The field of the disclosure generally relates to slurry sprayers and to supports for slurry sprayers. The field of the disclosure also generally relates to methods for slicing a silicon ingot.
Electronic chip and solar cell chips are fabricated from wafers sliced from ingots of silicon. Such ingots may be sliced by a wire saw (e.g., having a web of diamond wire). When slicing crystal ingots, the friction between the wafer and the wire generates heat, which increases the temperature of the wafer. Heat is conventionally dissipated by spraying the ingot and wire by a water jet discharge from a slurry sprayer. Conventional slurry sprayers are generally made by integrated molding. It is difficult to thoroughly remove the impurities and dirt inside the slurry sprayer during cleaning.
When slicing crystal ingots, the wire (e.g., diamond wire) may be at least wrapped on a main roller, which allows the wire to move synchronously with the main roller. After longer periods of use, the wire may wear the surface of the main roller. The surface is often flattened and smoothed to allow the roller to be used for longer periods. This causes the diameter of the main roller to gradually decrease which further lowers the contact position between the wire and the crystal ingot. Supports for conventional slurry sprayers are soldered in the crystal ingot wire saw which prevents adjustment of the slurry sprayer relative to the wire saw. When the contact position of the wire lowers, conventional slurry sprayers are not able to adjust correspondingly, which further leads to poor cooling efficiency when slicing crystal ingots.
There exists a need for slurry sprayers that may be cleaned more thoroughly and for slurry sprayer supports that allow the position of the sprayer to be adjusted.
This section is intended to introduce the reader to various aspects of art that may be related to various aspects of the disclosure, which are described and/or claimed below. This discussion is believed to be helpful in providing the reader with background information to facilitate a better understanding of the various aspects of the present disclosure. Accordingly, it should be understood that these statements are to be read in this light, and not as admissions of prior art.
One aspect of the present disclosure is directed to a slurry sprayer having a longitudinal axis. The slurry sprayer includes a main body having a top, a bottom opposite the top, a front and a rear opposite the front. A chamber is defined in the main body for receiving slurry. A plurality of discharge outlets are arranged along the longitudinal axis that extend through the top. A feed opening extends through the front. The feed opening is fluidly connected to the discharge outlets by the chamber. The slurry sprayer includes a cover plate detachably connected to the main body.
Another aspect of the present disclosure is directed to a slurry spray system. The slurry spray system has a slurry sprayer having a main body. The main body has a feed opening and a plurality of discharge openings. The slurry spray system includes a plurality of nozzles removably connected to a top of the main body. Each nozzle is aligned with a discharge opening. The slurry spray system includes an adjustable support for the slurry sprayer. The adjustable support includes a first supporting body that supports the slurry sprayer toward a first end of the slurry sprayer. The first supporting body includes a first fixed base and a first moving member moveable with respect to the first fixed base in a first direction. The first supporting body includes a second moving member moveable with respect to the first moving member in a second direction. The first supporting body also includes a positioning base that is rotatable with respect to the second moving member. The adjustable support includes a second supporting body that supports the slurry sprayer toward a second end of slurry sprayer.
A further aspect of the present disclosure is directed to an ingot wafering system. The ingot wafering system includes a first roller, a second roller, and a wire web at least partially disposed about the first roller and the second roller. The ingot wafering system includes a first slurry spray system for applying slurry. The first slurry spray system is disposed toward the first roller and includes a first slurry sprayer having a main body. The main body includes a plurality of discharge outlets, a first feed opening fluidly connected to the discharge outlets, and a second feed opening fluidly connected to the discharge outlets. The first slurry spray system includes a plurality of nozzles disposed on the main body. Each of the nozzles is fluidly connected to a discharge outlet. The ingot wafering system includes a second slurry spray system for applying slurry. The second slurry spray system is disposed toward the second roller and includes a second slurry sprayer having a main body. The main body of the second slurry sprayer has a plurality of discharge outlets, a first feed opening fluidly connected to the discharge outlets, and a second feed opening fluidly connected to the discharge outlets. The second slurry spray system includes a plurality of nozzles disposed on the main body. Each of the nozzles is fluidly connected to a discharge outlet.
Yet another aspect of the present disclosure is directed to a method for slicing a silicon ingot. A slurry sprayer is positioned onto a first supporting body. The first supporting body supports the slurry sprayer toward a first end of the slurry sprayer. The slurry sprayer is positioned onto a second supporting body. The second supporting body supports the slurry sprayer toward a second end of the slurry sprayer. The first and second supporting bodies are adjusted to set the position of the slurry sprayer in a horizontal and vertical position and to set an incline angle of the slurry sprayer. Slurry is directed from the sprayer to a wire web that contacts the silicon ingot to slice the silicon ingot into wafers. A silicon ingot is moved relative to the wire web while moving the wire web across the ingot to slice the silicon ingot into wafers.
