Claims
- 1. Infrared radiation signature generation system comprising:
- means defining an enclosed chamber,
- means for generating a hot vapor at selected rates, the temperature of the vapor being greater than the ambient temperature surrounding said chamber,
- means for distributing said hot vapor to the interior of said chamber at a pressure higher than ambient pressure,
- the wall of said chamber being formed of material which allows percolation of vapor therethrough, said percolating vapor transferring heat to said chamber wall and causing a temperature rise therein whereby said chamber wall emits an infrared radiation signature in response to such temperature rise,
- temperature transducer feedback means interrelated with the wall of said chamber and responsive to the temperature thereof for generating a signal whose amplitude varies in relation to such temperature, and
- rate controller means responsive to said signal for controlling the generation rate of hot vapor to maintain said chamber wall at a steady state temperature whereby a continuous infrared radiation signature is generated.
- 2. System in accordance with claim 1 wherein said means for generating include means for vaporizing a vapor precursor, means for introducing a vapor precursor to said means for vaporizing and control valve means responsive to said controller means for controlling vapor precursor flow rates to said means for vaporizing.
- 3. System in accordance with claim 1 wherein said chamber includes a cloth shroud.
- 4. System in accordance with claim 1 wherein said chamber is spherical in shape.
- 5. System in accordance with claim 1 wherein said means for distributing includes at least one manifold.
- 6. System in accordance with claim 2 wherein said means for introducing includes a pressure source.
- 7. System in accordance with claim 2 wherein said means for introducing includes a pump.
- 8. System in accordance with claim 2 wherein said means for vaporizing includes a reactor bed.
- 9. System in accordance with claim 2 wherein the vapor precursor includes hydrazine.
- 10. System in accordance with claim 6 wherein said pressure source includes nitrogen.
- 11. System in accordance with claim 2 further including means defining a tank for holding vapor precursor.
- 12. System in accordance with claim 1 wherein said means for generating, means for distributing, temperature transducer feedback means, and controller means are situated within said enclosed chamber.
BACKGROUND OF THE INVENTION
This application describes an invention made or partially made in the course of work under a U.S. Government contract, viz Department of the Air Force Contract No. F04701-78-C-0125. A royalty-free, non-exclusive license has been granted to the U.S. Government to utilize the invention for government purposes.
US Referenced Citations (4)