Methods for Extracting Process Control Information from...
- Publication number 20250054730
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Ranadeep Bhowmick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS
- Publication number 20250054738
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dan MAROHL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS
- Publication number 20250054736
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Patrick G. BREILING
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME
- Publication number 20250046571
- Publication date Feb 6, 2025
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250046580
- Publication date Feb 6, 2025
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20250046620
- Publication date Feb 6, 2025
- Hitachi High-Tech Corporation
- Kenta NAKAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A METHOD AND APPARATUS FOR ENHANCING ION ENERGY AND REDUCING ION EN...
- Publication number 20250046572
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Device
- Publication number 20250046575
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Takahiro SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION
- Publication number 20250046576
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING
- Publication number 20250046635
- Publication date Feb 6, 2025
- Samsung Electronics Co., Ltd.
- Sangchul Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250046579
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Hirotoshi SAKAUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Supply and Method of Supplying Power To Load
- Publication number 20250047216
- Publication date Feb 6, 2025
- EN2CORE technology, Inc
- Yeong-Hoon SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250046573
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Mohd Fairuz BIN BUDIMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING
- Publication number 20250046574
- Publication date Feb 6, 2025
- UVAT TECHNOLOGY CO.,LTD.
- YUAN-CHI LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR LATERAL ETCH WITH BOTTOM PASSIVATION
- Publication number 20250046617
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Adam Pranda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK DESIGN FOR USE WITH FREQUENCY SWEEPING
- Publication number 20250037972
- Publication date Jan 30, 2025
- Advanced Energy Industries, Inc.
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND COR...
- Publication number 20250037973
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Actively Controlled gas inject FOR PROCESS Temperature CONTROL
- Publication number 20250037975
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Zhepeng CONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...
- Publication number 20250040442
- Publication date Jan 30, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Hung-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250029829
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- SungBae Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR HEATING A MEDIUM USING AN RF SIGNAL
- Publication number 20250029813
- Publication date Jan 23, 2025
- TRUMPF Huettinger GmbH + Co. KG
- Sebastian Wassenberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE SWITCH ON TIME CONTROL FOR BIAS SUPPLY
- Publication number 20250022683
- Publication date Jan 16, 2025
- Advanced Energy Industries, Inc.
- Maneesh Kumar Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER ASSISTED PLASMA PROCESSING
- Publication number 20250022689
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250022682
- Publication date Jan 16, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Shogo OKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250022684
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the radio frequency energy being inductively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radio frequency (RF) system with embedded RF signal pickups

Plasma processing apparatus and plasma processing method

Ion beam source, substrate process apparatus including the same, an...

Spheroidal titanium metallic powders with custom microstructures

Systems and methods for processing gases

To an inductively coupled plasma source

Plasma processing methods using multiphase multifrequency bias pulses

FinFET device and method of forming same

Radio frequency source for inductively coupled and capacitively cou...

Plasma processing apparatus, and plasma processing method

RF tuning systems including tuning circuits having impedances for s...

Sensor data compression in a plasma tool

Multi-state pulsing for achieving a balance between bow control and...

Systems and methods for metastable activated radical selective stri...

Performing radio frequency matching control using a model-based dig...

Cleaning chamber for metal oxide removal

Uniformity control for plasma processing

High-frequency power supply apparatus

Rating substrate support assemblies based on impedance circuit elec...

Method and apparatus for anisotropic pattern etching and treatment

Solid-state switch based high-speed pulser with plasma IEDF modific...

Pressure-induced temperature modification during atomic scale proce...

Antenna structure and plasma generating device using same

Plasma processing device

Plasma processing apparatus and plasma processing method

Radio frequency power generator having multiple output ports

Radio frequency generator

Substrate processing apparatus, method of processing substrate, met...

HTCC antenna for generation of microplasma

Variable output impedance RF generator

Patents Applicationslast 30 patents

RF SPUTTERING OF MULTIPLE ELECTRODES WITH OPTIMIZED PLAMSA COUPLING...

SUBSTRATE PROCESSING TOOL WITH HIGH-SPEED MATCH NETWORK IMPEDANCE S...

CARBON MASK DEPOSITION

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Systems and Methods for Extracting Process Control Information from...

TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS

A WAFER CHUCK ASSEMBLY WITH THERMAL INSULATION FOR RF CONNECTIONS

PLASMA GENERATING APPARATUS AND METHOD FOR OPERATING SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

A METHOD AND APPARATUS FOR ENHANCING ION ENERGY AND REDUCING ION EN...

Plasma Processing Device

PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION

SUBSTRATE PROCESSING

COPPER-LAYER ETCHING METHOD AND SUBSTRATE PROCESSING APPARATUS

Power Supply and Method of Supplying Power To Load

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING

METHOD FOR LATERAL ETCH WITH BOTTOM PASSIVATION

MATCH NETWORK DESIGN FOR USE WITH FREQUENCY SWEEPING

CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND COR...

Actively Controlled gas inject FOR PROCESS Temperature CONTROL

POST-TREATMENT PROCESSES FOR ION BEAM ETCHING OF MAGNETIC TUNNEL JU...

SUBSTRATE PROCESSING METHOD

METHOD AND APPARATUS FOR HEATING A MEDIUM USING AN RF SIGNAL

ACTIVE SWITCH ON TIME CONTROL FOR BIAS SUPPLY

GAS CLUSTER ASSISTED PLASMA PROCESSING

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...