Various refinements exist of the features noted in relation to the above-mentioned aspects of the present disclosure. Further features may also be incorporated in the above-mentioned aspects of the present disclosure as well. These refinements and additional features may exist individually or in any combination. For instance, various features discussed below in relation to any of the illustrated embodiments of the present disclosure may be incorporated into any of the above-described aspects of the present disclosure, alone or in any combination.
Corresponding reference characters indicate corresponding parts throughout the drawings.
A slurry sprayer 1 of an embodiment of the present disclosure is shown in
The slurry sprayer 1 has a longitudinal axis AX that extends through a first end 117 and a second end 119 of the slurry sprayer 1. The main body 100 extends along the longitudinal axis AX. The main body 100 of the slurry sprayer 1 includes a chamber 122 defined therein through which slurry flows. The main body 100 includes first and second lips 140 (
The term “slurry” as used herein should not be considered in a limited sense. Reference herein to “slurry” includes liquid formulation which include abrasive particles and formulation which do not include abrasive particles (e.g., water).
The main body 100 of the slurry sprayer 1 may have any suitable shape that allows the sprayer 1 to function as described herein. In the illustrated embodiment, the main body 100 of the slurry sprayer 1 has a rectangular profile (i.e., rectangular cross-section). The main body 100 includes a top 105 (
Each discharge outlet 160 of the main body 100 is fluidly connected to a nozzle 170 (
The discharge outlets 160 are arranged on the main body 100 along the longitudinal axis AX and extend through the top 105 of the main body 100. Each of the discharge outlets 160 is in fluid communication with the chamber 122 formed in the main body 100. The feed openings 180 are also arranged on the main body 100 along the longitudinal axis AX. The feed openings 180 extend through the front 109 of the main body 100. Each feed opening 180 is in fluid communication with the chamber 122 formed in the main body 100. As shown in the Figures, the feed openings 180 and discharge outlets 160 are perpendicular to each other (i.e., the center axes that extend through the feed openings 180 and through the discharge outlets 160 are offset about 90° from each other).
The feed openings 180 are fluidly connected to the chamber 122 within the main body 100 which is fluidly connected to the discharge outlets 160. As shown in
In the illustrated embodiment, the slurry sprayer 1 has four nozzles 170 and four corresponding discharge outlets 160. The slurry sprayer 1 may have any number of nozzles 170 and discharge outlets 160 that allow the slurry sprayer 1 to function as described herein. For example, the slurry sprayer 1 may include 2, 3, 4, 6, 8, or 10 or more nozzles 170 and corresponding discharge outlets 160. In the illustrated embodiment, the slurry sprayer 1 includes two feed openings 180. The slurry sprayer 1 may have any number of feed openings 180 that allow the slurry sprayer 1 to operate as described herein. For example, the slurry sprayer 1 may include 1, 2, 3, 4 or more feed openings 180.
In some embodiments, the slurry sprayer 1 has a number of nozzles 170 (and corresponding discharge outlets 160) and a number of feed openings 180 such that the ratio of nozzles 170 (and corresponding discharge outlets 160) to feed openings is less than 8:1. In some embodiments, the ratio of the number of nozzles 170 (and corresponding discharge outlet 160) to the number of feed openings 180 is 5:1 or less, 4:1 or less, 3:1 or less or 2:1 or less.
Referring now to
The cover plate 110 includes a plurality of access apertures 112 (
The cover plate 110 includes a plurality of plugs 116 (
In the illustrated embodiment, the nozzles 170 are detachably connected to the corresponding discharge outlet 160. Each of the nozzles 170 has a channel 172 (
An adjustable support 200 for a slurry sprayer such as the slurry sprayer 1 described above is shown in
The first supporting body 220 includes a first fixed base 222, a first moving member 224, a second moving member 226, and a positioning base 228. The first moving member 224 is detachably connected to the first fixed base 222, and the first moving member 224 is moveable relative to the first fixed base 222 in a first direction D1. In the illustrated embodiment, the corresponding positions between the first fixed base 222 and the first moving member 224 are adjusted by a first adjusting mechanism 223. The first adjusting mechanism 223 could be, for example and without limitation, a combination of a locking rod and a slot or a combination of a bolt and a nut.
The second moving member 226 is detachably connected to the first moving member 224, and the second moving member 226 is moveable relative to the first moving member 224 in a second direction D2. The relative position between the first moving member 224 and the second moving member 226 are adjusted by a second adjusting mechanism 225. The second adjusting mechanism 225 may be, for example and without limitation, a combination of a locking rod and a slot or a combination of a bolt and a nut.
In the illustrated embodiment, the first direction D1 is perpendicular to the second direction D2. More specifically, the first direction D1 is a horizontal direction, and the second direction D2 is a vertical direction, and both the first direction D1 and the second direction D2 are perpendicular to the longitudinal axis AX of the slurry sprayer 1.
The positioning base 228 is connected to the second moving member 226, and is rotatable relative to the second moving member 226. The main body 100 of the slurry sprayer 1 is disposed on the positioning base 228.
The positioning base 228 rotates relative to the second moving member 226 along a rotation direction R. A fifth adjusting mechanism 227 allows the positioning base 228 to be selectively locked on unlocked with respect to the second moving member 226. This allows rotatable adjustment of the positioning base 228 (and slurry sprayer 1) relative to the second moving member 226. The fifth adjusting mechanism 227 could be, for example and without limitation, a combination of a locking rod and a slot or a combination of a bolt and a nut.
In the illustrated embodiment, the positioning base 228 has a receiving surface that matches the contour of the main body 100 of the slurry sprayer 1 (e.g., rectangular as shown). In some embodiments, the slurry sprayer 1 and positioning base 228 are prevented from rotating relative to each other (e.g., due to the V-shaped profile of the base 228 and rectangular profile of the main body 100). This allows the slurry sprayer 1 to rotate with the positioning base 228.
The first supporting body 220 includes a stop member 229. When the main body 100 of the slurry sprayer 1 is disposed on the positioning base 228, the stop member 229 abuts the main body 100. The enables the main body 100 to be fixed between the stop member 229 and the positioning base 228. The stop member 229 includes a pivot member 241 and a locking member 247. The stop member 229 is pivotally connected to the second moving member 226 by the pivot member 241 to allow the stop member 229 to be lifted upward. The stop member 229 may be fixed to the second moving member 226 by the locking member 247. This allows the main body 100 of the slurry sprayer 1 to be fixed between the stop member 229 and the positioning base 228. In some embodiments, the second moving member 226 has a recess 230 (
The second supporting body 240 (
The fourth moving member 246 is detachably connected to the third moving member 244 and is moveable relative to the third moving member 244 in the second direction D2. The third moving member 244 and the fourth moving member 246 are adjusted by a fourth adjusting mechanism 245. The fourth adjusting mechanism 245 could be, for example and without limitation, a combination of a locking rod and a slot or a combination of a bolt and a nut.
The fourth moving member 246 includes a recess 261 and the second end portion 150 of the slurry sprayer 1 is received in the recess 261. The second end portion 150 of the slurry sprayer 1 may rotate within the recess 261. In this arrangement, when the positioning base 228 (
The slurry sprayer 1 may be incorporated into an ingot wafering system 300 (
To circulate slurry through the slurry sprayer 1, slurry is introduced through the feed conduits 131 (
To clean the slurry sprayer 1, the plugs 116 (
Compared to conventional slurry sprayers, the slurry sprayers of embodiments of the present disclosure have several advantages. Access apertures that are aligned opposite the discharge outlets allow the discharge openings and nozzle to be cleaned with greater ease (e.g., without removing the cover plate). Embodiments having a removable cover plate allow for access to the chamber formed by the main body of the sprayer and for access to the discharge openings and nozzles. In embodiments in which sprayer includes at least two feed openings (e.g., with a ratio of nozzles to discharge openings being less than 8:1, 5:1 or less, or 4:1 or less), the pressure may be better balanced across the nozzles. In embodiment having an adjustable support, the sprayer may be rotated to change the incline angle to account for changes in the roller profile (e.g., reduction in diameter over time). The position of the slurry sprayer may also be adjusted for better cooling performance (e.g., horizontal and vertical positions relative to the roller, wire and/or ingot). The slurry sprayer may be adjustable in three directions—the angle of inclination of the slurry may be changed and the position of the sprayer may be moved horizontally and vertically.
As used herein, the terms “about,” “substantially,” “essentially” and “approximately” when used in conjunction with ranges of dimensions, concentrations, temperatures or other physical or chemical properties or characteristics is meant to cover variations that may exist in the upper and/or lower limits of the ranges of the properties or characteristics, including, for example, variations resulting from rounding, measurement methodology or other statistical variation.
When introducing elements of the present disclosure or the embodiment(s) thereof, the articles “a”, “an”, “the” and “said” are intended to mean that there are one or more of the elements. The terms “comprising,” “including,” “containing” and “having” are intended to be inclusive and mean that there may be additional elements other than the listed elements. The use of terms indicating a particular orientation (e.g., “top”, “bottom”, “side”, etc.) is for convenience of description and does not require any particular orientation of the item described.
As various changes could be made in the above constructions and methods without departing from the scope of the disclosure, it is intended that all matter contained in the above description and shown in the accompanying drawing[s] shall be interpreted as illustrative and not in a limiting sense.
Number | Date | Country | Kind |
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107143056 | Nov 2018 | TW | national |
107143057 | Nov 2018 | TW | national |
This application is a Divisional of U.S. Non-provisional patent application Ser. No. 18/313,441, filed May 8, 2023, which is a Divisional of U.S. Non-provisional patent application Ser. No. 16/697,709, filed Nov. 27, 2019, which claims priority to Taiwanese Patent Application No. 107143056, filed Nov. 30, 2018 and Taiwanese Patent Application No. 107143057, filed Nov. 30, 2018. Each application is incorporated herein by reference in its entirety.
Number | Date | Country | |
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Parent | 18313441 | May 2023 | US |
Child | 18818218 | US | |
Parent | 16697709 | Nov 2019 | US |
Child | 18313441 | US |